ATE521411T1 - Oberflächenmodifikation fester träger durch thermische zersetzung und funktionalisierung von silanen - Google Patents

Oberflächenmodifikation fester träger durch thermische zersetzung und funktionalisierung von silanen

Info

Publication number
ATE521411T1
ATE521411T1 AT00917706T AT00917706T ATE521411T1 AT E521411 T1 ATE521411 T1 AT E521411T1 AT 00917706 T AT00917706 T AT 00917706T AT 00917706 T AT00917706 T AT 00917706T AT E521411 T1 ATE521411 T1 AT E521411T1
Authority
AT
Austria
Prior art keywords
substrate
functionalization
silanes
thermal decomposition
surface modification
Prior art date
Application number
AT00917706T
Other languages
English (en)
Inventor
David Smith
Original Assignee
Silcotek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silcotek Corp filed Critical Silcotek Corp
Application granted granted Critical
Publication of ATE521411T1 publication Critical patent/ATE521411T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y10T428/31612—As silicone, silane or siloxane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
AT00917706T 1999-03-05 2000-03-02 Oberflächenmodifikation fester träger durch thermische zersetzung und funktionalisierung von silanen ATE521411T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12299099P 1999-03-05 1999-03-05
US09/388,868 US6444326B1 (en) 1999-03-05 1999-09-02 Surface modification of solid supports through the thermal decomposition and functionalization of silanes
PCT/US2000/005515 WO2000051732A1 (en) 1999-03-05 2000-03-02 The surface modification of solid supports through the thermal decomposition and functionalization of silanes

Publications (1)

Publication Number Publication Date
ATE521411T1 true ATE521411T1 (de) 2011-09-15

Family

ID=26821093

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00917706T ATE521411T1 (de) 1999-03-05 2000-03-02 Oberflächenmodifikation fester träger durch thermische zersetzung und funktionalisierung von silanen

Country Status (9)

Country Link
US (1) US6444326B1 (de)
EP (1) EP1181095B1 (de)
JP (1) JP4834225B2 (de)
KR (1) KR100828211B1 (de)
CN (1) CN1130263C (de)
AT (1) ATE521411T1 (de)
AU (4) AU3863800A (de)
CA (1) CA2365659C (de)
WO (1) WO2000051732A1 (de)

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030017359A1 (en) * 2001-07-17 2003-01-23 American Air Liquide, Inc. Increased stability low concentration gases, products comprising same, and methods of making same
US7832550B2 (en) * 2001-07-17 2010-11-16 American Air Liquide, Inc. Reactive gases with concentrations of increased stability and processes for manufacturing same
CA2448697C (en) * 2001-07-17 2012-09-25 L'air Liquide - Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of making a passivated surface
CN1316246C (zh) * 2002-05-29 2007-05-16 液体空气乔治洛德方法利用和研究的具有监督和管理委员会的有限公司 含酸性气体和基质气体的已减湿组合物、含所述组合物的制品及其制备方法
FR2843756B1 (fr) 2002-08-26 2005-04-22 Commissariat Energie Atomique Procede de soudage d'une surface polymere avec une surface conductrice ou semi-conductrice et ses applications
US7070833B2 (en) * 2003-03-05 2006-07-04 Restek Corporation Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
US20040234699A1 (en) 2003-05-21 2004-11-25 Alexza Molecular Delivery Corporation Methods of controlling uniformity of substrate temperature and self-contained heating unit and drug-supply unit employing same
CA2945455C (en) * 2003-11-20 2019-11-26 Sigma-Aldrich Co. Llc Polysilazane thermosetting polymers for use in chromatographic systems and applications
US7531365B2 (en) * 2004-01-08 2009-05-12 International Flavors & Fragrances Inc. Analysis of the headspace proximate a substrate surface containing fragrance-containing microcapsules
EP2246086A3 (de) 2004-08-12 2012-11-21 Alexza Pharmaceuticals, Inc. Aerosolverabreichungsvorrichtung mit Schlag gezündete Heizeinheit
US20060138392A1 (en) * 2004-10-28 2006-06-29 Bowden Ned B Mild methods for generating patterned silicon surfaces
US7867627B2 (en) * 2004-12-13 2011-01-11 Silcotek Corporation Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
EP1874858A1 (de) * 2005-04-29 2008-01-09 Eidgenössische Technische Hochschule Zürich Oberflächenfunktionalisierung und beschichtung von in der flamme erzeugten nanopartikeln
EP1795264B1 (de) 2006-07-06 2012-08-22 Agilent Technologies, Inc. Flüssigkeitsabweisende Spitze
WO2008054787A2 (en) * 2006-10-31 2008-05-08 Restek Corporation Silicon-based decorative coatings
US20080216958A1 (en) * 2007-03-07 2008-09-11 Novellus Systems, Inc. Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Methods for Manufacturing the Same
EP2121088B1 (de) 2007-03-09 2016-07-13 Alexza Pharmaceuticals, Inc. Erhitzungseinheit zur verwendung in einer arzneimittelabgabevorrichtung
US8197650B2 (en) * 2007-06-07 2012-06-12 Sensor Innovations, Inc. Silicon electrochemical sensors
US20100269504A1 (en) * 2009-04-24 2010-10-28 Hamilton Sunstrand Corporation Coating system and method for reducing coking and fuel system fouling
CN106319477A (zh) 2009-10-27 2017-01-11 西尔科特克公司 化学气相沉积涂层、制品和方法
US9340880B2 (en) 2009-10-27 2016-05-17 Silcotek Corp. Semiconductor fabrication process
US8163809B2 (en) * 2009-11-30 2012-04-24 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch Synthesis reactions in a syngas treatment unit
US8168687B2 (en) 2009-11-30 2012-05-01 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch synthesis reactions in a syngas treatment unit
US8202914B2 (en) 2010-02-22 2012-06-19 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch Synthesis reactions in a syngas treatment unit
CN103237920B (zh) * 2010-10-05 2016-01-13 西尔科特克公司 耐磨涂层、包含该耐磨涂层的产品以及涂覆该耐磨涂层的方法
US9562434B2 (en) * 2010-11-03 2017-02-07 National Research Council Of Canada Oscillating foil turbine
US8758584B2 (en) 2010-12-16 2014-06-24 Sensor Innovations, Inc. Electrochemical sensors
US12215572B2 (en) 2010-12-21 2025-02-04 Fastcap Ultracapacitors Llc Power system for high temperature applications with rechargeable energy storage
US9001495B2 (en) 2011-02-23 2015-04-07 Fastcap Systems Corporation High power and high energy electrodes using carbon nanotubes
CA2838558C (en) 2011-05-24 2022-08-30 Fastcap Systems Corporation Power system for high temperature applications with rechargeable energy storage
AU2012267770A1 (en) 2011-06-07 2014-01-23 Fastcap Systems Corporation Energy storage media for ultracapacitors
CN104221110B (zh) 2011-07-08 2019-04-05 快帽系统公司 高温能量储存装置
US9558894B2 (en) 2011-07-08 2017-01-31 Fastcap Systems Corporation Advanced electrolyte systems and their use in energy storage devices
US9150756B2 (en) 2011-08-10 2015-10-06 Hamilton Space Systems International, Inc. Sampling device for substance detection instrument
US9017634B2 (en) 2011-08-19 2015-04-28 Fastcap Systems Corporation In-line manufacture of carbon nanotubes
CN104024573B (zh) 2011-11-03 2018-05-15 快帽系统公司 生产测井仪
KR20140148409A (ko) 2012-03-26 2014-12-31 실코텍 코포레이션 코팅된 물품 및 화학적 기상증착방법
DE102012211242A1 (de) 2012-06-29 2014-01-02 Robert Bosch Gmbh Verfahren zum Bearbeiten der Oberfläche eines Bauteils
US9448177B2 (en) 2012-10-25 2016-09-20 Agilent Technologies, Inc. Flame photometric detector
US11002684B2 (en) 2012-10-25 2021-05-11 Agilent Technologies, Inc. Chemiluminescent detector having coating to reduce excited species adsorption
EP2996819A1 (de) 2013-05-14 2016-03-23 Silcotek Corp. Dampfphasenbehandlung amorpher kohlenstofffilme mit (perfluor-1,1,2,2-tetrahydroalkyl)trialkoxysilan
US20150024152A1 (en) 2013-07-19 2015-01-22 Agilent Technologies, Inc. Metal components with inert vapor phase coating on internal surfaces
US10767259B2 (en) 2013-07-19 2020-09-08 Agilent Technologies, Inc. Components with an atomic layer deposition coating and methods of producing the same
US10872737B2 (en) 2013-10-09 2020-12-22 Fastcap Systems Corporation Advanced electrolytes for high temperature energy storage device
US9664598B2 (en) 2013-10-18 2017-05-30 Agilent Technologies, Inc. Microfluidic contaminant trap for trapping contaminants in gas chromatography
US9638676B2 (en) 2013-10-18 2017-05-02 Agilent Technologies, Inc. GC column connection with a planar connection to mating devices
EP3084481B8 (de) 2013-12-20 2024-01-03 Fastcap Systems Corporation Vorrichtung zur elektromagnetischen telemetrie
US11270850B2 (en) 2013-12-20 2022-03-08 Fastcap Systems Corporation Ultracapacitors with high frequency response
US11292924B2 (en) 2014-04-08 2022-04-05 Silcotek Corp. Thermal chemical vapor deposition coated article and process
TWI504555B (zh) * 2014-07-21 2015-10-21 Nanomaterial Innovation Ltd 一種形成奈米片狀結構網絡在基材上的製備方法及其應用
SG10201506024WA (en) 2014-08-21 2016-03-30 Silcotek Corp Semiconductor fabrication process
SG10201506694QA (en) * 2014-09-03 2016-04-28 Silcotek Corp Chemical vapor deposition process and coated article
US9915001B2 (en) * 2014-09-03 2018-03-13 Silcotek Corp. Chemical vapor deposition process and coated article
CN113539696B (zh) 2014-10-09 2024-12-03 快帽系统公司 用于储能装置的纳米结构化电极
US10161835B1 (en) 2014-11-20 2018-12-25 National Technology & Engineering Solutions Of Sandia, Llc Microsampler and method of making the same
US10316408B2 (en) 2014-12-12 2019-06-11 Silcotek Corp. Delivery device, manufacturing system and process of manufacturing
US10197532B1 (en) 2015-01-12 2019-02-05 National Technology & Engineering Solutions Of Sandia, Llc Miniaturized pulsed discharge ionization detector, non-radioactive ionization sources, and methods thereof
WO2016114850A1 (en) 2015-01-14 2016-07-21 Agilent Technologies, Inc. Components with an atomic layer deposition coating and methods of producing the same
KR102469677B1 (ko) 2015-01-27 2022-11-22 패스트캡 시스템즈 코포레이션 넓은 온도 범위 울트라커패시터
US10876206B2 (en) 2015-09-01 2020-12-29 Silcotek Corp. Thermal chemical vapor deposition coating
US10029346B2 (en) * 2015-10-16 2018-07-24 Applied Materials, Inc. External clamp ring for a chemical mechanical polishing carrier head
US9920724B2 (en) 2015-10-19 2018-03-20 United Technologies Corporation Chemical scavenging component for a fuel system
US20170130334A1 (en) * 2015-11-05 2017-05-11 Silcotek Corp. Thermal chemical vapor deposition split-functionalization process, product, and coating
US10087521B2 (en) 2015-12-15 2018-10-02 Silcotek Corp. Silicon-nitride-containing thermal chemical vapor deposition coating
US10323321B1 (en) 2016-01-08 2019-06-18 Silcotek Corp. Thermal chemical vapor deposition process and coated article
WO2018102652A1 (en) 2016-12-02 2018-06-07 Fastcap Systems Corporation Composite electrode
US10487403B2 (en) * 2016-12-13 2019-11-26 Silcotek Corp Fluoro-containing thermal chemical vapor deposition process and article
RU2661320C1 (ru) * 2017-04-26 2018-07-13 Закрытое акционерное общество Научно-инженерный центр "ИНКОМСИСТЕМ" Способ гидрофобизации субстрата
US11161324B2 (en) 2017-09-13 2021-11-02 Silcotek Corp. Corrosion-resistant coated article and thermal chemical vapor deposition coating process
US11709156B2 (en) 2017-09-18 2023-07-25 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved analytical analysis
US11709155B2 (en) 2017-09-18 2023-07-25 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
US12181452B2 (en) 2017-09-18 2024-12-31 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
US12180581B2 (en) 2017-09-18 2024-12-31 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
US12214118B2 (en) 2018-02-02 2025-02-04 Alexza Pharmaceuticals, Inc. Electrical condensation aerosol device
US11796134B2 (en) * 2018-06-22 2023-10-24 Linde Gmbh Cylinder valves and methods for inhibiting the formation of contaminants in cylinders and cylinder valves
EP3887563B1 (de) 2018-11-29 2024-03-06 Silcotek Corp. Fluidkontaktverfahren, beschichteter gegenstand und beschichtungsverfahren
CN113507971A (zh) 2019-02-27 2021-10-15 沃特世科技公司 用于最大程度减少分析物吸附的色谱密封件和经涂覆的流动路径
US11747341B2 (en) 2019-03-04 2023-09-05 Waters Technologies Corporation Methods of use for low-bind polypropylene plates and vials
WO2020252306A1 (en) 2019-06-14 2020-12-17 Silcotek Corp. Nano-wire growth
US11557765B2 (en) 2019-07-05 2023-01-17 Fastcap Systems Corporation Electrodes for energy storage devices
US11918936B2 (en) 2020-01-17 2024-03-05 Waters Technologies Corporation Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding
US12473635B2 (en) 2020-06-03 2025-11-18 Silcotek Corp. Dielectric article
EP4189018A1 (de) 2020-07-30 2023-06-07 Silcotek Corp. Wärmetauscherverfahren
CN111718664B (zh) * 2020-08-05 2022-03-15 苏州宝优际科技股份有限公司 胶带
EP4628889A3 (de) 2020-09-24 2025-12-10 Waters Technologies Corporation Verbesserungen der chromatographischen hardware zur trennung von reaktiven molekülen
CN113583447A (zh) * 2021-08-18 2021-11-02 常州市诺普新材料有限公司 有机硅增强助剂及其制备方法以及有机硅材料
KR20240045304A (ko) * 2021-08-24 2024-04-05 실코텍 코포레이션 화학적 기상 증착 공정 및 코팅
CN118414209A (zh) * 2021-11-03 2024-07-30 西尔科特克公司 具有暴露于高于600摄氏度的温度的含非晶硅涂层的工艺、部件和系统
EP4721657A1 (de) 2024-10-07 2026-04-08 VOC - Advanced Breath Diagnostics GmbH Nicht-invasives verfahren zur bestimmung von atemgasen aufweisend schwefelwasserstoff

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2313073C2 (de) * 1973-03-16 1984-11-29 Istvan Prof. Dr. 6600 Saarbruecken Halasz Verfahren zur chemischen Modifizierung von Oberflächen anorganischer Festkörper und deren Verwendung
US4473597A (en) * 1978-02-01 1984-09-25 Rca Corporation Method and structure for passivating a PN junction
US4741964A (en) * 1986-07-17 1988-05-03 International Business Machines Corporation Structure containing hydrogenated amorphous silicon and process
US4873119A (en) * 1987-01-28 1989-10-10 Chronar Corp. Catalytic deposition of semiconductors
JPH01229265A (ja) * 1988-03-09 1989-09-12 Hitachi Ltd 電子写真感光体およびその製造方法
US5017540A (en) * 1989-09-15 1991-05-21 Sandoval Junior E Silicon hydride surface intermediates for chemical separations apparatus
DE69305936T3 (de) * 1992-07-11 2004-07-22 Pilkington United Kingdom Ltd., St. Helens Verfahren zur Herstellung von reflektierenden Schichten auf Glas
JPH0653137A (ja) * 1992-07-31 1994-02-25 Canon Inc 水素化アモルファスシリコン膜の形成方法
DE59304840D1 (de) * 1992-10-05 1997-01-30 Hoechst Ag Formkörper aus polyester, die kovalent eingebundene oxidpartikel enthalten
US5672660A (en) * 1995-12-01 1997-09-30 Advanced Elastomer Systems, L.P. Hydrosilylation crosslinking

Also Published As

Publication number Publication date
AU2010251782A1 (en) 2011-01-06
US6444326B1 (en) 2002-09-03
AU2004200293A1 (en) 2004-02-19
AU3863800A (en) 2000-09-21
CN1356926A (zh) 2002-07-03
EP1181095A1 (de) 2002-02-27
JP4834225B2 (ja) 2011-12-14
KR100828211B1 (ko) 2008-05-07
AU2010251782B2 (en) 2011-11-10
WO2000051732A1 (en) 2000-09-08
WO2000051732A9 (en) 2001-10-11
KR20020010123A (ko) 2002-02-02
JP2002538301A (ja) 2002-11-12
EP1181095A4 (de) 2002-10-16
AU2007201893A1 (en) 2007-05-17
CN1130263C (zh) 2003-12-10
EP1181095B1 (de) 2011-08-24
CA2365659A1 (en) 2000-09-08
CA2365659C (en) 2008-01-29

Similar Documents

Publication Publication Date Title
CN1130263C (zh) 通过硅烷热分解和官能化的固体载体表面改性
TW362118B (en) Method for depositing amorphous SiNC coatings
TW328971B (en) Method for depositing Si-O containing coatings
ATE367458T1 (de) Vorrichtung und verfahren zum auftragen einer dünnschicht auf einen wafer durch abscheidung von atomaren schichten
TW376545B (en) Method of producing silicon layer having surface controlling to be even
ATE346379T1 (de) Verfahren zur behandlung der oberfläche von halbleitenden substraten
ATA166799A (de) Verfahren und vorrichtung zur herstellung einer nanotube-schicht auf einem substrat
ATE510935T1 (de) Vorrichtung und verfahren zur beschichtung von halbleitermaterial
DE59611377D1 (de) Vorrichtung zum Beschichten eines Substrats mit Hilfe des Chemical-Vapor-Deposition-Verfahrens
EP2251913A3 (de) Herstellungsverfahren eines Dünnschicht photoelektrischen Umwandlers aus Silizium und für dieses Verfahren angewendeter Plasma-CVD Apparat
PT941078E (pt) Metodo e dispositivo para o revestimento de substratos para utilizacao farmaceutica
DE69511573D1 (de) Vorrichtung zur durchführung des gasphaseninfiltrations bzw.-beschichtungsverfahren
WO2002099161A3 (en) Method for the deposition of materials from mesomorphous films
KR900006474A (ko) 플라즈마 가공방법 및 이의 생성물
ATA4212001A (de) Ein ccvd-verfahren zur herstellung von röhrenförmigen kohlenstoff-nanofasern
GB2365437A (en) Surface coatings
DE59809788D1 (de) Vorrichtung zum Beschichten eines im wesentlichen flachen scheibenförmigen Substrats
GB2375107A (en) Improved binders for coatings
NZ508750A (en) A method of coating a surface by exposing the surface to a plasma containing organic monomers
CA2362798A1 (en) Method and device for treating substrates
ATE225414T1 (de) Verfahren und vorrichtung zur vakuumbeschichtung
KR970702152A (ko) 탄소-피복된 표면을 보유하는 장벽 필름(barrier films having carbon-coated surfaces)
WO2001049900A8 (fr) Procede d'application d'un revetement metallique et matiere couverte dudit revetement
DE69505837D1 (de) Beschichtungen mit niedriger oberflächenenergie
ATE399217T1 (de) Verfahren zur abscheidung von amorphen, wasserstoffhaltigen siliziumschichten

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties