ATE503209T1 - Herstellungsprozesse für substrate mit mehreren tiefen - Google Patents

Herstellungsprozesse für substrate mit mehreren tiefen

Info

Publication number
ATE503209T1
ATE503209T1 AT01932865T AT01932865T ATE503209T1 AT E503209 T1 ATE503209 T1 AT E503209T1 AT 01932865 T AT01932865 T AT 01932865T AT 01932865 T AT01932865 T AT 01932865T AT E503209 T1 ATE503209 T1 AT E503209T1
Authority
AT
Austria
Prior art keywords
selected regions
resist layer
substrates
manufacturing processes
multiple depth
Prior art date
Application number
AT01932865T
Other languages
English (en)
Inventor
Reynolds Richard Mc
Original Assignee
Caliper Life Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Caliper Life Sciences Inc filed Critical Caliper Life Sciences Inc
Application granted granted Critical
Publication of ATE503209T1 publication Critical patent/ATE503209T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00388—Etch mask forming
    • B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT01932865T 2000-05-03 2001-05-01 Herstellungsprozesse für substrate mit mehreren tiefen ATE503209T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20150400P 2000-05-03 2000-05-03
PCT/US2001/014125 WO2001084242A1 (en) 2000-05-03 2001-05-01 Multi depth substrate fabrication processes

Publications (1)

Publication Number Publication Date
ATE503209T1 true ATE503209T1 (de) 2011-04-15

Family

ID=22746084

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01932865T ATE503209T1 (de) 2000-05-03 2001-05-01 Herstellungsprozesse für substrate mit mehreren tiefen

Country Status (7)

Country Link
US (1) US6569607B2 (de)
EP (1) EP1279071B1 (de)
AT (1) ATE503209T1 (de)
AU (2) AU2001259355B2 (de)
CA (1) CA2406063A1 (de)
DE (1) DE60144278D1 (de)
WO (1) WO2001084242A1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6048734A (en) 1995-09-15 2000-04-11 The Regents Of The University Of Michigan Thermal microvalves in a fluid flow method
US7220334B2 (en) * 2000-06-20 2007-05-22 Kawamura Institute Of Chemical Research Method of manufacturing microdevice having laminated structure
US6692700B2 (en) 2001-02-14 2004-02-17 Handylab, Inc. Heat-reduction methods and systems related to microfluidic devices
US7323140B2 (en) 2001-03-28 2008-01-29 Handylab, Inc. Moving microdroplets in a microfluidic device
US7010391B2 (en) 2001-03-28 2006-03-07 Handylab, Inc. Methods and systems for control of microfluidic devices
US8895311B1 (en) 2001-03-28 2014-11-25 Handylab, Inc. Methods and systems for control of general purpose microfluidic devices
US7829025B2 (en) 2001-03-28 2010-11-09 Venture Lending & Leasing Iv, Inc. Systems and methods for thermal actuation of microfluidic devices
US6852287B2 (en) 2001-09-12 2005-02-08 Handylab, Inc. Microfluidic devices having a reduced number of input and output connections
US20030232450A1 (en) * 2002-06-13 2003-12-18 Yoshikazu Yoshida Microfluidic device and method for producing the same
EP1654066B1 (de) 2003-07-31 2014-11-12 Handylab, Inc. Verarbeitung von teilchenhaltigen proben
DE102004020363A1 (de) * 2004-04-23 2005-11-17 Schott Ag Verfahren zur Herstellung eines Masters, Master und Verfahren zur Herstellung von optischen Elementen sowie optischen Element
US8852862B2 (en) 2004-05-03 2014-10-07 Handylab, Inc. Method for processing polynucleotide-containing samples
EP2345739B8 (de) 2004-05-03 2016-12-07 Handylab, Inc. Mikrofluidische Vorrichtung zur Verarbeitung polynukleotidhaltiger Proben
US7378068B2 (en) * 2005-06-01 2008-05-27 Conocophillips Company Electrochemical process for decomposition of hydrogen sulfide and production of sulfur
US11806718B2 (en) 2006-03-24 2023-11-07 Handylab, Inc. Fluorescence detector for microfluidic diagnostic system
DK2001990T3 (en) 2006-03-24 2016-10-03 Handylab Inc Integrated microfluidic sample processing system and method for its use
US10900066B2 (en) 2006-03-24 2021-01-26 Handylab, Inc. Microfluidic system for amplifying and detecting polynucleotides in parallel
US7998708B2 (en) 2006-03-24 2011-08-16 Handylab, Inc. Microfluidic system for amplifying and detecting polynucleotides in parallel
WO2008061165A2 (en) 2006-11-14 2008-05-22 Handylab, Inc. Microfluidic cartridge and method of making same
WO2008060604A2 (en) 2006-11-14 2008-05-22 Handylab, Inc. Microfluidic system for amplifying and detecting polynucleotides in parallel
JP2008262953A (ja) * 2007-04-10 2008-10-30 Sharp Corp 半導体装置の製造方法
US8324372B2 (en) 2007-07-13 2012-12-04 Handylab, Inc. Polynucleotide capture materials, and methods of using same
US9186677B2 (en) 2007-07-13 2015-11-17 Handylab, Inc. Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples
US8182763B2 (en) 2007-07-13 2012-05-22 Handylab, Inc. Rack for sample tubes and reagent holders
US9618139B2 (en) 2007-07-13 2017-04-11 Handylab, Inc. Integrated heater and magnetic separator
USD621060S1 (en) 2008-07-14 2010-08-03 Handylab, Inc. Microfluidic cartridge
US8133671B2 (en) 2007-07-13 2012-03-13 Handylab, Inc. Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples
US8287820B2 (en) 2007-07-13 2012-10-16 Handylab, Inc. Automated pipetting apparatus having a combined liquid pump and pipette head system
US8105783B2 (en) 2007-07-13 2012-01-31 Handylab, Inc. Microfluidic cartridge
US20090136385A1 (en) 2007-07-13 2009-05-28 Handylab, Inc. Reagent Tube
US8016260B2 (en) * 2007-07-19 2011-09-13 Formulatrix, Inc. Metering assembly and method of dispensing fluid
US7951722B2 (en) * 2007-08-08 2011-05-31 Xilinx, Inc. Double exposure semiconductor process for improved process margin
USD618820S1 (en) 2008-07-11 2010-06-29 Handylab, Inc. Reagent holder
USD787087S1 (en) 2008-07-14 2017-05-16 Handylab, Inc. Housing
US8100293B2 (en) * 2009-01-23 2012-01-24 Formulatrix, Inc. Microfluidic dispensing assembly
KR20120055754A (ko) * 2010-11-22 2012-06-01 한국전자통신연구원 클리세 및 그의 제조방법
EP2697657B8 (de) 2011-04-15 2017-08-16 Becton, Dickinson and Company Mikrofluidischer abtastender echtzeit-thermocycler und verfahren zur optischen detektion mittels synchronisierter thermozyklierung und abtastung
DK3273253T3 (da) 2011-09-30 2020-10-12 Becton Dickinson Co Forenet reagensstrimmel
USD692162S1 (en) 2011-09-30 2013-10-22 Becton, Dickinson And Company Single piece reagent holder
EP2773892B1 (de) 2011-11-04 2020-10-07 Handylab, Inc. Vorrichtung zur vorbereitung von polynukleotidproben
DK2810080T3 (da) 2012-02-03 2024-06-17 Becton Dickinson Co Eksterne filer til fordeling af molekylære diagnostiske tests og bestemmelse af kompatabilitet imellem tests
US12493242B2 (en) 2021-04-15 2025-12-09 Meta Platforms Technologies, Llc Fabrication of micro/nano-fluidic channels through ultraviolet patterning

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5122490B2 (de) 1972-04-21 1976-07-10
US6007324A (en) 1977-10-23 1999-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Double layer method for fabricating a rim type attenuating phase shifting mask
LU86722A1 (fr) 1986-12-23 1988-07-14 Glaverbel Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse
US5143854A (en) 1989-06-07 1992-09-01 Affymax Technologies N.V. Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof
US5173442A (en) * 1990-07-23 1992-12-22 Microelectronics And Computer Technology Corporation Methods of forming channels and vias in insulating layers
JPH0625000B2 (ja) 1990-07-24 1994-04-06 日本ディジタルイクイップメント株式会社 固体表面処理方法
US5604081A (en) * 1992-08-14 1997-02-18 Siemens Aktiengesellschaft Method for producing a surface structure with reliefs
US5413884A (en) * 1992-12-14 1995-05-09 American Telephone And Telegraph Company Grating fabrication using electron beam lithography
KR0186067B1 (ko) * 1993-08-06 1999-05-15 기타지마 요시토시 계조 마스크 및 그의 제조방법
JPH07186155A (ja) * 1993-12-28 1995-07-25 Dainippon Printing Co Ltd 化粧板用賦形型の製造方法
US5942443A (en) 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
US5753417A (en) * 1996-06-10 1998-05-19 Sharp Microelectronics Technology, Inc. Multiple exposure masking system for forming multi-level resist profiles
CA2258489C (en) 1996-06-28 2004-01-27 Caliper Technologies Corporation High-throughput screening assay systems in microscale fluidic devices
AU726987B2 (en) 1996-06-28 2000-11-30 Caliper Life Sciences, Inc. Electropipettor and compensation means for electrophoretic bias
US5779868A (en) 1996-06-28 1998-07-14 Caliper Technologies Corporation Electropipettor and compensation means for electrophoretic bias
US5821169A (en) * 1996-08-05 1998-10-13 Sharp Microelectronics Technology,Inc. Hard mask method for transferring a multi-level photoresist pattern
US5976336A (en) 1997-04-25 1999-11-02 Caliper Technologies Corp. Microfluidic devices incorporating improved channel geometries
US6090251A (en) 1997-06-06 2000-07-18 Caliper Technologies, Inc. Microfabricated structures for facilitating fluid introduction into microfluidic devices
US5972570A (en) 1997-07-17 1999-10-26 International Business Machines Corporation Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
US5842787A (en) 1997-10-09 1998-12-01 Caliper Technologies Corporation Microfluidic systems incorporating varied channel dimensions
US5955221A (en) 1997-11-21 1999-09-21 The Regents Of The University Of California Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
US6093507A (en) * 1999-01-04 2000-07-25 Taiwan Semiconductor Manufacturing Company Simplified process for fabricating levinson and chromeless type phase shifting masks

Also Published As

Publication number Publication date
EP1279071A1 (de) 2003-01-29
WO2001084242A1 (en) 2001-11-08
DE60144278D1 (de) 2011-05-05
EP1279071B1 (de) 2011-03-23
AU5935501A (en) 2001-11-12
CA2406063A1 (en) 2001-11-08
AU2001259355B2 (en) 2005-09-01
US6569607B2 (en) 2003-05-27
EP1279071A4 (de) 2006-08-02
US20020004182A1 (en) 2002-01-10

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