BRPI0410985A - fotoiniciadores de polissiloxano tensoativos - Google Patents

fotoiniciadores de polissiloxano tensoativos

Info

Publication number
BRPI0410985A
BRPI0410985A BRPI0410985-6A BRPI0410985A BRPI0410985A BR PI0410985 A BRPI0410985 A BR PI0410985A BR PI0410985 A BRPI0410985 A BR PI0410985A BR PI0410985 A BRPI0410985 A BR PI0410985A
Authority
BR
Brazil
Prior art keywords
sub
photoinitiators
polysiloxane
surfactant
surfactant polysiloxane
Prior art date
Application number
BRPI0410985-6A
Other languages
English (en)
Inventor
Jonathan Rogers
Gis Le Baudin
Tunja Jung
Reinhold Ihrlein
Gabriele Baisch
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BRPI0410985A publication Critical patent/BRPI0410985A/pt
Publication of BRPI0410985B1 publication Critical patent/BRPI0410985B1/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

"FOTOINICIADORES DE POLISSILOXANO TENSOATIVOS". A presente invenção refere-se a fotoiniciadores poliméricos da fórmula I ou II onde n e m independentemente um do outro são 3-5; o é 10-16; p é 4-8; R é fenil-CO-CO-O-; Y e Y<39> independentemente um do outro são C~ 1~-C~ 10~ alquileno ou ¢(CH~ 2~)~ a~-O-(CH~ 2~)~ b~!~ c~- onde a é 2-10, b é 0-10, c é 1-3; com a condição de que, no entanto, eles sejam pelo menos 1 se o grupo metileno em questão estiver entre dois átomos de oxigênio.
BRPI0410985-6A 2003-06-06 2004-05-28 Fotoiniciadores poliméricos, seu processo de preparação e seu uso, composição fotocurável e seu uso, processo para produzir revestimentos, método para fazer com que um fotoiniciador se acumule na superfície de revestimentos, e substrato revestido BRPI0410985B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03405409 2003-06-06
EP03405409.8 2003-06-06
PCT/EP2004/050952 WO2004108799A1 (en) 2003-06-06 2004-05-28 Novel surface-active polysiloxane photoinitiators

Publications (2)

Publication Number Publication Date
BRPI0410985A true BRPI0410985A (pt) 2006-07-04
BRPI0410985B1 BRPI0410985B1 (pt) 2014-07-22

Family

ID=33495664

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0410985-6A BRPI0410985B1 (pt) 2003-06-06 2004-05-28 Fotoiniciadores poliméricos, seu processo de preparação e seu uso, composição fotocurável e seu uso, processo para produzir revestimentos, método para fazer com que um fotoiniciador se acumule na superfície de revestimentos, e substrato revestido

Country Status (13)

Country Link
US (1) US20070026509A1 (pt)
EP (1) EP1631616B1 (pt)
JP (1) JP4767840B2 (pt)
KR (1) KR101081758B1 (pt)
CN (1) CN100432122C (pt)
AT (1) ATE527304T1 (pt)
AU (1) AU2004245242A1 (pt)
BR (1) BRPI0410985B1 (pt)
CA (1) CA2525412A1 (pt)
MX (1) MXPA05012854A (pt)
RU (1) RU2351615C2 (pt)
TW (1) TWI340757B (pt)
WO (1) WO2004108799A1 (pt)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004058193A1 (de) * 2004-12-02 2006-06-08 Wacker Chemie Ag Vernetzbare Siloxan-Harnstoff-Copolymere
ATE509613T1 (de) * 2006-11-16 2011-06-15 Muehlbauer Ernst Gmbh & Co Kg Silikonabformmasse mit zweistufigem aushärtungsmechanismus
DE102007031689A1 (de) * 2007-07-06 2009-01-08 Evonik Goldschmidt Gmbh Enzympräparate
ATE533814T1 (de) * 2008-01-17 2011-12-15 Basf Se Modifizierte olefinpolymere
EP2368155B1 (en) * 2008-12-05 2013-07-10 3M Innovative Properties Company Three-dimensional articles using nonlinear thermal polymerization
US9303129B2 (en) * 2010-06-22 2016-04-05 Coloplast A/S Hydrophilic gels derived from grafted photoinitiators
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
IN2014DN08124A (pt) * 2012-04-11 2015-05-01 Ivoclar Vivadent Ag
KR20150051478A (ko) 2013-11-04 2015-05-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터 표시판의 제조 방법
RU2758381C2 (ru) * 2016-09-22 2021-10-28 БАСФ Коатингс ГмбХ Водные базовые покрытия с повышенной устойчивостью к воздействию циркуляционного трубопровода
KR102295744B1 (ko) * 2017-03-29 2021-08-30 아사히 가세이 가부시키가이샤 감광성 수지 조성물
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
CN110028637A (zh) * 2017-08-20 2019-07-19 湖南七纬科技有限公司 一种颜料釉料高分子分散剂的atrp制备法
CA3078301A1 (en) 2017-12-27 2019-07-04 Henkel IP & Holding GmbH Optically clear pressure sensitive adhesives and uses thereof
JP7146409B2 (ja) * 2018-02-20 2022-10-04 ヘンケルジャパン株式会社 Ｕｖ熱硬化型接着剤組成物
GB201807653D0 (en) * 2018-05-11 2018-06-27 Fujifilm Speciality Ink Systems Ltd A printing ink
CN112114502B (zh) * 2020-08-27 2024-08-16 江苏中德电子材料科技有限公司 一种cf返工液
JP7335217B2 (ja) * 2020-09-24 2023-08-29 信越化学工業株式会社 感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
JP3189275B2 (ja) * 1990-08-31 2001-07-16 大日本インキ化学工業株式会社 活性エネルギー線硬化型樹脂組成物
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
KR20010023087A (ko) * 1997-08-21 2001-03-26 유진 에프. 밀러 이중 경화 실리콘 조성물
DE19850507C1 (de) * 1998-11-03 2000-05-04 Goldschmidt Ag Th Verfahren zur Herstellung von Acrylsäureestern und/oder Methacrylsäureestern von hydroxyfunktionellen Siloxanen und/oder polyoxyalkylenmodifizierten Siloxanen und deren Verwendung
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
AU2002218297A1 (en) * 2000-11-20 2002-05-27 Ciba Specialty Chemicals Holding Inc. Fluorinated-photoinitiators in dual cure resins
CA2431619A1 (en) * 2000-12-13 2002-06-20 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
MXPA03005227A (es) * 2000-12-13 2003-09-25 Ciba Sc Holding Ag Fotoiniciadores de actividad superficial.
EP1341823B1 (en) * 2000-12-13 2008-10-01 Ciba Holding Inc. Surface-active photoinitiators
WO2003066688A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Surface-active siloxane photoinitiators
EP1487881A2 (en) * 2002-02-04 2004-12-22 Ciba SC Holding AG Surface-active photoinitiators
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
US7005281B2 (en) * 2002-03-06 2006-02-28 Ciba Specialty Chemicals Corp. Enzymatic process for preparing organosilicon group containing photoinitiators

Also Published As

Publication number Publication date
MXPA05012854A (es) 2006-02-22
KR20060021878A (ko) 2006-03-08
BRPI0410985B1 (pt) 2014-07-22
RU2005141515A (ru) 2006-07-27
TWI340757B (en) 2011-04-21
CN1798793A (zh) 2006-07-05
WO2004108799A1 (en) 2004-12-16
ATE527304T1 (de) 2011-10-15
JP2007526923A (ja) 2007-09-20
CA2525412A1 (en) 2004-12-16
RU2351615C2 (ru) 2009-04-10
TW200502338A (en) 2005-01-16
CN100432122C (zh) 2008-11-12
KR101081758B1 (ko) 2011-11-10
US20070026509A1 (en) 2007-02-01
EP1631616A1 (en) 2006-03-08
EP1631616B1 (en) 2011-10-05
JP4767840B2 (ja) 2011-09-07
AU2004245242A1 (en) 2004-12-16

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 22/07/2014, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time
B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2465 DE 03-04-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.