ATE72679T1 - Methylenchloridzusammensetzung und deren verwendung fuer die photolackentschichtung. - Google Patents

Methylenchloridzusammensetzung und deren verwendung fuer die photolackentschichtung.

Info

Publication number
ATE72679T1
ATE72679T1 AT87401626T AT87401626T ATE72679T1 AT E72679 T1 ATE72679 T1 AT E72679T1 AT 87401626 T AT87401626 T AT 87401626T AT 87401626 T AT87401626 T AT 87401626T AT E72679 T1 ATE72679 T1 AT E72679T1
Authority
AT
Austria
Prior art keywords
methylene chloride
photocoating
chloride composition
composition
methanol
Prior art date
Application number
AT87401626T
Other languages
English (en)
Inventor
Michel Campos
Jean-Charles Boussaguet
Jean-Philippe Letullier
Original Assignee
Atochem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atochem filed Critical Atochem
Application granted granted Critical
Publication of ATE72679T1 publication Critical patent/ATE72679T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C07C17/42—Use of additives, e.g. for stabilisation
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02854—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons characterised by the stabilising or corrosion inhibiting additives
    • C23G5/02861—Oxygen-containing compounds
    • C23G5/0288—Epoxy compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/288—Removal of non-metallic coatings, e.g. for repairing
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Dental Preparations (AREA)
  • Polyurethanes Or Polyureas (AREA)
AT87401626T 1986-07-21 1987-07-09 Methylenchloridzusammensetzung und deren verwendung fuer die photolackentschichtung. ATE72679T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8610529A FR2601703B1 (fr) 1986-07-21 1986-07-21 Composition a base de chlorure de methylene - son utilisation pour l'enlevement des films photoresist
EP19870401626 EP0258079B1 (de) 1986-07-21 1987-07-09 Methylenchloridzusammensetzung und deren Verwendung für die Photolackentschichtung

Publications (1)

Publication Number Publication Date
ATE72679T1 true ATE72679T1 (de) 1992-03-15

Family

ID=9337579

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87401626T ATE72679T1 (de) 1986-07-21 1987-07-09 Methylenchloridzusammensetzung und deren verwendung fuer die photolackentschichtung.

Country Status (12)

Country Link
EP (1) EP0258079B1 (de)
JP (1) JPS6330848A (de)
AT (1) ATE72679T1 (de)
CA (1) CA1295205C (de)
DE (1) DE3776737D1 (de)
DK (1) DK170076B1 (de)
ES (1) ES2006203A6 (de)
FI (1) FI84630C (de)
FR (1) FR2601703B1 (de)
GR (1) GR3004213T3 (de)
IE (1) IE59867B1 (de)
NO (1) NO173617C (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3068622B2 (ja) * 1988-08-30 2000-07-24 キヤノン株式会社 画像処理装置
FR2661918B1 (fr) * 1990-05-10 1992-07-17 Atochem Composition nettoyante a base de 1,1,1,2,2-pentafluoro-3,3-dichloro-propane et de methyl tert-butyl ether.

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625763A (en) * 1968-12-04 1971-12-07 Bunker Ramo Conformal coating stripping method and composition
US3646229A (en) * 1970-07-13 1972-02-29 Dow Chemical Co Use of dimethoxymethane to inhibit a methylene chloride-aluminum reaction
CA1049567A (en) * 1973-02-23 1979-02-27 Diamond Shamrock Corporation Inhibition of aromatic compound degradation of methylene chloride
DE2716534A1 (de) * 1976-05-03 1977-12-01 Solvay Verfahren zur stabilisierung von methylenchlorid
US4438192A (en) * 1983-02-14 1984-03-20 The Dow Chemical Company Photoresist stripper composition and method of use
JPS6120946A (ja) * 1984-07-10 1986-01-29 Asahi Glass Co Ltd フォトレジスト剥離用組成物

Also Published As

Publication number Publication date
FI84630C (fi) 1991-12-27
FI873189A0 (fi) 1987-07-20
DK170076B1 (da) 1995-05-15
FR2601703A1 (fr) 1988-01-22
NO173617B (no) 1993-09-27
CA1295205C (fr) 1992-02-04
EP0258079A1 (de) 1988-03-02
ES2006203A6 (es) 1989-04-16
DK376787A (da) 1988-01-22
JPH0449939B2 (de) 1992-08-12
EP0258079B1 (de) 1992-02-19
DE3776737D1 (de) 1992-03-26
FI84630B (fi) 1991-09-13
FR2601703B1 (fr) 1993-05-07
DK376787D0 (da) 1987-07-20
GR3004213T3 (de) 1993-03-31
JPS6330848A (ja) 1988-02-09
NO173617C (no) 1994-01-05
IE59867B1 (en) 1994-04-20
NO873030L (no) 1988-01-22
NO873030D0 (no) 1987-07-20
IE871958L (en) 1989-01-21
FI873189L (fi) 1988-01-22

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Legal Events

Date Code Title Description
EEFA Change of the company name
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee