ATE518247T1 - Fotoelektrischer wandler und bildaufnahmesystem mit dual-damascene verbindungsstrukturen - Google Patents

Fotoelektrischer wandler und bildaufnahmesystem mit dual-damascene verbindungsstrukturen

Info

Publication number
ATE518247T1
ATE518247T1 AT08151687T AT08151687T ATE518247T1 AT E518247 T1 ATE518247 T1 AT E518247T1 AT 08151687 T AT08151687 T AT 08151687T AT 08151687 T AT08151687 T AT 08151687T AT E518247 T1 ATE518247 T1 AT E518247T1
Authority
AT
Austria
Prior art keywords
forming
interlayer insulation
insulation film
hole
semiconductor substrate
Prior art date
Application number
AT08151687T
Other languages
English (en)
Inventor
Hiroaki Naruse
Takashi Okagawa
Ryuichi Mishima
Nobuhiko Sato
Hiroshi Yuzurihara
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE518247T1 publication Critical patent/ATE518247T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/014—Manufacture or treatment of image sensors covered by group H10F39/12 of CMOS image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/026—Wafer-level processing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/074—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/074—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
    • H10W20/077—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers on sidewalls or on top surfaces of conductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H10W20/084—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H10W20/084—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures
    • H10W20/086—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures involving buried masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/425—Barrier, adhesion or liner layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
AT08151687T 2007-02-23 2008-02-20 Fotoelektrischer wandler und bildaufnahmesystem mit dual-damascene verbindungsstrukturen ATE518247T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007044011A JP4110192B1 (ja) 2007-02-23 2007-02-23 光電変換装置及び光電変換装置を用いた撮像システム

Publications (1)

Publication Number Publication Date
ATE518247T1 true ATE518247T1 (de) 2011-08-15

Family

ID=39494626

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08151687T ATE518247T1 (de) 2007-02-23 2008-02-20 Fotoelektrischer wandler und bildaufnahmesystem mit dual-damascene verbindungsstrukturen

Country Status (6)

Country Link
US (2) US7838918B2 (de)
EP (2) EP2270862B1 (de)
JP (1) JP4110192B1 (de)
KR (1) KR100953153B1 (de)
CN (2) CN102142450B (de)
AT (1) ATE518247T1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4110192B1 (ja) * 2007-02-23 2008-07-02 キヤノン株式会社 光電変換装置及び光電変換装置を用いた撮像システム
US7891494B2 (en) * 2007-08-14 2011-02-22 Reflex Packaging, Inc. Light weight product cushioning device
JP5441382B2 (ja) * 2008-09-30 2014-03-12 キヤノン株式会社 光電変換装置及び光電変換装置の製造方法
JP5478871B2 (ja) * 2008-10-17 2014-04-23 キヤノン株式会社 光電変換装置、撮像システム、及び光電変換装置の製造方法
KR20100045094A (ko) * 2008-10-23 2010-05-03 주식회사 동부하이텍 이미지 센서의 제조 방법
JP2010161236A (ja) 2009-01-08 2010-07-22 Canon Inc 光電変換装置の製造方法
JP2010212365A (ja) * 2009-03-09 2010-09-24 Sony Corp 固体撮像装置、および、その製造方法、電子機器
JP5627202B2 (ja) * 2009-06-18 2014-11-19 キヤノン株式会社 固体撮像装置及びその製造方法
JP5558916B2 (ja) * 2009-06-26 2014-07-23 キヤノン株式会社 光電変換装置の製造方法
JP5563257B2 (ja) * 2009-08-28 2014-07-30 キヤノン株式会社 光電変換装置、撮像システム、及び光電変換装置の製造方法
JP5700945B2 (ja) * 2010-03-25 2015-04-15 キヤノン株式会社 光電変換装置及びその製造方法
US8426310B2 (en) * 2010-05-25 2013-04-23 Freescale Semiconductor, Inc. Method of forming a shared contact in a semiconductor device
KR101890748B1 (ko) 2011-02-01 2018-08-23 삼성전자주식회사 멀티 스택 씨모스(ｃｍｏｓ) 이미지 센서의 화소 및 그 제조방법
CN102789972B (zh) * 2011-05-20 2015-04-22 中芯国际集成电路制造(上海)有限公司 半导体器件的制造方法
JP2014049727A (ja) * 2012-09-04 2014-03-17 Canon Inc 固体撮像装置
JP6198485B2 (ja) * 2013-06-28 2017-09-20 キヤノン株式会社 光電変換装置、及び撮像システム
KR102268707B1 (ko) 2014-07-28 2021-06-28 삼성전자주식회사 이미지 센서
JP2016033972A (ja) 2014-07-31 2016-03-10 キヤノン株式会社 撮像装置及び撮像システム
US9991158B2 (en) * 2014-09-12 2018-06-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device, layout of semiconductor device, and method of manufacturing semiconductor device
JP6736318B2 (ja) * 2015-09-10 2020-08-05 キヤノン株式会社 固体撮像素子、固体撮像素子の製造方法および撮像システム
JP6818468B2 (ja) 2016-08-25 2021-01-20 キヤノン株式会社 光電変換装置及びカメラ
JP2018060921A (ja) 2016-10-05 2018-04-12 キヤノン株式会社 光電変換装置及びシステム
EP3324436B1 (de) * 2016-11-21 2020-08-05 IMEC vzw Chip mit integrierter schaltung mit stromversorgungsnetzwerk auf der rückseite des chips
US10347543B2 (en) * 2017-11-13 2019-07-09 Globalfoundries Inc. FDSOI semiconductor device with contact enhancement layer and method of manufacturing
JP2021019058A (ja) * 2019-07-18 2021-02-15 キヤノン株式会社 光電変換装置および機器
CN110634898A (zh) * 2019-09-23 2019-12-31 上海华力微电子有限公司 一种用于背照式图像传感器的深硅槽及其形成方法
US12029024B2 (en) 2021-04-05 2024-07-02 Samsung Electronics Co., Ltd. Semiconductor memory devices and methods of fabricating the same
US12310077B2 (en) * 2021-11-12 2025-05-20 Taiwan Semiconductor Manufacturing Co., Ltd. Dual damascene structure in forming source/drain contacts
US20250126874A1 (en) * 2023-10-16 2025-04-17 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and manufacturing method thereof

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6696101B2 (en) * 1994-08-08 2004-02-24 Light And Sound Design Ltd. Medium for a color changer
JPH0955440A (ja) * 1995-08-17 1997-02-25 Sony Corp 半導体装置及び半導体装置の製造方法
JP3534589B2 (ja) 1997-10-30 2004-06-07 シャープ株式会社 多層配線装置及びその製造方法
JPH11186386A (ja) 1997-12-19 1999-07-09 Asahi Kasei Micro Syst Co Ltd 半導体装置およびその製造方法
US6071789A (en) * 1998-11-10 2000-06-06 Vanguard International Semiconductor Corporation Method for simultaneously fabricating a DRAM capacitor and metal interconnections
JP4565700B2 (ja) * 1999-05-12 2010-10-20 ルネサスエレクトロニクス株式会社 半導体装置
JP2001060590A (ja) * 1999-08-20 2001-03-06 Denso Corp 半導体装置の電気配線及びその製造方法
JP2001298175A (ja) 2000-04-12 2001-10-26 Toshiba Corp 撮像システム
US6352921B1 (en) * 2000-07-19 2002-03-05 Chartered Semiconductor Manufacturing Ltd. Use of boron carbide as an etch-stop and barrier layer for copper dual damascene metallization
US6696360B2 (en) * 2001-03-15 2004-02-24 Micron Technology, Inc. Barrier-metal-free copper damascene technology using atomic hydrogen enhanced reflow
JP2002368203A (ja) 2001-06-05 2002-12-20 Sony Corp 固体撮像素子
JP4117672B2 (ja) * 2002-05-01 2008-07-16 ソニー株式会社 固体撮像素子及び固体撮像装置、並びにこれらの製造方法
JP3795846B2 (ja) * 2002-08-29 2006-07-12 富士通株式会社 半導体装置
JP2004165236A (ja) 2002-11-11 2004-06-10 Sony Corp 固体撮像装置の製造方法
JP3840214B2 (ja) * 2003-01-06 2006-11-01 キヤノン株式会社 光電変換装置及び光電変換装置の製造方法及び同光電変換装置を用いたカメラ
US6861686B2 (en) 2003-01-16 2005-03-01 Samsung Electronics Co., Ltd. Structure of a CMOS image sensor and method for fabricating the same
JP4086673B2 (ja) * 2003-02-04 2008-05-14 Ｎｅｃエレクトロニクス株式会社 半導体装置及びその製造方法
KR100499174B1 (ko) 2003-06-17 2005-07-01 삼성전자주식회사 이미지 소자
KR100500573B1 (ko) * 2003-07-01 2005-07-12 삼성전자주식회사 금속 배선 및 그 제조 방법, 금속 배선을 포함하는 이미지소자 및 그 제조 방법
KR100471001B1 (ko) * 2003-07-02 2005-03-14 삼성전자주식회사 리세스형 트랜지스터 및 그의 제조방법
JP4478038B2 (ja) * 2004-02-27 2010-06-09 株式会社半導体理工学研究センター 半導体装置及びその製造方法
US7176125B2 (en) * 2004-07-23 2007-02-13 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming a static random access memory with a buried local interconnect
KR100642764B1 (ko) * 2004-09-08 2006-11-10 삼성전자주식회사 이미지 소자 및 그 제조 방법
US7193289B2 (en) * 2004-11-30 2007-03-20 International Business Machines Corporation Damascene copper wiring image sensor
KR100628238B1 (ko) * 2004-12-30 2006-09-26 동부일렉트로닉스 주식회사 시모스 이미지 센서 및 그의 제조 방법
JP4938238B2 (ja) 2005-01-07 2012-05-23 ソニー株式会社 固体撮像素子及び固体撮像素子の製造方法
JP4686201B2 (ja) * 2005-01-27 2011-05-25 パナソニック株式会社 固体撮像装置及びその製造方法
JP4618786B2 (ja) * 2005-01-28 2011-01-26 キヤノン株式会社 固体撮像装置の製造方法
JP4340248B2 (ja) * 2005-03-17 2009-10-07 富士通マイクロエレクトロニクス株式会社 半導体撮像装置を製造する方法
JP4785433B2 (ja) * 2005-06-10 2011-10-05 キヤノン株式会社 固体撮像装置
CN100524786C (zh) * 2005-08-18 2009-08-05 联华电子股份有限公司 互补式金属氧化物半导体晶体管影像感测器及其制造方法
JP2007242697A (ja) * 2006-03-06 2007-09-20 Canon Inc 撮像装置および撮像システム
JP5305622B2 (ja) * 2006-08-31 2013-10-02 キヤノン株式会社 光電変換装置の製造方法
JP4315457B2 (ja) * 2006-08-31 2009-08-19 キヤノン株式会社 光電変換装置及び撮像システム
JP5159120B2 (ja) * 2007-02-23 2013-03-06 キヤノン株式会社 光電変換装置およびその製造方法
JP4110192B1 (ja) * 2007-02-23 2008-07-02 キヤノン株式会社 光電変換装置及び光電変換装置を用いた撮像システム

Also Published As

Publication number Publication date
US20080203450A1 (en) 2008-08-28
EP2270862A2 (de) 2011-01-05
JP2008210870A (ja) 2008-09-11
KR100953153B1 (ko) 2010-04-19
US8304278B2 (en) 2012-11-06
EP2270862B1 (de) 2013-04-24
EP1962345A3 (de) 2009-03-04
KR20080078586A (ko) 2008-08-27
CN102142450B (zh) 2013-10-30
JP4110192B1 (ja) 2008-07-02
CN102142450A (zh) 2011-08-03
CN101252138B (zh) 2011-03-30
US7838918B2 (en) 2010-11-23
US20110027934A1 (en) 2011-02-03
EP1962345A2 (de) 2008-08-27
EP2270862A3 (de) 2011-09-07
EP1962345B1 (de) 2011-07-27
CN101252138A (zh) 2008-08-27

Similar Documents

Publication Publication Date Title
ATE518247T1 (de) Fotoelektrischer wandler und bildaufnahmesystem mit dual-damascene verbindungsstrukturen
TWI256072B (en) Semiconductor integrated circuits with stacked node contact structures and methods of fabricating such devices
TWI540725B (zh) 半導體裝置及半導體裝置之製造方法
JP4389962B2 (ja) 半導体装置、電子機器、および半導体装置の製造方法
JP2010045406A5 (de)
EP1895591A3 (de) Herstellungsverfahren für eine fotoelektrische Wandlervorrichtung
TWI569411B (zh) 半導體裝置及半導體裝置之製造方法
JP2004063667A5 (de)
CN105845691B (zh) 电子器件及其制造方法
TW200713500A (en) Semiconductor device
CN103165605A (zh) 半导体器件和制造该半导体器件的方法
TW200746323A (en) Semiconductor device, manufacturing method of the semiconductor device, and mounting method of the semiconductor device
KR100475716B1 (ko) 복합 반도체 장치의 멀티 반도체 기판의 적층 구조 및 그방법
TWI267197B (en) Thin film and method array substrate and method of producing the same
TW200632428A (en) Active matrix substrate and its manufacturing method
JP2000150810A5 (de)
WO2009020240A3 (en) Semiconductor device and method for manufacturing the same
JP2004047608A5 (de)
JP2006113568A5 (de)
TW200509315A (en) Semiconductor device and method for fabricating the same
TW200744162A (en) Method for fabricating semiconductor device having capacitor
EP1530236A3 (de) Halbleiteranordnung mit einer Mehrschicht-Leiterstruktur und mit Verstärkungsmustern, und Herstellungsverfahren der Halbleiteranordnung
JP2014053341A (ja) 半導体装置およびその製造方法
TW200715525A (en) Semiconductor integrated circuit device and method for manufacturing same
CN105705990A (zh) 包含有机材料的电子装置

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties