ATE534678T1 - Verfahren zur herstellung von dünnem film - Google Patents

Verfahren zur herstellung von dünnem film

Info

Publication number
ATE534678T1
ATE534678T1 AT04723007T AT04723007T ATE534678T1 AT E534678 T1 ATE534678 T1 AT E534678T1 AT 04723007 T AT04723007 T AT 04723007T AT 04723007 T AT04723007 T AT 04723007T AT E534678 T1 ATE534678 T1 AT E534678T1
Authority
AT
Austria
Prior art keywords
thin film
producing thin
vinylidene fluoride
fluoride homopolymer
polymerization
Prior art date
Application number
AT04723007T
Other languages
English (en)
Inventor
Takayuki Araki
Tetsuhiro Kodani
Original Assignee
Daikin Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Ind Ltd filed Critical Daikin Ind Ltd
Application granted granted Critical
Publication of ATE534678T1 publication Critical patent/ATE534678T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F114/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F114/18—Monomers containing fluorine
    • C08F114/22—Vinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Insulating Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
AT04723007T 2003-03-26 2004-03-24 Verfahren zur herstellung von dünnem film ATE534678T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003086179 2003-03-26
JP2003422989 2003-12-19
PCT/JP2004/004028 WO2004085498A1 (ja) 2003-03-26 2004-03-24 薄膜の形成方法

Publications (1)

Publication Number Publication Date
ATE534678T1 true ATE534678T1 (de) 2011-12-15

Family

ID=44951550

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04723007T ATE534678T1 (de) 2003-03-26 2004-03-24 Verfahren zur herstellung von dünnem film

Country Status (5)

Country Link
US (3) US7655742B2 (de)
EP (3) EP1607417B1 (de)
JP (1) JP3867709B2 (de)
AT (1) ATE534678T1 (de)
WO (1) WO2004085498A1 (de)

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WO2007126854A2 (en) * 2006-03-28 2007-11-08 Alfred E. Mann Institute For Biomedical Engineering At The University Of Southern California Biomimetic tactile sensor
KR101409712B1 (ko) 2006-08-10 2014-06-19 가부시키가이샤 구라레 불화비닐리덴계 수지로 이루어지는 다공막 및 그 제조 방법
JP4881774B2 (ja) * 2007-03-26 2012-02-22 国立大学法人神戸大学 薄膜形成装置、薄膜形成方法、分極反転可能化方法、強誘電特性測定方法
US8272278B2 (en) 2007-03-28 2012-09-25 University Of Southern California Enhancements to improve the function of a biomimetic tactile sensor
JP5005592B2 (ja) * 2008-03-25 2012-08-22 ダイキン工業株式会社 積層体の製造方法、積層体およびビニリデンフルオライド系オリゴマー膜
EP2479710B1 (de) 2008-04-25 2018-09-26 Aware, Inc. Biometrische Identifizierung und Bestätigung
US20100092759A1 (en) * 2008-10-13 2010-04-15 Hua Fan Fluoropolymer/particulate filled protective sheet
US8623148B2 (en) * 2009-09-10 2014-01-07 Matheson Tri-Gas, Inc. NF3 chamber clean additive
CN103524295B (zh) * 2013-09-18 2015-05-06 巨化集团技术中心 一种1,1-二氢全氟碘代烷的合成方法
CN104448076A (zh) * 2014-12-06 2015-03-25 常熟丽源膜科技有限公司 聚偏氟乙烯的生产方法
KR101814921B1 (ko) 2015-10-02 2018-01-04 스미또모 가가꾸 가부시키가이샤 다공질층, 적층체, 다공질층을 포함하는 비수 전해액 이차 전지용 부재, 및 다공질층을 포함하는 비수 전해액 이차 전지
JP6725290B2 (ja) 2016-03-31 2020-07-15 東邦化成株式会社 圧電ワイヤー及びその製造方法、並びにその圧電ワイヤーを備えた圧電装置
JP6647973B2 (ja) 2016-06-21 2020-02-14 住友化学株式会社 積層体
JP6755726B2 (ja) 2016-06-21 2020-09-16 住友化学株式会社 積層体
JP6736375B2 (ja) 2016-06-21 2020-08-05 住友化学株式会社 積層体
JP6754628B2 (ja) 2016-06-21 2020-09-16 住友化学株式会社 積層体
JP6758943B2 (ja) 2016-06-21 2020-09-23 住友化学株式会社 積層体
JP7074419B2 (ja) 2016-06-21 2022-05-24 住友化学株式会社 積層体
US11094997B2 (en) 2017-05-29 2021-08-17 Sumitomo Chemical Company, Limited Nonaqueous electrolyte secondary battery
JP6430623B1 (ja) 2017-12-19 2018-11-28 住友化学株式会社 非水電解液二次電池
JP6430617B1 (ja) 2017-12-19 2018-11-28 住友化学株式会社 非水電解液二次電池
US11205799B2 (en) 2017-12-19 2021-12-21 Sumitomo Chemical Company, Limited Nonaqueous electrolyte secondary battery
US11158907B2 (en) 2017-12-19 2021-10-26 Sumitomo Chemical Company, Limited Nonaqueous electrolyte secondary battery
JP6430618B1 (ja) 2017-12-19 2018-11-28 住友化学株式会社 非水電解液二次電池
JP6430621B1 (ja) 2017-12-19 2018-11-28 住友化学株式会社 非水電解液二次電池
CN110508802A (zh) * 2019-08-29 2019-11-29 南京理工大学 聚偏二氟乙烯包覆微/纳米铝粉的制备方法
JP7517101B2 (ja) * 2020-11-17 2024-07-17 株式会社プロテリアル 高分子圧電材料の品質管理方法、樹脂組成物の製造方法、ケーブル又はチューブの製造方法、圧電素子の製造方法、焦電型センサの製造方法、及び不揮発性薄膜メモリの製造方法
FR3128714A1 (fr) * 2021-10-29 2023-05-05 Arkema Inc. Vdf contenant un (co)polymère ayant une grande masse moléculaire par utilisation d’un nouveau procédé de polymérisation par précipitation

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JP3671634B2 (ja) * 1996-11-29 2005-07-13 ユニマテック株式会社 含フッ素エラストマーの製造方法
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Also Published As

Publication number Publication date
EP2395031A1 (de) 2011-12-14
WO2004085498A1 (ja) 2004-10-07
US20060014912A1 (en) 2006-01-19
EP2395030A1 (de) 2011-12-14
US8883947B2 (en) 2014-11-11
EP1607417A4 (de) 2009-06-03
EP2395030B1 (de) 2017-09-20
JP2005200623A (ja) 2005-07-28
EP1607417A1 (de) 2005-12-21
US8450439B2 (en) 2013-05-28
EP1607417B1 (de) 2011-11-23
JP3867709B2 (ja) 2007-01-10
US20130237677A1 (en) 2013-09-12
US7655742B2 (en) 2010-02-02
EP2395031B1 (de) 2017-09-13
US20100093962A1 (en) 2010-04-15

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