ATE481430T1 - Acrylcopolymer und strahlungsempfindliche harzzusammensetzung - Google Patents

Acrylcopolymer und strahlungsempfindliche harzzusammensetzung

Info

Publication number
ATE481430T1
ATE481430T1 AT03770122T AT03770122T ATE481430T1 AT E481430 T1 ATE481430 T1 AT E481430T1 AT 03770122 T AT03770122 T AT 03770122T AT 03770122 T AT03770122 T AT 03770122T AT E481430 T1 ATE481430 T1 AT E481430T1
Authority
AT
Austria
Prior art keywords
acrylic copolymer
resin composition
sensitive resin
radiation sensitive
radiation
Prior art date
Application number
AT03770122T
Other languages
English (en)
Inventor
Hiroyuki Ishii
Kouichi Fujiwara
Hiroshi Yamaguchi
Yukio Nishimura
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Application granted granted Critical
Publication of ATE481430T1 publication Critical patent/ATE481430T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
AT03770122T 2002-11-05 2003-11-04 Acrylcopolymer und strahlungsempfindliche harzzusammensetzung ATE481430T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002320697 2002-11-05
JP2002330870 2002-11-14
PCT/JP2003/014051 WO2004041879A1 (ja) 2002-11-05 2003-11-04 アクリル系共重合体および感放射線性樹脂組成物

Publications (1)

Publication Number Publication Date
ATE481430T1 true ATE481430T1 (de) 2010-10-15

Family

ID=32314046

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03770122T ATE481430T1 (de) 2002-11-05 2003-11-04 Acrylcopolymer und strahlungsempfindliche harzzusammensetzung

Country Status (9)

Country Link
US (1) US7452655B2 (de)
EP (1) EP1586594B1 (de)
JP (3) JP5163345B2 (de)
KR (1) KR101010410B1 (de)
AT (1) ATE481430T1 (de)
AU (1) AU2003280710A1 (de)
DE (1) DE60334249D1 (de)
TW (1) TW200422309A (de)
WO (1) WO2004041879A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60334249D1 (de) * 2002-11-05 2010-10-28 Jsr Corp Acrylcopolymer und strahlungsempfindliche harzzusammensetzung
US7763412B2 (en) 2004-06-08 2010-07-27 Tokyo Ohka Kogyo Co., Ltd. Polymer, positive resist composition and method for forming resist pattern
JP2006003781A (ja) * 2004-06-21 2006-01-05 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物及びレジストパターン形成方法
JP4655128B2 (ja) * 2008-09-05 2011-03-23 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
JP6988635B2 (ja) * 2018-03-27 2022-01-05 三菱ケミカル株式会社 レジスト用重合体
JP6973265B2 (ja) * 2018-04-20 2021-11-24 信越化学工業株式会社 レジスト材料及びパターン形成方法
CN109991811A (zh) * 2019-02-27 2019-07-09 江苏南大光电材料股份有限公司 一种酸扩散抑制剂及其制备方法与光刻胶组合物
CN116088269B (zh) * 2021-11-05 2026-04-21 上海芯刻微材料技术有限责任公司 一种193nm湿法光刻胶用添加剂及其制备方法和应用

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2643056B2 (ja) 1991-06-28 1997-08-20 インターナショナル・ビジネス・マシーンズ・コーポレイション 表面反射防止コーティング形成組成物及びその使用
JPH0612452A (ja) 1992-06-25 1994-01-21 Hitachi Ltd グループ情報アクセス方式
JP3751065B2 (ja) 1995-06-28 2006-03-01 富士通株式会社 レジスト材料及びレジストパターンの形成方法
JP3042618B2 (ja) 1998-07-03 2000-05-15 日本電気株式会社 ラクトン構造を有する（メタ）アクリレート誘導体、重合体、フォトレジスト組成物、及びパターン形成方法
JP4131062B2 (ja) * 1998-09-25 2008-08-13 信越化学工業株式会社 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法
US6403280B1 (en) * 1999-04-28 2002-06-11 Jsr Corporation Radiation sensitive resin composition
US6482568B1 (en) * 1999-09-17 2002-11-19 Jsr Corporation Radiation-sensitive resin composition
JP3821211B2 (ja) * 2000-03-21 2006-09-13 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP4768152B2 (ja) 2000-09-01 2011-09-07 ダイセル化学工業株式会社 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2002202604A (ja) * 2000-12-28 2002-07-19 Jsr Corp 感放射線性樹脂組成物
KR100760146B1 (ko) * 2000-09-18 2007-09-18 제이에스알 가부시끼가이샤 감방사선성 수지 조성물
JP2002201232A (ja) * 2000-10-27 2002-07-19 Daicel Chem Ind Ltd フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2002156750A (ja) 2000-11-20 2002-05-31 Sumitomo Chem Co Ltd 化学増幅型ポジ型レジスト組成物
JP4088753B2 (ja) * 2000-12-07 2008-05-21 信越化学工業株式会社 レジスト組成物及びパターン形成方法
JP4208422B2 (ja) * 2001-02-23 2009-01-14 富士フイルム株式会社 ポジ型レジスト組成物
KR100907268B1 (ko) * 2001-04-05 2009-07-13 후지필름 가부시키가이샤 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법
JP4090773B2 (ja) * 2001-04-05 2008-05-28 富士フイルム株式会社 ポジ型レジスト組成物
JP4124978B2 (ja) 2001-04-05 2008-07-23 富士フイルム株式会社 ポジ型レジスト組成物
JP4149148B2 (ja) 2001-08-03 2008-09-10 富士フイルム株式会社 ポジ型レジスト組成物
JP3963724B2 (ja) 2002-01-10 2007-08-22 ダイセル化学工業株式会社 フォトレジスト用高分子化合物の製造方法、及びフォトレジスト用樹脂組成物
TW200304042A (en) * 2002-02-22 2003-09-16 Jsr Corp Radiation-sensitive resin composition
US7531286B2 (en) * 2002-03-15 2009-05-12 Jsr Corporation Radiation-sensitive resin composition
US7510822B2 (en) * 2002-04-10 2009-03-31 Fujifilm Corporation Stimulation sensitive composition and compound
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
DE60334249D1 (de) * 2002-11-05 2010-10-28 Jsr Corp Acrylcopolymer und strahlungsempfindliche harzzusammensetzung
US7005230B2 (en) * 2003-01-16 2006-02-28 Jsr Corporation Radiation-sensitive resin composition
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法

Also Published As

Publication number Publication date
JP2013032540A (ja) 2013-02-14
JP2013032541A (ja) 2013-02-14
TWI293076B (de) 2008-02-01
EP1586594A4 (de) 2007-03-28
TW200422309A (en) 2004-11-01
WO2004041879A1 (ja) 2004-05-21
JP5163345B2 (ja) 2013-03-13
US7452655B2 (en) 2008-11-18
KR20050084933A (ko) 2005-08-29
EP1586594A1 (de) 2005-10-19
JP5565443B2 (ja) 2014-08-06
DE60334249D1 (de) 2010-10-28
JP2009035734A (ja) 2009-02-19
EP1586594B1 (de) 2010-09-15
KR101010410B1 (ko) 2011-01-21
AU2003280710A1 (en) 2004-06-07
US20060074139A1 (en) 2006-04-06

Similar Documents

Publication Publication Date Title
KR970062810A (ko) 감방사선성 수지 조성물
TW200628977A (en) Photosensitive resin composition and photosensitive dry film by the use thereof
DE60126310D1 (de) Punktkontaktmatrix und elektronische Schaltung damit
ATE533117T1 (de) Verhinderung von manipulation in elektronischen geräten
FR2830206B1 (fr) Dispositif microfluidique et sa fabrication
DE60223842D1 (de) Lichtdurchlässige flammhemmende polycarbonat-harzzusammensetzungen
MY126016A (en) Cube corner retroreflective article with enhanded pigmentation
DE60119681D1 (de) Elektronische Vorrichtung mit zwei zueinander beweglichen Teilen
DK1592564T3 (da) Sikkerhedsdokument med mindst et sikkerhedselement
DE60129921D1 (de) Tasteninstrument mit Tastgefühlsregler
DE60334249D1 (de) Acrylcopolymer und strahlungsempfindliche harzzusammensetzung
SE0302216D0 (sv) Indikeringsanordning
DE60116002D1 (de) Druckanordnung die Maskenmuster verwendet mit Auflösungen, die nicht ganzzahlige Vielfache voneinander sind
ATE408961T1 (de) Mit einem siliziumsubstrat und einem siliziumschaltkreis integrierte isolierte germanium-photodetektoren umfassender bildsensor
DE60236710D1 (de) Strahlungsempfindliche Harzzusammensetzung
DE60204423D1 (de) Transparentes paramagnetisches polymer
DE60110808D1 (de) Temperatursensibler polymer/polymer-komplex
DE60321878D1 (de) Tastaturinstrument mit Pedalmechanismus
DE59906359D1 (de) Dehnungsempfindlicher widerstand
DE60302853D1 (de) Farbloses und transparentes Polyimidsiloxanharz mit wärmehärtenden funktionellen Gruppen
DE69013547D1 (de) N-Hydroxycarbyloxy-gehinderte, phosphorsubstituierte Amine verwendbar als Stabilisatoren gegen Lichteinwirkung.
DE60105946D1 (de) Lichtdurchlässiges wärmeempfindliches Aufzeichnungsmaterial
DE60107639D1 (de) Polymer, Resistzusammensetzung und Musterübertragungsverfahren
DE69000129D1 (de) Integrierte schaltung mit vollstaendigem schutz gegen ultraviolettstrahlen.
DE60137280D1 (de) Polymer, Resistzusammensetzung und Musterübertragungsverfahren

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties