ATE487166T1 - Prozess zur herstellung einer polymerischen relief struktur - Google Patents

Prozess zur herstellung einer polymerischen relief struktur

Info

Publication number
ATE487166T1
ATE487166T1 AT08759973T AT08759973T ATE487166T1 AT E487166 T1 ATE487166 T1 AT E487166T1 AT 08759973 T AT08759973 T AT 08759973T AT 08759973 T AT08759973 T AT 08759973T AT E487166 T1 ATE487166 T1 AT E487166T1
Authority
AT
Austria
Prior art keywords
relief structure
making
radiation
polymeric relief
coating composition
Prior art date
Application number
AT08759973T
Other languages
English (en)
Inventor
Jolke Perelaer
Ko Hermans
Cornelis Wilhelmus Maria Bastiaansen
Ulrich Sigmar Schubert
Original Assignee
Stichting Dutch Polymer Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stichting Dutch Polymer Inst filed Critical Stichting Dutch Polymer Inst
Application granted granted Critical
Publication of ATE487166T1 publication Critical patent/ATE487166T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
AT08759973T 2007-06-11 2008-05-23 Prozess zur herstellung einer polymerischen relief struktur ATE487166T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07109998A EP2019336A1 (de) 2007-06-11 2007-06-11 Verfahren zur Herstellung einer Polymerreliefstruktur
PCT/EP2008/056373 WO2008151915A1 (en) 2007-06-11 2008-05-23 Process for preparing a polymeric relief structure

Publications (1)

Publication Number Publication Date
ATE487166T1 true ATE487166T1 (de) 2010-11-15

Family

ID=38626528

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08759973T ATE487166T1 (de) 2007-06-11 2008-05-23 Prozess zur herstellung einer polymerischen relief struktur

Country Status (6)

Country Link
US (1) US20100279074A1 (de)
EP (2) EP2019336A1 (de)
JP (1) JP2010532394A (de)
AT (1) ATE487166T1 (de)
DE (1) DE602008003333D1 (de)
WO (1) WO2008151915A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2109005A1 (de) * 2008-04-07 2009-10-14 Stichting Dutch Polymer Institute Verfahren zur Herstellung einer Polymerreliefstruktur
JP5481000B2 (ja) * 2010-08-26 2014-04-23 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ方法
EP2592477A1 (de) * 2011-11-14 2013-05-15 Stichting Dutch Polymer Institute Durchgehendes Verfahren zur Herstellung eines Substrats mit Reliefsstruktur
JP5579217B2 (ja) * 2012-03-27 2014-08-27 富士フイルム株式会社 平版印刷版原版
CN109021968B (zh) * 2014-03-04 2021-08-20 纳米技术有限公司 用于制造量子点聚合物膜的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10228108A (ja) * 1997-02-17 1998-08-25 Hitachi Chem Co Ltd 感光性組成物、感光材料、レリーフパターンの製造法及びポリイミドパターンの製造法
US20040101782A1 (en) * 2002-11-27 2004-05-27 General Electric Company Method for making optical device structures
JP2007530988A (ja) * 2003-07-17 2007-11-01 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 反射器を製造する方法と、このような反射器を含む液晶ディスプレイデバイス
TWI275597B (en) * 2003-08-05 2007-03-11 Ind Tech Res Inst Resin with low polydispersity index, and preparation process, and use thereof
WO2005081071A1 (en) * 2004-02-19 2005-09-01 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
MY148946A (en) * 2004-10-04 2013-06-14 Univ Sydney Polymerisation process and polymer product
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
CN101142532A (zh) * 2005-02-15 2008-03-12 Rpo私人有限公司 聚合物材料的光刻构图
US7677877B2 (en) * 2005-11-04 2010-03-16 Asml Netherlands B.V. Imprint lithography
JP5451388B2 (ja) * 2006-08-21 2014-03-26 コーニンクレッカ フィリップス エヌ ヴェ シール化セル構造
EP2256788A4 (de) * 2008-03-07 2011-03-30 Showa Denko Kk Uv-nanoimprintverfahren, harzabdruckform und herstellungsverfahren dafür, magnetisches aufzeichnungsmedium und verfahren zu seiner herstellung sowie magnetisches aufzeichnungs-/wiedergabegerät

Also Published As

Publication number Publication date
EP2156247A1 (de) 2010-02-24
JP2010532394A (ja) 2010-10-07
EP2156247B1 (de) 2010-11-03
WO2008151915A1 (en) 2008-12-18
EP2019336A1 (de) 2009-01-28
US20100279074A1 (en) 2010-11-04
DE602008003333D1 (de) 2010-12-16

Similar Documents

Publication Publication Date Title
ATE483531T1 (de) Substrat, umfassend zumindest eine voll- oder teilflächige makrostrukturierte schicht, verfahren zu deren herstellung und deren verwendung
EP1921119A4 (de) Fleckenbeständige beschichtungszusammensetzung, fleckenbeständiger beschichtungsfilm, substrat mit dem beschichtungsfilm, verfahren zur formung einer beschichtung auf der oberfläche eines substrats und verfahren zur herstellung der fleckenbeständigkeit eines substrats
DE602008003333D1 (de) Prozess zur herstellung einer polymerischen relief struktur
DE60020110D1 (de) Vernetzbare polymere zur herstellung von vernetzbaren polymeren
ATE414744T1 (de) Mit anorganisch/organischen mischschichten beschichtete perlglanzpigmente und verfahren zu deren herstellung
WO2010012836A3 (de) Biokompatibilitätsschicht und beschichtete gegenstände
SG146599A1 (en) Lithographic apparatus and method
WO2008132045A3 (en) Substrates with biocidal coating
WO2007136656A3 (en) Colored masking for forming transparent structures
DE502005005338D1 (de) Wässrige beschichtungszusammensetzung mit korrosionsstabilen dünnen deckenden aluminiumpigmenten, verfahren zu deren herstellung und verwendung derselben
WO2005091835A3 (en) A method and system for making a coated medical device
WO2006086339A3 (en) Attachment of chitosan to surfaces using rehydration process
ATE377634T1 (de) Verwendung einer wässrigen beschichtungszusammensetzung für die herstellung von oberflächenbeschichtungen von dichtungen
PL2128208T3 (pl) Impregnacyjna kompozycja powłokowa, sposób wytwarzania kompozycji, impregnacyjna powłoka powlekająca utworzona z zastosowaniem kompozycji, powleczony powłoką powlekającą przedmiot na jego powierzchni i sposób impregnacyjnego działania dla wytworzenia powłoki powlekającej
WO2008025508A8 (en) Process for preparing a polymeric relief structure
DE602004029520D1 (de) Substrat mit Abstandhalter, Tafel und Verfahren zur Herstellung der Tafel
EP1826243A3 (de) Polymere aus organisch modifizierten Siloxanharzen mit Trenneffekt
PT2338088E (pt) Composição, processo de preparação e método de aplicação e de exposição para um papel de formação de imagens através de luz
IL308391B1 (en) Formulations and printing methods
EP4317217A4 (de) Aktive lichtempfindliche oder strahlungsempfindliche harzzusammensetzung, resistfilm, strukturbildungsverfahren und verfahren zur herstellung einer elektronischen vorrichtung
BRPI0907673A2 (pt) "composição de revestimento de papel, substrato de papel revestido, método de fabricação de um substrato de papel revestido e processo de preparação de uma composição de revestimento de papel".
BR112019001453A2 (pt) método de fabricação de uma estampa à base de poliorganossiloxano, estampa à base de poliorganossiloxano, uso da mesma e método de formação de uma camada dotada de um padrão
DE602007011821D1 (de) Hydrophiler überzug und herstellungsverfahren dafür
EP1589082A4 (de) Beschichtungszusammensetzung, antireflexionsfilm, fotolack und darauf basierendes musterbildungsverfahren
BRPI0607111A2 (pt) componente com um revestimento para reduzir a capacidade de umedecimento da superfìcie e método de produção do mesmo

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties