ATE50605T1 - Reagensquelle. - Google Patents

Reagensquelle.

Info

Publication number
ATE50605T1
ATE50605T1 AT87304105T AT87304105T ATE50605T1 AT E50605 T1 ATE50605 T1 AT E50605T1 AT 87304105 T AT87304105 T AT 87304105T AT 87304105 T AT87304105 T AT 87304105T AT E50605 T1 ATE50605 T1 AT E50605T1
Authority
AT
Austria
Prior art keywords
complexing agent
gas stream
rate
reagent
gaseous phase
Prior art date
Application number
AT87304105T
Other languages
English (en)
Inventor
Rodney Hollands Moss
Donald Charlton Bradley
Marc Marian Faktor
Dario Marcello Frigo
Original Assignee
British Telecomm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Telecomm filed Critical British Telecomm
Application granted granted Critical
Publication of ATE50605T1 publication Critical patent/ATE50605T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/04—Feed or outlet devices; Feed or outlet control devices using osmotic pressure using membranes, porous plates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Steroid Compounds (AREA)
  • Saccharide Compounds (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
AT87304105T 1986-05-21 1987-05-08 Reagensquelle. ATE50605T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB868612402A GB8612402D0 (en) 1986-05-21 1986-05-21 Reagent source
EP87304105A EP0246785B1 (de) 1986-05-21 1987-05-08 Reagensquelle

Publications (1)

Publication Number Publication Date
ATE50605T1 true ATE50605T1 (de) 1990-03-15

Family

ID=10598233

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87304105T ATE50605T1 (de) 1986-05-21 1987-05-08 Reagensquelle.

Country Status (5)

Country Link
EP (1) EP0246785B1 (de)
AT (1) ATE50605T1 (de)
CA (1) CA1332694C (de)
DE (1) DE3761773D1 (de)
GB (1) GB8612402D0 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4916088A (en) * 1988-04-29 1990-04-10 Sri International Method of making a low dislocation density semiconductor device
US5063166A (en) * 1988-04-29 1991-11-05 Sri International Method of forming a low dislocation density semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1947463A1 (de) * 1969-01-30 1970-08-06 Halbleiterwerk Frankfurt Oder Vorrichtung zum Beladen von Traegergasen
FR2569207B1 (fr) * 1984-08-14 1986-11-14 Mellet Robert Procede et dispositif d'obtention d'un courant gazeux contenant un compose a l'etat de vapeur, utilisable notamment pour introduire ce compose dans un reacteur d'epitaxie
GB8421162D0 (en) * 1984-08-21 1984-09-26 British Telecomm Growth of semi-conductors

Also Published As

Publication number Publication date
EP0246785B1 (de) 1990-02-28
CA1332694C (en) 1994-10-25
GB8612402D0 (en) 1986-06-25
DE3761773D1 (de) 1990-04-05
EP0246785A1 (de) 1987-11-25

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties