ATE492593T1 - Polymerformulierungen auf benzocyclobutenbasis - Google Patents
Polymerformulierungen auf benzocyclobutenbasisInfo
- Publication number
- ATE492593T1 ATE492593T1 AT08172459T AT08172459T ATE492593T1 AT E492593 T1 ATE492593 T1 AT E492593T1 AT 08172459 T AT08172459 T AT 08172459T AT 08172459 T AT08172459 T AT 08172459T AT E492593 T1 ATE492593 T1 AT E492593T1
- Authority
- AT
- Austria
- Prior art keywords
- benzocyclobutene
- based polymer
- polymer formulations
- benzocyclobutene monomer
- divinylsiloxane
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 title 1
- 239000000178 monomer Substances 0.000 abstract 2
- DYZHZLQEGSYGDH-UHFFFAOYSA-N 7-bicyclo[4.2.0]octa-1,3,5-trienyl-[[7,8-bis(ethenyl)-7-bicyclo[4.2.0]octa-1,3,5-trienyl]oxy]silane Chemical compound C1C2=CC=CC=C2C1[SiH2]OC1(C=C)C2=CC=CC=C2C1C=C DYZHZLQEGSYGDH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000003963 antioxidant agent Substances 0.000 abstract 1
- 230000003078 antioxidant effect Effects 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 abstract 1
- 230000015556 catabolic process Effects 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/13—Phenols; Phenolates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Dental Preparations (AREA)
- Formation Of Insulating Films (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61854804P | 2004-10-13 | 2004-10-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE492593T1 true ATE492593T1 (de) | 2011-01-15 |
Family
ID=35695848
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08172459T ATE492593T1 (de) | 2004-10-13 | 2005-10-12 | Polymerformulierungen auf benzocyclobutenbasis |
| AT05806417T ATE476468T1 (de) | 2004-10-13 | 2005-10-12 | Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05806417T ATE476468T1 (de) | 2004-10-13 | 2005-10-12 | Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8143324B2 (de) |
| EP (2) | EP2042547B1 (de) |
| JP (1) | JP5231017B2 (de) |
| KR (1) | KR101237554B1 (de) |
| AT (2) | ATE492593T1 (de) |
| DE (2) | DE602005022743D1 (de) |
| WO (1) | WO2006044337A1 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8530119B2 (en) * | 2009-05-20 | 2013-09-10 | Sumitomo Bakelite Co., Ltd. | Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same |
| US9752051B2 (en) | 2015-04-06 | 2017-09-05 | Rohm And Haas Electronic Materials Llc | Polyarylene polymers |
| FR3063082B1 (fr) * | 2017-02-17 | 2019-04-05 | Societe Bic | Nouvelle composition de pigment thermochrome comprenant un compose de formule (i) en tant que milieu reactionnel |
| FR3065729B1 (fr) | 2017-04-27 | 2020-12-18 | SOCIéTé BIC | Nouveaux composes de formule (i) et leur utilisation dans des compositions de pigment thermochrome |
| CN107987278B (zh) * | 2017-11-14 | 2021-03-30 | 复旦大学 | 一种苯并环丁烯官能化有机硅树脂及其制备方法 |
| JP2022184759A (ja) * | 2021-05-31 | 2022-12-13 | キヤノン株式会社 | 基板接合体 |
| CN114736434B (zh) * | 2022-04-23 | 2023-11-17 | 浙江科赛新材料科技有限公司 | 一种具有金属可探测ptfe紧固件的制备方法 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4724260A (en) | 1984-08-27 | 1988-02-09 | The Dow Chemical Company | Unsaturated alkyl monoarylcyclobutane monomers |
| US4826997A (en) | 1984-08-27 | 1989-05-02 | The Dow Chemical Company | N-Substituted arylcyclo butenyl-maleimides |
| US4540763A (en) | 1984-09-14 | 1985-09-10 | The Dow Chemical Company | Polymers derived from poly(arylcyclobutenes) |
| US4783514A (en) | 1986-02-28 | 1988-11-08 | The Dow Chemical Company | Polymeric monoarylcyclobutane compositions |
| US5449740A (en) | 1986-05-08 | 1995-09-12 | The University Of Dayton | Resin systems derived from insitu-generated bisdienes from bis-benzocyclobutene compounds |
| US4711964A (en) | 1986-05-08 | 1987-12-08 | University Of Dayton | Bisdiene from bis-benzocyclobutene compound |
| US4708994A (en) | 1986-06-30 | 1987-11-24 | Shell Oil Company | Engineering thermoplastics containing pendant benzocyclobutene groups |
| US4812588A (en) | 1987-12-14 | 1989-03-14 | The Dow Chemical Company | Polyorganosiloxane-bridged bisbenzocyclobutene monomers |
| US5002808A (en) | 1988-03-23 | 1991-03-26 | The Dow Chemical Company | Adhesion methods employing benzocyclobutene-based organosilane adhesion aids |
| US4831172A (en) * | 1988-03-23 | 1989-05-16 | The Dow Chemical Company | Benzocyclobutene-based organosilane adhesion aids |
| US4999499A (en) | 1989-09-21 | 1991-03-12 | General Dynamics Corporation | Method of inspecting solder joints with a laser inspection system |
| US5138081A (en) | 1991-04-30 | 1992-08-11 | The Dow Chemical Company | Process for purifying vinylically-unsaturated organosilicon compounds |
| US5136069A (en) | 1991-03-28 | 1992-08-04 | The Dow Chemical Company | Process for preparing vinylically-unsaturated compounds (II) |
| US5243068A (en) | 1991-03-28 | 1993-09-07 | The Dow Chemical Company | Process for preparing vinylically-unsaturated compounds (II) |
| US5156656A (en) | 1991-09-13 | 1992-10-20 | The Dow Chemical Company | Semi-permeable membranes derived from reactive oligomers |
| US5185391A (en) | 1991-11-27 | 1993-02-09 | The Dow Chemical Company | Oxidation inhibited arylcyclobutene polymers |
| WO1993012055A2 (en) | 1991-12-10 | 1993-06-24 | The Dow Chemical Company | Photocurable cyclobutarene compositions |
| US5854302A (en) | 1993-04-29 | 1998-12-29 | The Dow Chemical Company | Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins |
| US5668210A (en) * | 1994-10-24 | 1997-09-16 | The Dow Chemical Company | Adhesion promoter and self-priming arylcyclobutene resin compositions |
| US5868951A (en) | 1997-05-09 | 1999-02-09 | University Technology Corporation | Electro-optical device and method |
| US6361926B1 (en) | 1998-10-23 | 2002-03-26 | The Dow Chemical Company | Acid functional polymers based on benzocyclobutene |
| US6596624B1 (en) | 1999-07-31 | 2003-07-22 | International Business Machines Corporation | Process for making low dielectric constant hollow chip structures by removing sacrificial dielectric material after the chip is joined to a chip carrier |
| US6420093B1 (en) * | 2000-02-02 | 2002-07-16 | The Dow Chemical Company | Toughened benzocyclobutene based polymers and their use in building-up printed wiring boards |
| US6593155B2 (en) | 2000-12-28 | 2003-07-15 | Dow Global Technologies Inc. | Method for determination of cure and oxidation of spin-on dielectric polymers |
| JP4997670B2 (ja) * | 2001-06-29 | 2012-08-08 | 日本電気株式会社 | 共重合高分子膜の作製方法、前記形成方法で作製される共重合高分子膜、共重合高分子膜を利用する半導体装置 |
| US7019093B2 (en) * | 2002-10-18 | 2006-03-28 | Dow Global Technologies Inc. | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance |
| JP4289070B2 (ja) * | 2003-08-08 | 2009-07-01 | 住友ベークライト株式会社 | アルカリ可溶性樹脂、感光性樹脂組成物及び樹脂層の形成方法 |
| US8143360B2 (en) * | 2004-10-13 | 2012-03-27 | Dow Global Technologies Llc | Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions |
-
2005
- 2005-10-12 AT AT08172459T patent/ATE492593T1/de not_active IP Right Cessation
- 2005-10-12 KR KR1020077010786A patent/KR101237554B1/ko not_active Expired - Fee Related
- 2005-10-12 AT AT05806417T patent/ATE476468T1/de not_active IP Right Cessation
- 2005-10-12 DE DE602005022743T patent/DE602005022743D1/de not_active Expired - Lifetime
- 2005-10-12 DE DE602005025550T patent/DE602005025550D1/de not_active Expired - Lifetime
- 2005-10-12 EP EP08172459A patent/EP2042547B1/de not_active Expired - Lifetime
- 2005-10-12 JP JP2007536785A patent/JP5231017B2/ja not_active Expired - Fee Related
- 2005-10-12 US US11/665,245 patent/US8143324B2/en active Active
- 2005-10-12 WO PCT/US2005/036452 patent/WO2006044337A1/en not_active Ceased
- 2005-10-12 EP EP05806417A patent/EP1802693B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1802693A1 (de) | 2007-07-04 |
| KR20070085328A (ko) | 2007-08-27 |
| US20090275673A1 (en) | 2009-11-05 |
| EP2042547B1 (de) | 2010-12-22 |
| JP2008516072A (ja) | 2008-05-15 |
| KR101237554B1 (ko) | 2013-02-26 |
| EP2042547A1 (de) | 2009-04-01 |
| DE602005025550D1 (de) | 2011-02-03 |
| WO2006044337A1 (en) | 2006-04-27 |
| EP1802693B1 (de) | 2010-08-04 |
| JP5231017B2 (ja) | 2013-07-10 |
| ATE476468T1 (de) | 2010-08-15 |
| DE602005022743D1 (de) | 2010-09-16 |
| US8143324B2 (en) | 2012-03-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |