ATE480800T1 - Alkalischer entwickler für strahlungsempfindliche zusammensetzungen - Google Patents

Alkalischer entwickler für strahlungsempfindliche zusammensetzungen

Info

Publication number
ATE480800T1
ATE480800T1 AT05103878T AT05103878T ATE480800T1 AT E480800 T1 ATE480800 T1 AT E480800T1 AT 05103878 T AT05103878 T AT 05103878T AT 05103878 T AT05103878 T AT 05103878T AT E480800 T1 ATE480800 T1 AT E480800T1
Authority
AT
Austria
Prior art keywords
developer
radiation sensitive
sensitive compositions
alkaline developer
alkaline
Prior art date
Application number
AT05103878T
Other languages
English (en)
Inventor
Willi-Kurt Gries
Damme Marc Van
Mario Boxhorn
Pascla Meeus
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Application granted granted Critical
Publication of ATE480800T1 publication Critical patent/ATE480800T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
AT05103878T 2005-05-10 2005-05-10 Alkalischer entwickler für strahlungsempfindliche zusammensetzungen ATE480800T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05103878A EP1722274B1 (de) 2005-05-10 2005-05-10 Alkalischer Entwickler für strahlungsempfindliche Zusammensetzungen

Publications (1)

Publication Number Publication Date
ATE480800T1 true ATE480800T1 (de) 2010-09-15

Family

ID=36168413

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05103878T ATE480800T1 (de) 2005-05-10 2005-05-10 Alkalischer entwickler für strahlungsempfindliche zusammensetzungen

Country Status (3)

Country Link
EP (1) EP1722274B1 (de)
AT (1) ATE480800T1 (de)
DE (1) DE602005023417D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8445176B2 (en) 2007-05-25 2013-05-21 Agfa Graphics Nv Lithographic printing plate precursor
ATE529782T1 (de) * 2007-08-27 2011-11-15 Agfa Graphics Nv Verfahren zur entwicklung einer wärmeempfindlichen lithographiedruckplatte mit einer wässrigen alkalischen entwicklerlösung
WO2009080645A1 (en) * 2007-12-19 2009-07-02 Agfa Graphics Nv A method for preparing lithographic printing plate precursors
EP2095948B1 (de) * 2008-02-28 2010-09-15 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckplatte
JP5346755B2 (ja) * 2009-09-24 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5635328A (en) * 1993-08-21 1997-06-03 Konica Corporation Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
EP1172699B1 (de) * 2000-07-14 2013-09-11 FUJIFILM Corporation Verfahren zur Herstellung lithographischer Druckplatten
US6887654B2 (en) * 2002-05-07 2005-05-03 Shipley Company, L.L.C. Residue and scum reducing composition and method

Also Published As

Publication number Publication date
EP1722274A1 (de) 2006-11-15
DE602005023417D1 (de) 2010-10-21
EP1722274B1 (de) 2010-09-08

Similar Documents

Publication Publication Date Title
TW200710578A (en) Antireflective hardmask composition and methods for using same
TW200702928A (en) Composition for underlayer film of resist and process for producing the same
ATE493267T1 (de) Flachdruckplattenvorläufer und flachdruckprozess
DE602004018451D1 (de) Kolloidale Kieselsäure enthaltendes Bindemittel für einen Flussmittel, Flussmittel und Verfahren
ATE456633T1 (de) Tintenstrahldruckfarbe
TW200502699A (en) Novel positive photosensitive resin compositions
ATE480800T1 (de) Alkalischer entwickler für strahlungsempfindliche zusammensetzungen
ATE521016T1 (de) Verwendung einer positiven resist-zusammensetzung für immersions-lithographie, positive resist- zusammensetzung und immersions-lithographische strukturierungsmethode mit benutzung derselbigen
TW200801810A (en) Resist composition for immersion lithography, and method for forming resist pattern
BR112012021251A2 (pt) método para preparação de chapa de impressão litográfica e revelador para precursor de chapa de impressão litográfica.
WO2009035045A1 (ja) ポジ型感光性組成物、該組成物を用いたパターン形成方法、及び、該組成物に用いられる樹脂
TW200643622A (en) Antireflective hardmask composition and methods for using same
DE602005009617D1 (de) Verfahren zur Herstellung lithographischer Druckplatten
DE602006016845D1 (de) Verwendung von markierflüssigkeiten für vinylsubstrate
TR199700408T1 (xx) Bir suda tertier amin oksit i�inde bir sel�loz ��zeltisinin aktar�m� i�in i�lem.
TW200732835A (en) Pellicle for exposure apparatus having large numerical aperture
DE602006014657D1 (de) 2-sulfinyl- und 2-sulfonyl-substituierte imidazolderivate und deren verwendung als cytokininhibitoren
AR058178A1 (es) Preventivos remedios para trastornos urinarios
ATE486303T1 (de) Verfahren zur verarbeitung von flachdruckplatten
BRPI0508471A (pt) hidróxi-6-fenilfenantridinas substituìdas por difluoroetóxi
TW200712130A (en) Process oil and rubber composition
ATE483746T1 (de) Blockcopolymer und seine verwendung
FR2878855B1 (fr) Procede de preparation de polyorganosiloxane a groupements fonctionnels en presence de silanolate de lithium
TW200728925A (en) Protective film forming material and photoresist pattern forming method using the same
TW200736384A (en) Cleaning liquid and cleaning method

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties