ATE523067T1 - Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft - Google Patents

Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft

Info

Publication number
ATE523067T1
ATE523067T1 AT09708722T AT09708722T ATE523067T1 AT E523067 T1 ATE523067 T1 AT E523067T1 AT 09708722 T AT09708722 T AT 09708722T AT 09708722 T AT09708722 T AT 09708722T AT E523067 T1 ATE523067 T1 AT E523067T1
Authority
AT
Austria
Prior art keywords
stack structure
layer stack
producing
treatment space
boundary property
Prior art date
Application number
AT09708722T
Other languages
English (en)
Inventor
Vries Hindrik Willem De
De Sanden Mauritius Cornelius Marie Van
Original Assignee
Fujifilm Mfg Europe Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Mfg Europe Bv filed Critical Fujifilm Mfg Europe Bv
Application granted granted Critical
Publication of ATE523067T1 publication Critical patent/ATE523067T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/473—Cylindrical electrodes, e.g. rotary drums
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
AT09708722T 2008-02-08 2009-01-22 Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft ATE523067T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08151215 2008-02-08
PCT/NL2009/050027 WO2009099325A1 (en) 2008-02-08 2009-01-22 Method for manufacturing a multi_layer stack structure with improved wvtr barrier property

Publications (1)

Publication Number Publication Date
ATE523067T1 true ATE523067T1 (de) 2011-09-15

Family

ID=39575531

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09708722T ATE523067T1 (de) 2008-02-08 2009-01-22 Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft

Country Status (5)

Country Link
US (1) US8445897B2 (de)
EP (1) EP2241165B1 (de)
JP (1) JP5473946B2 (de)
AT (1) ATE523067T1 (de)
WO (1) WO2009099325A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080317974A1 (en) * 2005-08-26 2008-12-25 Fujifilm Manufacturing Europe B.V. Method and Arrangement for Generating and Controlling a Discharge Plasma
JP2009538989A (ja) 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
EP2032738A1 (de) * 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Verrfahren und vorrichtung zur atomlagenabscheidung unter verwendung eines atmosphärendruckglimmentladungsplasmas
US8338307B2 (en) * 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
JP5597551B2 (ja) * 2008-02-01 2014-10-01 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． 移動基材のプラズマ表面処理の装置、方法および当該方法の使用
US8648932B2 (en) 2009-08-13 2014-02-11 Olive Medical Corporation System, apparatus and methods for providing a single use imaging device for sterile environments
GB201012225D0 (en) 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier layer on a substrate and a multi-layer stack
GB201012226D0 (en) * 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier on a sheet and a sheet for PV modules
TWI501441B (zh) * 2012-08-24 2015-09-21 財團法人工業技術研究院 非連續複合阻障層、其形成方法及包含其之封裝結構
KR101970569B1 (ko) * 2012-12-17 2019-04-19 엘지디스플레이 주식회사 유기 발광 다이오드 표시 장치
TW201445794A (zh) * 2013-05-27 2014-12-01 Wistron Corp 有機光電元件封裝結構以及封裝方法
KR101563341B1 (ko) * 2014-04-29 2015-11-06 한국과학기술원 기상 증착 장치
US20250101678A1 (en) * 2023-09-21 2025-03-27 Polytex Sportbelage Produktions-Gmbh Artificial turf and method of manufacturing
EP4528031A1 (de) * 2023-09-21 2025-03-26 Polytex Sportbeläge Produktions-GmbH System zur kunstrasenherstellung
WO2025061821A1 (en) * 2023-09-21 2025-03-27 Polytex Sportbeläge Produktions-Gmbh Artificial turf and method of manufacturing
US20250100001A1 (en) * 2023-09-21 2025-03-27 Polytex Sportbelage Produktions-Gmbh System for artificial turf manufacturing
WO2025061334A1 (en) * 2023-09-21 2025-03-27 Polytex Sportbeläge Produktions-Gmbh System for artificial turf manufacturing

Family Cites Families (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3224234A1 (de) 1981-09-01 1983-03-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens
JPS58111380A (ja) 1981-12-24 1983-07-02 Seiko Epson Corp アモルフアスシリコン太陽電池の製造方法
JPS58217344A (ja) 1983-06-01 1983-12-17 旭化成ポリフレックス株式会社 バリヤ−性プラスチツク積層シ−ト
US4681780A (en) 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
US4631199A (en) 1985-07-22 1986-12-23 Hughes Aircraft Company Photochemical vapor deposition process for depositing oxide layers
JPS6433932A (en) 1987-07-29 1989-02-03 Matsushita Electric Industrial Co Ltd Etching apparatus
JPH0494169A (ja) 1990-08-09 1992-03-26 Kanegafuchi Chem Ind Co Ltd 薄膜ダイオード素子
US5187457A (en) 1991-09-12 1993-02-16 Eni Div. Of Astec America, Inc. Harmonic and subharmonic filter
FR2704558B1 (fr) 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
JP3148910B2 (ja) 1993-09-01 2001-03-26 日本真空技術株式会社 プラズマｃｖｄ成膜方法
US6342277B1 (en) 1996-08-16 2002-01-29 Licensee For Microelectronics: Asm America, Inc. Sequential chemical vapor deposition
JP3904523B2 (ja) * 1997-04-17 2007-04-11 株式会社クレハ エレクトロルミネセンス素子及びその製造方法
DE19728472A1 (de) 1997-07-03 1999-01-07 Siemens Ag Strukturierungsverfahren
AU742051B2 (en) * 1997-07-14 2001-12-13 University Of Tennessee Research Corporation, The Plasma treater systems and treatment methods
JP2000026632A (ja) 1998-07-13 2000-01-25 Sekisui Chem Co Ltd 常圧プラズマを用いたフィルム基材への薄膜形成方法
JP2000212753A (ja) * 1999-01-22 2000-08-02 Sekisui Chem Co Ltd 表面処理品の製造方法
US6774018B2 (en) 1999-02-01 2004-08-10 Sigma Laboratories Of Arizona, Inc. Barrier coatings produced by atmospheric glow discharge
DE60009771T2 (de) 1999-02-15 2005-03-17 Konica Corp. Verfahren zur Oberflächenbehandlung, Verfahren zur Herstellung eines Tintenstrahl-Aufzeichnungsmaterials sowie durch dieses Verfahren hergestelltes Material
JP2000313962A (ja) 1999-04-26 2000-11-14 Sekisui Chem Co Ltd 放電プラズマを用いたＴｉＯ２薄膜の形成方法
US6391785B1 (en) 1999-08-24 2002-05-21 Interuniversitair Microelektronica Centrum (Imec) Method for bottomless deposition of barrier layers in integrated circuit metallization schemes
US6413645B1 (en) * 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
TW520453B (en) 1999-12-27 2003-02-11 Seiko Epson Corp A method to fabricate thin insulating films
DE10011276A1 (de) 2000-03-08 2001-09-13 Wolff Walsrode Ag Verwendung eines indirrekten atomosphärischen Plasmatrons zur Oberflächenbehandlung oder Beschichtung bahnförmiger Werkstoffe sowie ein Verfahren zur Behandlung oder Beschichtung bahnförmiger Werkstoffe
ATE245310T1 (de) 2000-03-14 2003-08-15 Fraunhofer Ges Forschung Verfahren und vorrichtung zur plasmagestützten oberflächenbehandlung und verwendung des verfahrens
US6524431B1 (en) 2000-11-10 2003-02-25 Helix Technology Inc. Apparatus for automatically cleaning mask
CA2435852A1 (en) 2000-11-14 2002-05-23 Sekisui Chemical Co., Ltd. A method for plasma treatment under the atmospheric pressure and an equipment therefor
EP2233605B1 (de) 2000-12-12 2012-09-26 Konica Corporation Optischer Überzug, enthaltend eine Antreflexionsschicht
US6464779B1 (en) 2001-01-19 2002-10-15 Novellus Systems, Inc. Copper atomic layer chemical vapor desposition
GB0113751D0 (en) 2001-06-06 2001-07-25 Dow Corning Surface treatment
US6861334B2 (en) 2001-06-21 2005-03-01 Asm International, N.V. Method of fabricating trench isolation structures for integrated circuits using atomic layer deposition
CA2352567A1 (en) * 2001-07-06 2003-01-06 Mohamed Latreche Translucent material displaying ultra-low transport of gases and vapors, and method for its production
US7098131B2 (en) 2001-07-19 2006-08-29 Samsung Electronics Co., Ltd. Methods for forming atomic layers and thin films including tantalum nitride and devices including the same
JP2003049273A (ja) * 2001-08-08 2003-02-21 Kobe Steel Ltd プラズマｃｖｄ装置及びプラズマｃｖｄによる成膜方法
US6756318B2 (en) 2001-09-10 2004-06-29 Tegal Corporation Nanolayer thick film processing system and method
JP2003154255A (ja) * 2001-11-21 2003-05-27 Okura Ind Co Ltd シート状基材の大気圧放電プラズマ表面処理方法及び大気圧放電プラズマ表面処理装置
DE10161469A1 (de) 2001-12-13 2003-07-03 Schott Glas Volumenoptimierter Reaktor zur beidseitig gleichzeitigen Beschichtung von Brillengläsern
JP3859518B2 (ja) 2002-01-15 2006-12-20 住友ベークライト株式会社 透明水蒸気バリアフィルム
EP1351321B1 (de) 2002-04-01 2013-12-25 Konica Corporation Träger und organisches elektrolumineszentes Bauelement mit einem solchen Träger
US6759100B2 (en) 2002-06-10 2004-07-06 Konica Corporation Layer formation method, and substrate with a layer formed by the method
US6774569B2 (en) 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
US20050084610A1 (en) 2002-08-13 2005-04-21 Selitser Simon I. Atmospheric pressure molecular layer CVD
EP1403902A1 (de) 2002-09-30 2004-03-31 Fuji Photo Film B.V. Verfahren und Vorrichtung zur Erzeugung eines Glühentladungsplasmas unter atmosphärischem Druck
JP2007505219A (ja) 2003-09-09 2007-03-08 ダウ グローバル テクノロジーズ インコーポレイティド グロー放電発生化学蒸着
GB0323295D0 (en) 2003-10-04 2003-11-05 Dow Corning Deposition of thin films
US20050079418A1 (en) 2003-10-14 2005-04-14 3M Innovative Properties Company In-line deposition processes for thin film battery fabrication
US7969095B2 (en) 2003-12-22 2011-06-28 Fuji Photo Film B.V. Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma
EP1548795A1 (de) 2003-12-22 2005-06-29 Fuji Photo Film B.V. Procédé et dispositif de stabilisation d'un plasma à décharge luminescente sous conditions atmosphériques
JP2006004740A (ja) 2004-06-17 2006-01-05 Seiko Epson Corp 成膜方法、表示デバイスの製造方法、表示デバイス、及び電子機器
ATE348497T1 (de) 2004-08-13 2007-01-15 Fuji Photo Film Bv Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck
DE102004043384B4 (de) 2004-09-08 2010-06-17 Schott Ag Verfahren zur Herstellung eines beschichteten Hohlkörper-Substrates aus zumindest Polyethylenterephthalat
JP2006201538A (ja) 2005-01-21 2006-08-03 Seiko Epson Corp マスク、マスクの製造方法、パターン形成方法、配線パターン形成方法
US20060231908A1 (en) 2005-04-13 2006-10-19 Xerox Corporation Multilayer gate dielectric
EP1907596A4 (de) 2005-07-26 2009-09-16 Psm Inc Plasmabehandlungsvorrichtung und -verfahren vom injektionstyp
KR101218114B1 (ko) 2005-08-04 2013-01-18 주성엔지니어링(주) 플라즈마 식각 장치
US20080317974A1 (en) 2005-08-26 2008-12-25 Fujifilm Manufacturing Europe B.V. Method and Arrangement for Generating and Controlling a Discharge Plasma
US7763114B2 (en) 2005-12-28 2010-07-27 3M Innovative Properties Company Rotatable aperture mask assembly and deposition system
JP2009525381A (ja) * 2006-02-02 2009-07-09 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． プラズマによる表面処理方法及び表面処理装置
WO2007091891A1 (en) 2006-02-09 2007-08-16 Fujifilm Manufacturing Europe B.V. Short pulse atmospheric pressure glow discharge method and apparatus
JP2009538989A (ja) * 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
EP2032738A1 (de) 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Verrfahren und vorrichtung zur atomlagenabscheidung unter verwendung eines atmosphärendruckglimmentladungsplasmas
US8338307B2 (en) 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
JP5597551B2 (ja) 2008-02-01 2014-10-01 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． 移動基材のプラズマ表面処理の装置、方法および当該方法の使用
EP2245647B1 (de) 2008-02-21 2012-08-01 Fujifilm Manufacturing Europe B.V. Verfahren zur behandlung eines substrats mit einem atmosphärendruck-glühentladungselektrodenaufbau
US8609203B2 (en) 2008-06-06 2013-12-17 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of moving substrate
US20110311734A1 (en) 2009-02-12 2011-12-22 Fujifilm Manufacturing Europe B.V. Two Layer Barrier on Polymeric Substrate

Also Published As

Publication number Publication date
EP2241165B1 (de) 2011-08-31
JP5473946B2 (ja) 2014-04-16
JP2011514265A (ja) 2011-05-06
US8445897B2 (en) 2013-05-21
WO2009099325A1 (en) 2009-08-13
US20110049491A1 (en) 2011-03-03
EP2241165A1 (de) 2010-10-20

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