ATE527320T1 - Reaktiver uv-absorber, uv-schirm filmbildende härtbare beschichtungslösung, uv-schirmfilm und substrat mit uv-abschirmfunktion - Google Patents

Reaktiver uv-absorber, uv-schirm filmbildende härtbare beschichtungslösung, uv-schirmfilm und substrat mit uv-abschirmfunktion

Info

Publication number
ATE527320T1
ATE527320T1 AT09174278T AT09174278T ATE527320T1 AT E527320 T1 ATE527320 T1 AT E527320T1 AT 09174278 T AT09174278 T AT 09174278T AT 09174278 T AT09174278 T AT 09174278T AT E527320 T1 ATE527320 T1 AT E527320T1
Authority
AT
Austria
Prior art keywords
shield film
absorber
reactive
coating solution
substrate
Prior art date
Application number
AT09174278T
Other languages
English (en)
Inventor
Motoo Fukushima
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Application granted granted Critical
Publication of ATE527320T1 publication Critical patent/ATE527320T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/70—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form
    • C07C45/71—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form being hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31507—Of polycarbonate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y10T428/31612—As silicone, silane or siloxane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
AT09174278T 2008-11-04 2009-10-28 Reaktiver uv-absorber, uv-schirm filmbildende härtbare beschichtungslösung, uv-schirmfilm und substrat mit uv-abschirmfunktion ATE527320T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008283039A JP4844768B2 (ja) 2008-11-04 2008-11-04 反応性紫外線吸収剤及び硬化性紫外線遮蔽膜形成用塗布液、紫外線遮蔽膜並びに該紫外線遮蔽膜が形成された紫外線遮蔽機能を有する基材

Publications (1)

Publication Number Publication Date
ATE527320T1 true ATE527320T1 (de) 2011-10-15

Family

ID=41478546

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09174278T ATE527320T1 (de) 2008-11-04 2009-10-28 Reaktiver uv-absorber, uv-schirm filmbildende härtbare beschichtungslösung, uv-schirmfilm und substrat mit uv-abschirmfunktion

Country Status (4)

Country Link
US (1) US8052900B2 (de)
EP (1) EP2182032B1 (de)
JP (1) JP4844768B2 (de)
AT (1) ATE527320T1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5625641B2 (ja) * 2010-09-06 2014-11-19 信越化学工業株式会社 自動車グレージング用プラスチック基材
JP5387534B2 (ja) * 2010-09-08 2014-01-15 信越化学工業株式会社 コーティング用組成物
TWI407090B (zh) * 2010-12-01 2013-09-01 Univ St Johns 薄膜附著力檢測裝置
US8525191B2 (en) * 2011-04-01 2013-09-03 Sabic Innovative Plastics Ip B.V. Optoelectronic devices and coatings therefore
JP5867192B2 (ja) * 2012-03-13 2016-02-24 信越化学工業株式会社 コーティング用組成物及びプラスチックレンズ
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
EP2786987B1 (de) 2013-04-01 2016-06-15 Shin-Etsu Chemical Co., Ltd. Reaktiver UV-Absorber, Herstellungsverfahren, Beschichtungszusammensetzung, und beschichteter Artikel
US20160090511A1 (en) 2013-06-04 2016-03-31 Shin-Etsu Chemical Co., Ltd. Silicone coating composition and coated article
JP5974984B2 (ja) * 2013-06-07 2016-08-23 株式会社安川電機 アーク溶接装置、アーク溶接システム及びアーク溶接方法
JP6176163B2 (ja) * 2014-03-25 2017-08-09 信越化学工業株式会社 有機ケイ素化合物及び接着性組成物並びに物品
JP6361624B2 (ja) 2014-10-17 2018-07-25 信越化学工業株式会社 活性エネルギー線硬化型シリコーンコーティング組成物及び被覆物品
CN105907171B (zh) * 2016-05-12 2019-07-16 江苏科技大学 一种耐紫外线耐热助剂及包含其的用于pvc层的凹版油墨组合物
JP7212775B2 (ja) * 2018-11-15 2023-01-25 中国科学院大▲連▼化学物理研究所 高分子紫外線吸収剤およびその製造方法および使用
CN119585376A (zh) * 2022-07-26 2025-03-07 信越化学工业株式会社 底漆组合物和被覆物品

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278804A (en) 1980-05-30 1981-07-14 General Electric Company Ultraviolet light absorbing agents and compositions and articles containing same
US4321400A (en) 1980-05-30 1982-03-23 General Electric Company Ultraviolet light absorbing agents and compositions and articles containing same
US4390660A (en) * 1980-05-30 1983-06-28 General Electric Company Ultraviolet light absorbing compositions
US4373061A (en) * 1980-05-30 1983-02-08 General Electric Company Silicone coating for unprimed plastic substrate and coated articles
US4436924A (en) * 1981-01-15 1984-03-13 General Electric Company Ultraviolet light absorbing agents and compositions and articles containing same
US4495360A (en) * 1982-04-30 1985-01-22 General Electric Company Ultraviolet light absorbing agents, method for making, compositions and articles containing same
US4525426A (en) 1982-04-30 1985-06-25 General Electric Company Ultraviolet light absorbing agents, method for making, compositions, and articles containing same
US4524426A (en) * 1983-04-19 1985-06-18 Pitney Bowes Inc. Electronic postage meter controllable by mailing machine
JPH0570397A (ja) 1991-09-13 1993-03-23 Taoka Chem Co Ltd ポリヒドロキシベンゾフエノン類の製造法
US5391795A (en) 1994-02-18 1995-02-21 General Electric Company Silylated agents useful for absorbing ultraviolet light
JP2000160130A (ja) 1998-11-30 2000-06-13 Shigeki Iida 硬化性紫外線吸収剤、紫外線遮蔽膜形成用塗布液およびこれを用いた紫外線遮蔽膜
US6497964B1 (en) * 1999-07-22 2002-12-24 Shin-Etsu Chemical Co., Ltd. Coating compositions and method for the surface protection of plastic substrate
JP4092522B2 (ja) * 1999-09-28 2008-05-28 信越化学工業株式会社 下塗り剤組成物及びプラスチック基体の表面保護方法
US6649212B2 (en) * 2001-07-30 2003-11-18 Guardian Industries Corporation Modified silicon-based UV absorbers useful in crosslinkable polysiloxane coatings via sol-gel polymerization
WO2005120440A1 (de) * 2004-06-08 2005-12-22 Merck Patent Gmbh Partikel, funktionalisiert mit organischen verbindungen

Also Published As

Publication number Publication date
JP2010111715A (ja) 2010-05-20
EP2182032B1 (de) 2011-10-05
JP4844768B2 (ja) 2011-12-28
EP2182032A1 (de) 2010-05-05
US20100108960A1 (en) 2010-05-06
US8052900B2 (en) 2011-11-08

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