ATE514186T1 - Integrierter schaltkreis mit mosfet- sicherungselement - Google Patents

Integrierter schaltkreis mit mosfet- sicherungselement

Info

Publication number
ATE514186T1
ATE514186T1 AT09716959T AT09716959T ATE514186T1 AT E514186 T1 ATE514186 T1 AT E514186T1 AT 09716959 T AT09716959 T AT 09716959T AT 09716959 T AT09716959 T AT 09716959T AT E514186 T1 ATE514186 T1 AT E514186T1
Authority
AT
Austria
Prior art keywords
mos
fuse
measured
value
parameter
Prior art date
Application number
AT09716959T
Other languages
English (en)
Inventor
Hsung Im
Sunhom Paak
Boon Ang
Original Assignee
Xilinx Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xilinx Inc filed Critical Xilinx Inc
Application granted granted Critical
Publication of ATE514186T1 publication Critical patent/ATE514186T1/de

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • G11C17/14Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
    • G11C17/16Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B20/00Read-only memory [ROM] devices
    • H10B20/20Programmable ROM [PROM] devices comprising field-effect components
    • H10B20/25One-time programmable ROM [OTPROM] devices, e.g. using electrically-fusible links
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/49Adaptable interconnections, e.g. fuses or antifuses
    • H10W20/493Fuses, i.e. interconnections changeable from conductive to non-conductive

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
AT09716959T 2008-03-06 2009-02-20 Integrierter schaltkreis mit mosfet- sicherungselement ATE514186T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/043,914 US8564023B2 (en) 2008-03-06 2008-03-06 Integrated circuit with MOSFET fuse element
PCT/US2009/034749 WO2009111187A1 (en) 2008-03-06 2009-02-20 Integrated circuit with mosfet fuse element

Publications (1)

Publication Number Publication Date
ATE514186T1 true ATE514186T1 (de) 2011-07-15

Family

ID=40513889

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09716959T ATE514186T1 (de) 2008-03-06 2009-02-20 Integrierter schaltkreis mit mosfet- sicherungselement

Country Status (7)

Country Link
US (1) US8564023B2 (de)
EP (1) EP2250671B1 (de)
JP (1) JP5253522B2 (de)
CN (1) CN101965637B (de)
AT (1) ATE514186T1 (de)
CA (1) CA2713153C (de)
WO (1) WO2009111187A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7888771B1 (en) * 2007-05-02 2011-02-15 Xilinx, Inc. E-fuse with scalable filament link
US8102019B1 (en) * 2009-06-19 2012-01-24 Xilinx, Inc. Electrically programmable diffusion fuse
US8143695B1 (en) 2009-07-24 2012-03-27 Xilinx, Inc. Contact fuse one time programmable memory
JP5617380B2 (ja) 2010-06-25 2014-11-05 富士通セミコンダクター株式会社 半導体装置及びその製造方法
US8350264B2 (en) * 2010-07-14 2013-01-08 International Businesss Machines Corporation Secure anti-fuse with low voltage programming through localized diffusion heating
CN102347309B (zh) * 2010-08-05 2013-04-10 中国科学院微电子研究所 电熔丝结构及其形成方法
US9460807B2 (en) * 2010-08-20 2016-10-04 Shine C. Chung One-time programmable memory devices using FinFET technology
US8878337B1 (en) * 2011-07-19 2014-11-04 Xilinx, Inc. Integrated circuit structure having a capacitor structured to reduce dishing of metal layers
US8659118B2 (en) * 2011-07-29 2014-02-25 Infineon Technologies Ag Semiconductor device comprising a fuse structure and a method for manufacturing such semiconductor device
CN104025500B (zh) 2011-12-29 2017-07-25 英特尔公司 使用在物理上不可克隆的函数的安全密钥存储
US8981523B2 (en) 2012-03-14 2015-03-17 International Business Machines Corporation Programmable fuse structure and methods of forming
US9053889B2 (en) 2013-03-05 2015-06-09 International Business Machines Corporation Electronic fuse cell and array
KR20140146867A (ko) * 2013-06-18 2014-12-29 에스케이하이닉스 주식회사 반도체 장치 및 그의 동작 방법
JP2015211326A (ja) 2014-04-25 2015-11-24 株式会社東芝 プログラマブル論理回路および不揮発性fpga
US9368954B1 (en) 2014-09-23 2016-06-14 Google Inc. Electrical protection and sensing control system
US11574867B2 (en) * 2020-11-25 2023-02-07 Globalfoundries U.S. Inc. Non-planar silicided semiconductor electrical fuse
CN105762137B (zh) * 2014-12-15 2020-09-08 联华电子股份有限公司 熔丝结构以及其监控方式
US10598703B2 (en) 2015-07-20 2020-03-24 Eaton Intelligent Power Limited Electric fuse current sensing systems and monitoring methods
US9627373B2 (en) 2015-08-25 2017-04-18 International Business Machines Corporation CMOS compatible fuse or resistor using self-aligned contacts
US9805815B1 (en) * 2016-08-18 2017-10-31 Taiwan Semiconductor Manufacturing Company, Ltd. Electrical fuse bit cell and mask set
US10643006B2 (en) * 2017-06-14 2020-05-05 International Business Machines Corporation Semiconductor chip including integrated security circuit
US10163783B1 (en) 2018-03-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Reduced area efuse cell structure
US11289298B2 (en) 2018-05-31 2022-03-29 Eaton Intelligent Power Limited Monitoring systems and methods for estimating thermal-mechanical fatigue in an electrical fuse
US11143718B2 (en) 2018-05-31 2021-10-12 Eaton Intelligent Power Limited Monitoring systems and methods for estimating thermal-mechanical fatigue in an electrical fuse
US11715540B2 (en) * 2022-01-05 2023-08-01 Nanya Technology Corporation Anti-fuse device
KR102804259B1 (ko) * 2024-06-19 2025-05-12 한국원자력연구원 방사선 측정용 mos 트랜지스터 및 이의 제조 방법

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4219836A (en) * 1978-05-18 1980-08-26 Texas Instruments Incorporated Contact programmable double level polysilicon MOS read only memory
US4238839A (en) * 1979-04-19 1980-12-09 National Semiconductor Corporation Laser programmable read only memory
US4562454A (en) * 1983-12-29 1985-12-31 Motorola, Inc. Electronic fuse for semiconductor devices
JPS60182219A (ja) 1984-02-29 1985-09-17 Fujitsu Ltd 半導体装置
US4647340A (en) * 1986-03-31 1987-03-03 Ncr Corporation Programmable read only memory using a tungsten fuse
US4872140A (en) * 1987-05-19 1989-10-03 Gazelle Microcircuits, Inc. Laser programmable memory array
US5166758A (en) * 1991-01-18 1992-11-24 Energy Conversion Devices, Inc. Electrically erasable phase change memory
US5708291A (en) * 1995-09-29 1998-01-13 Intel Corporation Silicide agglomeration fuse device
JP3614546B2 (ja) * 1995-12-27 2005-01-26 富士通株式会社 半導体集積回路
US5742555A (en) * 1996-08-20 1998-04-21 Micron Technology, Inc. Method of anti-fuse repair
US6060743A (en) * 1997-05-21 2000-05-09 Kabushiki Kaisha Toshiba Semiconductor memory device having multilayer group IV nanocrystal quantum dot floating gate and method of manufacturing the same
US6522582B1 (en) * 1999-03-05 2003-02-18 Xilinx, Inc. Non-volatile memory array using gate breakdown structures
US6525397B1 (en) * 1999-08-17 2003-02-25 National Semiconductor Corporation Extended drain MOSFET for programming an integrated fuse element to high resistance in low voltage process technology
US6368902B1 (en) * 2000-05-30 2002-04-09 International Business Machines Corporation Enhanced efuses by the local degradation of the fuse link
US6339544B1 (en) * 2000-09-29 2002-01-15 Intel Corporation Method to enhance performance of thermal resistor device
US6496416B1 (en) * 2000-12-19 2002-12-17 Xilinx, Inc. Low voltage non-volatile memory cell
US6882571B1 (en) * 2000-12-19 2005-04-19 Xilinx, Inc. Low voltage non-volatile memory cell
US6597013B2 (en) * 2001-08-06 2003-07-22 Texas Instruments Incorporated Low current blow trim fuse
TWI235456B (en) * 2001-11-06 2005-07-01 Yamaha Corp Semiconductor device having fuse and its manufacture method
JP3515556B2 (ja) * 2001-12-04 2004-04-05 株式会社東芝 プログラマブル素子、プログラマブル回路及び半導体装置
US20040004268A1 (en) * 2002-07-08 2004-01-08 International Business Machines Corporation E-Fuse and anti-E-Fuse device structures and methods
US6930920B1 (en) * 2002-10-29 2005-08-16 Xilinx, Inc. Low voltage non-volatile memory cell
US6807079B2 (en) * 2002-11-01 2004-10-19 Hewlett-Packard Development Company, L.P. Device having a state dependent upon the state of particles dispersed in a carrier
US20040124458A1 (en) * 2002-12-31 2004-07-01 Chandrasekharan Kothandaraman Programmable fuse device
US6911360B2 (en) * 2003-04-29 2005-06-28 Freescale Semiconductor, Inc. Fuse and method for forming
JP2004047987A (ja) 2003-06-12 2004-02-12 Rohm Co Ltd 積層基板体および半導体装置
US7068072B2 (en) * 2003-06-30 2006-06-27 Xilinx, Inc. Integrated circuit with interface tile for coupling to a stacked-die second integrated circuit
US7180102B2 (en) * 2003-09-30 2007-02-20 Agere Systems Inc. Method and apparatus for using cobalt silicided polycrystalline silicon for a one time programmable non-volatile semiconductor memory
US7026692B1 (en) * 2003-11-12 2006-04-11 Xilinx, Inc. Low voltage non-volatile memory transistor
DE102004014925B4 (de) * 2004-03-26 2016-12-29 Infineon Technologies Ag Elektronische Schaltkreisanordnung
US20050254189A1 (en) * 2004-05-07 2005-11-17 Taiwan Semiconductor Manufacturing Co., Ltd. ESD protection circuit with low parasitic capacitance
US7060566B2 (en) * 2004-06-22 2006-06-13 Infineon Technologies Ag Standby current reduction over a process window with a trimmable well bias
US7098721B2 (en) * 2004-09-01 2006-08-29 International Business Machines Corporation Low voltage programmable eFuse with differential sensing scheme
KR20060112117A (ko) * 2005-04-26 2006-10-31 주식회사 하이닉스반도체 반도체소자의 퓨즈 구조 및 그 형성방법
JP4701034B2 (ja) 2005-08-02 2011-06-15 パナソニック株式会社 半導体装置
US7224633B1 (en) * 2005-12-08 2007-05-29 International Business Machines Corporation eFuse sense circuit
JP2007194377A (ja) 2006-01-18 2007-08-02 Toshiba Corp ヒューズ素子
US7787292B2 (en) * 2007-06-29 2010-08-31 Intel Corporation Carbon nanotube fuse element

Also Published As

Publication number Publication date
CN101965637B (zh) 2013-01-16
WO2009111187A1 (en) 2009-09-11
EP2250671A1 (de) 2010-11-17
CA2713153A1 (en) 2009-09-11
US8564023B2 (en) 2013-10-22
US20090224323A1 (en) 2009-09-10
CN101965637A (zh) 2011-02-02
EP2250671B1 (de) 2011-06-22
JP5253522B2 (ja) 2013-07-31
JP2011515836A (ja) 2011-05-19
CA2713153C (en) 2014-02-11

Similar Documents

Publication Publication Date Title
ATE514186T1 (de) Integrierter schaltkreis mit mosfet- sicherungselement
ATE534132T1 (de) Programmierbare niederspannungs-efuse mit differenz-leseverfahren
WO2012058324A3 (en) Resistance change memory cell circuits and methods
JP5806853B2 (ja) ボルテージレギュレータ
TW200603167A (en) Semiconductor integrated circuit device with otp memory and programming method for otp memory
EP2843425A8 (de) Strommesskreis
WO2009102732A3 (en) Bridge circuits and their components
JP2012238233A5 (de)
ATE550377T1 (de) Zusammensetzung mit positivem temperaturkoeffizienten und zugehöriges verfahren
JP2007505556A5 (de)
WO2014137548A3 (en) Electronic fuse cell and array
JP2010193034A5 (de)
JP2016051496A5 (de)
TW200707729A (en) Reprogrammable electrical fuse
DE602004028946D1 (de) S für einen ausgangstreiber
EA201591225A1 (ru) Полупроводниковое устройство, обладающее свойствами для предотвращения обратного проектирования
JP2011008514A5 (de)
TW200710847A (en) Current limit circuit and semiconductor memory device
ATE490600T1 (de) Verfahren und vorrichtungen zur programmierung von anti-sicherungen
JP2012075092A5 (de)
WO2009017223A1 (ja) 半導体評価回路
TW200719349A (en) An non-volatile memory cell, memory cell array and device
CN102411113B (zh) 检测电路
ATE557395T1 (de) Strommessverstärker mit rückkopplungsschleife
TW200731272A (en) Electric fuse circuit providing margin read function

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties