Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B81—MICROSTRUCTURAL TECHNOLOGY
  • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
  • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
  • B81C1/00388—Etch mask forming
  • B81C1/00412—Mask characterised by its behaviour during the etching process, e.g. soluble masks
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
  • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
  • H10P76/202—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials for lift-off processes
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
  • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

• Engineering & Computer Science (AREA)
• Manufacturing & Machinery (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Micromachines (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
• Application Of Or Painting With Fluid Materials (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Superconductors And Manufacturing Methods Therefor (AREA)
• Physical Vapour Deposition (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=31986049

Family Applications (1)

Country Status (12)

Families Citing this family (10)

Family Cites Families (11)

• 2002
  • 2002-09-12 IT IT000793A patent/ITTO20020793A1/it unknown
• 2003
  • 2003-09-11 US US10/527,670 patent/US7255799B2/en not_active Expired - Lifetime
  • 2003-09-11 JP JP2004535827A patent/JP4559859B2/ja not_active Expired - Lifetime
  • 2003-09-11 EP EP03795198A patent/EP1546028B8/de not_active Expired - Lifetime
  • 2003-09-11 WO PCT/IT2003/000545 patent/WO2004025726A2/en not_active Ceased
  • 2003-09-11 AT AT03795198T patent/ATE553063T1/de active
  • 2003-09-11 BR BR0314276-0A patent/BR0314276A/pt not_active IP Right Cessation
  • 2003-09-11 RU RU2005110686/28A patent/RU2334304C2/ru not_active IP Right Cessation
  • 2003-09-11 KR KR1020057004246A patent/KR100997940B1/ko not_active Expired - Lifetime
  • 2003-09-11 CN CNB03824005XA patent/CN100439233C/zh not_active Expired - Lifetime
  • 2003-09-11 AU AU2003265164A patent/AU2003265164B2/en not_active Ceased
  • 2003-09-11 CA CA2498669A patent/CA2498669C/en not_active Expired - Lifetime

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