ATE526435T1 - Verfahren und vorrichtung zur abscheidung eines materials auf einem substrat - Google Patents

Verfahren und vorrichtung zur abscheidung eines materials auf einem substrat

Info

Publication number
ATE526435T1
ATE526435T1 AT05777207T AT05777207T ATE526435T1 AT E526435 T1 ATE526435 T1 AT E526435T1 AT 05777207 T AT05777207 T AT 05777207T AT 05777207 T AT05777207 T AT 05777207T AT E526435 T1 ATE526435 T1 AT E526435T1
Authority
AT
Austria
Prior art keywords
substrate
deposing
depositing
vapor
deposited
Prior art date
Application number
AT05777207T
Other languages
English (en)
Inventor
James Nolan
Original Assignee
First Solar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by First Solar Inc filed Critical First Solar Inc
Application granted granted Critical
Publication of ATE526435T1 publication Critical patent/ATE526435T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45568—Porous nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT05777207T 2004-08-11 2005-07-28 Verfahren und vorrichtung zur abscheidung eines materials auf einem substrat ATE526435T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/915,695 US7780787B2 (en) 2004-08-11 2004-08-11 Apparatus and method for depositing a material on a substrate
PCT/US2005/026753 WO2006020409A2 (en) 2004-08-11 2005-07-28 Apparatus and method for depositing a material on a substrate

Publications (1)

Publication Number Publication Date
ATE526435T1 true ATE526435T1 (de) 2011-10-15

Family

ID=35798794

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05777207T ATE526435T1 (de) 2004-08-11 2005-07-28 Verfahren und vorrichtung zur abscheidung eines materials auf einem substrat

Country Status (5)

Country Link
US (2) US7780787B2 (de)
EP (1) EP1794346B1 (de)
AT (1) ATE526435T1 (de)
EA (1) EA010965B1 (de)
WO (1) WO2006020409A2 (de)

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JP4180948B2 (ja) * 2003-03-24 2008-11-12 東京エレクトロン株式会社 基板処理装置および基板処理方法、ガスノズル
FI119478B (fi) * 2005-04-22 2008-11-28 Beneq Oy Reaktori
US9017480B2 (en) 2006-04-06 2015-04-28 First Solar, Inc. System and method for transport
AU2008210794A1 (en) * 2007-02-01 2008-08-07 Willard & Kelsey Solar Group, Llc System and method for glass sheet semiconductor coating
US8628617B2 (en) * 2008-12-03 2014-01-14 First Solar, Inc. System and method for top-down material deposition
US8372482B2 (en) * 2009-02-27 2013-02-12 Goodrich Corporation Methods and apparatus for controlled chemical vapor deposition
JP5719546B2 (ja) * 2009-09-08 2015-05-20 東京応化工業株式会社 塗布装置及び塗布方法
JP5469966B2 (ja) * 2009-09-08 2014-04-16 東京応化工業株式会社 塗布装置及び塗布方法
KR101337368B1 (ko) * 2010-10-27 2013-12-05 엘지디스플레이 주식회사 코팅장치 및 이를 이용한 코팅막 형성방법
WO2013032801A1 (en) 2011-09-02 2013-03-07 First Solar, Inc. Feeder system and method for a vapor transport deposition system
WO2013052460A1 (en) 2011-10-05 2013-04-11 First Solar, Inc. Vapor transport deposition method and system for material co-deposition
US9490120B2 (en) 2011-11-18 2016-11-08 First Solar, Inc. Vapor transport deposition method and system for material co-deposition
US9006020B2 (en) 2012-01-12 2015-04-14 First Solar, Inc. Method and system of providing dopant concentration control in different layers of a semiconductor device
WO2013116215A1 (en) 2012-01-31 2013-08-08 First Solar, Inc. Integrated vapor transport deposition method and system
US9692039B2 (en) 2012-07-24 2017-06-27 Quantumscape Corporation Nanostructured materials for electrochemical conversion reactions
US10158115B2 (en) 2013-06-06 2018-12-18 Quantumscape Corporation Flash evaporation of solid state battery component
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel
WO2015130831A1 (en) 2014-02-25 2015-09-03 Quantumscape Corporation Hybrid electrodes with both intercalation and conversion materials
WO2016025866A1 (en) 2014-08-15 2016-02-18 Quantumscape Corporation Doped conversion materials for secondary battery cathodes
DE102014117492A1 (de) 2014-11-28 2016-06-02 Aixtron Se Vorrichtung zum Abscheiden einer Schicht auf einem Substrat
DE102016101856B4 (de) * 2016-02-03 2017-11-30 Ctf Solar Gmbh Verfahren zum Abscheiden einer CdTe-Schicht auf einem Substrat
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
MY201789A (en) 2017-10-26 2024-03-18 First Solar Inc Systems and methods for vaporization and vapor distribution
EP3824492A4 (de) 2018-07-18 2022-04-20 Massachusetts Institute of Technology Alternierende mehrquellen-dampftransportabscheidung
EP4043609A1 (de) 2018-08-10 2022-08-17 First Solar, Inc. System zur verdampfung und dampfverteilung
US12112897B2 (en) 2020-02-19 2024-10-08 First Solar, Inc. Methods for perovskite device processing by vapor transport deposition

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Also Published As

Publication number Publication date
US20060032440A1 (en) 2006-02-16
EP1794346A2 (de) 2007-06-13
EA010965B1 (ru) 2008-12-30
EA200700423A1 (ru) 2007-10-26
US9085822B2 (en) 2015-07-21
US20110039401A1 (en) 2011-02-17
WO2006020409A3 (en) 2007-07-19
WO2006020409A2 (en) 2006-02-23
US7780787B2 (en) 2010-08-24
EP1794346A4 (de) 2008-12-24
EP1794346B1 (de) 2011-09-28

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