ATE503209T1 - Herstellungsprozesse für substrate mit mehreren tiefen - Google Patents
Herstellungsprozesse für substrate mit mehreren tiefenInfo
- Publication number
- ATE503209T1 ATE503209T1 AT01932865T AT01932865T ATE503209T1 AT E503209 T1 ATE503209 T1 AT E503209T1 AT 01932865 T AT01932865 T AT 01932865T AT 01932865 T AT01932865 T AT 01932865T AT E503209 T1 ATE503209 T1 AT E503209T1
- Authority
- AT
- Austria
- Prior art keywords
- selected regions
- resist layer
- substrates
- manufacturing processes
- multiple depth
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20150400P | 2000-05-03 | 2000-05-03 | |
| PCT/US2001/014125 WO2001084242A1 (en) | 2000-05-03 | 2001-05-01 | Multi depth substrate fabrication processes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE503209T1 true ATE503209T1 (de) | 2011-04-15 |
Family
ID=22746084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01932865T ATE503209T1 (de) | 2000-05-03 | 2001-05-01 | Herstellungsprozesse für substrate mit mehreren tiefen |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6569607B2 (de) |
| EP (1) | EP1279071B1 (de) |
| AT (1) | ATE503209T1 (de) |
| AU (2) | AU2001259355B2 (de) |
| CA (1) | CA2406063A1 (de) |
| DE (1) | DE60144278D1 (de) |
| WO (1) | WO2001084242A1 (de) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6048734A (en) | 1995-09-15 | 2000-04-11 | The Regents Of The University Of Michigan | Thermal microvalves in a fluid flow method |
| CN1222466C (zh) * | 2000-06-20 | 2005-10-12 | 财团法人川村理化学研究所 | 具有叠层结构的微型装置及其制造方法 |
| US6692700B2 (en) | 2001-02-14 | 2004-02-17 | Handylab, Inc. | Heat-reduction methods and systems related to microfluidic devices |
| US6852287B2 (en) | 2001-09-12 | 2005-02-08 | Handylab, Inc. | Microfluidic devices having a reduced number of input and output connections |
| US7323140B2 (en) | 2001-03-28 | 2008-01-29 | Handylab, Inc. | Moving microdroplets in a microfluidic device |
| US7829025B2 (en) | 2001-03-28 | 2010-11-09 | Venture Lending & Leasing Iv, Inc. | Systems and methods for thermal actuation of microfluidic devices |
| US8895311B1 (en) | 2001-03-28 | 2014-11-25 | Handylab, Inc. | Methods and systems for control of general purpose microfluidic devices |
| US7010391B2 (en) | 2001-03-28 | 2006-03-07 | Handylab, Inc. | Methods and systems for control of microfluidic devices |
| US20030232450A1 (en) * | 2002-06-13 | 2003-12-18 | Yoshikazu Yoshida | Microfluidic device and method for producing the same |
| JP4996248B2 (ja) | 2003-07-31 | 2012-08-08 | ハンディーラブ インコーポレイテッド | 粒子含有サンプルの処理 |
| DE102004020363A1 (de) * | 2004-04-23 | 2005-11-17 | Schott Ag | Verfahren zur Herstellung eines Masters, Master und Verfahren zur Herstellung von optischen Elementen sowie optischen Element |
| US8852862B2 (en) | 2004-05-03 | 2014-10-07 | Handylab, Inc. | Method for processing polynucleotide-containing samples |
| EP2345739B8 (de) | 2004-05-03 | 2016-12-07 | Handylab, Inc. | Mikrofluidische Vorrichtung zur Verarbeitung polynukleotidhaltiger Proben |
| US7378068B2 (en) * | 2005-06-01 | 2008-05-27 | Conocophillips Company | Electrochemical process for decomposition of hydrogen sulfide and production of sulfur |
| US11806718B2 (en) | 2006-03-24 | 2023-11-07 | Handylab, Inc. | Fluorescence detector for microfluidic diagnostic system |
| WO2007112114A2 (en) | 2006-03-24 | 2007-10-04 | Handylab, Inc. | Integrated system for processing microfluidic samples, and method of using same |
| US8883490B2 (en) | 2006-03-24 | 2014-11-11 | Handylab, Inc. | Fluorescence detector for microfluidic diagnostic system |
| US7998708B2 (en) | 2006-03-24 | 2011-08-16 | Handylab, Inc. | Microfluidic system for amplifying and detecting polynucleotides in parallel |
| US10900066B2 (en) | 2006-03-24 | 2021-01-26 | Handylab, Inc. | Microfluidic system for amplifying and detecting polynucleotides in parallel |
| US8709787B2 (en) | 2006-11-14 | 2014-04-29 | Handylab, Inc. | Microfluidic cartridge and method of using same |
| JP2008262953A (ja) * | 2007-04-10 | 2008-10-30 | Sharp Corp | 半導体装置の製造方法 |
| USD621060S1 (en) | 2008-07-14 | 2010-08-03 | Handylab, Inc. | Microfluidic cartridge |
| US8287820B2 (en) | 2007-07-13 | 2012-10-16 | Handylab, Inc. | Automated pipetting apparatus having a combined liquid pump and pipette head system |
| US9618139B2 (en) | 2007-07-13 | 2017-04-11 | Handylab, Inc. | Integrated heater and magnetic separator |
| US8182763B2 (en) | 2007-07-13 | 2012-05-22 | Handylab, Inc. | Rack for sample tubes and reagent holders |
| US8133671B2 (en) | 2007-07-13 | 2012-03-13 | Handylab, Inc. | Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples |
| US20090136385A1 (en) | 2007-07-13 | 2009-05-28 | Handylab, Inc. | Reagent Tube |
| WO2009012185A1 (en) | 2007-07-13 | 2009-01-22 | Handylab, Inc. | Polynucleotide capture materials, and methods of using same |
| US9186677B2 (en) | 2007-07-13 | 2015-11-17 | Handylab, Inc. | Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples |
| US8105783B2 (en) | 2007-07-13 | 2012-01-31 | Handylab, Inc. | Microfluidic cartridge |
| US8016260B2 (en) * | 2007-07-19 | 2011-09-13 | Formulatrix, Inc. | Metering assembly and method of dispensing fluid |
| US7951722B2 (en) * | 2007-08-08 | 2011-05-31 | Xilinx, Inc. | Double exposure semiconductor process for improved process margin |
| USD618820S1 (en) | 2008-07-11 | 2010-06-29 | Handylab, Inc. | Reagent holder |
| USD787087S1 (en) | 2008-07-14 | 2017-05-16 | Handylab, Inc. | Housing |
| US8100293B2 (en) * | 2009-01-23 | 2012-01-24 | Formulatrix, Inc. | Microfluidic dispensing assembly |
| KR20120055754A (ko) * | 2010-11-22 | 2012-06-01 | 한국전자통신연구원 | 클리세 및 그의 제조방법 |
| AU2012242510B2 (en) | 2011-04-15 | 2015-05-14 | Becton, Dickinson And Company | Scanning real-time microfluidic thermocycler and methods for synchronized thermocycling and scanning optical detection |
| JP6117217B2 (ja) | 2011-09-30 | 2017-04-19 | ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company | ユニット化された試薬ストリップ |
| USD692162S1 (en) | 2011-09-30 | 2013-10-22 | Becton, Dickinson And Company | Single piece reagent holder |
| EP2773892B1 (de) | 2011-11-04 | 2020-10-07 | Handylab, Inc. | Vorrichtung zur vorbereitung von polynukleotidproben |
| ES2978107T3 (es) | 2012-02-03 | 2024-09-05 | Becton Dickinson Co | Archivos externos para distribución de pruebas de diagnóstico molecular y determinación de compatibilidad entre pruebas |
| US12493242B2 (en) | 2021-04-15 | 2025-12-09 | Meta Platforms Technologies, Llc | Fabrication of micro/nano-fluidic channels through ultraviolet patterning |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5122490B2 (de) | 1972-04-21 | 1976-07-10 | ||
| US6007324A (en) | 1977-10-23 | 1999-12-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Double layer method for fabricating a rim type attenuating phase shifting mask |
| LU86722A1 (fr) | 1986-12-23 | 1988-07-14 | Glaverbel | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
| US5143854A (en) | 1989-06-07 | 1992-09-01 | Affymax Technologies N.V. | Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof |
| US5173442A (en) * | 1990-07-23 | 1992-12-22 | Microelectronics And Computer Technology Corporation | Methods of forming channels and vias in insulating layers |
| JPH0625000B2 (ja) | 1990-07-24 | 1994-04-06 | 日本ディジタルイクイップメント株式会社 | 固体表面処理方法 |
| US5604081A (en) * | 1992-08-14 | 1997-02-18 | Siemens Aktiengesellschaft | Method for producing a surface structure with reliefs |
| US5413884A (en) * | 1992-12-14 | 1995-05-09 | American Telephone And Telegraph Company | Grating fabrication using electron beam lithography |
| KR0186067B1 (ko) * | 1993-08-06 | 1999-05-15 | 기타지마 요시토시 | 계조 마스크 및 그의 제조방법 |
| JPH07186155A (ja) | 1993-12-28 | 1995-07-25 | Dainippon Printing Co Ltd | 化粧板用賦形型の製造方法 |
| US5942443A (en) | 1996-06-28 | 1999-08-24 | Caliper Technologies Corporation | High throughput screening assay systems in microscale fluidic devices |
| US5753417A (en) * | 1996-06-10 | 1998-05-19 | Sharp Microelectronics Technology, Inc. | Multiple exposure masking system for forming multi-level resist profiles |
| US6429025B1 (en) | 1996-06-28 | 2002-08-06 | Caliper Technologies Corp. | High-throughput screening assay systems in microscale fluidic devices |
| NZ333345A (en) | 1996-06-28 | 2000-09-29 | Caliper Techn Corp | Electropipettor and compensation for electrophoretic bias during electroosmotic microfluid transport |
| US5779868A (en) | 1996-06-28 | 1998-07-14 | Caliper Technologies Corporation | Electropipettor and compensation means for electrophoretic bias |
| US5821169A (en) * | 1996-08-05 | 1998-10-13 | Sharp Microelectronics Technology,Inc. | Hard mask method for transferring a multi-level photoresist pattern |
| US5976336A (en) | 1997-04-25 | 1999-11-02 | Caliper Technologies Corp. | Microfluidic devices incorporating improved channel geometries |
| US6090251A (en) | 1997-06-06 | 2000-07-18 | Caliper Technologies, Inc. | Microfabricated structures for facilitating fluid introduction into microfluidic devices |
| US5972570A (en) * | 1997-07-17 | 1999-10-26 | International Business Machines Corporation | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
| US5842787A (en) | 1997-10-09 | 1998-12-01 | Caliper Technologies Corporation | Microfluidic systems incorporating varied channel dimensions |
| US5955221A (en) | 1997-11-21 | 1999-09-21 | The Regents Of The University Of California | Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart |
| US6093507A (en) * | 1999-01-04 | 2000-07-25 | Taiwan Semiconductor Manufacturing Company | Simplified process for fabricating levinson and chromeless type phase shifting masks |
-
2001
- 2001-05-01 WO PCT/US2001/014125 patent/WO2001084242A1/en not_active Ceased
- 2001-05-01 AU AU2001259355A patent/AU2001259355B2/en not_active Ceased
- 2001-05-01 AU AU5935501A patent/AU5935501A/xx active Pending
- 2001-05-01 US US09/846,679 patent/US6569607B2/en not_active Expired - Lifetime
- 2001-05-01 EP EP01932865A patent/EP1279071B1/de not_active Expired - Lifetime
- 2001-05-01 DE DE60144278T patent/DE60144278D1/de not_active Expired - Lifetime
- 2001-05-01 CA CA002406063A patent/CA2406063A1/en not_active Abandoned
- 2001-05-01 AT AT01932865T patent/ATE503209T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1279071A4 (de) | 2006-08-02 |
| EP1279071A1 (de) | 2003-01-29 |
| CA2406063A1 (en) | 2001-11-08 |
| AU5935501A (en) | 2001-11-12 |
| AU2001259355B2 (en) | 2005-09-01 |
| US20020004182A1 (en) | 2002-01-10 |
| EP1279071B1 (de) | 2011-03-23 |
| DE60144278D1 (de) | 2011-05-05 |
| WO2001084242A1 (en) | 2001-11-08 |
| US6569607B2 (en) | 2003-05-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |