ATE510332T1 - Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers - Google Patents
Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasersInfo
- Publication number
- ATE510332T1 ATE510332T1 AT08744395T AT08744395T ATE510332T1 AT E510332 T1 ATE510332 T1 AT E510332T1 AT 08744395 T AT08744395 T AT 08744395T AT 08744395 T AT08744395 T AT 08744395T AT E510332 T1 ATE510332 T1 AT E510332T1
- Authority
- AT
- Austria
- Prior art keywords
- laser
- pressure
- gases
- excimer laser
- gas discharge
- Prior art date
Links
- 239000007789 gas Substances 0.000 abstract 5
- 230000003287 optical effect Effects 0.000 abstract 2
- 230000001902 propagating effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2253—XeCl, i.e. xenon chloride is comprised for lasing around 308 nm
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US92027207P | 2007-03-27 | 2007-03-27 | |
| PCT/US2008/058293 WO2008118975A2 (en) | 2007-03-27 | 2008-03-26 | Method and apparatus for efficiently operating a gas discharge excimer laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE510332T1 true ATE510332T1 (de) | 2011-06-15 |
Family
ID=39789265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08744395T ATE510332T1 (de) | 2007-03-27 | 2008-03-26 | Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20080240197A1 (de) |
| EP (1) | EP2140529B1 (de) |
| KR (1) | KR20100015929A (de) |
| AT (1) | ATE510332T1 (de) |
| TW (1) | TW200903935A (de) |
| WO (1) | WO2008118975A2 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2002245163A1 (en) * | 2000-10-20 | 2002-07-24 | Photomedex | Controlled dose delivery of ultraviolet light for treating skin disorders |
| US7144248B2 (en) * | 2001-10-18 | 2006-12-05 | Irwin Dean S | Device for oral UV photo-therapy |
| US20070032844A1 (en) * | 2005-08-05 | 2007-02-08 | Levatter Jeffrey I | Targeted UV phototherapy light block |
| US20070030876A1 (en) * | 2005-08-05 | 2007-02-08 | Levatter Jeffrey I | Apparatus and method for purging and recharging excimer laser gases |
| ATE510332T1 (de) * | 2007-03-27 | 2011-06-15 | Photomedex Inc | Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers |
| JP6310390B2 (ja) * | 2012-06-26 | 2018-04-11 | ギガフォトン株式会社 | レーザ装置の制御方法及びレーザ装置 |
| US9116445B2 (en) | 2012-11-29 | 2015-08-25 | Kla-Tencor Corporation | Resonant cavity conditioning for improved nonlinear crystal performance |
| CN105556641A (zh) * | 2013-07-23 | 2016-05-04 | 恩特格里斯公司 | 化学试剂的远程传送 |
| US8929419B1 (en) * | 2013-08-13 | 2015-01-06 | Lightmachinery Inc. | Excimer laser with gas purification |
| US9634455B1 (en) * | 2016-02-16 | 2017-04-25 | Cymer, Llc | Gas optimization in a gas discharge light source |
| US11581692B2 (en) * | 2019-06-18 | 2023-02-14 | KLA Corp. | Controlling pressure in a cavity of a light source |
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| JP4650881B2 (ja) * | 2005-04-20 | 2011-03-16 | 株式会社小松製作所 | エキシマレーザ装置とレーザガス交換方法と部分ガス交換量演算方法 |
| US20060268946A1 (en) * | 2005-04-26 | 2006-11-30 | Levatter Jeffrey I | Wavelength conversion of excimer-generated UV light |
| US20070030876A1 (en) * | 2005-08-05 | 2007-02-08 | Levatter Jeffrey I | Apparatus and method for purging and recharging excimer laser gases |
| US20070032844A1 (en) * | 2005-08-05 | 2007-02-08 | Levatter Jeffrey I | Targeted UV phototherapy light block |
| US7848378B2 (en) * | 2005-08-05 | 2010-12-07 | Photomedex, Inc. | Apparatus and method for monitoring power of a UV laser |
| US20080130701A1 (en) * | 2006-12-05 | 2008-06-05 | Asml Netherlands B.V. | Gas laser apparatus and method |
| ATE510332T1 (de) * | 2007-03-27 | 2011-06-15 | Photomedex Inc | Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers |
-
2008
- 2008-03-26 AT AT08744395T patent/ATE510332T1/de not_active IP Right Cessation
- 2008-03-26 TW TW097110822A patent/TW200903935A/zh unknown
- 2008-03-26 KR KR1020097022377A patent/KR20100015929A/ko not_active Withdrawn
- 2008-03-26 US US12/055,851 patent/US20080240197A1/en not_active Abandoned
- 2008-03-26 WO PCT/US2008/058293 patent/WO2008118975A2/en not_active Ceased
- 2008-03-26 EP EP08744395A patent/EP2140529B1/de not_active Not-in-force
-
2009
- 2009-11-17 US US12/620,310 patent/US20100232469A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP2140529B1 (de) | 2011-05-18 |
| WO2008118975A2 (en) | 2008-10-02 |
| EP2140529A2 (de) | 2010-01-06 |
| TW200903935A (en) | 2009-01-16 |
| KR20100015929A (ko) | 2010-02-12 |
| WO2008118975A3 (en) | 2009-04-16 |
| US20080240197A1 (en) | 2008-10-02 |
| US20100232469A1 (en) | 2010-09-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |