ATE509365T1 - Verfahren zum behandeln eines gasstroms - Google Patents

Verfahren zum behandeln eines gasstroms

Info

Publication number
ATE509365T1
ATE509365T1 AT06765117T AT06765117T ATE509365T1 AT E509365 T1 ATE509365 T1 AT E509365T1 AT 06765117 T AT06765117 T AT 06765117T AT 06765117 T AT06765117 T AT 06765117T AT E509365 T1 ATE509365 T1 AT E509365T1
Authority
AT
Austria
Prior art keywords
resonant cavity
plasma
microwave
gas outlet
gas
Prior art date
Application number
AT06765117T
Other languages
English (en)
Inventor
James Smith
Andrew Seeley
Derek Baker
Marilena Radiou
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Priority claimed from PCT/GB2006/002795 external-priority patent/WO2007020374A1/en
Application granted granted Critical
Publication of ATE509365T1 publication Critical patent/ATE509365T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
  • Lasers (AREA)
AT06765117T 2005-08-15 2006-07-27 Verfahren zum behandeln eines gasstroms ATE509365T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0516695.4A GB0516695D0 (en) 2005-08-15 2005-08-15 Microwave plasma reactor
GBGB0521961.3A GB0521961D0 (en) 2005-08-15 2005-10-27 Method of treating a gas stream
PCT/GB2006/002795 WO2007020374A1 (en) 2005-08-15 2006-07-27 Method of treating a gas stream

Publications (1)

Publication Number Publication Date
ATE509365T1 true ATE509365T1 (de) 2011-05-15

Family

ID=35098307

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06765117T ATE509365T1 (de) 2005-08-15 2006-07-27 Verfahren zum behandeln eines gasstroms

Country Status (10)

Country Link
US (2) US8776719B2 (de)
EP (1) EP1915768B1 (de)
JP (2) JP5027808B2 (de)
KR (1) KR101286348B1 (de)
CN (2) CN101243534B (de)
AT (1) ATE509365T1 (de)
GB (2) GB0516695D0 (de)
SG (1) SG186661A1 (de)
TW (2) TWI399454B (de)
WO (1) WO2007020373A1 (de)

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Also Published As

Publication number Publication date
TWI399454B (zh) 2013-06-21
JP2009504394A (ja) 2009-02-05
KR20080033408A (ko) 2008-04-16
GB0516695D0 (en) 2005-09-21
US8776719B2 (en) 2014-07-15
CN101243534B (zh) 2010-05-26
EP1915768B1 (de) 2014-09-10
TW200712249A (en) 2007-04-01
CN101248506B (zh) 2011-09-07
TWI405239B (zh) 2013-08-11
US8518162B2 (en) 2013-08-27
JP2009504393A (ja) 2009-02-05
US20100006227A1 (en) 2010-01-14
TW200727325A (en) 2007-07-16
EP1915768A1 (de) 2008-04-30
CN101248506A (zh) 2008-08-20
KR101286348B1 (ko) 2013-07-23
US20110197759A1 (en) 2011-08-18
WO2007020373A1 (en) 2007-02-22
GB0521961D0 (en) 2005-12-07
JP5600394B2 (ja) 2014-10-01
CN101243534A (zh) 2008-08-13
JP5027808B2 (ja) 2012-09-19
SG186661A1 (en) 2013-01-30

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