ATE507327T1 - Elektrolyt und verfahren zur abscheidung einer matten metallschicht - Google Patents

Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Info

Publication number
ATE507327T1
ATE507327T1 AT06701821T AT06701821T ATE507327T1 AT E507327 T1 ATE507327 T1 AT E507327T1 AT 06701821 T AT06701821 T AT 06701821T AT 06701821 T AT06701821 T AT 06701821T AT E507327 T1 ATE507327 T1 AT E507327T1
Authority
AT
Austria
Prior art keywords
metal layer
electrolyte
depositing
polyalkylene oxide
dispersion
Prior art date
Application number
AT06701821T
Other languages
English (en)
Inventor
Andreas Koenigshofen
Danica Elbick
Christoph Werner
Wolfgang Clauberg
Peter Pies
Andreas Moebius
Original Assignee
Enthone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone filed Critical Enthone
Application granted granted Critical
Publication of ATE507327T1 publication Critical patent/ATE507327T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Manufacture And Refinement Of Metals (AREA)
AT06701821T 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht ATE507327T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2006/000076 WO2007076898A1 (de) 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Publications (1)

Publication Number Publication Date
ATE507327T1 true ATE507327T1 (de) 2011-05-15

Family

ID=36956125

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06701821T ATE507327T1 (de) 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Country Status (10)

Country Link
US (2) US8192607B2 (de)
EP (1) EP1969160B1 (de)
JP (1) JP4811880B2 (de)
KR (1) KR101234429B1 (de)
CN (1) CN101400830B (de)
AT (1) ATE507327T1 (de)
DE (1) DE502006009414D1 (de)
ES (1) ES2361500T3 (de)
PL (1) PL1969160T3 (de)
WO (1) WO2007076898A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2143828B1 (de) * 2008-07-08 2016-12-28 Enthone, Inc. Elektrolyt und Verfahren zur Ablagerung einer matten Metallschicht
US7951600B2 (en) 2008-11-07 2011-05-31 Xtalic Corporation Electrodeposition baths, systems and methods
EP2568063A1 (de) * 2011-09-09 2013-03-13 Rohm and Haas Electronic Materials LLC Kupfer-Elektroplattierverfahren mit geringer innerer Spannung
US20130220819A1 (en) * 2012-02-27 2013-08-29 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
US20160032479A1 (en) * 2013-03-15 2016-02-04 Enthone Inc. Electrodeposition of silver with fluoropolymer nanoparticles
CN103382564B (zh) * 2013-07-18 2016-10-05 华南理工大学 金属表面超疏水钴镀层及其制备方法
KR101636361B1 (ko) * 2014-07-31 2016-07-06 주식회사 에이피씨티 과불소화알킬 계면활성제를 함유하는 솔더범프용 주석합금 전기도금액
GB2534120A (en) * 2014-11-28 2016-07-20 Daido Ind Bearings Europe Ltd Bismuth-based composite coating for overlay applications in plain bearings
AT516876B1 (de) * 2015-03-09 2016-11-15 Ing W Garhöfer Ges M B H Abscheidung von dekorativen Palladium-Eisen-Legierungsbeschichtungen auf metallischen Substanzen
JP6631349B2 (ja) 2015-03-26 2020-01-15 三菱マテリアル株式会社 アンモニウム塩を用いためっき液
CN105648490B (zh) * 2016-01-07 2017-08-15 东南大学 一种无低表面能物质改性的超疏水表面及其制备方法
CN105862093B (zh) * 2016-05-26 2018-03-06 安庆师范大学 一种离子液体中电镀Ni‑Cr‑PTFE复合镀层的方法
CN109652829B (zh) * 2019-01-04 2021-07-09 中国计量大学 一种无稀土Bi基磁性电镀液及其制备方法
CN109680310B (zh) * 2019-01-04 2020-07-07 中国计量大学 一种镍锑电镀液及其制备方法
FR3092589A1 (fr) * 2019-02-08 2020-08-14 Aveni Electrodéposition d’un alliage de cobalt et utilisation en microélectronique
CN110714212B (zh) * 2019-10-12 2021-04-30 常州大学 一种水溶液体系中由氯化镍一步法制备超疏水镍薄膜的方法
AT523922B1 (de) * 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3839166A (en) * 1967-05-16 1974-10-01 Henkel & Cie Gmbh Method for obtaining nickel deposits with satin finish
US3839165A (en) * 1967-08-26 1974-10-01 Henkel & Cie Gmbh Nickel electroplating method
US3787294A (en) * 1971-12-07 1974-01-22 S Kurosaki Process for producing a solid lubricant self-supplying-type co-deposited metal film
FR2190940A1 (en) 1972-06-28 1974-02-01 Rhone Poulenc Sa Additives for tinplating baths - contg diethers and surfactants
DE2327881B2 (de) * 1973-06-01 1978-06-22 Langbein-Pfanhauser Werke Ag, 4040 Neuss Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge
JPS5856038B2 (ja) * 1975-07-28 1983-12-13 ソニー株式会社 酸性Ｎｉ電気メッキ浴
US4444630A (en) * 1977-07-11 1984-04-24 Richardson Chemical Company Acid bright zinc plating
US4381228A (en) * 1981-06-16 1983-04-26 Occidental Chemical Corporation Process and composition for the electrodeposition of tin and tin alloys
AU559896B2 (en) * 1983-06-10 1987-03-26 Omi International Corp. Electrolytic copper depositing processes
DE3909811A1 (de) 1989-03-24 1990-09-27 Lpw Chemie Gmbh Verwendung von zumindest einer organischen sulfinsaeure und/oder von zumindest einem alkalisalz einer organischen sulfinsaeure als mittel ...
JP2626065B2 (ja) * 1989-07-04 1997-07-02 上村工業株式会社 サテンニッケル又はニッケル合金めっき浴及びめっき方法
DE69110652T2 (de) * 1991-01-07 1996-02-01 Atochem Elf Sa Verfahren zur Elektrogewinnung von Zink.
US5401590A (en) * 1992-12-07 1995-03-28 Duracell Inc. Additives for electrochemical cells having zinc anodes
JP3263750B2 (ja) * 1993-12-08 2002-03-11 奥野製薬工業株式会社 酸性銅めっき浴及びこれを使用するめっき方法
DE19540011C2 (de) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen
US5667659A (en) * 1996-04-04 1997-09-16 Handy & Harman Low friction solder electrodeposits
EP1059333B1 (de) * 1998-02-24 2006-10-11 Asahi Glass Company, Limited Wässrige Polytetrafluorethylen Dispersionszusammensetzung
JP2001089897A (ja) * 1999-07-16 2001-04-03 Toto Ltd めっき製品
JP2001125413A (ja) * 1999-10-27 2001-05-11 Shinwa Denki Kk 電子写真用定着ロ−ラ−及びその製造法
JP2001226798A (ja) * 2000-02-14 2001-08-21 Osaka Gas Co Ltd 摺動部材
US6491806B1 (en) * 2000-04-27 2002-12-10 Intel Corporation Electroplating bath composition
DE10025552C1 (de) * 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
EP1341951B1 (de) * 2000-10-19 2004-05-19 ATOTECH Deutschland GmbH Kupferbad und verfahren zur abscheidung eines matten kupferüberzuges
US6776893B1 (en) * 2000-11-20 2004-08-17 Enthone Inc. Electroplating chemistry for the CU filling of submicron features of VLSI/ULSI interconnect
US6790763B2 (en) * 2000-12-04 2004-09-14 Ebara Corporation Substrate processing method
JP2002317298A (ja) 2001-04-17 2002-10-31 Inax Corp 撥水性サテンめっき製品及びその製造方法
EP1308541A1 (de) * 2001-10-04 2003-05-07 Shipley Company LLC Beschichtungsbad und Methode zur Abscheidung einer Metallschicht auf einem Substrat
US6726827B2 (en) * 2002-01-17 2004-04-27 Lucent Technologies Inc. Electroplating solution for high speed plating of tin-bismuth solder
DE10222962A1 (de) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
JP4249438B2 (ja) * 2002-07-05 2009-04-02 日本ニュークローム株式会社 銅―錫合金めっき用ピロリン酸浴
US20050072683A1 (en) * 2003-04-03 2005-04-07 Ebara Corporation Copper plating bath and plating method
JP4603812B2 (ja) 2003-05-12 2010-12-22 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 改良されたスズめっき方法
CN100348780C (zh) * 2004-03-16 2007-11-14 天津大学 脉冲镀镍基纳米复合镀层的方法及设备
TW200632147A (de) * 2004-11-12 2006-09-16

Also Published As

Publication number Publication date
CN101400830A (zh) 2009-04-01
US8192607B2 (en) 2012-06-05
KR20080092399A (ko) 2008-10-15
DE502006009414D1 (de) 2011-06-09
ES2361500T3 (es) 2011-06-17
CN101400830B (zh) 2012-07-04
JP2009522441A (ja) 2009-06-11
EP1969160A1 (de) 2008-09-17
KR101234429B1 (ko) 2013-02-18
PL1969160T3 (pl) 2011-09-30
JP4811880B2 (ja) 2011-11-09
US20120298519A1 (en) 2012-11-29
WO2007076898A1 (de) 2007-07-12
EP1969160B1 (de) 2011-04-27
US20080302668A1 (en) 2008-12-11

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