ATE514189T1 - Verfahren zur bildung von vorrichtungsstrukturen mit einer selbstausgerichteten schadensschicht - Google Patents

Verfahren zur bildung von vorrichtungsstrukturen mit einer selbstausgerichteten schadensschicht

Info

Publication number
ATE514189T1
ATE514189T1 AT08167167T AT08167167T ATE514189T1 AT E514189 T1 ATE514189 T1 AT E514189T1 AT 08167167 T AT08167167 T AT 08167167T AT 08167167 T AT08167167 T AT 08167167T AT E514189 T1 ATE514189 T1 AT E514189T1
Authority
AT
Austria
Prior art keywords
damage layer
doped region
substrate
device structures
self
Prior art date
Application number
AT08167167T
Other languages
English (en)
Inventor
Ethan Cannon
Fen Chen
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE514189T1 publication Critical patent/ATE514189T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113—Isolations within a component, i.e. internal isolations
    • H10D62/115—Dielectric isolations, e.g. air gaps
    • H10D62/116—Dielectric isolations, e.g. air gaps adjoining the input or output regions of field-effect devices, e.g. adjoining source or drain regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0221—Manufacture or treatment of FETs having insulated gates [IGFET] having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended-drain MOSFETs [EDMOS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • H10D30/0227—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate having both lightly-doped source and drain extensions and source and drain regions self-aligned to the sides of the gate, e.g. lightly-doped drain [LDD] MOSFET or double-diffused drain [DDD] MOSFET
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/791—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/791—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions
    • H10D30/797—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions being in source or drain regions, e.g. SiGe source or drain
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00—Ion implantation into wafers, substrates or parts of devices
    • H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
    • H10P30/202—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping characterised by the semiconductor materials
    • H10P30/204—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping characterised by the semiconductor materials into Group IV semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00—Ion implantation into wafers, substrates or parts of devices
    • H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
    • H10P30/208—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping of electrically inactive species

Landscapes

  • Insulated Gate Type Field-Effect Transistor (AREA)
AT08167167T 2008-07-24 2008-10-21 Verfahren zur bildung von vorrichtungsstrukturen mit einer selbstausgerichteten schadensschicht ATE514189T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/178,766 US7795679B2 (en) 2008-07-24 2008-07-24 Device structures with a self-aligned damage layer and methods for forming such device structures

Publications (1)

Publication Number Publication Date
ATE514189T1 true ATE514189T1 (de) 2011-07-15

Family

ID=40578806

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08167167T ATE514189T1 (de) 2008-07-24 2008-10-21 Verfahren zur bildung von vorrichtungsstrukturen mit einer selbstausgerichteten schadensschicht

Country Status (5)

Country Link
US (1) US7795679B2 (de)
EP (1) EP2148372B1 (de)
JP (2) JP4782821B2 (de)
CN (1) CN101635312B (de)
AT (1) ATE514189T1 (de)

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CN102005414B (zh) * 2009-08-28 2012-12-12 中芯国际集成电路制造(上海)有限公司 Cmos图像传感器像素、制造方法及图像捕获设备
US10128115B2 (en) * 2010-02-26 2018-11-13 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming ultra-shallow junctions in semiconductor devices
CN102468164B (zh) * 2010-10-29 2014-10-08 中国科学院微电子研究所 晶体管及其制造方法
JP2014056881A (ja) * 2012-09-11 2014-03-27 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
US9721853B2 (en) * 2013-03-13 2017-08-01 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for forming a semiconductor device
CN105448913A (zh) * 2014-06-23 2016-03-30 中芯国际集成电路制造(上海)有限公司 Cmos器件及其形成方法
US10573627B2 (en) 2015-01-09 2020-02-25 Silicon Genesis Corporation Three dimensional integrated circuit
US10833175B2 (en) * 2015-06-04 2020-11-10 International Business Machines Corporation Formation of dislocation-free SiGe finFET using porous silicon
CN106486376A (zh) * 2015-08-31 2017-03-08 中芯国际集成电路制造(上海)有限公司 鳍式场效应管及其制作方法
JP6611532B2 (ja) * 2015-09-17 2019-11-27 ローム株式会社 半導体装置および半導体装置の製造方法
CN107492487B (zh) * 2016-06-13 2020-03-10 中芯国际集成电路制造(上海)有限公司 半导体器件的形成方法
CN111684581B (zh) * 2017-12-01 2024-08-13 硅源公司 三维集成电路
US11133227B2 (en) * 2018-12-20 2021-09-28 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Semiconductor device having active region and method for fabricating the same
US11164867B2 (en) * 2019-08-07 2021-11-02 Globalfoundries U.S. Inc. Fin-type field-effect transistors over one or more buried polycrystalline layers
US11315825B2 (en) 2019-08-28 2022-04-26 Globalfoundries U.S. Inc. Semiconductor structures including stacked depleted and high resistivity regions
US10971633B2 (en) * 2019-09-04 2021-04-06 Stmicroelectronics (Rousset) Sas Structure and method of forming a semiconductor device
US11860417B2 (en) * 2019-09-09 2024-01-02 Cisco Technology, Inc. Precision spacing control for optical waveguides

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US4766482A (en) 1986-12-09 1988-08-23 General Electric Company Semiconductor device and method of making the same
EP0694960B1 (de) 1994-07-25 2002-07-03 Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno - CoRiMMe Verfahren zur lokalen Reduzierung der Ladungsträgerlebensdauer
JPH1167682A (ja) 1997-08-08 1999-03-09 Mitsubishi Electric Corp 半導体装置の製造方法
JP3211773B2 (ja) 1998-06-26 2001-09-25 日本電気株式会社 半導体装置およびその製造方法
US6228694B1 (en) * 1999-06-28 2001-05-08 Intel Corporation Method of increasing the mobility of MOS transistors by use of localized stress regions
US6362082B1 (en) 1999-06-28 2002-03-26 Intel Corporation Methodology for control of short channel effects in MOS transistors
KR20040007025A (ko) * 2002-07-16 2004-01-24 주식회사 하이닉스반도체 반도체 웨이퍼 제조 방법
US6828632B2 (en) 2002-07-18 2004-12-07 Micron Technology, Inc. Stable PD-SOI devices and methods
US7022544B2 (en) 2002-12-18 2006-04-04 International Business Machines Corporation High speed photodiode with a barrier layer for blocking or eliminating slow photonic carriers and method for forming same
US6803270B2 (en) * 2003-02-21 2004-10-12 International Business Machines Corporation CMOS performance enhancement using localized voids and extended defects
TWI239105B (en) * 2004-05-18 2005-09-01 Ind Tech Res Inst Method of fabricating compressive strained silicon by ion implantation and transistor fabricated thereby
WO2006049834A1 (en) 2004-10-29 2006-05-11 Advanced Micro Devices, Inc. A semiconductor device including semiconductor regions having differently strained channel regions and a method of manufacturing the same
US7432553B2 (en) * 2005-01-19 2008-10-07 International Business Machines Corporation Structure and method to optimize strain in CMOSFETs
US20070158779A1 (en) 2006-01-12 2007-07-12 International Business Machines Corporation Methods and semiconductor structures for latch-up suppression using a buried damage layer

Also Published As

Publication number Publication date
CN101635312A (zh) 2010-01-27
EP2148372A1 (de) 2010-01-27
JP5385926B2 (ja) 2014-01-08
CN101635312B (zh) 2012-05-16
JP4782821B2 (ja) 2011-09-28
JP2010034488A (ja) 2010-02-12
US20100019330A1 (en) 2010-01-28
JP2011097082A (ja) 2011-05-12
US7795679B2 (en) 2010-09-14
EP2148372B1 (de) 2011-06-22

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