ATE527304T1 - Neue oberflächenaktive polysiloxanphotoinitiatoren - Google Patents

Neue oberflächenaktive polysiloxanphotoinitiatoren

Info

Publication number
ATE527304T1
ATE527304T1 AT04735241T AT04735241T ATE527304T1 AT E527304 T1 ATE527304 T1 AT E527304T1 AT 04735241 T AT04735241 T AT 04735241T AT 04735241 T AT04735241 T AT 04735241T AT E527304 T1 ATE527304 T1 AT E527304T1
Authority
AT
Austria
Prior art keywords
sub
photoinitiators
new surface
active polysiloxane
polysiloxane
Prior art date
Application number
AT04735241T
Other languages
English (en)
Inventor
Jonathan Rogers
Gisele Baudin
Tunja Jung
Reinhold Oehrlein
Gabriele Baisch
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Application granted granted Critical
Publication of ATE527304T1 publication Critical patent/ATE527304T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT04735241T 2003-06-06 2004-05-28 Neue oberflächenaktive polysiloxanphotoinitiatoren ATE527304T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03405409 2003-06-06
PCT/EP2004/050952 WO2004108799A1 (en) 2003-06-06 2004-05-28 Novel surface-active polysiloxane photoinitiators

Publications (1)

Publication Number Publication Date
ATE527304T1 true ATE527304T1 (de) 2011-10-15

Family

ID=33495664

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04735241T ATE527304T1 (de) 2003-06-06 2004-05-28 Neue oberflächenaktive polysiloxanphotoinitiatoren

Country Status (13)

Country Link
US (1) US20070026509A1 (de)
EP (1) EP1631616B1 (de)
JP (1) JP4767840B2 (de)
KR (1) KR101081758B1 (de)
CN (1) CN100432122C (de)
AT (1) ATE527304T1 (de)
AU (1) AU2004245242A1 (de)
BR (1) BRPI0410985B1 (de)
CA (1) CA2525412A1 (de)
MX (1) MXPA05012854A (de)
RU (1) RU2351615C2 (de)
TW (1) TWI340757B (de)
WO (1) WO2004108799A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004058193A1 (de) * 2004-12-02 2006-06-08 Wacker Chemie Ag Vernetzbare Siloxan-Harnstoff-Copolymere
ATE509613T1 (de) * 2006-11-16 2011-06-15 Muehlbauer Ernst Gmbh & Co Kg Silikonabformmasse mit zweistufigem aushärtungsmechanismus
DE102007031689A1 (de) * 2007-07-06 2009-01-08 Evonik Goldschmidt Gmbh Enzympräparate
ATE533814T1 (de) 2008-01-17 2011-12-15 Basf Se Modifizierte olefinpolymere
CN102301277B (zh) * 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
SG186778A1 (en) * 2010-06-22 2013-02-28 Coloplast As Hydrophilic gels derived from grafted photoinitiators
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
JP6438385B2 (ja) * 2012-04-11 2018-12-12 イフォクレール ヴィヴァデント アクチェンゲゼルシャフトＩｖｏｃｌａｒ Ｖｉｖａｄｅｎｔ ＡＧ 複合樹脂組成物およびステレオリソグラフィーによる歯科構成部品の生成のためのプロセス
KR20150051478A (ko) 2013-11-04 2015-05-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터 표시판의 제조 방법
ES2818553T5 (es) * 2016-09-22 2023-06-27 Basf Coatings Gmbh Pintura acuosa para capa de base con estabilidad mejorada en tubería anular
MY194777A (en) * 2017-03-29 2022-12-15 Asahi Chemical Ind Photosensitive resin composition
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
CN110028637A (zh) * 2017-08-20 2019-07-19 湖南七纬科技有限公司 一种颜料釉料高分子分散剂的atrp制备法
CN111527170B (zh) 2017-12-27 2022-12-09 汉高股份有限及两合公司 光学透明的压敏粘合剂及其用途
JP7146409B2 (ja) * 2018-02-20 2022-10-04 ヘンケルジャパン株式会社 Ｕｖ熱硬化型接着剤組成物
GB201807653D0 (en) * 2018-05-11 2018-06-27 Fujifilm Speciality Ink Systems Ltd A printing ink
CN112114502B (zh) * 2020-08-27 2024-08-16 江苏中德电子材料科技有限公司 一种cf返工液
JP7335217B2 (ja) * 2020-09-24 2023-08-29 信越化学工業株式会社 感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
JP3189275B2 (ja) * 1990-08-31 2001-07-16 大日本インキ化学工業株式会社 活性エネルギー線硬化型樹脂組成物
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
BR9811313A (pt) * 1997-08-21 2000-08-29 Loctite Corp Composição de silicone de dupla cura
DE19850507C1 (de) * 1998-11-03 2000-05-04 Goldschmidt Ag Th Verfahren zur Herstellung von Acrylsäureestern und/oder Methacrylsäureestern von hydroxyfunktionellen Siloxanen und/oder polyoxyalkylenmodifizierten Siloxanen und deren Verwendung
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
AU2002218297A1 (en) * 2000-11-20 2002-05-27 Ciba Specialty Chemicals Holding Inc. Fluorinated-photoinitiators in dual cure resins
JP2004522819A (ja) * 2000-12-13 2004-07-29 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 界面活性光開始剤
KR20030063416A (ko) * 2000-12-13 2003-07-28 시바 스페셜티 케미칼스 홀딩 인크. 계면 활성 광 개시제
WO2002048202A1 (en) * 2000-12-13 2002-06-20 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
JP2005517022A (ja) * 2002-02-04 2005-06-09 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 界面活性光開始剤
JP4222945B2 (ja) * 2002-02-04 2009-02-12 チバ ホールディング インコーポレーテッド 界面活性シロキサン光開始剤
AU2003205688A1 (en) * 2002-02-04 2003-09-02 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
CN1286984C (zh) * 2002-03-06 2006-11-29 西巴特殊化学品控股有限公司 用于制备含有机硅基团的光敏引发剂的酶促方法

Also Published As

Publication number Publication date
WO2004108799A1 (en) 2004-12-16
EP1631616A1 (de) 2006-03-08
CN1798793A (zh) 2006-07-05
RU2005141515A (ru) 2006-07-27
JP2007526923A (ja) 2007-09-20
CN100432122C (zh) 2008-11-12
US20070026509A1 (en) 2007-02-01
EP1631616B1 (de) 2011-10-05
RU2351615C2 (ru) 2009-04-10
JP4767840B2 (ja) 2011-09-07
KR101081758B1 (ko) 2011-11-10
TW200502338A (en) 2005-01-16
AU2004245242A1 (en) 2004-12-16
BRPI0410985B1 (pt) 2014-07-22
TWI340757B (en) 2011-04-21
MXPA05012854A (es) 2006-02-22
KR20060021878A (ko) 2006-03-08
CA2525412A1 (en) 2004-12-16
BRPI0410985A (pt) 2006-07-04

Similar Documents

Publication Publication Date Title
ATE527304T1 (de) Neue oberflächenaktive polysiloxanphotoinitiatoren
DE69933665D1 (de) Nicht-elastomere polyurethanzusammensetzungen
BR9809474A (pt) Policarbonatos baseados em silìcio
EP1254916A3 (de) Polysiloxan-enthaltende elastomere Polyurethanzusammensetzungen
ATE446322T1 (de) Oxim ester photoinitiatoren mit kombinierter struktur
EP1302462A4 (de) Sulfonderivate, verfahren zu ihrer herstellung und ihre verwendung
SE0004245D0 (sv) Novel compounds and their use
ES2138154T3 (es) Copolicarbonato.
AR001440A1 (es) Nuevos taxoides, su preparación y composiciones farmacéuticas que los contienen.
TR199902372A2 (xx) Sulfanilsilanlar.
BR0113162A (pt) Ariloxialquilaminas nao-imidazóis
ATE527324T1 (de) Gefärbte wasserverteilbare polyurethane
ES2192067T3 (es) Esteres con olor almizclado y su utilizacion en perfumeria.
EA200100422A1 (ru) Производные мононитрата изосорбида и их использование в качестве сосудорасширяющих агентов с пониженной толерантностью
ES2088633T3 (es) Estabilizantes polisiloxanicos que contienen grupos fenol y grupos oxamidicos estericamente impedidos.
ATE445661T1 (de) Polymer enthaltend substituierte triphenylamin- einheiten
EP1029527A4 (de) Kosmetische zusammensetzung
AU2003244439A1 (en) Surface-active siloxane photoinitiators
AU2001262526A1 (en) Photo-polymers and use thereof
ES2083861T3 (es) Copolimeros de siloxano que contienen grupos viniloxi, su fabricacion y su utilizacion.
CA2022119A1 (en) Substituted aromatic sulfonamides as antiglaucoma agents
DE60126306D1 (de) Tensid
ES2103194A1 (es) Colorantes reactivos de aluminio-ftalocianina.
ATE401325T1 (de) C10-carbamoyloxysubstituierte taxane als antitumormittel
DE59303512D1 (de) Vinyloxygruppen aufweisende siloxancopolymere, deren herstellung und verwendung

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties