ATE523067T1 - Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft - Google Patents
Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaftInfo
- Publication number
- ATE523067T1 ATE523067T1 AT09708722T AT09708722T ATE523067T1 AT E523067 T1 ATE523067 T1 AT E523067T1 AT 09708722 T AT09708722 T AT 09708722T AT 09708722 T AT09708722 T AT 09708722T AT E523067 T1 ATE523067 T1 AT E523067T1
- Authority
- AT
- Austria
- Prior art keywords
- stack structure
- layer stack
- producing
- treatment space
- boundary property
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 5
- 239000010410 layer Substances 0.000 abstract 4
- 239000012790 adhesive layer Substances 0.000 abstract 2
- 230000004888 barrier function Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000010030 laminating Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
- H05H1/473—Cylindrical electrodes, e.g. rotary drums
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
- H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2240/00—Testing
- H05H2240/10—Testing at atmospheric pressure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08151215 | 2008-02-08 | ||
| PCT/NL2009/050027 WO2009099325A1 (en) | 2008-02-08 | 2009-01-22 | Method for manufacturing a multi_layer stack structure with improved wvtr barrier property |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE523067T1 true ATE523067T1 (de) | 2011-09-15 |
Family
ID=39575531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT09708722T ATE523067T1 (de) | 2008-02-08 | 2009-01-22 | Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8445897B2 (de) |
| EP (1) | EP2241165B1 (de) |
| JP (1) | JP5473946B2 (de) |
| AT (1) | ATE523067T1 (de) |
| WO (1) | WO2009099325A1 (de) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007024134A1 (en) * | 2005-08-26 | 2007-03-01 | Fujifilm Manufacturing Europe B.V. | Method and arrangement for generating and controlling a discharge plasma |
| JP2009538989A (ja) | 2006-05-30 | 2009-11-12 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | パルス化大気圧グロー放電を使用する堆積の方法及び装置 |
| US20090324971A1 (en) * | 2006-06-16 | 2009-12-31 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
| US8338307B2 (en) | 2007-02-13 | 2012-12-25 | Fujifilm Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
| WO2009096785A1 (en) | 2008-02-01 | 2009-08-06 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of a moving substrate |
| US8648932B2 (en) | 2009-08-13 | 2014-02-11 | Olive Medical Corporation | System, apparatus and methods for providing a single use imaging device for sterile environments |
| GB201012225D0 (en) | 2010-07-21 | 2010-09-08 | Fujifilm Mfg Europe Bv | Method for manufacturing a barrier layer on a substrate and a multi-layer stack |
| GB201012226D0 (en) * | 2010-07-21 | 2010-09-08 | Fujifilm Mfg Europe Bv | Method for manufacturing a barrier on a sheet and a sheet for PV modules |
| TWI501441B (zh) * | 2012-08-24 | 2015-09-21 | 財團法人工業技術研究院 | 非連續複合阻障層、其形成方法及包含其之封裝結構 |
| KR101970569B1 (ko) * | 2012-12-17 | 2019-04-19 | 엘지디스플레이 주식회사 | 유기 발광 다이오드 표시 장치 |
| TW201445794A (zh) * | 2013-05-27 | 2014-12-01 | Wistron Corp | 有機光電元件封裝結構以及封裝方法 |
| KR101563341B1 (ko) * | 2014-04-29 | 2015-11-06 | 한국과학기술원 | 기상 증착 장치 |
| WO2025061334A1 (en) * | 2023-09-21 | 2025-03-27 | Polytex Sportbeläge Produktions-Gmbh | System for artificial turf manufacturing |
| US20250100001A1 (en) * | 2023-09-21 | 2025-03-27 | Polytex Sportbelage Produktions-Gmbh | System for artificial turf manufacturing |
| EP4528031A1 (de) * | 2023-09-21 | 2025-03-26 | Polytex Sportbeläge Produktions-GmbH | System zur kunstrasenherstellung |
| US20260002320A1 (en) * | 2023-09-21 | 2026-01-01 | Polytex Sportbelage Produktions-Gmbh | Artificial turf with traction control agent |
| US20250101678A1 (en) * | 2023-09-21 | 2025-03-27 | Polytex Sportbelage Produktions-Gmbh | Artificial turf and method of manufacturing |
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| JPS58111380A (ja) | 1981-12-24 | 1983-07-02 | Seiko Epson Corp | アモルフアスシリコン太陽電池の製造方法 |
| JPS58217344A (ja) | 1983-06-01 | 1983-12-17 | 旭化成ポリフレックス株式会社 | バリヤ−性プラスチツク積層シ−ト |
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| US4631199A (en) | 1985-07-22 | 1986-12-23 | Hughes Aircraft Company | Photochemical vapor deposition process for depositing oxide layers |
| JPS6433932A (en) | 1987-07-29 | 1989-02-03 | Matsushita Electric Industrial Co Ltd | Etching apparatus |
| JPH0494169A (ja) | 1990-08-09 | 1992-03-26 | Kanegafuchi Chem Ind Co Ltd | 薄膜ダイオード素子 |
| US5187457A (en) | 1991-09-12 | 1993-02-16 | Eni Div. Of Astec America, Inc. | Harmonic and subharmonic filter |
| FR2704558B1 (fr) | 1993-04-29 | 1995-06-23 | Air Liquide | Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement. |
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| DE19728472A1 (de) | 1997-07-03 | 1999-01-07 | Siemens Ag | Strukturierungsverfahren |
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| JP2000026632A (ja) | 1998-07-13 | 2000-01-25 | Sekisui Chem Co Ltd | 常圧プラズマを用いたフィルム基材への薄膜形成方法 |
| JP2000212753A (ja) * | 1999-01-22 | 2000-08-02 | Sekisui Chem Co Ltd | 表面処理品の製造方法 |
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| EP1029702B1 (de) | 1999-02-15 | 2004-04-14 | Konica Corporation | Verfahren zur Oberflächenbehandlung, Verfahren zur Herstellung eines Tintenstrahl-Aufzeichnungsmaterials sowie durch dieses Verfahren hergestelltes Material |
| JP2000313962A (ja) | 1999-04-26 | 2000-11-14 | Sekisui Chem Co Ltd | 放電プラズマを用いたTiO2薄膜の形成方法 |
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| DE10011276A1 (de) | 2000-03-08 | 2001-09-13 | Wolff Walsrode Ag | Verwendung eines indirrekten atomosphärischen Plasmatrons zur Oberflächenbehandlung oder Beschichtung bahnförmiger Werkstoffe sowie ein Verfahren zur Behandlung oder Beschichtung bahnförmiger Werkstoffe |
| ATE245310T1 (de) | 2000-03-14 | 2003-08-15 | Fraunhofer Ges Forschung | Verfahren und vorrichtung zur plasmagestützten oberflächenbehandlung und verwendung des verfahrens |
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| CA2352567A1 (en) * | 2001-07-06 | 2003-01-06 | Mohamed Latreche | Translucent material displaying ultra-low transport of gases and vapors, and method for its production |
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| US6756318B2 (en) | 2001-09-10 | 2004-06-29 | Tegal Corporation | Nanolayer thick film processing system and method |
| JP2003154255A (ja) * | 2001-11-21 | 2003-05-27 | Okura Ind Co Ltd | シート状基材の大気圧放電プラズマ表面処理方法及び大気圧放電プラズマ表面処理装置 |
| DE10161469A1 (de) | 2001-12-13 | 2003-07-03 | Schott Glas | Volumenoptimierter Reaktor zur beidseitig gleichzeitigen Beschichtung von Brillengläsern |
| JP3859518B2 (ja) | 2002-01-15 | 2006-12-20 | 住友ベークライト株式会社 | 透明水蒸気バリアフィルム |
| EP2249413A3 (de) | 2002-04-01 | 2011-02-02 | Konica Corporation | Träger und organisches elektrolumineszentes Bauelement mit einem solchen Träger |
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| US6774569B2 (en) | 2002-07-11 | 2004-08-10 | Fuji Photo Film B.V. | Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
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| US20050084610A1 (en) | 2002-08-13 | 2005-04-21 | Selitser Simon I. | Atmospheric pressure molecular layer CVD |
| EP1403902A1 (de) | 2002-09-30 | 2004-03-31 | Fuji Photo Film B.V. | Verfahren und Vorrichtung zur Erzeugung eines Glühentladungsplasmas unter atmosphärischem Druck |
| KR20060082858A (ko) | 2003-09-09 | 2006-07-19 | 다우 글로벌 테크놀로지스 인크. | 글로우 방전 발생의 화학 증착법 |
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| EP1697962B1 (de) | 2003-12-22 | 2009-12-09 | FUJIFILM Manufacturing Europe B.V. | Verfahren und anordnung zum entfernen von verunreinigungen von einer substratoberfläche unter verwendung eines atmosphärendruck-glühplasmas |
| EP1548795A1 (de) | 2003-12-22 | 2005-06-29 | Fuji Photo Film B.V. | Procédé et dispositif de stabilisation d'un plasma à décharge luminescente sous conditions atmosphériques |
| JP2006004740A (ja) | 2004-06-17 | 2006-01-05 | Seiko Epson Corp | 成膜方法、表示デバイスの製造方法、表示デバイス、及び電子機器 |
| DE602004003697T2 (de) | 2004-08-13 | 2007-10-04 | Fuji Film Manufacturing Europe B.V. | Verfahren und Vorrichtung zur Steuerung eines Glühentladungsplasmas unter atmosphärischem Druck |
| DE102004043384B4 (de) | 2004-09-08 | 2010-06-17 | Schott Ag | Verfahren zur Herstellung eines beschichteten Hohlkörper-Substrates aus zumindest Polyethylenterephthalat |
| JP2006201538A (ja) | 2005-01-21 | 2006-08-03 | Seiko Epson Corp | マスク、マスクの製造方法、パターン形成方法、配線パターン形成方法 |
| US20060231908A1 (en) | 2005-04-13 | 2006-10-19 | Xerox Corporation | Multilayer gate dielectric |
| CN101228288B (zh) | 2005-07-26 | 2011-12-28 | Psm有限公司 | 注射型等离子体处理设备和方法 |
| KR101218114B1 (ko) | 2005-08-04 | 2013-01-18 | 주성엔지니어링(주) | 플라즈마 식각 장치 |
| WO2007024134A1 (en) | 2005-08-26 | 2007-03-01 | Fujifilm Manufacturing Europe B.V. | Method and arrangement for generating and controlling a discharge plasma |
| US7763114B2 (en) | 2005-12-28 | 2010-07-27 | 3M Innovative Properties Company | Rotatable aperture mask assembly and deposition system |
| WO2007089146A1 (en) * | 2006-02-02 | 2007-08-09 | Fujifilm Manufacturing Europe B.V. | Method for surface treatment by plasma and surface treatment apparatus |
| JP2009526129A (ja) | 2006-02-09 | 2009-07-16 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | 短パルス大気圧グロー放電方法及び装置 |
| JP2009538989A (ja) | 2006-05-30 | 2009-11-12 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | パルス化大気圧グロー放電を使用する堆積の方法及び装置 |
| US20090324971A1 (en) | 2006-06-16 | 2009-12-31 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
| US8338307B2 (en) | 2007-02-13 | 2012-12-25 | Fujifilm Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
| WO2009096785A1 (en) | 2008-02-01 | 2009-08-06 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of a moving substrate |
| US20110014424A1 (en) | 2008-02-21 | 2011-01-20 | Fujifilm Manufacturing Europe B.V. | Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration |
| US8609203B2 (en) | 2008-06-06 | 2013-12-17 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of moving substrate |
| EP2396451B1 (de) | 2009-02-12 | 2012-11-07 | Fujifilm Manufacturing Europe BV | Zweischichtige barriere auf polymersubstrat |
-
2009
- 2009-01-22 AT AT09708722T patent/ATE523067T1/de not_active IP Right Cessation
- 2009-01-22 US US12/866,704 patent/US8445897B2/en not_active Expired - Fee Related
- 2009-01-22 WO PCT/NL2009/050027 patent/WO2009099325A1/en not_active Ceased
- 2009-01-22 JP JP2010545817A patent/JP5473946B2/ja not_active Expired - Fee Related
- 2009-01-22 EP EP09708722A patent/EP2241165B1/de not_active Not-in-force
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009099325A1 (en) | 2009-08-13 |
| US8445897B2 (en) | 2013-05-21 |
| US20110049491A1 (en) | 2011-03-03 |
| JP2011514265A (ja) | 2011-05-06 |
| EP2241165B1 (de) | 2011-08-31 |
| EP2241165A1 (de) | 2010-10-20 |
| JP5473946B2 (ja) | 2014-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |