ATE480800T1 - Alkalischer entwickler für strahlungsempfindliche zusammensetzungen - Google Patents
Alkalischer entwickler für strahlungsempfindliche zusammensetzungenInfo
- Publication number
- ATE480800T1 ATE480800T1 AT05103878T AT05103878T ATE480800T1 AT E480800 T1 ATE480800 T1 AT E480800T1 AT 05103878 T AT05103878 T AT 05103878T AT 05103878 T AT05103878 T AT 05103878T AT E480800 T1 ATE480800 T1 AT E480800T1
- Authority
- AT
- Austria
- Prior art keywords
- developer
- radiation sensitive
- sensitive compositions
- alkaline developer
- alkaline
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- -1 polyethyleneoxy group Polymers 0.000 abstract 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 230000002209 hydrophobic effect Effects 0.000 abstract 1
- 239000002736 nonionic surfactant Substances 0.000 abstract 1
- 238000004062 sedimentation Methods 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05103878A EP1722274B1 (de) | 2005-05-10 | 2005-05-10 | Alkalischer Entwickler für strahlungsempfindliche Zusammensetzungen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE480800T1 true ATE480800T1 (de) | 2010-09-15 |
Family
ID=36168413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05103878T ATE480800T1 (de) | 2005-05-10 | 2005-05-10 | Alkalischer entwickler für strahlungsempfindliche zusammensetzungen |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1722274B1 (de) |
| AT (1) | ATE480800T1 (de) |
| DE (1) | DE602005023417D1 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101681106B (zh) | 2007-05-25 | 2013-11-20 | 爱克发印艺公司 | 平版印刷印版前体、制备前体中敏化剂混合物的方法 |
| EP2031448B1 (de) | 2007-08-27 | 2011-10-19 | Agfa Graphics N.V. | Verfahren zur Entwicklung einer wärmeempfindlichen Lithographiedruckplatte mit einer wässrigen alkalischen Entwicklerlösung |
| WO2009080645A1 (en) * | 2007-12-19 | 2009-07-02 | Agfa Graphics Nv | A method for preparing lithographic printing plate precursors |
| EP2095948B1 (de) * | 2008-02-28 | 2010-09-15 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckplatte |
| JP5346755B2 (ja) * | 2009-09-24 | 2013-11-20 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5635328A (en) * | 1993-08-21 | 1997-06-03 | Konica Corporation | Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound |
| US6248506B1 (en) * | 1998-12-04 | 2001-06-19 | Nichigo-Morton | Aqueous developing solutions for reduced developer residue |
| EP1172699B1 (de) * | 2000-07-14 | 2013-09-11 | FUJIFILM Corporation | Verfahren zur Herstellung lithographischer Druckplatten |
| US6887654B2 (en) * | 2002-05-07 | 2005-05-03 | Shipley Company, L.L.C. | Residue and scum reducing composition and method |
-
2005
- 2005-05-10 AT AT05103878T patent/ATE480800T1/de not_active IP Right Cessation
- 2005-05-10 EP EP05103878A patent/EP1722274B1/de not_active Expired - Lifetime
- 2005-05-10 DE DE602005023417T patent/DE602005023417D1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1722274A1 (de) | 2006-11-15 |
| DE602005023417D1 (de) | 2010-10-21 |
| EP1722274B1 (de) | 2010-09-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |