ATE532099T1 - Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat - Google Patents

Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat

Info

Publication number
ATE532099T1
ATE532099T1 AT03727761T AT03727761T ATE532099T1 AT E532099 T1 ATE532099 T1 AT E532099T1 AT 03727761 T AT03727761 T AT 03727761T AT 03727761 T AT03727761 T AT 03727761T AT E532099 T1 ATE532099 T1 AT E532099T1
Authority
AT
Austria
Prior art keywords
pattern
receiving surface
stamp
transferring
substrate
Prior art date
Application number
AT03727761T
Other languages
English (en)
Inventor
Marinus DONA
Martin Blees
Michel Decre
Eerd Patrick Van
Richard Schroerders
Teunis Heijmans
Chris Janssen
Peter Slikkerveer
Bas Rens
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE532099T1 publication Critical patent/ATE532099T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C17/00—Hand tools or apparatus using hand held tools, for applying liquids or other fluent materials to, for spreading applied liquids or other fluent materials on, or for partially removing applied liquids or other fluent materials from, surfaces
    • B05C17/06—Stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
    • B05C1/027—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles only at particular parts of the articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Printing Methods (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Manufacturing Optical Record Carriers (AREA)
AT03727761T 2002-05-27 2003-05-26 Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat ATE532099T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02077087 2002-05-27
EP02077079 2002-05-27
PCT/IB2003/002003 WO2003099463A2 (en) 2002-05-27 2003-05-26 Method and device for transferring a pattern from a stamp to a substrate

Publications (1)

Publication Number Publication Date
ATE532099T1 true ATE532099T1 (de) 2011-11-15

Family

ID=29585707

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03727761T ATE532099T1 (de) 2002-05-27 2003-05-26 Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat

Country Status (8)

Country Link
US (1) US7296519B2 (de)
EP (1) EP1511632B1 (de)
JP (1) JP4639081B2 (de)
KR (1) KR100981692B1 (de)
CN (1) CN100358728C (de)
AT (1) ATE532099T1 (de)
AU (1) AU2003232962A1 (de)
WO (1) WO2003099463A2 (de)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4340086B2 (ja) * 2003-03-20 2009-10-07 株式会社日立製作所 ナノプリント用スタンパ、及び微細構造転写方法
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
US7632087B2 (en) * 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
US6981445B2 (en) * 2003-12-24 2006-01-03 Axela Biosensors Inc. Method and apparatus for micro-contact printing
US7195733B2 (en) * 2004-04-27 2007-03-27 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
WO2005109535A2 (en) * 2004-05-06 2005-11-17 Koninklijke Philips Electronics N.V. A method of manufacturing a thermoelectric device
EP1763704A2 (de) * 2004-06-30 2007-03-21 Koninklijke Philips Electronics N.V. Weicher lithographischer stempel mit einer chemisch strukturierten oberfläche
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
WO2006043244A1 (en) 2004-10-22 2006-04-27 Koninklijke Philips Electronics N.V. Roller micro-contact printer with pressure control
WO2006061741A2 (en) 2004-12-06 2006-06-15 Koninklijke Philips Electronics N.V. Etchant solutions and additives therefor
EP1669196B1 (de) * 2004-12-10 2008-05-21 ESSILOR INTERNATIONAL (Compagnie Générale d'Optique) Stempel zum Auftragen eines Motivs, Verfahren zur Stempelherstellung und Verfahren zur Herstellung eines Objekts anhand von diesem Stempel
US7331283B2 (en) 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7363854B2 (en) 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US7409759B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US7410591B2 (en) 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7399422B2 (en) 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
WO2006083518A2 (en) * 2005-01-31 2006-08-10 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
JP5180820B2 (ja) 2005-05-03 2013-04-10 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ スタンプから基板にパターンを転写する方法及び装置
JP4596981B2 (ja) * 2005-05-24 2010-12-15 株式会社日立ハイテクノロジーズ インプリント装置、及び微細構造転写方法
US20080202360A1 (en) * 2005-06-13 2008-08-28 Korea Institute Of Machinery & Materials Imprinting Apparatus For Forming Pattern at Uniform Contact by Additional Constant Pressure
US20070178237A1 (en) * 2005-08-02 2007-08-02 Shin Dong M Method for patterning coatings
US20070035717A1 (en) * 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
TWI345804B (en) * 2005-08-17 2011-07-21 Lg Chemical Ltd Patterning method using coatings containing ionic components
EP1764648B1 (de) 2005-09-14 2012-05-23 Thallner, Erich, Dipl.-Ing. Stempel mit einer Nanostempelstruktur sowie Vorrichtung und Verfahren zu dessen Herstellung
US7677877B2 (en) 2005-11-04 2010-03-16 Asml Netherlands B.V. Imprint lithography
JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US7707937B2 (en) * 2005-12-15 2010-05-04 Palo Alto Research Center Incorporated Digital impression printing system
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP4814682B2 (ja) * 2006-04-18 2011-11-16 株式会社日立ハイテクノロジーズ 微細構造パターンの転写方法及び転写装置
JP4854383B2 (ja) * 2006-05-15 2012-01-18 アピックヤマダ株式会社 インプリント方法およびナノ・インプリント装置
JP4996150B2 (ja) * 2006-07-07 2012-08-08 株式会社日立ハイテクノロジーズ 微細構造転写装置および微細構造転写方法
JP4449949B2 (ja) * 2006-07-18 2010-04-14 セイコーエプソン株式会社 表面エネルギー差バンクの形成方法、パターンの形成方法、バンク構造、電子回路、電子デバイス、電子機器、及びスタンプ
US7946837B2 (en) 2006-10-06 2011-05-24 Asml Netherlands B.V. Imprint lithography
WO2008068701A2 (en) * 2006-12-04 2008-06-12 Koninklijke Philips Electronics N.V. Method and apparatus for applying a sheet to a substrate
CN101583436B (zh) * 2007-01-16 2014-05-07 皇家飞利浦电子股份有限公司 用于挠性板件和基板接触的方法和系统
GB0701909D0 (en) * 2007-01-31 2007-03-14 Imp Innovations Ltd Deposition Of Organic Layers
CA2682928A1 (en) 2007-04-19 2008-10-30 Basf Se Method for forming a pattern on a substrate and electronic device formed thereby
US20080309900A1 (en) * 2007-06-12 2008-12-18 Micron Technology, Inc. Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure
JP5041214B2 (ja) * 2007-06-15 2012-10-03 ソニー株式会社 金属薄膜の形成方法および電子デバイスの製造方法
JP5045263B2 (ja) * 2007-06-20 2012-10-10 ソニー株式会社 印刷装置および印刷方法
NL1036034A1 (nl) 2007-10-11 2009-04-15 Asml Netherlands Bv Imprint lithography.
GB2453766A (en) * 2007-10-18 2009-04-22 Novalia Ltd Method of fabricating an electronic device
CN103365077B (zh) 2008-06-06 2016-06-08 皇家飞利浦电子股份有限公司 用于软光刻的硅酮橡胶材料
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
US8462325B2 (en) 2008-10-10 2013-06-11 Koninklijke Philips Electronics N.V. Light directionality sensor
JP5261845B2 (ja) * 2008-10-28 2013-08-14 株式会社ブイ・テクノロジー 欠陥修正方法
US8506867B2 (en) * 2008-11-19 2013-08-13 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
JP2011005773A (ja) * 2009-06-26 2011-01-13 Fuji Electric Device Technology Co Ltd インプリント用スタンパおよびインプリント装置
US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
JP5843784B2 (ja) 2009-12-22 2016-01-13 スリーエム イノベイティブ プロパティズ カンパニー 加圧ローラーを使用するマイクロコンタクトプリンティングのための装置及び方法
CN101807004B (zh) * 2010-03-08 2012-07-11 彩虹集团电子股份有限公司 一种用于彩色显像管网版生产的工作版的制做方法
JP5618588B2 (ja) * 2010-03-24 2014-11-05 キヤノン株式会社 インプリント方法
US9765934B2 (en) 2011-05-16 2017-09-19 The Board Of Trustees Of The University Of Illinois Thermally managed LED arrays assembled by printing
DE102011054789A1 (de) * 2011-10-25 2013-04-25 Universität Kassel Nano-Formgebungsstruktur
JP6086675B2 (ja) * 2011-11-30 2017-03-01 株式会社Ｓｃｒｅｅｎホールディングス 印刷装置および印刷方法
JP5759348B2 (ja) * 2011-11-30 2015-08-05 株式会社Ｓｃｒｅｅｎホールディングス パターン形成装置およびパターン形成方法
JP5925505B2 (ja) * 2012-02-03 2016-05-25 セーレン株式会社 微細ドットパターンの印刷方法
CN103373094A (zh) * 2012-04-11 2013-10-30 得利环球有限公司 微接触印刷设备及方法
CN102866582B (zh) * 2012-09-29 2014-09-10 兰红波 一种用于高亮度led图形化的纳米压印装置和方法
JP6207997B2 (ja) * 2013-01-30 2017-10-04 株式会社Ｓｃｒｅｅｎホールディングス パターン形成装置およびパターン形成方法
US10088747B2 (en) * 2014-03-31 2018-10-02 Koninklijke Philips N.V. Imprinting method, computer program product and apparatus for the same
RU2701780C2 (ru) * 2014-09-22 2019-10-01 Конинклейке Филипс Н.В. Способ переноса, а также устройство и компьютерный программный продукт для его осуществления
EP3215895B1 (de) * 2014-11-03 2022-02-23 Universität Osnabrück Verfahren zur durchführung eines kapillar-nanodrucks, feld von tintentropfen und feld von drähten erhältlich nach dem verfahren
KR102331438B1 (ko) 2016-04-06 2021-11-26 코닌클리케 필립스 엔.브이. 임프린트 리소그래피 스탬프, 이의 제조 방법 및 사용 방법
CN116736631A (zh) 2016-07-14 2023-09-12 莫福托尼克斯控股有限公司 用于使用柔性压模压印不连续基板的设备
US11338477B2 (en) * 2016-07-27 2022-05-24 Koninklijke Philips N.V. Polyorganosiloxane-based stamp manufacturing method, polyorganosiloxane-based stamp, use of the same for a printing process, and an imprinting method using the same
CN107215111B (zh) * 2017-06-14 2023-03-28 浙江大学 一种磁控转印印章及磁控转移印刷方法
WO2020099265A1 (en) 2018-11-14 2020-05-22 Koninklijke Philips N.V. Pneumatic system, imprint apparatus and use thereof
US20220223451A1 (en) * 2019-05-22 2022-07-14 Vuereal Inc. Systems and methods for transferring devices or patterns to a substrate
CN111430272B (zh) * 2020-03-09 2023-02-03 广东工业大学 单类和多类微小物体悬浮定向移动及自主装巨量转移方法
EP4123376A1 (de) * 2021-07-21 2023-01-25 Koninklijke Philips N.V. Prägevorrichtung
US20240329520A1 (en) 2021-07-21 2024-10-03 Koninklijke Philips N.V. Imprinting apparatus
US12259660B2 (en) * 2021-10-26 2025-03-25 Industrial Technology Research Institute Inspection method and inspection platform for lithography
EP4390539A1 (de) 2022-12-19 2024-06-26 Koninklijke Philips N.V. Ausrichtungsverfahren für imprintverfahren
EP4390540A1 (de) 2022-12-19 2024-06-26 Koninklijke Philips N.V. Ausrichtungsverfahren
US20240427236A1 (en) * 2023-06-26 2024-12-26 Google Llc Process control pattern to improve nanoimprint detaching process

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE94221C (de) *
US1527921A (en) 1923-05-22 1925-02-24 Auto Mark Corp Printing device
DE1103357B (de) * 1955-01-24 1961-03-30 Konrad Elsaesser Vorrichtung zum Bedrucken oder Bestempeln von Markenetiketten
GB1005502A (en) * 1963-04-17 1965-09-22 Ellicock & Healy Ltd Improvements in or relating to printing blocks for printing machines
US5352651A (en) * 1992-12-23 1994-10-04 Minnesota Mining And Manufacturing Company Nanostructured imaging transfer element
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
WO1997006013A1 (en) * 1995-08-04 1997-02-20 International Business Machines Corporation Lithographic surface or thin layer modification
EP0784542B1 (de) * 1995-08-04 2001-11-28 International Business Machines Corporation Stempel für lithographie-verfahren
JPH09263028A (ja) * 1996-01-25 1997-10-07 Hiroyuki Koike 回転式印字器及び回転式印字器に用いる帯状体の製造方法
US5669303A (en) * 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6129016A (en) * 1998-04-03 2000-10-10 Rehkemper; Steven Stamping toy having indexing means
US20020043170A1 (en) * 2000-01-10 2002-04-18 Rafael Bronstein System and method for preparing and utilizing a printing member having magnetic particles therein
DE60118843T2 (de) * 2000-02-07 2006-11-30 Koninklijke Philips Electronics N.V. Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat
JP2002273996A (ja) * 2001-03-21 2002-09-25 Yamahachi Chemical Co Ltd 複数の印面を有する液浸透式スタンプ
AU2003217184A1 (en) * 2002-01-11 2003-09-02 Massachusetts Institute Of Technology Microcontact printing
US7037458B2 (en) * 2003-10-23 2006-05-02 Intel Corporation Progressive stamping apparatus and method
KR100585951B1 (ko) * 2004-02-18 2006-06-01 한국기계연구원 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치

Also Published As

Publication number Publication date
KR100981692B1 (ko) 2010-09-13
WO2003099463A3 (en) 2004-09-16
US20050173049A1 (en) 2005-08-11
JP4639081B2 (ja) 2011-02-23
EP1511632B1 (de) 2011-11-02
AU2003232962A1 (en) 2003-12-12
JP2005527406A (ja) 2005-09-15
CN1665684A (zh) 2005-09-07
CN100358728C (zh) 2008-01-02
EP1511632A2 (de) 2005-03-09
WO2003099463A2 (en) 2003-12-04
KR20050016441A (ko) 2005-02-21
US7296519B2 (en) 2007-11-20
AU2003232962A8 (en) 2003-12-12

Similar Documents

Publication Publication Date Title
ATE532099T1 (de) Verfahren und vorrichtung zur übertragung eines musters von einem stempel auf ein substrat
DE69007733D1 (de) Vorrichtung und verfahren zur behandlung eines flachen, scheibenförmigen substrates unter niedrigem druck.
ATE549294T1 (de) Vorrichtung und verfahren zum transfer von mustern mit zwischenstempel
EP1357590A3 (de) Verfahren und Vorrichtung zur Herstellung von Halbleiterbauelementen
DE60211951D1 (de) Vorrichtung und verfahren zur herstellung eines produkts durch freiformen
DE60122578D1 (de) Verfahren und vorrichtung zur auswahl von tientenstrahldruck parametern
DE60033084D1 (de) Vorrichtung und Verfahren zur Beschichtung einer Metallschicht auf die Oberfläche einer Keimschicht eines Halbleiterwafers
WO2003096123A8 (en) Reversal imprint technique
TW200520112A (en) Method for production of a film
DE60018598D1 (de) Verfahren und vorrichtung zur beschichtung eines substrates
DE68926361D1 (de) Verfahren und Vorrichtung zur Aufbringung einer dünnen Schicht auf ein Substrat unter Druck
TW200628236A (en) Apparatus and method for processing a substrate
DE69032227D1 (de) Verfahren und vorrichtung zur herstellung eines bedruckten und geprägten bodenbelags
TW200505617A (en) Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate
EP1726991A3 (de) Mikrokontaktdruckmodul
DE19983807T1 (de) Verfahren und Vorrichtung zur Oberflächemmarkierung eines Substrats
DE69612452D1 (de) Verfahren und Vorrichtung zum Entfernen von Beschichtungen aus der Oberfläche einer Glasplatte
DE59913661D1 (de) Vorrichtung und Verfahren zum Beschichten eines ebenen Substrates
GR1004059B (el) Κατασκευη βιοπολυμερικων σχηματων μεσω εναποθεσης με λειζερ.
ATE243621T1 (de) Verfahren und vorrichtung zum aufbringen eines mediums auf ein substrat, system mit mehreren dieser vorrichtungenund anwendung dieser vorrichtung, verfahren und system
DE60110510D1 (de) Vorrichtung und Verfahren zur Substratbeschichtung
DE3667498D1 (de) Verfahren zur metallbeschichtung eines organischen substrates.
ATE102150T1 (de) Verfahren zum uebertragen eines dekors von einer praegefolie auf ein ebenflaechiges substrat und vorrichtung zur durchfuehrung des verfahrens.
DE60218797D1 (de) Vorrichtung und Verfahren zum Beschichten von lichtempfindlichem Substrat
DE69008359D1 (de) Verfahren zur ablagerung von deckschichten auf anodisierbaren metallsubstraten und dadurch erhaltene produkte.