ATE518409T1 - Vorrichtung und prozess zum erzeugen, beschleunigen und ausbreiten von strahlen von elektronen und plasma - Google Patents

Vorrichtung und prozess zum erzeugen, beschleunigen und ausbreiten von strahlen von elektronen und plasma

Info

Publication number
ATE518409T1
ATE518409T1 AT06724055T AT06724055T ATE518409T1 AT E518409 T1 ATE518409 T1 AT E518409T1 AT 06724055 T AT06724055 T AT 06724055T AT 06724055 T AT06724055 T AT 06724055T AT E518409 T1 ATE518409 T1 AT E518409T1
Authority
AT
Austria
Prior art keywords
plasma
dielectric tube
accelerating
electrons
generating
Prior art date
Application number
AT06724055T
Other languages
English (en)
Inventor
Francesco Cino Matacotta
Carlo Taliani
Original Assignee
Francesco Cino Matacotta
Carlo Taliani
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Francesco Cino Matacotta, Carlo Taliani filed Critical Francesco Cino Matacotta
Application granted granted Critical
Publication of ATE518409T1 publication Critical patent/ATE518409T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/025—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Chemical Vapour Deposition (AREA)
AT06724055T 2005-04-07 2006-04-05 Vorrichtung und prozess zum erzeugen, beschleunigen und ausbreiten von strahlen von elektronen und plasma ATE518409T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000585A ITMI20050585A1 (it) 2005-04-07 2005-04-07 Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma
PCT/EP2006/003107 WO2006105955A2 (en) 2005-04-07 2006-04-05 Apparatus and process for generating, accelerating and propagating beams of electrons and plasma

Publications (1)

Publication Number Publication Date
ATE518409T1 true ATE518409T1 (de) 2011-08-15

Family

ID=36676505

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06724055T ATE518409T1 (de) 2005-04-07 2006-04-05 Vorrichtung und prozess zum erzeugen, beschleunigen und ausbreiten von strahlen von elektronen und plasma

Country Status (8)

Country Link
US (1) US7872406B2 (de)
EP (1) EP1867221B1 (de)
JP (1) JP2008535193A (de)
KR (1) KR20070119072A (de)
CN (1) CN101156505B (de)
AT (1) ATE518409T1 (de)
IT (1) ITMI20050585A1 (de)
WO (1) WO2006105955A2 (de)

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IT1395701B1 (it) * 2009-03-23 2012-10-19 Organic Spintronics S R L Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio
US8890410B2 (en) * 2009-09-17 2014-11-18 Imagineering, Inc. Plasma generation device
KR101078164B1 (ko) * 2010-03-11 2011-10-28 포항공과대학교 산학협력단 전자빔 발생장치 및 이를 제조하는 방법
IT1400038B1 (it) 2010-05-24 2013-05-17 Organic Spintronics S R L Metodo per la realizzazione di celle solari.
IT1401417B1 (it) * 2010-08-23 2013-07-26 Organic Spintronics S R L Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio
IT1401818B1 (it) * 2010-09-22 2013-08-28 Organic Spintronics S R L Metodo per la deposizione di uno strato di un materiale su un substrato.
CN101992052B (zh) * 2010-10-29 2013-01-16 黑龙江大学 同轴空心阴极放电分数氢催化反应发生器
US8980046B2 (en) 2011-04-11 2015-03-17 Lam Research Corporation Semiconductor processing system with source for decoupled ion and radical control
US8900402B2 (en) 2011-05-10 2014-12-02 Lam Research Corporation Semiconductor processing system having multiple decoupled plasma sources
US20120255678A1 (en) * 2011-04-11 2012-10-11 Lam Research Corporation Multi-Frequency Hollow Cathode System for Substrate Plasma Processing
US9177756B2 (en) 2011-04-11 2015-11-03 Lam Research Corporation E-beam enhanced decoupled source for semiconductor processing
US9111728B2 (en) 2011-04-11 2015-08-18 Lam Research Corporation E-beam enhanced decoupled source for semiconductor processing
US8900403B2 (en) 2011-05-10 2014-12-02 Lam Research Corporation Semiconductor processing system having multiple decoupled plasma sources
JP5681030B2 (ja) * 2011-04-15 2015-03-04 清水電設工業株式会社 プラズマ・電子ビーム発生装置、薄膜製造装置及び薄膜の製造方法
RU2462009C1 (ru) * 2011-06-08 2012-09-20 Мурадин Абубекирович Кумахов Способ изменения направления движения пучка ускоренных заряженных частиц, устройство для осуществления этого способа, источник электромагнитного излучения, линейный и циклический ускорители заряженных частиц, коллайдер и средство для получения магнитного поля, создаваемого током ускоренных заряженных частиц
ITBO20110669A1 (it) * 2011-11-23 2013-05-24 Organic Spintronics S R L Metodo per la deposizione di uno strato di un materiale su un substrato
US9123507B2 (en) * 2012-03-20 2015-09-01 Mapper Lithography Ip B.V. Arrangement and method for transporting radicals
US9064671B2 (en) * 2012-05-09 2015-06-23 Arcam Ab Method and apparatus for generating electron beams
ITBO20120695A1 (it) * 2012-12-20 2014-06-21 Organic Spintronics S R L Dispositivo di deposizione a plasma impulsato
US9437401B2 (en) * 2013-12-20 2016-09-06 Plasmology4, Inc. System and method for plasma treatment using directional dielectric barrier discharge energy system
US9378928B2 (en) * 2014-05-29 2016-06-28 Applied Materials, Inc. Apparatus for treating a gas in a conduit
IT201600115342A1 (it) * 2016-11-15 2018-05-15 Consorzio Di Ricerca Hypatia Macchina per la deposizione di film sottili
US12078154B1 (en) * 2017-10-05 2024-09-03 The Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama In Huntsville Microplasma-based heaterless, insertless cathode
CN109475037B (zh) * 2018-12-14 2021-07-23 华中科技大学 一种等离子体活性增强法及发生装置
CN109819573A (zh) * 2019-03-08 2019-05-28 北京中百源国际科技创新研究有限公司 激光离子加速装置及应用其的医用激光离子治疗装置
US11812540B1 (en) * 2019-09-30 2023-11-07 Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama In Huntsville Continuous large area cold atmospheric pressure plasma sheet source
US11043394B1 (en) 2019-12-18 2021-06-22 Applied Materials, Inc. Techniques and apparatus for selective shaping of mask features using angled beams
CN114071849B (zh) * 2021-11-15 2023-11-14 上海无线电设备研究所 一种超高声速目标烧蚀扩散物等离子体发生器
CN115209604B (zh) * 2022-08-15 2024-12-03 中国工程物理研究院流体物理研究所 一种激光间接辅助激励的等离子体焦点装置

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DE4208764C2 (de) * 1992-03-19 1994-02-24 Kernforschungsz Karlsruhe Gasgefüllter Teilchenbeschleuniger
JPH11102799A (ja) 1997-09-26 1999-04-13 Mitsubishi Electric Corp プラズマ発生装置
JP3697499B2 (ja) * 2000-06-29 2005-09-21 松下電器産業株式会社 量子ドット型機能構造体作製装置
DE10130464B4 (de) * 2001-06-23 2010-09-16 Thales Electron Devices Gmbh Plasmabeschleuniger-Anordnung
DE10207835C1 (de) * 2002-02-25 2003-06-12 Karlsruhe Forschzent Kanalfunkenquelle zur Erzeugung eines stabil gebündelten Elektronenstrahls

Also Published As

Publication number Publication date
JP2008535193A (ja) 2008-08-28
US20090066212A1 (en) 2009-03-12
CN101156505A (zh) 2008-04-02
CN101156505B (zh) 2012-07-18
US7872406B2 (en) 2011-01-18
EP1867221B1 (de) 2011-07-27
ITMI20050585A1 (it) 2006-10-08
EP1867221A2 (de) 2007-12-19
KR20070119072A (ko) 2007-12-18
WO2006105955A3 (en) 2007-04-05
WO2006105955A2 (en) 2006-10-12

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