ATE532099T1 - Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat - Google Patents

Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat

Info

Publication number
ATE532099T1
ATE532099T1 AT03727761T AT03727761T ATE532099T1 AT E532099 T1 ATE532099 T1 AT E532099T1 AT 03727761 T AT03727761 T AT 03727761T AT 03727761 T AT03727761 T AT 03727761T AT E532099 T1 ATE532099 T1 AT E532099T1
Authority
AT
Austria
Prior art keywords
pattern
receiving surface
stamp
transferring
substrate
Prior art date
Application number
AT03727761T
Other languages
English (en)
Inventor
Marinus DONA
Martin Blees
Michel Decre
Eerd Patrick Van
Richard Schroerders
Teunis Heijmans
Chris Janssen
Peter Slikkerveer
Bas Rens
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE532099T1 publication Critical patent/ATE532099T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C17/00—Hand tools or apparatus using hand held tools, for applying liquids or other fluent materials to, for spreading applied liquids or other fluent materials on, or for partially removing applied liquids or other fluent materials from, surfaces
    • B05C17/06—Stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
    • B05C1/027—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles only at particular parts of the articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Printing Methods (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Manufacturing Optical Record Carriers (AREA)
AT03727761T 2002-05-27 2003-05-26 Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat ATE532099T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02077087 2002-05-27
EP02077079 2002-05-27
PCT/IB2003/002003 WO2003099463A2 (en) 2002-05-27 2003-05-26 Method and device for transferring a pattern from a stamp to a substrate

Publications (1)

Publication Number Publication Date
ATE532099T1 true ATE532099T1 (de) 2011-11-15

Family

ID=29585707

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03727761T ATE532099T1 (de) 2002-05-27 2003-05-26 Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat

Country Status (8)

Country Link
US (1) US7296519B2 (de)
EP (1) EP1511632B1 (de)
JP (1) JP4639081B2 (de)
KR (1) KR100981692B1 (de)
CN (1) CN100358728C (de)
AT (1) ATE532099T1 (de)
AU (1) AU2003232962A1 (de)
WO (1) WO2003099463A2 (de)

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JP4340086B2 (ja) * 2003-03-20 2009-10-07 株式会社日立製作所 ナノプリント用スタンパ、及び微細構造転写方法
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
US7632087B2 (en) * 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
US6981445B2 (en) * 2003-12-24 2006-01-03 Axela Biosensors Inc. Method and apparatus for micro-contact printing
US7195733B2 (en) * 2004-04-27 2007-03-27 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
WO2005109535A2 (en) * 2004-05-06 2005-11-17 Koninklijke Philips Electronics N.V. A method of manufacturing a thermoelectric device
KR20070029762A (ko) * 2004-06-30 2007-03-14 코닌클리케 필립스 일렉트로닉스 엔.브이. 화학적으로 패터닝된 표면을 구비한 소프트 리소그라피스탬프
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
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EP1669196B1 (de) * 2004-12-10 2008-05-21 ESSILOR INTERNATIONAL (Compagnie Générale d'Optique) Stempel zum Auftragen eines Motivs, Verfahren zur Stempelherstellung und Verfahren zur Herstellung eines Objekts anhand von diesem Stempel
US7410591B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
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JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
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CN104317161A (zh) 2005-12-08 2015-01-28 分子制模股份有限公司 用于衬底双面图案形成的方法和系统
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JP4449949B2 (ja) * 2006-07-18 2010-04-14 セイコーエプソン株式会社 表面エネルギー差バンクの形成方法、パターンの形成方法、バンク構造、電子回路、電子デバイス、電子機器、及びスタンプ
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CN107407868B (zh) * 2014-11-03 2021-08-03 武汉大学 一种用于毛细纳米印刷的装置和使用该装置进行毛细纳米印刷的方法及其应用
RU2745059C2 (ru) 2016-04-06 2021-03-18 Конинклейке Филипс Н.В. Штамп для импринт-литографии и способ его изготовления и использования
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BR112019001453B1 (pt) * 2016-07-27 2023-02-07 Koninklijke Philips N.V. Método de fabricação de uma estampa à base de poliorganossiloxano, estampa à base de poliorganossiloxano, uso da mesma e método de formação de uma camada dotada de um padrão
CN107215111B (zh) * 2017-06-14 2023-03-28 浙江大学 一种磁控转印印章及磁控转移印刷方法
KR20210087998A (ko) 2018-11-14 2021-07-13 코닌클리케 필립스 엔.브이. 공압 시스템, 임프린트 장치 및 그의 용도
CN113853671B (zh) * 2019-05-22 2025-09-16 维耶尔公司 用于将器件或图案转移到基板的系统和方法
CN111430272B (zh) * 2020-03-09 2023-02-03 广东工业大学 单类和多类微小物体悬浮定向移动及自主装巨量转移方法
JP7732073B2 (ja) 2021-07-21 2025-09-01 コーニンクレッカ フィリップス エヌ ヴェ インプリント装置
EP4123376A1 (de) * 2021-07-21 2023-01-25 Koninklijke Philips N.V. Prägevorrichtung
US12259660B2 (en) * 2021-10-26 2025-03-25 Industrial Technology Research Institute Inspection method and inspection platform for lithography
EP4390540A1 (de) 2022-12-19 2024-06-26 Koninklijke Philips N.V. Ausrichtungsverfahren
EP4390539A1 (de) 2022-12-19 2024-06-26 Koninklijke Philips N.V. Ausrichtungsverfahren für imprintverfahren
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Also Published As

Publication number Publication date
KR20050016441A (ko) 2005-02-21
CN1665684A (zh) 2005-09-07
KR100981692B1 (ko) 2010-09-13
CN100358728C (zh) 2008-01-02
US20050173049A1 (en) 2005-08-11
AU2003232962A8 (en) 2003-12-12
WO2003099463A3 (en) 2004-09-16
WO2003099463A2 (en) 2003-12-04
AU2003232962A1 (en) 2003-12-12
EP1511632B1 (de) 2011-11-02
US7296519B2 (en) 2007-11-20
JP4639081B2 (ja) 2011-02-23
JP2005527406A (ja) 2005-09-15
EP1511632A2 (de) 2005-03-09

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