ATE526612T1 - Ablagerungsminderungsvorrichtung mit drehbarer folienfalle - Google Patents

Ablagerungsminderungsvorrichtung mit drehbarer folienfalle

Info

Publication number
ATE526612T1
ATE526612T1 AT09714245T AT09714245T ATE526612T1 AT E526612 T1 ATE526612 T1 AT E526612T1 AT 09714245 T AT09714245 T AT 09714245T AT 09714245 T AT09714245 T AT 09714245T AT E526612 T1 ATE526612 T1 AT E526612T1
Authority
AT
Austria
Prior art keywords
driving
mitigation device
debris mitigation
casing
gap
Prior art date
Application number
AT09714245T
Other languages
English (en)
Inventor
Guenther Hans Derra
Michael Schaaf
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE526612T1 publication Critical patent/ATE526612T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/72—Sealings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mechanical Engineering (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT09714245T 2008-02-28 2009-02-25 Ablagerungsminderungsvorrichtung mit drehbarer folienfalle ATE526612T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08102119 2008-02-28
PCT/IB2009/050742 WO2009107063A1 (en) 2008-02-28 2009-02-25 Debris mitigation device with rotating foil trap and drive assembly

Publications (1)

Publication Number Publication Date
ATE526612T1 true ATE526612T1 (de) 2011-10-15

Family

ID=40589550

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09714245T ATE526612T1 (de) 2008-02-28 2009-02-25 Ablagerungsminderungsvorrichtung mit drehbarer folienfalle

Country Status (7)

Country Link
US (1) US8338797B2 (de)
EP (1) EP2250535B1 (de)
JP (1) JP5475693B2 (de)
KR (1) KR101606436B1 (de)
CN (1) CN101960386B (de)
AT (1) ATE526612T1 (de)
WO (1) WO2009107063A1 (de)

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Publication number Priority date Publication date Assignee Title
RU2496282C1 (ru) * 2012-02-15 2013-10-20 Общество С Ограниченной Ответственностью "Эуф Лабс" Устройство и способ для генерации излучения из разрядной плазмы
US9268031B2 (en) 2012-04-09 2016-02-23 Kla-Tencor Corporation Advanced debris mitigation of EUV light source
JP6151525B2 (ja) * 2013-02-05 2017-06-21 ギガフォトン株式会社 ガスロック装置及び極端紫外光生成装置
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
JP6135410B2 (ja) * 2013-09-06 2017-05-31 ウシオ電機株式会社 ホイルトラップ及びこのホイルトラップを用いた光源装置
US10222701B2 (en) 2013-10-16 2019-03-05 Asml Netherlands B.V. Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
JP5983594B2 (ja) * 2013-12-25 2016-08-31 ウシオ電機株式会社 光源装置
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
CN106527062B (zh) * 2017-01-11 2018-11-27 惠科股份有限公司 一种曝光机及其图像偏移防治方法和系统
US10877190B2 (en) * 2018-08-17 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet radiation source
JP7107334B2 (ja) * 2020-06-12 2022-07-27 ウシオ電機株式会社 極端紫外光光源装置
JP7264119B2 (ja) * 2020-06-12 2023-04-25 ウシオ電機株式会社 極端紫外光光源装置
WO2021251046A1 (ja) * 2020-06-12 2021-12-16 ウシオ電機株式会社 極端紫外光光源装置
JP2026127383A (ja) * 2025-01-27 2026-08-06 ウシオ電機株式会社 光源装置及び放射線取り出し方法
DE102025103413A1 (de) 2025-01-30 2026-07-30 Carl Zeiss Smt Gmbh EUV-Optiksystem, Verfahren zum Betreiben eines EUV-Optiksystems

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JPS6241472A (ja) * 1985-08-15 1987-02-23 Fujitsu Ltd 回転体の塵埃発生防止装置
JPH01320322A (ja) * 1988-06-17 1989-12-26 Matsushita Electric Ind Co Ltd 非接触型密封装置及び電動機
JPH0599176A (ja) 1991-10-01 1993-04-20 Ebara Corp スクリユー式ドライ真空ポンプ
JPH0643348U (ja) * 1992-11-24 1994-06-07 新明和工業株式会社 エアスピンドル
JP2000018395A (ja) * 1998-06-29 2000-01-18 Toyoda Mach Works Ltd 回転軸のシール装置
DE19962160C2 (de) 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
US6714624B2 (en) 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
KR20040052231A (ko) 2001-10-12 2004-06-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부
JP3883836B2 (ja) * 2001-10-24 2007-02-21 株式会社荏原製作所 差動排気シール装置
US7134668B2 (en) * 2001-10-24 2006-11-14 Ebara Corporation Differential pumping seal apparatus
CN100427779C (zh) * 2001-11-13 2008-10-22 Ntn株式会社 流体轴承装置
US6963071B2 (en) * 2002-11-25 2005-11-08 Intel Corporation Debris mitigation device
CN100476585C (zh) * 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
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US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
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US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7889312B2 (en) 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap

Also Published As

Publication number Publication date
CN101960386B (zh) 2013-02-06
CN101960386A (zh) 2011-01-26
US8338797B2 (en) 2012-12-25
KR20100119580A (ko) 2010-11-09
WO2009107063A1 (en) 2009-09-03
US20110002569A1 (en) 2011-01-06
JP2011515022A (ja) 2011-05-12
EP2250535B1 (de) 2011-09-28
JP5475693B2 (ja) 2014-04-16
EP2250535A1 (de) 2010-11-17
KR101606436B1 (ko) 2016-03-28

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