ATE504074T1 - Gepulste hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter wirkung - Google Patents

Gepulste hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter wirkung

Info

Publication number
ATE504074T1
ATE504074T1 AT03776584T AT03776584T ATE504074T1 AT E504074 T1 ATE504074 T1 AT E504074T1 AT 03776584 T AT03776584 T AT 03776584T AT 03776584 T AT03776584 T AT 03776584T AT E504074 T1 ATE504074 T1 AT E504074T1
Authority
AT
Austria
Prior art keywords
cathode
weakly
proximate
ionized plasma
plasma processing
Prior art date
Application number
AT03776584T
Other languages
English (en)
Inventor
Roman Chistyakov
Original Assignee
Zond Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=32106072&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE504074(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Zond Inc filed Critical Zond Inc
Application granted granted Critical
Publication of ATE504074T1 publication Critical patent/ATE504074T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Magnetic Treatment Devices (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
AT03776584T 2002-10-29 2003-10-28 Gepulste hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter wirkung ATE504074T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/065,551 US6896775B2 (en) 2002-10-29 2002-10-29 High-power pulsed magnetically enhanced plasma processing
PCT/US2003/034191 WO2004040615A2 (en) 2002-10-29 2003-10-28 High-power pulsed magnetically enhanced plasma processing

Publications (1)

Publication Number Publication Date
ATE504074T1 true ATE504074T1 (de) 2011-04-15

Family

ID=32106072

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03776584T ATE504074T1 (de) 2002-10-29 2003-10-28 Gepulste hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter wirkung

Country Status (7)

Country Link
US (2) US6896775B2 (de)
EP (1) EP1556882B1 (de)
JP (1) JP2006505128A (de)
AT (1) ATE504074T1 (de)
AU (1) AU2003284194A1 (de)
DE (1) DE60336574D1 (de)
WO (1) WO2004040615A2 (de)

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Also Published As

Publication number Publication date
AU2003284194A1 (en) 2004-05-25
WO2004040615A3 (en) 2004-09-23
US6896775B2 (en) 2005-05-24
DE60336574D1 (de) 2011-05-12
US20050167263A1 (en) 2005-08-04
US20040082187A1 (en) 2004-04-29
WO2004040615A2 (en) 2004-05-13
EP1556882A2 (de) 2005-07-27
EP1556882B1 (de) 2011-03-30
JP2006505128A (ja) 2006-02-09

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