ATE488862T1 - Schnelles wärmebehandlungssystem für integrierte schaltungen - Google Patents

Schnelles wärmebehandlungssystem für integrierte schaltungen

Info

Publication number
ATE488862T1
ATE488862T1 AT02718446T AT02718446T ATE488862T1 AT E488862 T1 ATE488862 T1 AT E488862T1 AT 02718446 T AT02718446 T AT 02718446T AT 02718446 T AT02718446 T AT 02718446T AT E488862 T1 ATE488862 T1 AT E488862T1
Authority
AT
Austria
Prior art keywords
lamps
heat
chamber
isolate
optically transparent
Prior art date
Application number
AT02718446T
Other languages
English (en)
Inventor
Sing-Pin Tay
Yao Hu
Markus Hauf
Original Assignee
Mattson Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mattson Tech Inc filed Critical Mattson Tech Inc
Application granted granted Critical
Publication of ATE488862T1 publication Critical patent/ATE488862T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Drying Of Semiconductors (AREA)
AT02718446T 2001-04-17 2002-04-03 Schnelles wärmebehandlungssystem für integrierte schaltungen ATE488862T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/836,098 US6600138B2 (en) 2001-04-17 2001-04-17 Rapid thermal processing system for integrated circuits
PCT/IB2002/001130 WO2002084712A2 (en) 2001-04-17 2002-04-03 Rapid thermal processing system for integrated circuits

Publications (1)

Publication Number Publication Date
ATE488862T1 true ATE488862T1 (de) 2010-12-15

Family

ID=25271237

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02718446T ATE488862T1 (de) 2001-04-17 2002-04-03 Schnelles wärmebehandlungssystem für integrierte schaltungen

Country Status (9)

Country Link
US (1) US6600138B2 (de)
EP (1) EP1382058B1 (de)
JP (1) JP2005503003A (de)
KR (1) KR20030088504A (de)
CN (1) CN100338729C (de)
AT (1) ATE488862T1 (de)
DE (1) DE60238313D1 (de)
TW (1) TWI250587B (de)
WO (1) WO2002084712A2 (de)

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KR101374752B1 (ko) * 2012-12-21 2014-03-17 주식회사 나래나노텍 기판 온도 측정 및 제어 시스템을 구비한 기판 열처리 챔버, 장치 및 방법
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KR101464662B1 (ko) * 2013-07-24 2014-11-25 주식회사 나래나노텍 개선된 보트, 및 이를 구비한 기판 열처리 챔버 및 기판 열처리 장치
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KR102154654B1 (ko) * 2014-04-23 2020-09-22 주식회사 제우스 기판의 열처리 장치
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CN109874182B (zh) * 2017-12-01 2021-05-07 中国飞机强度研究所 一种新型石英灯加热装置
KR102161165B1 (ko) * 2018-05-18 2020-09-29 에이피시스템 주식회사 히터 블록, 열 처리 장치 및 방법
KR102584511B1 (ko) * 2020-12-07 2023-10-06 세메스 주식회사 지지 유닛 및 이를 포함하는 기판 처리 장치
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Also Published As

Publication number Publication date
JP2005503003A (ja) 2005-01-27
EP1382058A2 (de) 2004-01-21
CN1507648A (zh) 2004-06-23
CN100338729C (zh) 2007-09-19
WO2002084712A2 (en) 2002-10-24
KR20030088504A (ko) 2003-11-19
DE60238313D1 (de) 2010-12-30
US6600138B2 (en) 2003-07-29
US20020148824A1 (en) 2002-10-17
EP1382058B1 (de) 2010-11-17
TWI250587B (en) 2006-03-01
WO2002084712A3 (en) 2003-03-13

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