ATE76112T1 - Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei maessiger temperatur. - Google Patents

Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei maessiger temperatur.

Info

Publication number: ATE76112T1
Authority: AT; Austria
Prior art keywords: moderate temperature; equipment; high strength; deposition; thermal deposition
Prior art date: 1987-03-27

Application number

AT88902870T

Other languages

English (en)

Inventor

Lionel Vandenbulcke

Jean-Paul Piton

Beatrice Ladouce

Original Assignee

Chimie Metal

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-03-27

Filing date

1988-03-21

Publication date

1992-05-15

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9349513&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE76112(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1988-03-21 Application filed by Chimie Metal filed Critical Chimie Metal

1992-05-15 Application granted granted Critical

1992-05-15 Publication of ATE76112T1 publication Critical patent/ATE76112T1/de

Links

238000000034 method Methods 0.000 title abstract 2
238000002207 thermal evaporation Methods 0.000 title 1
238000000576 coating method Methods 0.000 abstract 2
238000000151 deposition Methods 0.000 abstract 2
230000008021 deposition Effects 0.000 abstract 2
239000007789 gas Substances 0.000 abstract 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
238000005234 chemical deposition Methods 0.000 abstract 1
239000011248 coating agent Substances 0.000 abstract 1
150000001875 compounds Chemical class 0.000 abstract 1
239000001257 hydrogen Substances 0.000 abstract 1
229910052739 hydrogen Inorganic materials 0.000 abstract 1
239000000203 mixture Substances 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/38—Borides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Landscapes

Chemical & Material Sciences (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Electrochemistry (AREA)
Chemical Vapour Deposition (AREA)
Agricultural Chemicals And Associated Chemicals (AREA)

AT88902870T 1987-03-27 1988-03-21 Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei maessiger temperatur. ATE76112T1 (de)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
FR8704320A FR2612946B1 (fr)	1987-03-27	1987-03-27	Procede et installation pour le depot chimique de revetements ultradurs a temperature moderee
EP88902870A EP0362207B1 (de)	1987-03-27	1988-03-21	Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei mässiger temperatur
PCT/FR1988/000149 WO1988007596A1 (fr)	1987-03-27	1988-03-21	Procede et installation pour le depot chimique de revetements ultradurs a temperature moderee

Publications (1)

Publication Number	Publication Date
ATE76112T1 true ATE76112T1 (de)	1992-05-15

Family

ID=9349513

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT88902870T ATE76112T1 (de)	1987-03-27	1988-03-21	Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei maessiger temperatur.

Country Status (5)

Country	Link
EP (1)	EP0362207B1 (de)
AT (1)	ATE76112T1 (de)
DE (1)	DE3871145D1 (de)
FR (1)	FR2612946B1 (de)
WO (1)	WO1988007596A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4898778A (en) *	1988-11-28	1990-02-06	Avco Corporation	Silicon carbide monofilaments for improved composite properties and method
US5139825A (en) *	1989-11-30	1992-08-18	President And Fellows Of Harvard College	Process for chemical vapor deposition of transition metal nitrides
EP0577678B1 (de) *	1991-03-27	1995-03-08	Widia GmbH	Verbundkörper, verwendung des verbundkörpers und verfahren zu seiner herstellung
DE10258282A1 (de) *	2002-12-13	2004-07-08	Walter Ag	CVD-Beschichtungsverfarhen für ZrBx CyNz-Schichten (x+y+z = 1) sowie beschichtetes Schneidwerkzeug
JP4576201B2 (ja) *	2004-10-26	2010-11-04	創世理工株式会社	三酸化モリブデン層の作製方法
DE102006023046B4 (de) *	2006-05-17	2009-02-05	Qimonda Ag	Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors
EP3519605B1 (de) *	2016-09-28	2020-08-05	Commissariat à l'Énergie Atomique et aux Énergies Alternatives	Nukleare komponente mit amorpher crc-beschichtung, verfahren zur herstellung davon mittels dli-mocvd und verwendung davon zur kontrolle von oxidation/hydridation
JP7198746B2 (ja)	2016-09-28	2023-01-04	コミサーリャアレナジーアトミックエーオーエナジーアルタナティブ	金属基材を有する原子炉コンポーネント、ｄｌｉ－ｍｏｃｖｄによる製造方法および酸化／水素化に対する使用
FR3056601B1 (fr) *	2016-09-28	2020-12-25	Commissariat Energie Atomique	Procede de fabrication d'un composant nucleaire a substrat metallique par dli-mocvd
FR3056815B1 (fr) *	2016-09-28	2021-01-29	Commissariat Energie Atomique	Composant nucleaire a substrat metallique et utilisations contre l'oxydation/hydruration.
WO2018060644A1 (fr)	2016-09-28	2018-04-05	Commissariat A L'energie Atomique Et Aux Energies Alternatives	Composant nucléaire composite, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
WO2018060643A1 (fr)	2016-09-28	2018-04-05	Commissariat A L'energie Atomique Et Aux Energies Alternatives	Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
FR3056816B1 (fr) *	2016-09-28	2021-03-05	Commissariat Energie Atomique	Composant nucleaire avec revetement de crc amorphe, utilisations contre l'oxydation/hydruration.
FR3056602B1 (fr) *	2016-09-28	2021-01-01	Commissariat Energie Atomique	Procede de fabrication par dli-mocvd d'un composant nucleaire avec revetement de crc amorphe

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL7003431A (de) *	1970-03-11	1971-09-14
CA1087041A (en) *	1975-09-15	1980-10-07	Westinghouse Canada Limited	Hafnium carbide and nitride coatings
JPS5694751A (en) *	1979-12-28	1981-07-31	Fujitsu Ltd	Vapor growth method
EP0117542B1 (de) *	1983-02-25	1992-06-17	Liburdi Engineering Limited	Chemische Dampfabscheidung von Überzügen aus metallischen Verbindungen unter Verwendung von metallischen Subhalogeniden

1987
- 1987-03-27 FR FR8704320A patent/FR2612946B1/fr not_active Expired - Fee Related
1988
- 1988-03-21 EP EP88902870A patent/EP0362207B1/de not_active Expired - Lifetime
- 1988-03-21 AT AT88902870T patent/ATE76112T1/de not_active IP Right Cessation
- 1988-03-21 DE DE8888902870T patent/DE3871145D1/de not_active Expired - Fee Related
- 1988-03-21 WO PCT/FR1988/000149 patent/WO1988007596A1/fr not_active Ceased

Also Published As

Publication number	Publication date
FR2612946B1 (fr)	1993-02-19
EP0362207B1 (de)	1992-05-13
DE3871145D1 (de)	1992-06-17
WO1988007596A1 (fr)	1988-10-06
EP0362207A1 (de)	1990-04-11
FR2612946A1 (fr)	1988-09-30

Legal Events

Date	Code	Title	Description
1992-11-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties

Publication	Publication Date	Title
DE3871145D1 (de)	1992-06-17	Verfahren und anlage zur thermischen ablagerung von hochfesten beschichtungen bei maessiger temperatur.
ZA861282B (en)	1986-10-29	Thioxotropic coating composition,process for coating a substrate with such coating composition and the coated substrate thus obtained
JPS644343A (en)	1989-01-09	Manufacture of abrasion-resistant polycarbonate article and manufactured article
TW362118B (en)	1999-06-21	Method for depositing amorphous SiNC coatings
ES457596A1 (es)	1978-03-16	Aparato para la formacion de recubrimientos metalicos o de compuesto metalico sobre una cara de un sustrato de vidrio.
DE69432175D1 (de)	2003-04-03	Verfahren und vorrichtung zur verbrennungs cvd von filmen und beschichtungen
US3846162A (en)	1974-11-05	Metal carbonitride coatings
US2836513A (en)	1958-05-27	Chromizing, adhering coating
DE2963407D1 (en)	1982-09-16	Process for applying a protective coating containing silicon to articles made from a superalloy
DK496487A (da)	1988-03-25	Vandigt belaegningsmiddel og fremgangsmaade til belaegning af et substrat med et saadant middel
ATE116380T1 (de)	1995-01-15	Verfahren und vorrichtung zum abscheiden von beschichtungen aus einer feinkörnigen und/oder gleichachsigen kornstruktur und daraus erhaltene werkstücke.
ATE1753T1 (de)	1982-11-15	Verfahren zur herstellung von haftfaehigen schichten auf polyolefinen.
ZA918941B (en)	1992-11-25	Cvd diamond by alternating chemical reactions
DE3861864D1 (de)	1991-04-11	Korrosionsinhibierung.
DE69308970D1 (de)	1997-04-24	Verfahren zur Vorbehandlung der Reaktionskammer und/oder des Substrates für die Selektive Auftragung des Wolframs
ATE20734T1 (de)	1986-08-15	Verfahren zur herstellung von alkylisocyanaten.
ATE107337T1 (de)	1994-07-15	Verfahren zum beschichten elektrisch leitfähiger substrate, wässriger lack, verfahren zur herstellung eines urethangruppenhaltigen adduktes und urethangruppenhaltiges addukt.
EP0117542A3 (en)	1987-08-12	Chemical vapor deposition of metal compound coatings utilizing metal sub-halides
ES466902A1 (es)	1978-10-01	Un metodo para formar una pelicula de fosforo-nitrogeno-oxi-geno.
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