ATE507200T1 - Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke - Google Patents

Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke

Info

Publication number
ATE507200T1
ATE507200T1 AT04766405T AT04766405T ATE507200T1 AT E507200 T1 ATE507200 T1 AT E507200T1 AT 04766405 T AT04766405 T AT 04766405T AT 04766405 T AT04766405 T AT 04766405T AT E507200 T1 ATE507200 T1 AT E507200T1
Authority
AT
Austria
Prior art keywords
large thickness
producing large
thickness coatings
photopolymerizable systems
clear
Prior art date
Application number
AT04766405T
Other languages
English (en)
Inventor
Gabriele Norcini
Stefano Romagnano
Marco Visconti
Bassi Giuseppe Li
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lamberti Spa filed Critical Lamberti Spa
Application granted granted Critical
Publication of ATE507200T1 publication Critical patent/ATE507200T1/de

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/02Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C225/14Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
    • C07C225/16Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46Friedel-Crafts reactions
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/63Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/64Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00Systems containing only non-condensed rings
    • C07C2601/12Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14The ring being saturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
AT04766405T 2003-08-07 2004-08-03 Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke ATE507200T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000028A ITVA20030028A1 (it) 2003-08-07 2003-08-07 Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.
PCT/EP2004/051699 WO2005014515A2 (en) 2003-08-07 2004-08-03 Clear photopolymerizable systems for the preparation of high thickness coatings

Publications (1)

Publication Number Publication Date
ATE507200T1 true ATE507200T1 (de) 2011-05-15

Family

ID=34131257

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04766405T ATE507200T1 (de) 2003-08-07 2004-08-03 Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke

Country Status (10)

Country Link
US (1) US7534880B2 (de)
EP (1) EP1670740B1 (de)
JP (1) JP4638869B2 (de)
CN (1) CN100554234C (de)
AT (1) ATE507200T1 (de)
CA (1) CA2532458C (de)
DE (1) DE602004032452D1 (de)
DK (1) DK1670740T3 (de)
IT (1) ITVA20030028A1 (de)
WO (1) WO2005014515A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITVA20030040A1 (it) * 2003-10-27 2005-04-28 Lamberti Spa Fotoiniziatore solido bianco in polvere e procedimento per la sua preparazione.
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
CN103601628B (zh) 2010-11-12 2015-11-18 深圳市有为化学技术有限公司 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂
CN102504054B (zh) * 2011-11-01 2014-07-02 长沙新宇高分子科技有限公司 降低直至消除voc排放的多官能团羟基酮光引发剂
BE1022066B1 (nl) * 2013-06-28 2016-02-15 Chemstream Bvba Oppervlakteactief middel en bereiding daarvan
CN104974053B (zh) * 2015-06-24 2017-04-26 天津久日新材料股份有限公司 一种新的氨基酮类光引发剂及在uv‑led光固化体系的应用
KR102079026B1 (ko) 2015-12-15 2020-02-19 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 플루오렌 다작용성 광개시제 및 이의 제조 및 용도, 및 플루오렌 광개시제를 포함하는 광감성 수지 조성물 및 이의 용도
WO2018049976A1 (zh) 2016-09-13 2018-03-22 常州强力先端电子材料有限公司 芴类光引发剂、其制备方法、具有其的光固化组合物及其在光固化领域的应用
US11399986B2 (en) * 2016-12-16 2022-08-02 The Procter & Gamble Company Article comprising energy curable ink
WO2018149370A1 (zh) 2017-02-17 2018-08-23 常州强力先端电子材料有限公司 芴氨基酮类光引发剂、其制备方法及含芴氨基酮类光引发剂的uv光固化组合物
CN112004800B (zh) * 2018-06-29 2024-12-03 株式会社Adeka 肟酯化合物和含有其的光聚合引发剂
CN109678735B (zh) * 2018-12-28 2022-02-22 山东久日化学科技有限公司 一种烷基胺原位回收利用技术制备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715293A (en) 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
US4318791A (en) * 1977-12-22 1982-03-09 Ciba-Geigy Corporation Use of aromatic-aliphatic ketones as photo sensitizers
EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
IT1208494B (it) 1985-01-28 1989-07-10 Lamberti Flli Spa Polimerizzazione. derivati solforati di chetoni aromatico-alifatici e alifatici come fotoiniziatori di
DE3880868D1 (en) 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
EP0850253B1 (de) * 1995-09-11 1999-12-01 LAMBERTI S.p.A. Betaketosulfonsäure-derivate geeignet als polymerisations photoinitiatoren und photopolymerisierbare systeme die diese enthalten
IT1303775B1 (it) * 1998-11-19 2001-02-23 Lamberti Spa Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
DE50003989D1 (de) * 1999-01-12 2003-11-13 Clariant Finance Bvi Ltd Benzophenone und ihre verwendung als photoinitiatoren

Also Published As

Publication number Publication date
US7534880B2 (en) 2009-05-19
DK1670740T3 (da) 2011-08-15
CN1832912A (zh) 2006-09-13
CA2532458A1 (en) 2005-02-17
ITVA20030028A1 (it) 2005-02-08
EP1670740A2 (de) 2006-06-21
WO2005014515A2 (en) 2005-02-17
CN100554234C (zh) 2009-10-28
DE602004032452D1 (de) 2011-06-09
US20060246228A1 (en) 2006-11-02
EP1670740B1 (de) 2011-04-27
WO2005014515A3 (en) 2005-04-28
JP2007501776A (ja) 2007-02-01
CA2532458C (en) 2012-01-03
JP4638869B2 (ja) 2011-02-23

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