ATE476468T1 - Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen - Google Patents

Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen

Info

Publication number
ATE476468T1
ATE476468T1 AT05806417T AT05806417T ATE476468T1 AT E476468 T1 ATE476468 T1 AT E476468T1 AT 05806417 T AT05806417 T AT 05806417T AT 05806417 T AT05806417 T AT 05806417T AT E476468 T1 ATE476468 T1 AT E476468T1
Authority
AT
Austria
Prior art keywords
formulations
benzocyclobutene
processing
based polymer
oxidative environments
Prior art date
Application number
AT05806417T
Other languages
English (en)
Inventor
Ying So
Edmund Stark
Jack Hetzner
Shellene Thruston
Original Assignee
Dow Global Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Global Technologies Inc filed Critical Dow Global Technologies Inc
Application granted granted Critical
Publication of ATE476468T1 publication Critical patent/ATE476468T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Dental Preparations (AREA)
  • Formation Of Insulating Films (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT05806417T 2004-10-13 2005-10-12 Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen ATE476468T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61854804P 2004-10-13 2004-10-13
PCT/US2005/036452 WO2006044337A1 (en) 2004-10-13 2005-10-12 Benzocyclobutene based polymer formulations and methods for processing such formulations in oxidative environments

Publications (1)

Publication Number Publication Date
ATE476468T1 true ATE476468T1 (de) 2010-08-15

Family

ID=35695848

Family Applications (2)

Application Number Title Priority Date Filing Date
AT08172459T ATE492593T1 (de) 2004-10-13 2005-10-12 Polymerformulierungen auf benzocyclobutenbasis
AT05806417T ATE476468T1 (de) 2004-10-13 2005-10-12 Polymerformulierungen auf benzocyclobutenbasis und verfahren zur verarbeitung derartiger formulierungen in oxidativen umgebungen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT08172459T ATE492593T1 (de) 2004-10-13 2005-10-12 Polymerformulierungen auf benzocyclobutenbasis

Country Status (7)

Country Link
US (1) US8143324B2 (de)
EP (2) EP2042547B1 (de)
JP (1) JP5231017B2 (de)
KR (1) KR101237554B1 (de)
AT (2) ATE492593T1 (de)
DE (2) DE602005022743D1 (de)
WO (1) WO2006044337A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8530119B2 (en) * 2009-05-20 2013-09-10 Sumitomo Bakelite Co., Ltd. Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same
US9752051B2 (en) 2015-04-06 2017-09-05 Rohm And Haas Electronic Materials Llc Polyarylene polymers
FR3063082B1 (fr) * 2017-02-17 2019-04-05 Societe Bic Nouvelle composition de pigment thermochrome comprenant un compose de formule (i) en tant que milieu reactionnel
FR3065729B1 (fr) 2017-04-27 2020-12-18 SOCIéTé BIC Nouveaux composes de formule (i) et leur utilisation dans des compositions de pigment thermochrome
CN107987278B (zh) * 2017-11-14 2021-03-30 复旦大学 一种苯并环丁烯官能化有机硅树脂及其制备方法
JP2022184759A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 基板接合体
CN114736434B (zh) * 2022-04-23 2023-11-17 浙江科赛新材料科技有限公司 一种具有金属可探测ptfe紧固件的制备方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724260A (en) 1984-08-27 1988-02-09 The Dow Chemical Company Unsaturated alkyl monoarylcyclobutane monomers
US4826997A (en) 1984-08-27 1989-05-02 The Dow Chemical Company N-Substituted arylcyclo butenyl-maleimides
US4540763A (en) 1984-09-14 1985-09-10 The Dow Chemical Company Polymers derived from poly(arylcyclobutenes)
US4783514A (en) 1986-02-28 1988-11-08 The Dow Chemical Company Polymeric monoarylcyclobutane compositions
US5449740A (en) 1986-05-08 1995-09-12 The University Of Dayton Resin systems derived from insitu-generated bisdienes from bis-benzocyclobutene compounds
US4711964A (en) 1986-05-08 1987-12-08 University Of Dayton Bisdiene from bis-benzocyclobutene compound
US4708994A (en) 1986-06-30 1987-11-24 Shell Oil Company Engineering thermoplastics containing pendant benzocyclobutene groups
US4812588A (en) 1987-12-14 1989-03-14 The Dow Chemical Company Polyorganosiloxane-bridged bisbenzocyclobutene monomers
US5002808A (en) 1988-03-23 1991-03-26 The Dow Chemical Company Adhesion methods employing benzocyclobutene-based organosilane adhesion aids
US4831172A (en) * 1988-03-23 1989-05-16 The Dow Chemical Company Benzocyclobutene-based organosilane adhesion aids
US4999499A (en) 1989-09-21 1991-03-12 General Dynamics Corporation Method of inspecting solder joints with a laser inspection system
US5138081A (en) 1991-04-30 1992-08-11 The Dow Chemical Company Process for purifying vinylically-unsaturated organosilicon compounds
US5136069A (en) 1991-03-28 1992-08-04 The Dow Chemical Company Process for preparing vinylically-unsaturated compounds (II)
US5243068A (en) 1991-03-28 1993-09-07 The Dow Chemical Company Process for preparing vinylically-unsaturated compounds (II)
US5156656A (en) 1991-09-13 1992-10-20 The Dow Chemical Company Semi-permeable membranes derived from reactive oligomers
US5185391A (en) 1991-11-27 1993-02-09 The Dow Chemical Company Oxidation inhibited arylcyclobutene polymers
WO1993012055A2 (en) 1991-12-10 1993-06-24 The Dow Chemical Company Photocurable cyclobutarene compositions
US5854302A (en) 1993-04-29 1998-12-29 The Dow Chemical Company Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins
US5668210A (en) * 1994-10-24 1997-09-16 The Dow Chemical Company Adhesion promoter and self-priming arylcyclobutene resin compositions
US5868951A (en) 1997-05-09 1999-02-09 University Technology Corporation Electro-optical device and method
US6361926B1 (en) 1998-10-23 2002-03-26 The Dow Chemical Company Acid functional polymers based on benzocyclobutene
US6596624B1 (en) 1999-07-31 2003-07-22 International Business Machines Corporation Process for making low dielectric constant hollow chip structures by removing sacrificial dielectric material after the chip is joined to a chip carrier
US6420093B1 (en) * 2000-02-02 2002-07-16 The Dow Chemical Company Toughened benzocyclobutene based polymers and their use in building-up printed wiring boards
US6593155B2 (en) 2000-12-28 2003-07-15 Dow Global Technologies Inc. Method for determination of cure and oxidation of spin-on dielectric polymers
JP4997670B2 (ja) * 2001-06-29 2012-08-08 日本電気株式会社 共重合高分子膜の作製方法、前記形成方法で作製される共重合高分子膜、共重合高分子膜を利用する半導体装置
US7019093B2 (en) * 2002-10-18 2006-03-28 Dow Global Technologies Inc. Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
JP4289070B2 (ja) * 2003-08-08 2009-07-01 住友ベークライト株式会社 アルカリ可溶性樹脂、感光性樹脂組成物及び樹脂層の形成方法
US8143360B2 (en) * 2004-10-13 2012-03-27 Dow Global Technologies Llc Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions

Also Published As

Publication number Publication date
EP1802693A1 (de) 2007-07-04
KR20070085328A (ko) 2007-08-27
US20090275673A1 (en) 2009-11-05
EP2042547B1 (de) 2010-12-22
JP2008516072A (ja) 2008-05-15
KR101237554B1 (ko) 2013-02-26
ATE492593T1 (de) 2011-01-15
EP2042547A1 (de) 2009-04-01
DE602005025550D1 (de) 2011-02-03
WO2006044337A1 (en) 2006-04-27
EP1802693B1 (de) 2010-08-04
JP5231017B2 (ja) 2013-07-10
DE602005022743D1 (de) 2010-09-16
US8143324B2 (en) 2012-03-27

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