ATE521217T1 - Elektrode für plasmaerzeuger - Google Patents

Elektrode für plasmaerzeuger

Info

Publication number
ATE521217T1
ATE521217T1 AT08718192T AT08718192T ATE521217T1 AT E521217 T1 ATE521217 T1 AT E521217T1 AT 08718192 T AT08718192 T AT 08718192T AT 08718192 T AT08718192 T AT 08718192T AT E521217 T1 ATE521217 T1 AT E521217T1
Authority
AT
Austria
Prior art keywords
electrode
partial electrodes
plasma generators
slot
microwaves
Prior art date
Application number
AT08718192T
Other languages
English (en)
Inventor
Roland Gesche
Andreea Andrei
Stephan Buchholz
Silvio Kuehn
Original Assignee
Forschungsverbund Berlin Ev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungsverbund Berlin Ev filed Critical Forschungsverbund Berlin Ev
Application granted granted Critical
Publication of ATE521217T1 publication Critical patent/ATE521217T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/463—Microwave discharges using antennas or applicators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/34—Skin treatments, e.g. disinfection or wound treatment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2277/00—Applications of particle accelerators
    • H05H2277/10—Medical devices
    • H05H2277/11—Radiotherapy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
AT08718192T 2007-04-27 2008-03-25 Elektrode für plasmaerzeuger ATE521217T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007020419A DE102007020419A1 (de) 2007-04-27 2007-04-27 Elektrode für Plasmaerzeuger
PCT/EP2008/053507 WO2008131997A1 (de) 2007-04-27 2008-03-25 Elektrode für plasmaerzeuger

Publications (1)

Publication Number Publication Date
ATE521217T1 true ATE521217T1 (de) 2011-09-15

Family

ID=39534997

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08718192T ATE521217T1 (de) 2007-04-27 2008-03-25 Elektrode für plasmaerzeuger

Country Status (7)

Country Link
US (1) US8339047B2 (de)
EP (1) EP2143306B1 (de)
JP (1) JP5683262B2 (de)
KR (1) KR101555385B1 (de)
AT (1) ATE521217T1 (de)
DE (1) DE102007020419A1 (de)
WO (1) WO2008131997A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3042091B1 (fr) * 2015-10-05 2017-10-27 Sairem Soc Pour L'application Ind De La Rech En Electronique Et Micro Ondes Dispositif elementaire d’application d’une energie micro-onde avec applicateur coaxial
KR102190524B1 (ko) * 2020-02-24 2020-12-14 이엠코어텍 주식회사 저전압 플라즈마 이오나이저

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3848196A (en) * 1973-11-08 1974-11-12 Rca Corp Broadband trapatt diode amplifier
JPS6011417B2 (ja) * 1979-10-23 1985-03-26 株式会社東芝 ホロ−カソ−ド放電装置
JPS6087200U (ja) * 1983-11-15 1985-06-15 新日本無線株式会社 マイクロ波プラズマ発生装置
JPS62115700A (ja) * 1985-11-15 1987-05-27 キヤノン株式会社 気相励起装置
JPH01109699A (ja) * 1987-10-23 1989-04-26 Japan Synthetic Rubber Co Ltd プラズマ処理装置
DE3830430A1 (de) * 1987-09-11 1989-03-23 Japan Synthetic Rubber Co Ltd Verfahren zur herstellung von ueberzuegen
JPH0719674B2 (ja) * 1992-06-24 1995-03-06 徳芳 佐藤 マイクロ波放電反応装置の電極装置
US5537004A (en) * 1993-03-06 1996-07-16 Tokyo Electron Limited Low frequency electron cyclotron resonance plasma processor
US5838111A (en) * 1996-02-27 1998-11-17 Matsushita Electric Industrial Co., Ltd. Plasma generator with antennas attached to top electrodes
US6518703B1 (en) * 1998-03-16 2003-02-11 Matsushita Electrical Industrial Co., Ltd. Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device using surface wave transmission line
US6350417B1 (en) * 1998-11-05 2002-02-26 Sharper Image Corporation Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices
JP2000299199A (ja) * 1999-04-13 2000-10-24 Plasma System Corp プラズマ発生装置およびプラズマ処理装置
DE19955671B4 (de) * 1999-11-19 2004-07-22 Muegge Electronic Gmbh Vorrichtung zur Erzeugung von Plasma
US6576202B1 (en) * 2000-04-21 2003-06-10 Kin-Chung Ray Chiu Highly efficient compact capacitance coupled plasma reactor/generator and method
US6759808B2 (en) * 2001-10-26 2004-07-06 Board Of Trustees Of Michigan State University Microwave stripline applicators
WO2004062326A2 (en) * 2002-12-30 2004-07-22 Northeastern University Low power plasma generator
DE10335523B4 (de) * 2003-07-31 2009-04-30 Koch, Berthold, Dr.-Ing. Vorrichtung zur Plasmaerregung mit Mikrowellen
JP4631046B2 (ja) * 2004-10-01 2011-02-16 国立大学法人 東京大学 マイクロ波励起プラズマ装置及びシステム
JP4035568B2 (ja) * 2004-11-29 2008-01-23 株式会社エーイーティー 大気圧大面積プラズマ発生装置
US8216433B2 (en) * 2006-03-07 2012-07-10 University Of The Ryukyus Plasma generator and method of generating plasma using the same
JP4967784B2 (ja) * 2007-04-25 2012-07-04 凸版印刷株式会社 マイクロ波プラズマ発生装置

Also Published As

Publication number Publication date
EP2143306A1 (de) 2010-01-13
KR101555385B1 (ko) 2015-09-23
EP2143306B1 (de) 2011-08-17
JP5683262B2 (ja) 2015-03-11
US8339047B2 (en) 2012-12-25
US20100171425A1 (en) 2010-07-08
WO2008131997A1 (de) 2008-11-06
DE102007020419A1 (de) 2008-11-06
KR20100015978A (ko) 2010-02-12
JP2010525534A (ja) 2010-07-22

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