ATE556098T1 - Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur - Google Patents

Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur

Info

Publication number
ATE556098T1
ATE556098T1 AT08711219T AT08711219T ATE556098T1 AT E556098 T1 ATE556098 T1 AT E556098T1 AT 08711219 T AT08711219 T AT 08711219T AT 08711219 T AT08711219 T AT 08711219T AT E556098 T1 ATE556098 T1 AT E556098T1
Authority
AT
Austria
Prior art keywords
compound
mass
producing
light
surface structure
Prior art date
Application number
AT08711219T
Other languages
English (en)
Inventor
Yasuhide Kawaguchi
Kentaro Tsunozaki
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE556098T1 publication Critical patent/ATE556098T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
AT08711219T 2007-06-20 2008-02-13 Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur ATE556098T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007162466 2007-06-20
PCT/JP2008/052373 WO2008155928A1 (ja) 2007-06-20 2008-02-13 光硬化性組成物および表面に微細パターンを有する成形体の製造方法

Publications (1)

Publication Number Publication Date
ATE556098T1 true ATE556098T1 (de) 2012-05-15

Family

ID=40156091

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08711219T ATE556098T1 (de) 2007-06-20 2008-02-13 Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur

Country Status (8)

Country Link
US (2) US8163813B2 (de)
EP (1) EP2159236B1 (de)
JP (1) JP5387406B2 (de)
KR (1) KR101431861B1 (de)
CN (1) CN101679568B (de)
AT (1) ATE556098T1 (de)
TW (1) TWI455951B (de)
WO (1) WO2008155928A1 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101416083A (zh) * 2006-04-07 2009-04-22 旭硝子株式会社 线栅型偏振器及其制造方法
WO2009041646A1 (ja) * 2007-09-28 2009-04-02 Asahi Glass Company, Limited 光硬化性組成物、微細パターン形成体の製造方法および光学素子
JP2009215179A (ja) * 2008-03-07 2009-09-24 Fujifilm Corp （メタ）アクリレート化合物、これを用いた硬化性組成物、光ナノインプリント用組成物、並びにこれらの硬化性組成物の硬化物およびその製造方法
KR20110002008A (ko) * 2008-04-03 2011-01-06 아사히 가라스 가부시키가이샤 와이어 그리드형 편광자 및 그 제조 방법
WO2009125751A1 (ja) * 2008-04-08 2009-10-15 旭硝子株式会社 ワイヤグリッド型偏光子の製造方法
KR101652680B1 (ko) * 2008-05-29 2016-08-31 아사히 가라스 가부시키가이샤 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법
EP2299299A4 (de) * 2008-07-10 2013-05-29 Asahi Glass Co Ltd Drahtgitterpolarisierer und verfahren zur herstellung dieses polarisierers
EP2357205A4 (de) * 2008-12-05 2013-11-20 Asahi Glass Co Ltd Lichthärtende zusammensetzung und herstellungsverfahren für einen formköper mit einem feinen muster auf der oberfläche
US20100215968A1 (en) * 2009-02-26 2010-08-26 Fields Lenwood L Electrically isolating polymer composition
US9978479B2 (en) 2009-02-26 2018-05-22 Corning Incorporated Electrically isolating polymer composition
JP5518538B2 (ja) * 2009-03-26 2014-06-11 富士フイルム株式会社 レジスト組成物、レジスト層、インプリント方法、パターン形成体、磁気記録媒体の製造方法、及び磁気記録媒体
JP5245164B2 (ja) * 2009-05-14 2013-07-24 公立大学法人首都大学東京 マイクロリアクターおよびマイクロリアクターの製造方法
JP5566639B2 (ja) * 2009-07-16 2014-08-06 富士フイルム株式会社 インプリント用硬化性組成物、硬化物およびパターン形成方法
JP5466705B2 (ja) 2009-08-26 2014-04-09 三井化学株式会社 フッ素含有環状オレフィンポリマー組成物、該組成物から得られた転写体およびその製造方法
JP5671302B2 (ja) * 2009-11-10 2015-02-18 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
JP5693925B2 (ja) * 2010-02-04 2015-04-01 丸善石油化学株式会社 樹脂型、成形体、及び成形体の製造方法
JP5681980B2 (ja) * 2010-03-01 2015-03-11 公立大学法人大阪府立大学 溶剤溶解型光硬化性組成物を用いた微細構造体の製造方法
WO2011125800A1 (ja) * 2010-03-31 2011-10-13 Jsr株式会社 ナノインプリント用硬化性組成物、半導体素子及びナノインプリント方法
CN103038860B (zh) * 2010-08-04 2016-05-18 旭硝子株式会社 光固化性组合物及表面具有微细图案的成形体的制造方法
TWI480324B (zh) * 2010-08-04 2015-04-11 Asahi Glass Co Ltd A photohardenable composition, and a molded article having a fine pattern on its surface
JP5905207B2 (ja) 2011-04-21 2016-04-20 丸善石油化学株式会社 金属不純物量の少ない半導体リソグラフィー用共重合体の製造方法及び該共重合体を製造するための重合開始剤の精製方法
US9504987B2 (en) * 2011-07-18 2016-11-29 New Jersey Institute Of Technology System and method for superabsorbent material
JP5696017B2 (ja) * 2011-09-27 2015-04-08 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
JP5959865B2 (ja) 2012-02-09 2016-08-02 キヤノン株式会社 光硬化物及びその製造方法
JP5794387B2 (ja) * 2012-04-10 2015-10-14 ダイキン工業株式会社 インプリント用樹脂モールド材料組成物
US20150072128A1 (en) * 2012-04-16 2015-03-12 Nissan Chemical Industries, Ltd. Flourine-containing highly branched polymer and polycarbonate resin composition containing the same
JP2017014303A (ja) * 2013-11-21 2017-01-19 旭硝子株式会社 硬化性組成物、硬化物、カメラモジュール、撮像装置の製造方法
TW201627431A (zh) * 2014-12-25 2016-08-01 富士軟片股份有限公司 壓印用光硬化性組成物、圖案形成方法及元件製造方法
CN107408495B (zh) 2015-03-20 2021-04-16 富士胶片株式会社 压印用固化性组合物、固化物、图案形成方法、光刻法、图案及光刻用掩模
JP6753038B2 (ja) * 2015-04-07 2020-09-09 三菱ケミカル株式会社 光硬化性組成物
WO2018173930A1 (ja) * 2017-03-23 2018-09-27 Ａｇｃ株式会社 インプリント用硬化性組成物、レプリカモールドおよびその製造方法
US11360385B1 (en) * 2018-07-24 2022-06-14 Magic Leap, Inc. Eyepiece assembly adhesion using a zero residual layer region
US11294278B1 (en) 2018-12-11 2022-04-05 Facebook Technologies, Llc Reducing adhesive failure during nanoimprint lithography demolding
US11262650B1 (en) * 2018-12-11 2022-03-01 Facebook Technologies, Llc Reducing adhesive failure during nanoimprint lithography demolding
JP7789789B2 (ja) * 2021-08-12 2025-12-22 ニッカ コリア カンパニー リミテッド フッ素系ポリマー、表面処理剤、繊維製品の製造方法、及び、繊維製品

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3681366D1 (de) * 1985-07-31 1991-10-17 Du Pont Optische beschichtungszusammensetzung.
CA1316725C (en) * 1988-01-15 1993-04-27 Dalen Eugene Keys Process of forming reflection holograms in photopolymerizable layers
US5004790A (en) * 1989-02-15 1991-04-02 Allied-Signal Inc. Fluorinated surfactant monomers for polymer surface modification
US5609990A (en) * 1995-02-08 1997-03-11 Imation Corp. Optical recording disk having a sealcoat layer
JP3605868B2 (ja) * 1995-03-01 2004-12-22 日本油脂株式会社 撥水・撥油性材料
DE19706515A1 (de) * 1997-02-19 1998-08-20 Inst Neue Mat Gemein Gmbh Hydroxylgruppen-arme organisch/anorganische Komposite, Verfahren zu deren Herstellung und deren Verwendung
EP1141054B1 (de) * 1998-12-11 2004-02-25 Biocompatibles UK Limited Vernetzte polymere und refraktionsvorrichtung aus diesen geformt
EP1352295B1 (de) 2000-10-12 2015-12-23 Board of Regents, The University of Texas System Schablone für die mikro- und nanodrucklithographie für zimmertemperatur und niedrigen druck
JP4003565B2 (ja) * 2002-07-19 2007-11-07 三菱化学株式会社 重合性組成物及びその硬化物
JP2004071934A (ja) 2002-08-08 2004-03-04 Kanegafuchi Chem Ind Co Ltd 微細パターンの製造方法および転写材料
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
US7050227B2 (en) * 2003-12-11 2006-05-23 3M Innovative Properties Company Composition for microstructured screens
JP2005338780A (ja) * 2004-04-28 2005-12-08 Omron Corp マイクロレンズ
WO2006030625A1 (ja) * 2004-09-16 2006-03-23 Asahi Glass Company, Limited 硬化性組成物、微細構造体の製造方法およびパターンの形成方法
JP5169213B2 (ja) * 2005-02-04 2013-03-27 ダイキン工業株式会社 硬化性組成物およびそれを硬化してなる光学部材
CN101160331B (zh) 2005-04-21 2010-12-15 旭硝子株式会社 光固化性组合物、精细图案形成体及其制造方法
JP2006306951A (ja) * 2005-04-27 2006-11-09 Mitsubishi Rayon Co Ltd アクリル系樹脂板の製造方法、並びにタッチパネル用重合性組成物、該重合性組成物を用いた透明基板、透明電極板およびタッチパネル
WO2007020901A1 (ja) * 2005-08-17 2007-02-22 Idemitsu Kosan Co., Ltd. 含フッ素アダマンタン誘導体、重合性基含有含フッ素アダマンタン誘導体及びそれを含有する樹脂組成物
JP4770354B2 (ja) * 2005-09-20 2011-09-14 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いたパターン形成方法
JP2007137998A (ja) * 2005-11-17 2007-06-07 Daikin Ind Ltd 硬化性組成物およびそれを硬化してなる光学材料
JP2007162466A (ja) 2005-12-09 2007-06-28 Denso Corp ソレノイド制御装置
JP2007178724A (ja) * 2005-12-28 2007-07-12 Mitsubishi Rayon Co Ltd 表面に微細凹凸構造を有する成形体の製造方法および反射防止物品
JP5249760B2 (ja) * 2006-08-04 2013-07-31 出光興産株式会社 アダマンタン構造含有重合性化合物、その製造方法及び樹脂組成物

Also Published As

Publication number Publication date
CN101679568A (zh) 2010-03-24
TW200916488A (en) 2009-04-16
US20100038831A1 (en) 2010-02-18
JP5387406B2 (ja) 2014-01-15
TWI455951B (zh) 2014-10-11
JPWO2008155928A1 (ja) 2010-08-26
EP2159236B1 (de) 2012-05-02
EP2159236A1 (de) 2010-03-03
US8163813B2 (en) 2012-04-24
US20120175821A1 (en) 2012-07-12
KR101431861B1 (ko) 2014-08-25
CN101679568B (zh) 2012-07-04
WO2008155928A1 (ja) 2008-12-24
EP2159236A4 (de) 2010-12-22
KR20100032358A (ko) 2010-03-25

Similar Documents

Publication Publication Date Title
ATE556098T1 (de) Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur
EP2357205A4 (de) Lichthärtende zusammensetzung und herstellungsverfahren für einen formköper mit einem feinen muster auf der oberfläche
JP7092284B2 (ja) 光硬化性組成物、義歯床及び有床義歯
GB201300311D0 (en) Composition for photocurable imprint, and method for formation of pattern using the composition
CN107533287B (zh) 聚合物组合物或预聚物组合物或者包含此类组合物的压花漆及其用途
ATE479731T1 (de) Tintenzusammensetzung, tintenstrahlaufzeichnungsverfahren, drucksachen, verfahren zur herstellung einer flachdruckplatte und flachdruckplatte
JP2016014885A5 (de)
ATE414732T1 (de) Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz
ATE552277T1 (de) Verfahren zur herstellung eines hartfilms oder einer beschichtung mit akzeptablem geruch aus einer kationisch vernetzbaren/polymerisierbaren zusammensetzung mit einem iodoniumborat
ATE322366T1 (de) Verfahren und form zum herstellen eines schichtförmigen teiles, insbesondere reaktionsspritzgiessverfahren zum herstellen einer polyurethanhaut
MY171909A (en) Printing diffraction gratings on paper and board
WO2009057479A1 (ja) 金型清掃用ゴム系組成物
ATE507969T1 (de) Verfahren zur herstellung einer flexographischen druckform
JP2015517018A5 (de)
ATE465188T1 (de) Verfahren zur herstellung von superabsorbern
EP1839843A3 (de) Verfahren zur Herstellung eines strukturierten Kunststoffbauteils
JP2009509007A5 (de)
JP2010506931A5 (de)
ATE535385T1 (de) Original-hochdruck-platte für lasergravur und daraus hergestellte hochdruck-platte
EP2561969A3 (de) Dekorschicht und Formverfahren in Giessform
JP2016134629A5 (de)
EP2700394A3 (de) Dentaler Haftvermittler für Hochleistungspolymere
DE50109287D1 (de) Selbstverstärkendes, thermoplastisch verformbares halbzeug, insbesondere für die herstellung von sanitärartikeln, verfahren zur herstellung sowie daraus hergestellte formkörper
WO2012167076A3 (en) Nanochannel-guided patterning for polymeric substrates
JP2008533228A5 (de)