ATE485537T1 - Lichtempfindliche zusammensetzung, lichtempfindlicher harzübertragungsfilm, sowie verfahren zur herstellung eines lichtabstandhalters und substrat für eine flüssigkristallanzeigenvorrichtung und flüssigkristallanzeige - Google Patents

Lichtempfindliche zusammensetzung, lichtempfindlicher harzübertragungsfilm, sowie verfahren zur herstellung eines lichtabstandhalters und substrat für eine flüssigkristallanzeigenvorrichtung und flüssigkristallanzeige

Info

Publication number
ATE485537T1
ATE485537T1 AT08013249T AT08013249T ATE485537T1 AT E485537 T1 ATE485537 T1 AT E485537T1 AT 08013249 T AT08013249 T AT 08013249T AT 08013249 T AT08013249 T AT 08013249T AT E485537 T1 ATE485537 T1 AT E485537T1
Authority
AT
Austria
Prior art keywords
liquid crystal
crystal display
light sensitive
display device
light
Prior art date
Application number
AT08013249T
Other languages
English (en)
Inventor
Hideyuki Nakamura
Kyohei Mochizuki
Yuuichi Fukushige
Daisuke Arioka
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE485537T1 publication Critical patent/ATE485537T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT08013249T 2007-07-26 2008-07-23 Lichtempfindliche zusammensetzung, lichtempfindlicher harzübertragungsfilm, sowie verfahren zur herstellung eines lichtabstandhalters und substrat für eine flüssigkristallanzeigenvorrichtung und flüssigkristallanzeige ATE485537T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007194239 2007-07-26

Publications (1)

Publication Number Publication Date
ATE485537T1 true ATE485537T1 (de) 2010-11-15

Family

ID=40120279

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08013249T ATE485537T1 (de) 2007-07-26 2008-07-23 Lichtempfindliche zusammensetzung, lichtempfindlicher harzübertragungsfilm, sowie verfahren zur herstellung eines lichtabstandhalters und substrat für eine flüssigkristallanzeigenvorrichtung und flüssigkristallanzeige

Country Status (8)

Country Link
US (1) US20090027608A1 (de)
EP (1) EP2023203B1 (de)
JP (1) JP2009048187A (de)
KR (1) KR20090012139A (de)
CN (1) CN101354532A (de)
AT (1) ATE485537T1 (de)
DE (1) DE602008003071D1 (de)
TW (1) TW200910005A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101333713B1 (ko) * 2010-12-21 2013-11-28 제일모직주식회사 흑색 감광성 수지 조성물, 및 이를 이용한 차광층 및 칼럼 스페이서
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
WO2013084283A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント
JP2015146038A (ja) * 2011-12-05 2015-08-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜
JP2013200577A (ja) * 2011-12-05 2013-10-03 Hitachi Chemical Co Ltd 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜
CN103130919B (zh) 2013-02-08 2015-02-25 常州强力先端电子材料有限公司 一种咔唑酮肟酯类高感光度光引发剂
CN103293855B (zh) 2013-05-20 2015-12-23 常州强力先端电子材料有限公司 一种丙烯酸酯类光固化组合物
CN109867257A (zh) * 2017-12-04 2019-06-11 讯芯电子科技（中山）有限公司 芯片封装体与制造方法
JP7228121B2 (ja) * 2018-04-25 2023-02-24 エア・ウォーター・パフォーマンスケミカル株式会社 光重合増感剤組成物

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE465271A (de) 1941-12-31 1900-01-01
US2448828A (en) 1946-09-04 1948-09-07 Du Pont Photopolymerization
BE513714A (de) 1951-08-23 1900-01-01
US2722512A (en) 1952-10-23 1955-11-01 Du Pont Photopolymerization process
NL227834A (de) 1957-05-17
US3046127A (en) 1957-10-07 1962-07-24 Du Pont Photopolymerizable compositions, elements and processes
US3549367A (en) 1968-05-24 1970-12-22 Du Pont Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones
JPS5148516B2 (de) 1973-02-07 1976-12-21
US4212976A (en) 1973-06-15 1980-07-15 Merck & Co., Inc. 3,4α-Di-O-derivatives of mercaptomethylpyridine and pyridylmethyldisulfide
JPS5928328B2 (ja) 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JP3316093B2 (ja) 1993-08-10 2002-08-19 富士写真フイルム株式会社 感光性積層材料およびその製造方法
JP3681867B2 (ja) 1997-09-01 2005-08-10 富士写真フイルム株式会社 フィルム張付装置
JPH11133600A (ja) 1997-10-30 1999-05-21 Jsr Corp 表示パネルスペーサー用感放射線性樹脂組成物
JP3896389B2 (ja) 1999-05-28 2007-03-22 富士フイルムホールディングス株式会社 フィルムラミネータ
JP2001310147A (ja) 2000-05-02 2001-11-06 Tokyo Ohka Kogyo Co Ltd スリットコータの予備吐出装置および予備吐出方法
JP2002079163A (ja) 2000-09-05 2002-03-19 Toppan Printing Co Ltd スリットコータ
JP2002148794A (ja) 2000-11-15 2002-05-22 Fuji Photo Film Co Ltd 感光層転写装置及び方法
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2002287354A (ja) 2001-03-28 2002-10-03 Nippon Paint Co Ltd フォトソルダーレジスト組成物
JP4461647B2 (ja) 2001-07-03 2010-05-12 凸版印刷株式会社 スリットノズルの洗浄方法及び洗浄機構
JP4148404B2 (ja) 2001-11-08 2008-09-10 富士フイルム株式会社 スペーサー用樹脂組成物及びスペーサー並びに液晶表示素子
JP2003164787A (ja) 2001-11-29 2003-06-10 Canon Inc 液体の吐出口
JP2003170098A (ja) 2001-12-06 2003-06-17 Shimadzu Corp スリットコータ
JP4119666B2 (ja) 2002-04-11 2008-07-16 富士フイルム株式会社 スペーサー用樹脂組成物及び液晶表示素子
KR100923022B1 (ko) 2002-06-14 2009-10-22 삼성전자주식회사 감광물질 코팅 방법 및 장치
JP2004089851A (ja) 2002-08-30 2004-03-25 Shimadzu Corp スリットコータ
JP2004347831A (ja) 2003-05-22 2004-12-09 Fuji Photo Film Co Ltd カラーフィルター
JP2005003861A (ja) 2003-06-11 2005-01-06 Fuji Photo Film Co Ltd カラーフィルターの製造方法
JP4291638B2 (ja) * 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP2005062620A (ja) 2003-08-18 2005-03-10 Sekisui Chem Co Ltd 光硬化性樹脂組成物、柱状スペーサ、微粒子スペーサ固定剤及び液晶表示素子
JP4401262B2 (ja) * 2004-02-02 2010-01-20 富士フイルム株式会社 平版印刷版原版
JP4502784B2 (ja) 2004-06-07 2010-07-14 富士フイルム株式会社 カラーフィルター、カラーフィルターの製造方法、及び液晶表示装置
JP2006064921A (ja) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 感光性転写材料、カラーフィルタ、及び液晶表示装置
JP5339686B2 (ja) * 2007-03-30 2013-11-13 富士フイルム株式会社 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法
JP4866774B2 (ja) * 2007-03-30 2012-02-01 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法

Also Published As

Publication number Publication date
EP2023203B1 (de) 2010-10-20
US20090027608A1 (en) 2009-01-29
DE602008003071D1 (de) 2010-12-02
JP2009048187A (ja) 2009-03-05
KR20090012139A (ko) 2009-02-02
TW200910005A (en) 2009-03-01
EP2023203A1 (de) 2009-02-11
CN101354532A (zh) 2009-01-28

Similar Documents

Publication Publication Date Title
DE602008003071D1 (de) Lichtempfindliche Zusammensetzung, lichtempfindlicher Harzübertragungsfilm, sowie Verfahren zur Herstellung eines Lichtabstandhalters und Substrat für eine Flüssigkristallanzeigenvorrichtung und Flüssigkristallanzeige
EP4020572A4 (de) Anzeigevorrichtung und herstellungsverfahren dafür sowie antriebssubstrat
EP2293354A4 (de) Lichtemittierende anordnung, planare lichtquelle, flüssigkristallanzeigeanordnung und verfahren zur herstellung einer lichtemittierenden anordnung
EP4053899A4 (de) Anzeigesubstrat, anzeigevorrichtung und anzeigesteuerungsverfahren
BRPI0908318A8 (pt) película ótica, dispositivo ou aparelho mostrador de imagem, dispositivo mostrador de cristal líquido (lcd) e conjunto polarizador.
SG148015A1 (en) Lithographic apparatus and device manufacturing method
EP4057263A4 (de) Anzeigesubstrat, herstellungsverfahren dafür und anzeigevorrichtung
EP2138518A4 (de) Polymerstabilisierte flüssigkristallzusammensetzung, flüssigkristallanzeige und verfahren zur herstellung einer flüssigkristallanzeige
DE102005061305B8 (de) Vorrichtung zum Ansteuern eines Flüssigkristalldisplays sowie Ansteuerungsverfahren unter Verwendung derselben
DE602008005505D1 (de) Photolackzusammensetzung, Verfahren zur Herstellung einer organischen Folienstruktur und Verwendung derselben in einer Anzeigevorrichtung
TW200604758A (en) Exposure apparatus, exposure method and method of manufacturing device
TW200732857A (en) Lithographic apparatus, device manufacturing method and exchangeable optical element
EP2442163A4 (de) Verfahren zur herstellung eines optischen films, optischer film, laminierte polarisierungsplatte und bildanzeigevorrichtung
TW200741818A (en) Exposure apparatus and device manufacturing method
EP1895772A3 (de) Projektionsanzeigevorrichtung und Bilderzeugungsvorrichtung
TW200802893A (en) Fabrication apparatus and method of fabricating a soft mold
EP4224461A4 (de) Treiberschaltung und ansteuerungsverfahren dafür, arraysubstrat und anzeigevorrichtung
EP1684116A3 (de) Lichtempfindliche Zusammensetzung, Verbindung zur Verwendung für die lichtempfindliche Zusammensetzung und Strukturbildungsverfahren unter Verwendung der lichtempfindlichen Zusammensetzung
TW200702807A (en) Method of manufacturing liquid crystal display device
EP3575381A4 (de) Zusammensetzung eines flüssigkristallausrichtungsmittels, verfahren zur herstellung eines flüssigkristallausrichtungsfilms damit, flüssigkristallausrichtungsfilm damit und flüssigkristallanzeigevorrichtung
WO2008117719A1 (ja) 表面凹凸の作製方法
WO2008155896A1 (ja) 電子装置の製造方法
TW200734718A (en) Method for forming pixel isolation wall for color filter, substrate having pixel isolation wall for color filter, color filter for display device, and display device
TW200834195A (en) Photospacer for liquid crystal display, manufacturing method thereof, and liquid crystal display device
TW200630717A (en) Liquid crystal device for compensating for aberration, optical pickup including liquid crystal device, and optical recording and/or reproducing apparatus employing optical pickup

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties