ATE480129T1 - Stabilisierte oszillatorschaltung zur messung der plasmadichte - Google Patents

Stabilisierte oszillatorschaltung zur messung der plasmadichte

Info

Publication number
ATE480129T1
ATE480129T1 AT00948743T AT00948743T ATE480129T1 AT E480129 T1 ATE480129 T1 AT E480129T1 AT 00948743 T AT00948743 T AT 00948743T AT 00948743 T AT00948743 T AT 00948743T AT E480129 T1 ATE480129 T1 AT E480129T1
Authority
AT
Austria
Prior art keywords
measurement
oscillator circuit
plasma density
stabilized oscillator
voltage
Prior art date
Application number
AT00948743T
Other languages
English (en)
Inventor
Murray Sirkis
Joseph Verdeyen
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of ATE480129T1 publication Critical patent/ATE480129T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
AT00948743T 1999-11-19 2000-07-20 Stabilisierte oszillatorschaltung zur messung der plasmadichte ATE480129T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16641899P 1999-11-19 1999-11-19
PCT/US2000/019540 WO2001037306A1 (en) 1999-11-19 2000-07-20 Stabilized oscillator circuit for plasma density measurement

Publications (1)

Publication Number Publication Date
ATE480129T1 true ATE480129T1 (de) 2010-09-15

Family

ID=22603226

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00948743T ATE480129T1 (de) 1999-11-19 2000-07-20 Stabilisierte oszillatorschaltung zur messung der plasmadichte

Country Status (8)

Country Link
EP (1) EP1232513B1 (de)
JP (1) JP4890714B2 (de)
KR (1) KR100800183B1 (de)
CN (1) CN1156868C (de)
AT (1) ATE480129T1 (de)
DE (1) DE60044908D1 (de)
TW (1) TW456161B (de)
WO (1) WO2001037306A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6646386B1 (en) 1999-07-20 2003-11-11 Tokyo Electron Limited Stabilized oscillator circuit for plasma density measurement
KR100792303B1 (ko) * 1999-07-20 2008-01-07 동경 엘렉트론 주식회사 플라즈마를 수용하는 개방형 공진기에 고정된 마이크로파발진기를 사용하는 전자밀도측정과 플라즈마 공정제어시스템
US6741944B1 (en) 1999-07-20 2004-05-25 Tokyo Electron Limited Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
US6861844B1 (en) 1999-07-21 2005-03-01 Tokyo Electron Limited Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
CN1249401C (zh) * 2001-10-24 2006-04-05 东京电子株式会社 用于壁膜监测的方法与设备
US7480571B2 (en) * 2002-03-08 2009-01-20 Lam Research Corporation Apparatus and methods for improving the stability of RF power delivery to a plasma load
JP4777647B2 (ja) * 2002-07-23 2011-09-21 東京エレクトロン株式会社 プラズマ診断システムおよびその制御方法
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
US7902991B2 (en) * 2006-09-21 2011-03-08 Applied Materials, Inc. Frequency monitoring to detect plasma process abnormality
CN110618443B (zh) * 2019-08-26 2021-04-13 北京控制工程研究所 一种等离子体推力器稳态离子流场测量装置及测量方法
KR20250072298A (ko) * 2023-11-16 2025-05-23 한국핵융합에너지연구원 주파수 스윕 간섭계를 이용한 플라스마 밀도 측정 장치 및 이를 이용한 플라스마 밀도 측정 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4381485A (en) 1981-02-23 1983-04-26 Steinbrecher Corporation Microwave test apparatus and method
JPH0512704U (ja) * 1991-02-28 1993-02-19 株式会社不二越 位置決め制御回路
US5225740A (en) * 1992-03-26 1993-07-06 General Atomics Method and apparatus for producing high density plasma using whistler mode excitation
JP3269853B2 (ja) * 1992-07-17 2002-04-02 株式会社ダイヘン プラズマ処理装置
JPH06349594A (ja) * 1993-06-07 1994-12-22 Mitsubishi Electric Corp プラズマ発生装置
US5506475A (en) * 1994-03-22 1996-04-09 Martin Marietta Energy Systems, Inc. Microwave electron cyclotron electron resonance (ECR) ion source with a large, uniformly distributed, axially symmetric, ECR plasma volume
US5568801A (en) * 1994-05-20 1996-10-29 Ortech Corporation Plasma arc ignition system
KR970055231A (ko) * 1995-12-28 1997-07-31 김광호 전압제어발진기의 발진주파수와 대역필터의 중심주파수의 자동조정시스템
US5770922A (en) * 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
US6027601A (en) * 1997-07-01 2000-02-22 Applied Materials, Inc Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor

Also Published As

Publication number Publication date
KR20020079722A (ko) 2002-10-19
CN1361919A (zh) 2002-07-31
WO2001037306A1 (en) 2001-05-25
EP1232513A1 (de) 2002-08-21
JP2003514362A (ja) 2003-04-15
TW456161B (en) 2001-09-21
EP1232513A4 (de) 2007-03-07
EP1232513B1 (de) 2010-09-01
KR100800183B1 (ko) 2008-02-01
DE60044908D1 (de) 2010-10-14
CN1156868C (zh) 2004-07-07
JP4890714B2 (ja) 2012-03-07

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