BE715535A - - Google Patents

Description

  

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   Element sensitive to radiation and its prc @ ede of experimentation and processing for the manufacture of useful articles.
Radiation-sensitive elements are already known which are typically constituted by a metallic layer whether or not provided with a reinforcing support or with a substrate which is covered with an adhesive layer of a material capable of interfering. -.

   reaction with the metal or metals of the metal layer when exposed to inolent electromagnetic radiation, for example high intensity white light or similar radiation * The inter-reaction triggered by the radiation between the metal layer and coating layer extends

  <Desc / Clms Page number 2>

 
 EMI2.1
 in deep? since l.rztoxrc evzQ "i" cxcb metallic and! 1>,. ,>,.,. >. ,, \ ... 0 ..., /, ,,,> = n, <. , './j ..)' "..,. '*'" '' - *. 4 ,. tion to the electromagnetic x.yvauemant * It oc forms pix consequent to 1'interface entered there. metallic layer and r9YO layer imcnt, one or more rüd'xLte nye 11 '1es chemical compositions and keys: t'1atiquoe phyoiquoa which dift9J: Ollt of cones 9 Qozst tt.an ws so many the coucho: n6 "!;

  al11que that of the layer do 'Pv +, rent. The one or them will produce c; ': t.zztex-rs.ct.year little.- = + nt +' re withdrawn by an action. m0iqc or chemical or by heating do l! é: .ément sEJ! 1s1ble at r3.yon.riement after his exhibition, duo 'rn -i r3 provoouar ait'si la. f.'u1-lir'c.tion of the d r .tT. '.'; 0-rëa.c4; iC '::. Lee parts i '.'3 ue3 ^.' 'FJ di) the layer do: rOï {} f,!:. 0': '.' pr ;. <.%. Pnt r¯ ', 1.1l! I. . "\ 1: 1'0 s] P 1l ('. 3"' .1 'action ^ .. 10: ^ nique, chiBdqua or photochimiz1 =: a or pELT.; U ".ims.t1o !: at the ohalour qrt can? '*' rc o: at'zto ..; in cardboard applications at the same time as 1 v3evemont of the inter-reaction products- The 1.9.t01'C of the little coated layer '; n ? rouvo '.' ooes a solid aJ.'Ql or, as oola ost eg <: ù.orn,;> nt already known, it ') c': '. ",' 4.'s G07S the form 1.i'rd; the fornf):. '.' 1 vapaur.



  At! '1 "." I)! \ Of the 41st; enT aenaible to radiation conforming to 1' .n. we. o,:, il ect dono poaaibio d 'c> tce y des 1maees en reli f md ^ .. a.l.c; sea or non-metallic, dieposéoa or not on a Ouo3trat ot pooa4dant various qualities from an artistic and functional point of view.



  The invention brings certain improvements to the constitution ilGa elements aon61bl138 at radioment defined oidonsu9, as well as to prooédéa d. element treatment aen- 31010 <; 1.1. : ra.; .. onncment exposes, d <. so as to fat tick diVd) :, 9 [1ti-. c10e finis * Among other things, the invention orée des elenenta weakened to the radiation disposed on a support or a substrate '.or, .bl9 having divorB advantages in the graphic art *
 EMI2.2
 The invention also includes elements sensitive to radiation.
 EMI2.3
 ueul with multiple layers making it possible to obtain images in;

  .o "l.i" '. p "" ",'." ,! '' '' 'deeper than ooH'3 which we can

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 disposing with two-layer radiation sensitive elements * The invention further involves the manufacture of electrical printed circuits, electrical components, lithographic plates, etc., by appropriate operations in the treatment of radiation sensitive elements exposed and, in addition, the removal of the metal layer for a
 EMI3.1
 a1mplit1o for certain applioationa of the element sensitive to radiation *: ';; .., .. -0 .-- ¯¯; -..... ¯ - + 4ristiques emerge from the detailed description which follows and Uv- '- # i .. annexed which represent, by way of nonlimiting examples, embodiments of the object of the invention.



   The figure is a schematic perspective representation of a radiation sensitive element according to a first aspect of the invention, in the course of selective and disorient exposure to incident electromagnetic radiation * Figure 2 is a schematic sectional view of the freeze element 1.



   Fig 3 is a view similar to FIG. 2, but showing the radiation-sensitive element after selective and discrete exposure to electromagnetic radiation *
Fig. 4 is a view similar to fig'3, but showing the element sensitive to radiation after removal of the product formed as a result of the inter-reaction caused by the radiation between the metal layer and the coating layer *
Fig 5 is a view similar to shank 4, hand showing the radiation sensitive element after removal of the remaining unreacted product from the coating layer.
Fig. 6 is a schematic representation of an element arrangement for practicing the invention. Fig.

   7 is a schematic perspective view of a finished artiole according to the invention *
Fig. 8 is a view similar to fig 7, mata

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 showing a variant of the finished article.



   Fig. 9 is a schematic perspective view of a multi-layered radiation sensitive element according to another aspect of the invention, illustrated greatly exaggerated from the point of view of its thickness, during its exposure to radiation. electromagnetic through an oaohe or a suitable screen-
Fig 10 * is a diagrammatic cross-section of the arrangement of fig 9.



   Figure 11 is a view similar to Figure 10, but showing the multi-layered radiation-resistant element after exposure to incident electromagnetic radiation @
Rod 12 is a schematic perspective view of an exemplary finished article obtained from the multi-layered radiation sensitive member of rod 9, after exposure to electromagnetic radiation and removal of the product. 'interaction formed by radiation, in accordance with one aspect of the invention *
Fig 13 * is a sectional view of the article of Fig 12. FIG.

   14 is a schematic perspective representation of another example of a finished article obtained from the article of FIG. 12, by another operation of the process, according to yet another aspect of the invention *
Fig. 15 is a sectional view of the article of FIG. 14.



   Fig. 16 is a schematic perspective view of an example of a variant of the finished article obtained *
Fig. 17 is a schematic sectional view illustrating another aspect of the invention.
Fig. 18 is a schematic sectional view of an article obtained by the method of fig 17.



   Fig. 19 is a schematic representation of an example of a device making it possible to obtain, by means of a

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 EMI5.1
 element sensitive to electromagnetic radiation * conforms to .'vd # it7Il, L111 Ot311d v.â vlLdllv 3 élo; 1: lùi%, "1 qà" to xJ = 3 of predetermined value, in accordance with an aspect of the invention.
Fig 20 is a schematic sectional view of an exemplary radiation sensitive element for use in an arrangement as shown in Fig 19.
Fig 21 is a view similar to Fig 20, but showing the radiation sensitive element after exposure to incident electromagnetic radiation.
Fig.

   22 is a view similar to figure 20, but showing a variant of the element sensitive to radiation.
Fig 23 is a view similar to Fig 22, but showing the radiation sensitive element after exposure to incident electromagnetic radiation.



   Fig. 24 is a schematic representation of a
 EMI5.2
 Agenoement conforms to another aspect of the invention, for obtaining an electrical component, such as a capacitor having a predetermined capacity *
Fig 25 is a sectional view of a portion of a radiation sensitive element for use in the arrangement shown in Fig 24.



     Fig 26 is a view similar to Fig 25, but showing the radiation sensitive element after exposure to electromagnetic radiation.
Pin 27 is a perspective view of a variant of the radiation sensitive element incorporated in the arrangement of pin 24.



   Fig 28 is a sectional view relating to Fig 27.



   Fig. 29 is a similar sectional view after exposure to electromagnetic radiation.
Fig. 30 is a schematic perspective representation of an radiation-sensitive element for obtaining a circuit

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 electric by the process according to the invention
Fig. 31 is a diagram. in perspective of the element of the pin 30, but clearly showing a face not visible to the pin 30.



   The rod 32 is a schematic representation of the circuit obtained by the element of FIGS. 30 and 31, represented by conventional electrical symbols *
Figure 33 is a schematic perspective view of an integrated electrical circuit obtained by the process of the invention.
Figure 34 is a cross-sectional schematic representation of a typical radiation sensitive element according to the invention, during selective and discrete exposure to inoident electromagnetic radiation, for example light radiation *
Fig 35 is a view similar to Fig 34,

   but showing the radiation sensitive element after exposure to incident electromagnetic radiation *
Fig 36 is a schematic sectional view illustrating an operation of the method of the invention, which consists in removing discrete parts of the coating layer of the radiation sensitive element, corresponding to the areas of. element that were previously exposed to incident electromagnetic radiation.



   Fig 37 is a view analogous to Fig 36, but showing the radiation sensitive element after parts of the coating have been removed.



   Fig. 38 is a schematic cross-sectional representation of an arrangement allowing electrolytic coating of areas of the metal layer discovered as a result of the removal of parts of the coating layer * - Figures 39 and 40 are schematic sectional views. of the radiation sensitive element after electrolytic coating by a relatively thin layer and a layer

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 EMI7.1
 relatively 'thick, respeotiv # eA'f t .......... yin ... t1 .. "'nn' street 'lna.10H": she from t'1.



  39p maie showing the element of this figure jsadant a second exposure to electromagnetic radiation.



   Fig. 42 is a view similar to rod 41, but showing the element after removal of the remaining parts of the coating layer, following the second exposure to electromagnetic radiation of rod 41-
Fig '43 is a view similar to fig. 42, but
 EMI7.2
 showing results obtained by an aaaonda azpo4it.on to electromagnetic radiation, of sufficient duration and intensity to consume in depth the entire thickness of the metal of the metallic layer at the level of the remaining areas
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 reOOUTert89 with parts of the re-layer before the second exposure.



   Fig '44 is a schematic representation of a
 EMI7.4
 agenoement allowing 1 '> nlévemen: or erosion 3lectrech.m, i.qu3 of parts of 8urfaco of the layer mtEÙ.11q' .. te dtScouver4. * orj cooel; consequence of the selective and discrete removal of part 3 of the coating layer *
Fig. 45 shows a first form of the object ob-
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 held as a result of the electroohimical erosion of surface parts of the metallic layer not covered by the coating layer.



   Fig '46 shows the article ie Fig' 45 after removing the remaining parts of the coating layer.
Fig. 47 is a view similar to FIG. 45, but showing the results obtained by complete erosion by means of the arrangement of fig. 44 of the exposed surface parts of the metallic layer-
Fig. 48 is a view similar to FIG. 47, hand countering the article after removing the remaining parts of the coating hole * Fig. 49 is a schematic view similar to the

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 freezes 34, but showing an element sensitive to radiation, during selective and discrete exposure to radiation;

     electro- magnetic falling on the side of the element carrying the metallic oouohe-
Fig 50 is a view similar to Fig 49, but showing the radiation sensitive element after exposure to incident electromagnetic radiation.
Fig 51 is a view similar to Fig 50, but showing the radiation sensitive element after removal of the products resulting from the inter-reaction caused by the radiation between the constituents of the radiation sensitive element.
Fig 52 is a view similar to Fig 51, hand showing the radiation sensitive element after the electrolytic coating of the remaining parts of the metallic layer.
Fig 53 is a view similar to Fig 52,

   but showing the element of this figure during a wave exposure to electromagnetic radiation, in view of obtaining a different structure of the finished article.



   Fig. 54 is a schematic sectional view of the article obtained after the second exposure of fig 53.



   Fig. 55 is a schematic sectional view of another article.



   Fig. 56 is a diagrammatic cross-section of an element sensitive to electromagnetic radiation in accordance with the invention, during its exposure to incident eleutromagnetic radiation, according to a predetermined pattern.
Fig. 57 is a schematic sectional representation of the radiation sensitive element of fig '56 after exposure to electromagnetic radiation *
Fig 59 is a schematic sectional representation of the element sensitive to electromagnetic radiation of Fig 57 during the removal of the parts of its coating orohe corresponding to the previously exposed areas.

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 EMI9.1
 to leotromagndt1qu6 'radiation.



   Fig. 59 is a schematic sectional representation of the electromagnetic radiation sensitive element after release and during exposure to heat.
Fig. 60 is a schematic sectional representation of a first form of finished article.
Fig. 61, and a view similar to FIG. 60, showing a variant of the finished article '
 EMI9.2
 Fig. 62 9a ime schematic view aensiblemen 'similar to Fig' 56, but feeling a sensitive element r radiation of molified constitution.
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  Fig '53 is an Achecat sectional view. 'J of a finished article obtained by means of the element senaib) .- -, i radiation of fig' 62.



  The shooting. 64 is a diagrammatic view of a typical radiation sensitive element during its exposure to a 4lootT radiation pattern; "Time or an analogous oirouit oorm ^ .-- '= ¯ .. L- 2g. 65 is a schematic perspective view
 EMI9.4
 of a ,, ¯. ' ..,) 10 finished, for example a bare printed electric circuit by means of the arrangement of fig '64.



   Fig. 66 aat a schematic sectional representation of an example of a radiation sensitive element according to the invention, during selective and discrete exposure to electromagnetic radiation.
Fig. 67 is a view analogous to rod 66, but showing the radiation sensitive element after selective and discrete exposure to electromagnetic radiation.



   Fig. 68 is a view similar to FIG. 67, but showing an intermediate phase in accordance with another aspect of the invention.



   Fig. 69 is a view similar to FIG. 68, but showing a subsequent operation consistent with this asper 'of

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 EMI10.1
 1. e. r r.1 f Jan r s dw, '
Fig. 70 illustrates another operation in accordance with this aspect of the invention.
Fig. 71 is a schematic sectional view of an alternative operation according to another aspect of the invention.
Fig. 72 is a view similar to fig '71, but showing the other operation which consists of a brief uniform exposure to electromagnetic radiation of the element sensitive to this radiation'
Fig. 73 is a view similar to FIG. 72, but showing the results obtained by this second exposure.



   FIG. 74 illustrates a subsequent phase of the variant of the method according to the invention.



   Rod 75 is a schematic sectional view of a variation of the radiation sensitive element according to another aspect of the invention, during selective and discrete exposure to electromagnetic radiation.
Fig. 76 is a view similar to FIG. 75, hand showing the radiation sensitive element during brief uniform exposure to electromagnetic radiation.



     Fig. 77 is a view similar to FIG. 76, but showing the results obtained by this exposure to electromagnetic radiation '*
The rod 78 illustrates another operation of the variant of the method of the invention *
 EMI10.2
 Fig '79 il' '' ,,:,; ':: .. "asmatiqudment the finished article obtained by the process of Figs 75 to 78.



   Fig. 80 is a schematic sectional representation of a radiation sensitive element according to the invention, during its selective and discrete exposure to electromagnetic radiation.
Fig '81 is a schematic representation of a lithographic plate or similar plate made by means of the element sensitive to electromagnetic radiation

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 of fig. 80.



   Fig. 82 is a schematic sectional representation of a variant of the element sensitive to electromagnetic radiation of FIG. 80, during selective and discreet exposure to electromagnetic radiation.



   Fig. 83 is a lithographic plate or a plate analogous to the means of the element sensitive to electromagnetic radiation of the riser. 82.



   Fig. 84 is a diagrammatic cross-sectional representation of another variant of an element sensitive to electromagnetic radiation for the implementation of the invention, during its selective and discrete exposure to electromagnetic radiation. FIG. 85 is a schematic representation of the element sensitive to electromagnetic radiation of the rod 84, after selective and discrete exposure to electromagnetic radiation, in a shape suitable for being used as an offset lithographic plate or similar plate.



   Fig. 86 schematically illustrates a variety? configuration of an offset lithographic plate or of a similar plate produced in accordance with the invention by means of the element sensitive to electromagnetic radiation of the pin 84.



   Fig '87 is a schematic representation, part in perspective and part in section, of an element sensitive to radiation according to the invention, during its selective and discrete exposure to electromagnetic radiation.
Fig. 88 is a view analogous to fig '87, May, showing the radiation sensitive element after selective and discrete exposure to electromagnetic radiation.
Fig '89 is a view similar to fig. 88, May showing the radiation sensitive element after being subjected to the action of a suitable solvent-
The rod 90 is a view similar to FIG.

   89, May

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 EMI12.1
 showing the element sensitive to radiation & t * eiydtromagn4tiqu <exposed after being subjected to the action of a solvent capable of dissolving the material of the reinforcing support or the substrate -
Fig. 91 is a schematic representation in
 EMI12.2
 perageotiya of a J1Óm, nt sensitive to electromagnetic radiation according to the invention, during selective and discrete exposure to electromagnetic radiation to. through a suitable cover.



   Fig. 92 is a schematic perspective representation of an element sensitive to electromagnetic radiation in accordance with the invention, during selective and discrete exposure to electromagnetic radiation, by projection of an image of electromagnetic radiation on this element.



   Figure 93 is a schematic representation of an arrangement using an element sensitive to electromagnetic radiation according to the invention, during exposure.
 EMI12.3
 aéleotiva and d1aor6 an electromagnetic ray, oonaistant to a space of enargia under vacuum, for example an electron beam '
The rod 94 is a view of an arrangement similar to that of FIG.

   93, but in which the element sensitive to electromagnetic radiation is disposed externally to the container containing the source of the electron beam '
Fig. 95 is a view of an arrangement analogous to that of shank 94, but in which the element sensitive to electromagnetic radiation takes the form of an elongated foldable element,
Fig. 96 is a schematic representation of an element sensitive to electromagnetic radiation during exposure to electromagnetic radiation, caused to explore its surface according to a predetermined pattern.
 EMI12.4
 L:

  8 tig - 97 and 98 are views 8ohat1qu $ en à ootpg of part of Un ÓJâ1'ent aenaible au. elsotoeomagné radiation% iqm

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 after exposure to this radiation * freezes 99 and 100, including schematic views of a variant of the element sensitive to electromagnetic radiation in accordance with the invention, before and after exposure to electromagnetic radiation.
To the attached drawings and more particularly to figs.

   1 and 2, a radiation sensitive element according to the invention, generally designated by 10, comprises a flexible substrate, a reinforcing support or a base 12, for example made of paper, cardboard, plastic or the like , covered with a metallic layer 14 which adheres thereto and which consists of uno since layer or a film of a metal or of several metals, the thickness of which may be.

   the order of a few atoms or a few A. The metal layer is deposited on the base 12 by any conventional means well known in the field, for example by bonding, by electrolytic or electrodeless deposition, by deposition of va - fear, cathodic sputtering, etc. - The term "metal layer" is understood to mean a layer containing at least one metal, either solid, alloyed with another metal or with other metals or combined or mixed with one or more other elements . Metal layer 14 can contain any one. common metals, such as silver, copper, niobium, lead, iron, aluminum, chromium, nickel, eto.



   There is, above the metal layer 14, an adhesion layer or a coating layer 16 of any of the materials already mentioned, this material or these materials being capable, by exposure to electromagnetic radiation, of interact with the metal or metals of the metal layer 14 to form with them one or more inter-reaction products having chemical compositions and physical characteristics which differ from those of the constituents. The coating layer 16 is also very thin, preferably on the order of a few atoms or a few.

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 at alle is represented as ab ttouvant soue the solid form. although it tends to be in the liquid phase or in the vapor phase.



  The use of a coating layer 16 of vapor-reactive radiation-reactive material is particularly suitable for the invention, as it greatly simplified the already simple processing of the sensing element to form a finished article with A metallic image or diagram on a flexible or collapsible substrate or base, as explained in detail in the following. the material of the coating layer 16 can be any of several ternary materials containing aeanio, sutre and iodine, or arsenic, sulfur or bismuth, for example. Alternatively, the material constituting the coating layer 16 may be any one of several binary materials, such as a halide;

   metal sulfide, iodide, arsenide, elenide or teluride, arsenio trisulfide, arsenic pentasulfide and mixtures of sulfur and selenium. As an alternative, the material of the coating layer 16 can consist of any one of several simple elements, such as arsenic, sulfur, iodine, selenium, tellurium, thallium, etc. By way of illustration useful for the explanation and understanding of the principles of the invention and for the purposes of the present description, the invention is hereinafter described with respect to rods 1 to 8, with regard to the element sensitive to radiation 10,

   composed of a paper base 12 reopened with a thin film of pure silver forming the metallic layer 14. having a thickness of a few #. The metal layer 14 is in turn covered with a solid coating layer 16, also a few # thick, in a solid glass form. The radiation sensitive element 10 is first exposed to a incident electromagnetic radiation, as shown in figs 1 and 2, by interposing a cover 18

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 on the path of the incident electromagnetic radiation 20, which consists of a whitened light of high pollution caused by a conventional source,

   such as a high-power incandescent oenoe lamp. Parts of the cover 18, as shown at 22, are essentially capable of transmitting electromagnetic radiation, while other parts, as shown at 24, are essentially incapable of transmitting it. Therefore, the surface of the sensing element 10 is selectively and discretely irradiated at the area level, as shown at 26, corresponding to the radiator 2 transmitting the cacho 18, while at the other 30 parts of the surface of the radiation sensitive element 10 are shielded from electromagnetic radiation 20 ,

   for example the areas 30 of the radiant element corresponding to the areas 24 of the caohe 18 which are essentially incapable of transmitting electromagnetic radiation. It is evident that, alternatively, a suitable image can be projected onto the element. sensitive to radiation by a conventional optical promotion device.



   After exposure of rayon sensitive retament. However, for a predetermined period of time at most a few seconds, there occurs an inter-reaction caused by the radiation between the material of the couc. coating 16 and the metal of the metal layer 14, level of the areas 26 subjected to this radiation, with format! of the inter-reaotion product 32, as shown in FIG. with in-depth exhaustion of all the metal, namely silver in the present example, of the metallic layer 14 Lee aires 30 (fig.

   1 and 2) of the radiation-sensitive element not subjected to irradiation are left intact, as shown at 34 in FIG. 3, each of these areas 34 having a pattern consisting of the remainder of the metal layer 14 with a adhesion coating of the coating layer 16 corresponding to the areas 24 of the cover 18

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 rods 1 and 2 unable to transmit radiation or corresponding to the dark areas of the image projected on the radiation sensitive element 'After removal of the inter-reaction product 32, the finished article looks like the artiole 11 of the rod 4 consisting exclusively of the paper support 12 to which adheres a design formed by the areas 34 which are formed by the remaining parts of the silver layer 14 and,

   respectively, of the arsenic triulfide coating layer 16. For some applications such an article may be perfectly suitable and may be used as is, without further treatment.



   81 it is desired to remove the remainder of the coating layer 16, this remainder can be removed by any of several means, for example, by heat sublimation, chemical dissolution or mechanical removal, although there is It should be noted that in most applications it is possible to simultaneously remove both the inter-reaction product 32 and the remaining portions of the resurfacing layer 16 in a single operation by mechanical, chemical or chemical methods. miques or heat sublimation, or in accordance with the means explained in detail below for producing item 11 'of Figs. 5 and 7.



   By operating with a radiation sensitive element composed of a flexible or foldable support, such as paper for example, covered with a thin metallic layer, such as silver, in an atmosphere charged with vapor of the constituent material the coating layer, for example arsenic trisulfide vapor, the inter-reaction product (s) are automatically sublimated as they form and the finished article 11 'consists exclusively of the support 12 carrying a metallic design, as shown at 36 in FIGS.

   5 and 7, this metallic pattern being formed by the remaining parts of the metallic layer 14 corresponding to the parts of the element sensitive to the initial radiation which have not

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 EMI17.1
 --- ^ 11RAn i 1.,, .T¯ -,. ,,. T '4.- <-to- 4 -
This finished artiole, as shown at 11 'at rods 5 and 7, is identical to the finished article which can be obtained from article 11 of FIG. 4, after the removal of the coating layer 16 which, as explained above, can be carried out at the same time as that of the inter-reaction product 32 of fig'3.

   For some applications, for example when it is desired to produce the high contrast reproduction of the original image, it may be desirable to color, darken or darken the metallic image 36 of item 11 'of Figs. This can be achieved by treating the metallic image 36 with an appropriate dye, toning agent or blackening agent. By free in applications where the metallic image 36 is a silver image, its contrast, against the background of the support 12, may be intensified or the image may be obscured by subjecting it to hydrogen sulfide. .

   After darkening, the article obtained as shown schematically at the rod 8 is provided with its metallic silver image 36 suitably darkened so as to be endowed with a fori contrast appearing with respect to the visual background formed by the paper support 12.



   Fig '6 schematically illustrates a device for automatically processing a radiation sensitive element 10 in the form of a continuous strip, with a view to obtaining a finished article in the form, for example, of a printing. an original image or a succession of original images - The strip of photosensitive element is obtained from a reel or a supply drum 40 on the periphery of which it is wound - A suitable intermittent drive device, for example oommo shown on 42, is designed to unwind and feed sections of appropriate length of the radiation sensitive element,

   from the reel or feed drum - A

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 EMI18.1
 exposure station 4 at which the cronçuna auccea- Bits of the continuous band of the radiation sensitive element 10 are irradiated during each pause period of the intermittent control 42, by means of a projection lantern 46 or d an equivalent lamp, adapted to focus on the surface of the radiation sensitive element an appropriate image for a predetermined period of time, at an appropriate illumination intensity.

   After exposure, the radiation sensitive member strip 10 is forced bent at a stripping station 48 to a small radius roll 50 continuously rotating and causing the remaining portions of the coating to break. coating in small fragments which easily separate from the underlying metal layer - These remaining areas of the coating layer correspond to the areas of the radiation sensitive element which have not been subjected to illumination,

   while the inter-reaction product at the areas which have been irradiated during the exposure is also caused to break into small fragments which easily separate from the paper backing. The bending of the exposed sensitive material strip. the roller 50 is best suited for removing both the remainder of the coating layer and the interaction product, while the parts of the metallic layer corresponding to airoa which were not irradiated during the exposure remain attached to the support of the coating. paper.

   This practical stripping of the sensitive element strip is particularly pronounced as a result of the use of a radiation sensitive element consisting of a paper backing having a thin coating of metallic silver covered in turn with a coating layer. glassy of arse trisulture
 EMI18.2
 nio.

   Luo u.iron do 19614moxit aan weaken at rt1, YolU! UUlou1I which have been exposed to the aotion of incident light and which keep the glassy appearance separate from the paper backing in essentially the same way as the remaining parts of the diaper

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 EMI19.1
 1 q7 h) ±) = t a. >> ..W o..ß 7! ..ßon i,, -, 4 u '7. -tt ** - <# - .. - <* - # - # # -.

   - # '-MI jf ¯ ,, ¯ exposed to incident electromagnetic radiation during exposure * The explanation for this result seems to be that the silver oouohe exhibits a strong adhesive bond with the paper backing, so that the unreacted parts of the metal layer remain strongly attached to the paper backing during stripping - however, the reacted parts show a weak adhesive bond - with the input of paper because the metal layer in the level of these areas has been completely consumed - The arsenic trisulfide coating layer is vitreous in appearance and behavior, so that as a result of bending or bending under a small radius,

   the arsenic trisulfide coating layer simply breaks off and lifts off the metal layer. In areas which have been exposed to irradiation, the formation of the inter-reaction product appears to result in an essentially analogous phenomenon. a migrate! ionic or atomic metal of the metallic coucae in the vitreous material of the coating layer, so that the inter-reaction areas, as a result of bending under a very small radius, also break into small fragments which s' spread and separate from the paper backing
In applications where the coating layer is made of a material other than arsenic disulfide, arsenio pentasulfide, mixtures of arsenic, sulfur and iodine,

   and the mixture of lead and iodine, it may be necessary to facilitate the separation of the unreacted parts of the coating layer and the interreaction product from the remaining part of the metal layer and, again, of the coating. substrate or support, by wiping or brushing the surface of the element during stripping or by applying to the surface of the element a flexible sheet of material covered with a very poor adhesive *
After the count, the tape continues from the elec-

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 The now exposed and stripped radiation sensitive element 10 exhibiting a metallic image on the paper backing is passed through a bending station 52 where it is placed in contact with steam 54 which,

   in the example of an arbitrarily chosen embodiment in which the metallic image set a silver image, consists of gaseous hydrogen sulfide 'The continuous band carrying on its surface a colored or obsourois image then advances by means of the rollers of advances 56 to a sectioning station 58 where, if necessary, it is cut into sections of suitable length.



   It is evident that if it is not necessary to color or obscure the image, the coloring station 52 can be omitted and it is furthermore evident that the stripping station can be omitted in applications in the environment. which the radiation-sensitive element is constituted simply by a backing of paper, cardboard or the like having a thin layer of metal which adheres thereto and which is exposed to electromagnetic radiation in an atomosphere of reactive materials, such as arsenic triulfide, arsenic pentasulfide, eta. In these applications, the exposure station 44 included a physical enclosure containing vapors of the reactive material and a suitable heater.



   As regards more particularly the figs 9 to 18, these figures illustrate an element sensitive to radiation with several layers 110 which comprises, in accordance with the invention, several layers (fig. 9 and 10), composed of two chains 112 and Primarily adhesive 114, of different materials. The multi-layered radiation sensitive member 110 may be disposed on a backing support or substrate 116, although this may be omitted in some applications.
In the illustrated example of the invention, a radiation sensitive element 110 is shown as composed of

  <Desc / Clms Page number 21>

 
 EMI21.1
 cross 8rate8 onmpreuazit càacana two couonoj 0- ex s with -r of different materials,

   capable of inter-reaction when exposed to electromagnetic radiation with the formation of an inter-reaction product having chemical and physical characteristics that differ from those of the initial constituents * As has already been explained in what above, each stratum comprises a metal layer 114 and is entered.

   here by metal layer one! layer comprising at least one metal, either alone, alloyed with another metal or with other metals, combined or mixed with one or more other elements. The metal layer 114 can thus contain any of the common metals, such as silver, nickel, copper, niobium, lead, iron, aluminum, chromium etc - The material of layer 112 can be any of the materials of a group of ternary materials Contained arsenic, sulfur and iodine, or arsenic, sulfur and bismuth, for example- Alternatively, the material of layer 112 can:

   be any material from a group of binary materials, such as a metal halide, sulfur, iodide, arsenide, selenide or telluride, arsenic trisulfide, erseni pentasulfide and mixtures sulfur and selenium. As a variant the material of layer 112 may consist of any one of several simple elements, such as arsenic, sulfur, iodine, selenium, tellurium, thallium, etc. *
Each layer 112 or 114 is very thin and can have a thickness of between a few atoms and more.



   As many strata or pairs of layers can be used as practice requires in a radiation sensitive element according to the invention, the only condition being that each stratum is essentially capable of transmitting the electromagnetic radiation used for the exposure. , this electromagnetic radiation being, in many cases, simply ordinary white light of great intensity, so that

  <Desc / Clms Page number 22>

 
 EMI22.1
 1 radiation; 'd4: .atü pauß a3:, aw.s W.

   F * '* d' t .J; ';:.:. 4 suitable during exposure- Because there is a certain degree of absorption of electromagnetic radiation at each layer, the depth of penetration of the radiation electromagnetic is essentially proportional to the intensity of irradiation-
Exposure to electromagnetic radiation of a multi-layered photosensitive element according to the invention can be effected by projecting an appropriate image onto the surface of the element, this exposure being shown in Figs.

   9at 10, as being effected through a cover 118 having airea, as shown at 120 which are substantially capable of transmitting electromagnetic radiation, and other areas, as shown at 122, which are substantially incapable of transmitting rayon - 'electromagnetic' Therefore, electromagnetic radiation, arbitrarily represented by arrows 124, can selectively and discreetly fall on the radiation sensitive element in appropriate areas 126 corresponding to the shape or contour of the projected image,

   while other areas 128 are protected and are not encountered by the radiation - At the level of the areas 126 irradiated by the electromagnetic radiation 124, for a sufficient intensity of the radiation energy, a deep penetration of the radiation is caused, as shown arbitrarily by the floches 130, and it follows that the materials of the layers 112 and 114, at the level of the areas thus irradiated and crossed, undergo an inter-reaction so as to form an inter-reaction product, as designated by 132 in fig.



  He. The formation of this inter-reaction product causes a reduction in the adhesion between the layers which allows the mechanical removal of the irradiated parts of the element 10 according to the methods described hereinafter. Alternatively, the reaction product 132 is capable of

  <Desc / Clms Page number 23>

 selective removal by chemical means or by sublimate;
 EMI23.1
 \ lT. T- <., # '. <..,! -.-....-.



  1 -? ell tbi- ^, -% -4, - '., Y 1 - -.: - - ::,' - = -z s, * '- * ";" "" - y. An example of an element sensitive to radiation at
 EMI23.2
 ooucnea multiple 110 comprises several strata each containing a metal layer 114 in a.rge! 1, '"; was a 1'2 layer of arsenic trisulfide or penta1al-o ar3cn =, c. oune 4:

  an eaally capable vitreous composition. transmitting ordinary light The silver layer 114 also thin enough to be essential = exoe capable of transmitting it. ordinary white light of great intensity. so that, for appropriate irradiation, training
 EMI23.3
 of the dlizter-react4-ozi 132 product is caused to extend in depth over the entire thickness of the shaving sensitive element and, therefore, in the element xenple there glossed here having a support of The action product 132 thus formed is also essentially capable of transmitting the electromagnetic radiation resulting in this reinforcing support or this substrate.

   1 = formation of the product of inter-reaction does not e = not sensitive to the formation of other product of inte = -rôaction àdeoniveaw greater ban da la otruoturo, one vuo of a natiofaisante irradiation. after removing the product of intor-rdac: ioa 132. a finished article 11 is obtained, Corsica represents in ig. 12 and 3, comprising 34 voids which cooespo = + tooth to its irradiated areas and parts, oomme reprosento in 136 and 138, which correspond to the areas which have not been struck:

   electromagnetic radiation
 EMI23.4
 If a finished article with a contour recessed from the image initially projected onto the radiation sensitive element is desig- nated, the parts of the finished article 111 of FIGS. and 13 included in the perimeter of this contour are removed by conventional mechanical means or by exposure

  <Desc / Clms Page number 24>

 subsequent to electromagnetic radiation, through
 EMI24.1
 -1-4 -l - 1 t, i- ,, '1 .- ;. ywr, ^, ri, .S "Jp.I" \ o1: "\. No1: 1.l" ::' '3 .yr.> nnq ':': lan 1Sl, Al "f., b. magnetic to fall on:

   appropriate areas, for example at 136, in order to cause the formation of an interaction product weaken the bond between its layers to facilitate their mechanical removal, or alternatively, to allow removal by chemical means or by heat sublimation of this inter-reaction product by a known process. The finished article 111 obtained is illustrated in FIGS. 14 and 15 ot present of reliof parts 138 corresponding to the unexposed areas and recessed parts, as shown at 140, defining an intaglio representation of the original image.



   If the reverse is desired, portions 138 of item 111 of Figs 12 and 13 are removed thereby leaving, as shown at rod 16, an item 111a which presents an image at link 142 of the image. original.



   As a result of the gradual absorption of the radiation transmitted at depth through the multiple layers of a radiation sensitive element according to the invention, a finished article, provided with a raised image, having a contour or cosentiolloment depth representative of the intensity of the electromagnetic radiation falling on this element can be obtained with an arrangement as illustrated schematically in FIG. 17.

   A radiation sensitive element, comprising several layers each having two layers 112 and 114 of different materials susceptible to inter-reaction, as explained above, when they are irradiated, is exposed by means of a cover 144 having parts 122 not transmitting the incident electromagnetic radiation 124, parts 120 fully capable of transmitting electromagnetic radiation and parts 146 partially susceptible to this transmission * These parts 146 of the cover 144 are arbitrarily represented as having a

  <Desc / Clms Page number 25>

 gradual gradual increase in the ability to transmit radiation from the extreme left edge, as shown in fig.

   17, towards the far right edge, so that the inter-reaction caused by the radiation extends deep into the radiation sensitive element, to a varying degree, as illustrated 148, corresponding substantially to the various limits between two consecutive layers in which sufficient radiation causes sufficient formation of inter-reaction product to achieve an effective result such as, for example, weakening of the bond between the layers to a sufficient extent to facilitate mechanical removal non-activated parts of the sensitive element.



   The article obtained, as illustrated in FIG. 18, has profiled recesses, as shown at 150, extending in depth to the appropriate limit between the various layers 112 and 114 reached by electromagnetic radiation of sufficient intensity to cause the appropriate formation of the inter-product. -reaction.



   The object of the invention is now described in detail in relation to FIGS. 19 to. 33, relating to examples of means for obtaining printed electric circuits, individual resistors of predetermined resistance values, capacitors of predetermined capacitance values and integrated circuits having resistors and capacitors of predetermined value, connections appropriate between these elements and appropriate input and output terminals relating to the electrical circuit - it should be noted that the actual physical appearance of the components and elements illustrated in figs.

   19 to 33 are not given for illustration to explain the principles involved in accordance with the invention and that the means indicated for the control of the electrical characteristics of the constituents obtained in accordance with the methods of the invention are not also given.

  <Desc / Clms Page number 26>

 for illustrative purposes and many other means
 EMI26.1
 Don < <-4 / WA + wlJO wôiÀù 1 {.....:. A¯ "\", 1'J11r: '' 3 s'1! Cia1istee.



   The invention uses as an element sensitive to radiation an element, as shown at 210 in FIGS. 19 and 20, which essentially comprises a metallic layer 212 made of a thin layer or film of one or more metals, which may have a thickness of a few atoms or which may reach a few A or a few hundredths of a millimeter, bearing a layer 214 of material capable, when exposed to electromagnetic radiation, to undergo inter-reaction with the metal or metals of the metal layer 212 to form with them one or more interaction products having a chemical composition, physical characteristics and electrical characteristics, such as, resistivity,

   which differs from those of the constituents * The layer 214 is also essentially thin, of the same order of thickness as the metallic layer 212 and is deposited on this layer by any conventional means, such as vapor deposition, sputtering, etc. .



   Layer 212 is made of a metal or a mixture or an alloy of at least two metals or a combination of a metal or metals and one or more other elements. layer 212 dono contain, as indicated in the above, any of the common metals such as silver, copper, niobium, lead, iron, aluminum, chromium, nickel, etc.

   The material of bed 214 can be, as also already mentioned, any of several ternary materials containing arsenic, sulfur and ioda or arsenio, sulfur and bismuth. For example, alternatively, the material of the layer 214 may be any of several binary materials, such as a metal halide, sulfide, iodide, arsenide, selenide or telluride, arsenic trisulfide, arsenic pontasulfide and mixtures of

  <Desc / Clms Page number 27>

 sulfur and selenium * The material of the bed 214 may be formed by any of several simple elements, such as arsenic, sulfur, iodine, selenium, tellurium, thallium,

   etc-
Examples of configurations and applications of the invention are explained here in detail, preferably with respect to a radiation sensitive element, as shown at 210, having a metallic layer 212 waite of a strip or foil. silver, copper, chromium, niokel, or mixtures of these metals, bearing a solid adhesive layer 214 of arsenic trisulfide or arsenic pontasulfide, although the invention achieves substantially the same results using the same. any of the constituents listed above.

   In some applications, there are certain definite advantages to using the liquid forming material 214 in the liquid phase or, preferably, vaporization. By using the material of the layer 214 in the vapor state, this provides the vapor. definite advantage that the finished article constitutes it:

   or the electrical circuit does not need to be shielded from subsequent exposure to electromagnetic radiation - However, the same result can be achieved by removing non-exposed interaction products and particles of the ouohe 214 after exposure to electromagnetic radiation of the element sensitive to this radiation, soue regulated conditions, in order to prevent the deterioration or the variation of the electrical characteristics of the components. or circuitry, as a consequence of subsequent exposure to electromagnetic radiation.

   However, for some applications, the use of a radiation sensitive element bearing a layer 214 in the solid state provides the definite advantages of good electrical insulation when a material such as arsenic trisulfide is employed, having a resistivity of about 10-15 ohm-cm or when the inter-reaction product is used as part of the electrical components or

  <Desc / Clms Page number 28>

 
 EMI28.1
 of the 6100triquei circuit as deoi'bi '= ap3ès'' hr ooneëquentt
 EMI28.2
 ¯ .t., 1 .... "" 1 ... ^ 1 'v .. 4, -' <. ,, 4.jt.-, q, G4, 4 -, -. ' <..; a, --- Q "", J - ...., J "" 'W' '- j!' wI¯W- - ,. 1 -. ,, -... -V- "" --..-..- .. -...---:

  As an example, the use of an element sensitive to electromagnetic radiation, comprising a layer 214 of material in solid phase.



   The radiation sensitive element 210 of the rods 19 and 20 has a pair of terminals 216 and 218 electrically bonded over a part or a given length of the metal layer 212. the radiation sensitive element 210 is exposed to the incident electromagnetic radiation, such as ordinary white light 222 emitted by a light source, such as incandescent bulbs 220.

   The light 222 is made to fall on the surface of the radiation sensitive element 210 after passing through a cover 224 having, in the example chosen, parts 226 essentially capable of transmitting light and a part 230 partially capable of transmitting light. Consequently, the surface of the radiation sensitive element 210 is fully irradiated in parts, as shown at 232, corresponding to parts 226 of the cover 224 which are fully capable of transmitting light 222, while other parts , as shown in 234, almost completely escape the effect of light * Another part, as shown in 236, is struck by a light of reduced intensity% ±,

   For a given light exposure, parts of the metal layer 212 corresponding to the fully irradiated parts 232 are entirely consumed as a result of the light-induced inter-reaction between the metal layer and the material, for example, trisulfide. arsenic from layer 214.

   The parts of the metal layer
 EMI28.3
 lique 212 corresponding to the oaohe8 parts 234 remain unaffected, while the part of the metallic layer corresponding to the partially irradiated area 236 is partial = and etched in depth to a degree corresponding to this.

  <Desc / Clms Page number 29>

 irradiation intensity - 'Therefore. a side view of the radiation sensitive element 210 passing essentially through the axis which contains the terminals 216 and 218 has been shown schematically in FIG.

   21 and it follows that the metallic layer 212 comprises parts 23e which have the initial thickness and which are electrically connected to the terminals 216 and 218 separated by a part 240 of reduced thickness, the thickness of the part 240 being approximately inversely proportional to the exposure of the area 236 (Fig. 19) of the electromagnetic-sensitive element 210 to the incident light.

   The resulting article is a resistor having a predetermined resistance value depending on the resistivity of the metal or metals forming the metallic cou @ e 212 of the section area offered to the passage of the current and the length of the path offered to the current. Therefore, the total resistance value of the resistor thus formed constituted by the remaining part of the metal layer 212, located between the terminals 216 and 218, can be satisfactorily determined according to the geometric dimensions of the projected image. on the radiation sensitive element and the duration of exposure of the irradiated area 236 of the element 'When the predetermined resistance value of the resistor Rx has thus been obtained,

   the irradiation of the radiation sensitive element 210 is interrupted, then the element can be enclosed in a screen for its permanent protection during the subsequent irradiation, or alternatively it can be covered with a layer of shellac or paint opaque to electromagnetic radiation which can affect the element and modify its value. Likewise, alternatively, the remainder of layer 214, as shown at 242 in fig 21, which has not been subjected to irradiation and parts of layer 214, as designated 244, which include the product resulting from the inter-reaction between this layer and the metallic layer 212 can be

  <Desc / Clms Page number 30>

 removed by known mechanical or chemical means.



   The resistance value of the resistance given by the device of the pin 19 can be continuously monitored, for example, by means of an ohmmeter connected to terminals 216 and 218 or by means of a bridge, such as that illustrated, comprising resistors R1, R2 RX (the resistance formed by the invontion process) and R3 arranged in a bridge having an electric current source 245 placed across a diagonal of the bridge and a measuring device 46 connected to the terminals of the other diagonal of the bridge.

   When the bridge is in equilibrium, the current flowing through the meter 246 is zero and the value of the resistance RX is given by the formula s
 EMI30.1
 
Therefore, for given values of R1, R2 and R3 the value of RX can be monitored continuously until it reaches a value at which the meter 246 indicates that the bridge is in equilibrium. As shown schematically, the meter 246 can be arranged to close a switch 248 when oxidizing a zero value or the meter 246 can be replaced by a relay as shown at 250 also adapted to open. switch 248 when a predetermined value of Rx is reached, so as to disconnect the light bulbs 220 from an energy source 252, in order to:

     to interrupt the exposure of element 210 to light *
The resistivity of the part of the layer 214 exposed to electromagnetic radiation is reduced as a function of its: exposure as a result of the formation of the inter-reaction product which tends to remain in solid solution in the material constituting the ouohe 214- As already mentioned, the resistivity of arsenic trisulfide is 10-15 ohm-om and the resistivity of an arsenic trisulfide can be.

  <Desc / Clms Page number 31>

 
 EMI31.1
 reduced by an amount oon8idéralè; sr.1!;.; t.ii8Po8'e in
 EMI31.2
 contact with a COUCue of me'cal 44 $ jaé> - ;, 1;

   1'¯, ¯ the resistivity of the arsenic triulfide layer decreasing in proportion to the exposure tending towards a minimum value which remains constant after all the silver in the metal layer has been exhausted. Therefore, a resistance
 EMI31.3
 oomforme -.1 the invention can be produced using an element sensitive to radiation z 0, as shown at ig '22, identical to the element sensitive to radiation 210 of
 EMI31.4
 tîg.

   20, ma-ta being provided with a terminal, cotta terminal designated by 216 being re-IL.4-de to the lez layer, and another terminal 213 which is connected to the metallic layer 212- By exposure of 1 'element sensitive to radiation 210 of FIG. 22 to electromagnetic radiation, by means of a cover such as cover 247 of FIG. 23, having along a longitudinal section an end part 249 fully capable of to transmit electromagnetic radiation, another
 EMI31.5
 part axtrame 51 3ment to 'transmit the radiation to the 9ci: roma.snetique has a? i0 1C: 6 & 1r 53 whose power of t: ra .. "1.! 3miB1on di: J.lo.':.: <3 a.duall-5- :: .i3 part 9, part 251, lt r;

   ; # ;, abmnu, co.4s r <3 presented to the rod 23, present in neck? A uno? Ar10 25. 1minuting progressively from the metallic layer 12 connected to the terminal 218 and corresponding to the part 253 to be able to
 EMI31.6
 gradual transmission of the cache & 47. The finished article also compares a part, as shown at 256, comprising the unreacted area of the layer 214 and a part near and attached to terminal 216, formed by fully reacted area of the lying surface. 212 and 214, as shown at 258.

   Part of layer 214 matches. to part 253 with gradually decreasing transmission power: the element of the cover 247 has a resistivity gradually decreasing from right to left in FIG. 23, so that the total resistance between terminals 216 and 218 can be

  <Desc / Clms Page number 32>

 determined within certain limits as a result of the element's total exposure to electromagnetic radiation.



   It can thus be seen that electrical constituents, such as resistances of predetermined resistance values, can be obtained using radiation sensitive elements according to the invention as a result of practicing its method.
Lee fig. 24 and 25 illustrate a radiation sensitive element 210 ', according to a further aspect of the invention, which, as best shown in section by rod 25, comprises a metallic layer 212 provided with a cover layer 214 of capable material. , when exposed to electromagnetic radiation, inter-reaction with the metal or metals of the metal layer 212.

   The latter is in turn disposed, so as to adhere thereto, on one face of a dielectric layer 260 having another metallic oouohe 262. on its other face. An electrical terminal 264 is fixed to the metallic layer 212 and a second electrical terminal 266 is fixed to the metal layer 262. Such an assembly forms a capacitor having parallel plates defined by metal layers 212 and 262 whose capacitance, as is well known, is given by the following formula 1
 EMI32.1
 where A this is the effective area of the plate in cm2, d is the thickness of the dielectric in cm and K = 0.0085 Er, Er being equal to the constant of the dielectric with respect to air.



   As is well known, the effective effective area of the parallel plate capacitor, the capacitance of which is according to the formula given above, actually corresponds to the areas of coincidence of the plates and to reduce the capacitance of a capacitor. it suffices to decrease the areas of

  <Desc / Clms Page number 33>

 coincidence of the plates, which can be obtained by reducing the area of one of the plates and leaving inangial ±;

  area of the other plate- This result is obtained, according to one aspect of the invention, by providing a screen 268 capable of protecting the sensitive surface of the element 210 'from incident electromagnetic radiation, such as light, as shown in 222, emitted by a source such as the incandescent lamps 220.



   The capacitor defined by the element 210 'is mounted in a bridge circuit, as shown in FIG. 24, this bridge comprising the impedance Zx, the impedance of the capacitor being produced in accordance with the prcoedé of the invention, and known impedances Z1, Z2, and Z3.

   A source of alternating current 270 of frequency. 1 ocune is connected to the terminals of a diagonal of the bridge
An ammeter 246 is connected to the terminals of the other diagonal of the bridge. At equilibrium, the measuring device 246 records the value 0 and the impedance Zx is given by the formula:
 EMI33.1
 at the capacitance of the capacitor is derived from the formula:
 EMI33.2
 
The measuring apparatus 246 may be arranged to open a switch 248 mounted in series between a source of electrical energy 252 and lamps 220 or else;

   alternatively, a relay, as shown at 250, can be used to directly open the switch 248 when the impedanoe Zx of the capacitor reaches a predetermined value - In order to reduce the capacitance of the capacitor, the screen is moved. 268 in the direction shown by arrow 272 (fig. 24 and 25), so as to increase the area of the layer

  <Desc / Clms Page number 34>

 metal 212 undergoing intr-reaction with the covering layer 214 knots the influence of electromagnetic radiation falling on this layer '
The capacitor, after exposure to electromagnetic radiation of the element 210 ', as shown in FIG.

   26, has a first plate formed of a metal layer 262 connected to terminal 266 and a second plate formed by the remaining unreacted area of metal layer 212, connected to terminal 264 and separated by the dielectric layer 260. The part or area of the metal layer 212 not protected by the screen 268 from the action of the incident electromagnetic radiation has been made to interact with the material of the layer 214, thus consuming the metal of the layer in depth. 212 with formation of interaction products, as shown at 274, and effectively balancing the effective area of the capacitor plate-
Therefore, according to the invention,

   a capacitor of predetermined value can be fabricated and precisely balanced to a predetermined capacitance value by means of electromagnetic radiation, such as light.



   Figs. 27 and 28 illustrate a variant of a capacitor produced according to another aspect of the invention which, as best shown in Fig. 28, comprises an element sensitive to radiation 210 ", comprising a layer 214 made of the marl material which the layers 214 of the sensitive elements described above, for example in arsenio trisulfide or arsenic pentasulfide, having on each of its faces a very thin metallic layer 212, the thinness of which is sufficient so that, when exposed electromagnetic radiation, this radiation is capable of being transmitted by the metal layers so as to cause an inter-réaqtion between the material of the layer 214 and the metal or metals of the metal layers 212.

   A screen is arranged, as illustrated at 276, and can slide so that part of the element

  <Desc / Clms Page number 35>

 sensitive to radiation 210 "can be subjected to irradia-
 EMI35.1
 tàs = jur i, a (; \ "'III" ,, a9 Bos cot4e or else. as represented, on its two obtained, so as to form at the level of its struck areas the product of inter-reaction 274 (fig. 29) by consuming the areas struck by the metallic layers 212.



  The article obtained, as shown in FIG. 29, is a capacitor of predetermined value depending on the extent of the areas exposed to electromagnetic radiation? sen plates being defined by the remaining non-reacted parts of ouone 212 connected to terminals 264 and 266.



   Elements sensitive to radiation, according to the invention and as explained in the above oe, can be. used to obtain integrated circuits by simple exposure to electromagnetic radiation via a mask or by projection on these elements of a predetermined design = mined, an example of which has been given in FIGS. 30 to 33.

   A radiation sensitive element 280 is formed by reopening a dielectric sheet 260 of appropriate thickness of a substantially thin metal layer 212 on both sides, which metal layer in turn being covered with a coating layer 214 of. a material capable of reacting when exposed to electromagnetic radiation with the metal of the layer 212, as explained above. The first face 282 of the radiation sensitive element 280 is exposed to the radiation via a , ache or as a result # the projection of a drawing on this face, as shown in fig.

   30, this drawing having parts, as shown at 286, protecting the face 282 from incident electromagnetic radiation, other parts, as shown at 288, allowing the total incidence of electromagnetic radiation on this face and other parts, such as shown at 290, allowing reduced irradiation of the radiation sensitive surface. The other face 284 of element 280 is also exposed to electromagnetic radiation, as shown in

  <Desc / Clms Page number 36>

 the rod 31, parts of this face receiving, as shown in 288, the tonal radiation intensity, other parts receiving only a reduced radiation intensity, as shown in 290, and other parts being protected from the aotion of electromagnetic radiation as represented in 286.

   Terminals, as shown in 292, 294 and 296, are affixed, either before or after arposition to electromagnetic radiation, at the edge of the metal layer 212 of face 282 and terminals, as shown in 298 and 300 are fixed to the metal layer 212 of the face 284.



  The finished article is an integrated screen in which the unreacted portions of the layers 212 which correspond to the areas 286 constitute conductors or capacitor plates and each of the areas, such as the areas 290 which have been exposed. . partially to radiation, constitutes a resistance whose resistance value depends on the degree of radiation and the geometric dimensions of the area.

   The artiole obtained is therefore an electrical circuit, the schematic equivalent of which is illustrated at rod 32, comprising a plate 302 of capacitor 304 connected to terminal 294 via a resistor 306, to terminal 292 via of a resistor 308 and to terminal 296 via a conductor 310, defined on face 282 of element 280.

   The other plate, i.e. plate 312, of capacitor 304 is connected to terminal 298 via resistor 314 and is also connected to terminal 300 via resistor 316, the various areas illustrated in figs. 30 and 31 being identified by the same references as in the diagram given by fig 32,

   in order to facilitate understanding of the equivalence between these figures If the area of any of the plates 302 or 312 of the condenaatour 304 must be balanced to obtain a more precise value of capacitance of the inverter or to fine tune the circuit to electrical characteristics

  <Desc / Clms Page number 37>

 
 EMI37.1
 predetermined, an area of one of tie-11iatf \ ië1f;

   -O- even represented at 318, with respect to the plate 302 in FIG. 30, can then be individually exposed to electromagnetic radiation, as already explained, and the value of each resistance can also be determined individually with precision by subsequent discrete and selective exposure to electromagnetic radiation, keeping in mind, however, that the adjustable variations of the values of the constituents are naturally directed towards a reduction in capacity, with regard to the capacitors, and to an increase in resistance ,,

   regarding resistances *
The finished monolithic circuit may be enclosed in an enclosure suitable for protecting the radiation-sensitive faces 282 and 284 of the element from subsequent irradiation or it may be covered with an opaque varnish or a similar material or else, Alternatively, the reacted and unreacted parts of the couohes 214 can be removed mechanically or chemically, so as to produce a circuit, as shown at rod 33, which fully equates to the diagram of rod 32.



   Since the radiation sensitive elements according to the invention, under certain conditions and for certain groups of materials, act as semiconductors, it is also possible, using the structure and methods of the invention. invention, to obtain fully integrated circuits comprising unidirectional elements and analogous elements provided with adjustment means, such as diodes and transistors, eto.



   As regards, in general, Figs.



    34 to 55, the invention is now described from the point of view of methods for producing metallic designs by projecting an image of a design to be reproduced onto a radiation sensitive element consisting essentially of a metallic layer reopened with a coating layer adhered to it, formed

  <Desc / Clms Page number 38>

 of a material capable of reacting:

   The layer is exposed to electromagnetic radiation, along with the metal of the metal layer. After exposure, the parts of the coating layer having reduced adhesion to the metal of the layer, as a consequence of this exposure, are detached thereby selectively and discreetly exposing areas of the surface of the metal layer which are then treated by electrolytic deposition or by electrochemical erosion, depending on whether a relief or hollow design is desired,
Alternatively, radiation sensitive elements according to the invention having a metal layer thin enough to transmit radiation,

   can be exposed by projecting the image of the design onto the metallic layer i, thus consuming in depth selective and discrete parts of this layer. -The remaining unreacted parts of the metallic layer are then treated by deposition; electrolytic-
As shown in fig. 34, the first step of the methods of the invention is to expose a radiation sensitive element 410 to incident electromagnetic radiation 412, such as light radiation.

   The radiation sensitive element 410 is exposed, for example, through a cover 414 having a predetermined pattern, made up of parts, as shown at 416, which are essentially capable of transmitting incident radiation and other parts. , as shown at 418, which are essentially incapable of transmitting electromagnetic radiation.
The radiation-sensitive element 10, as deorit in detail in the above, is essentially composed of a metal layer 420 provided with a coating layer 422 of material capable of inter-reaction with the metal or metals of metallic oouohe 420, as a consequence of exposure to electromagnetic radiation,

   such as light * Metal layer 420 is foil or film

  <Desc / Clms Page number 39>

 containing to the monk a metal, either alone or alloyed with one or more other metals, or combined or mixed with one or more other elements. The metal layer 420 can thus contain any of the most common metals, such as 'silver, copper, niobium, lead, iron, aluminum, chromium, nickel, etc. The coating layer 422, deposited by adhesion on the oouohe 420, oomprend one of the materials defined above.

   The metallic layer 420 may be required, for certain applications, of a metallic or non-metallic reinforcing support or qubatrat as shown at 424 by an imaginary line. Each of the layers may have a thinness of the order of a few layers of. atoms or a few A's and its thickness can reach a few hundredths of a millimeter-
The radiation sensitive element 410, formed for example of a metallic silver layer 420, covered with a coating layer 422 of arsenic sulphide, is exposed to incident electromagnetic radiation by means of a mask 414, as explained above,

   or is impressed by means of a suitable design projected onto read by an appropriate projection system - During exposure of the radiation sensitive element which is offected oommo shown on its face having the coating layer 422, certain areas, as shown at 426, are struck by the electromagnetic radiation inducing '' 412, while other areas, as shown at 428, are not subjected to the effect of the irradiation.

   As a consequence of this selective and discrete exposure to electromagnetic radiation at discrete areas of the boundary layer between the metallic silver layer 420 and the arsenic trisulfide coating layer 422 which are exposed to electromagnetic radiation, there is one or more inter-reaction products are selectively and unobtrusively formed, as shown at 430 at rod 35.

   Areas not subjected to irradiation are

  <Desc / Clms Page number 40>

 left intact, as represented by @ @ the formation of
 EMI40.1
 this produces at s: -.,:.:; ,, 3 () '..1. è! "Vq" 't dae 1 \ 1'1: '99 i: r1'adi4ee causes a substantial selective and discrete reduction in the adhesion force between the arsenic trisulfide coating layer 422 and the arsenic trisulfide layer. metallic silver 420.

   The parts of the areenia triulphide coating layer 422 corresponding to these irradiated areas may be removed by means such as, for example, a non-rigid sheet member, as shown at 434 in FIG. 36, carrying on one face 436 an adhesive producing a bond with the coating layer 422 of intermediate strength between the adhesion force of the arsenic trisulfide layer 422 and the metallic silver layer 420 and the force of adhesion reduced between these irradiated areas.

   Therefore, when an adhesive coated sheet 434 is pulled back, the parts of. the coating layer 422 corresponding to the irradiated areas of the radiation sensitive element 410 are drawn and entrained by the sheet 434, as shown at 438, as a consequence of the adhesion to the sheet with a force greater than the adhesion between the layers of the irradiated areas, while the other parts, as shown at 440, of the coating layer 422, which retain a strong adhesion to the metallic silver layer 420, are caused to break sharply and separate from the parts 438 while remaining in position, so that the stripped radiation sensitive member is essentially as shown schematically at 1a.

   Fig 37, having discrete surface areas 442 of the metal layer exposed or uncovered and not protected by the arsenic triulphide coating layer 422.



   The uncovered surface areas 442 of the metallic silver ouohe 428 are then treated by electrolytic deposition, according to one aspect of the invention, by being placed in a bao 444 (fig. 38) containing an electrolyte.

  <Desc / Clms Page number 41>

 446 in which the element 410 is immersed, the metallic silver layer 428 being placed in a direct current electrical circuit having a direct current source 448 so as to form a cathode, a plate or a suitable block of metal, as shown at 450, being connected to the negative terminal of power source 448.

   Depending on the electrolyte used and the composition of the anode plate 450, a metal or metals of predetermined composition are fixed by electrolytic deposition on the metallic silver layer 420, at the level of the airce 442 which are not protected by the remaining parts. :! 140 of the coating layer 422.

   Obviously, if the metal layer 420 is not provided with a reinforcing support or insulating substrate 424, it is preferable to cover the surface of the metal layer 420, opposite to its surface discretely provided with the remaining parts. 440 of the coating layer 422, of an insulating paint or varnish, so as to prevent electrolytic deposition thereon and this deposition is undesirable.

     Since the material forming the coating layer 422 being, in practice, a dielectric, as is the case with arsenic trisulfide or pentasulfide, there is no electrolytic deposition on the surface of the remaining parts of the material. the coating layer 422 in contact with the electrolyte. When using materials which conduct a little better current, such as arsenic, bismuth or the like to form the coating layer 422,

   whether or not the electrolytic deposition on the coating layer occurs or not is of little importance due to the poor adhesion of this electrolytic deposit to the material of the support and the thinness of the coating which can easily be removed by simple cleaning mechanical or chemical.

   Alternatively, when the coating layer 422 is made of a material which can be subjected to some electroplating, a simple operation of coating the outer surface of the parts.

  <Desc / Clms Page number 42>

 446 in which the element 410 is immersed, the metallic silver orohe 428 being placed in a direct current electrical circuit comprising a direct current source 448 so as to form a cathode, a plate or a suitable block of metal, as shown at 450, being connected to the negative terminal of power source 448.

   Depending on the electrolyte used and the composition of the anode plate 450, a metal or metals of predetermined composition are fixed by electrolytic deposition on the metallic silver layer 420, at the areas 442 which are not protected by the remaining parts. :! 440 of the coating layer 422.

   Obviously, if the metal layer 420 is not provided with a reinforcing support or insulating substrate 424, it is preferable to cover the surface of the metal layer 420, opposite to its surface discretely provided with the remaining parts. 440 of the coating layer 422, of an insulating paint or varnish, so as to prevent electrolytic deposition thereon if this deposition is undesirable.

     Since the material forming the coating layer 422 being, in practice, a dielectric, as is the case with arsenic trisulfide or pentasulfide, there is no electrolytic deposition on the surface of the remaining parts of the material. the coating layer 422 in contact with the electrolyte. When using materials which conduct a little better current, such as arsenic, bismuth or the like to form the coating layer 422,

   Whether or not the electrolytic deposition on the coating layer occurs is of little importance due to the poor adhesion of this electrolytic deposit to the material of the support and the thinness of the coating which can easily be removed by simple cleaning mechanical or chemical.

   Alternatively, when the coating layer 422 is made of a material which can be subjected to some electroplating, a simple operation of coating the outer surface of the parts.

  <Desc / Clms Page number 43>

 other parts 428 are left intact. at the boundary or interface between the metal layer 420 and the substrate
 EMI43.1
 1, "'... ¯1 ......-......" "...-.....'" '- ""' T / 11N 11'9 "" 't ,,) "'14:' to 1- fisante to the incident radiation from the point of view of the temple or the intensity, or both, it forms one or more product of inter-reaction as shown at 430 in FIG. . 50 which, due to the thinness of the metallic layer 420, consumes
 EMI43.2
 an deep touz i ;,,., A; = 1¯ A 1- metallic new 'Lee other, parts 432 of the boundary layer which are pi-. :

  7 ±, - 4u rnvonne. electromagnetically remain provided with unreacted parts 494 of the metal layer 420. Once the inter-reaction product 430 has been removed, for example by mechanical means such as friction or by chemical means such as dissolving the inter-reaction product in an aqueous solution of a base such as sulfide or sodium hydrochloride, the radiation sensitive element is as shown in Fig '51, and oomporte a substrate 422 presentai discrete portions 484 of metal layer 420 forming an appropriate pattern corresponding to the area formed by the mask through which the radiation sensitive element was originally exposed to electromagnetic radiation, or,

   alternatively, to the design projected onto the surface of the metallic layer 420. The discrete surface areas 486 of the remaining portions 484 of the metallic layer 420 can then be electroplated with a suitable metal by means of a process as already. described with reference to Fig '38, the metal layer 420 being oonvenab ment connected to the positive terminal of the power source. After the electroplating, the article obtained is as shown in H on rod 52.

   The article H thus constitutes the remaining parts 484 of the metallic layer 420 adhering to the substrate 422 and having their surface areas 486 reopened from electrolytic deposition, as shown at 488, with a coating of an additional metal.

  <Desc / Clms Page number 44>

 could be, for example, an electric circuit.



   However, if one wishes to obtain a finished article
 EMI44.1
 "" U.t1, U..J .... 4 oo ùo. ± A f - - Ju 1 5JlÎ ùT µ j 1: V "'' '' '' '.- 04' 2, r" -l "" <1 be dissolved in a suitable solvent, or alternatively, the substrate 422 may be removed by a wave exposure of the element, as illustrated in fig '53, by causing the electromagnetic radiation 412 to arrive on the element. side of the substrate so as to cause the formation of the interaction product 454 at the interface between the remaining parts 484 of the metal layer 420 and the adjacent substrate 422.



  This second exposure, as already mentioned, should present only the duration and intensity necessary to reduce the adhesive force between the remaining parts 484 of the metal layer 420 and the oontaot area of the substrate 422, from aorta that the last oe can then be easily ripped from. the metallic layer 420, giving the finished article J illustrated to the rod 54.



   If the second exposure to electromagnetic radiation is sufficient, in duration and intensity, to completely consume the remaining parts 484 of the metallic layer 420, the article obtained is similar to article X of fig '55, which consists exclusively of a metallic pattern formed by the parts 488 of metal fixed by electrolytic deposition In this variant of the invention, the element sensitive to electromagnetic radiation was only used as a vehicle to obtain an appropriate metallic pattern corresponding to the pattern initially projected on the element, made of metals or alloys, of any suitable composition and thickness.

   Such a method has particular utility when it is desired to obtain a metallic pattern made of a metal which is incapable of reacting with a material forming a layer 422 under the influence of electromagnetic radiation.



   It can thus be seen that the methods of the invention make it possible to produce metallic designs in relief.

  <Desc / Clms Page number 45>

 by means of a radiation sensitive element which is then electrochemically treated so as to electroplate selectively and discretely selected portions of the element or alternatively to selectively and discreetly erode selected parts of the element-
As shown in particular in Figs. 56 to 65, the invention, according to another of its aspects, adorned with the production proaédés of an artiole drawing in metallic relief by irradiation, in accordance with the drawing to be reproduced, of an element sensitive to radiation s:

   heat, consisting essentially of a metal layer covered with a coating layer which adheres thereto, of a material capable of inter-reaction with the metal when the element is exposed to either electromagnetic radiation or heat - After exposure to electromagnetic radiation which causes a reduction in the adhesion between the coating layer and the metal layer, the element is stripped of the parts of the coating layer corresponding to the irradiated areas and is then heated to cause an inter-reaction between the remaining parts of the coating layer and the metal layer,

   by consuming in depth and thus eroding the metal of the metallic oouohe-
There is shown in schematic section in FIG. 56 an element sensitive to electromagnetic radiation 510 constitutes
 EMI45.1
 essentially killed, as already explained, 'J., ruz -.-- 5. :: ac: ¯' ".... :: :: .... lique 512 carrying a layer of coating 514 which adheres to it, in a material capable of undergoing inter-reaction with the metal of the metal layer 512 by exposure to electromagnetic radiation, for example to light radiation.

   For the practice of the methods of the invention in a more efficient and cost effective manner, it has been found that certain metals forming the metal layer 512, and certain materials forming the coating layer 514 have been shown to be effective.

  <Desc / Clms Page number 46>

 better affinity for each other abous the influence of exposure to electromagnetic radiation and in particular us the influence of heat- Preferably, the metal of the metallic ouohe 512 is silver or copper, and pre- In particular, the coating material 514 is a material belonging to a group consisting of arsenic trisulfide, arsenic pentasulfide, mixtures of lead and iodine and mixtures of sulfur, arsenio and arsenic. a halogen, for example an arsenic-sulfur-iodine mixture.

   However, any of the other metals mentioned in the above can be used to form the metal layer 512, either alone or alloyed with other metals, or in combination with one or more other elements, for example nickel, nickel. niobium, lead, ter, chromo, aluminum, etc-
The coating material 514 can also be made from any of the other materials mentioned above, such as arsenio, sulfur, iodine, selenium, telure, thallium, or a halide, a. sulfide, iodide, arsenide, selenide or telluride metal and mixtures of sulfur and selenium, or a ternary material containing arsenic, sulfur and bismuth as a variant of the material mentioned oi- above.



   The material forming the coating layer 514 is attached to the metal layer in the glassy form, preferably by vacuum deposition or the like. The bond formed by adhesion between the metal layer 512 and the film layer. coating 514 at the interface 516 between them is essentially strong. The thickness of both the metal layer 512 and the coating layer 514 is preferably on the order of a few atom layers to a few microns '
For the implementation of the method of the invention, the sensitive element 10 is first exposed in the manner described above to an inoident electromagnetic radiation,

  <Desc / Clms Page number 47>

 for example light as represented by floches 518,

   falling on the element sensitive to radiation following a
 EMI47.1
 lidasâ, tlï iltt! uJ.in.lya.l .: .J; "'4 <:; ;.: "'::. ::.: ¯ .... .I ,, ...., .. 4 .t t.' .. a.'j3. Of the radiation sensitive element may be effected, for example, by exposing the sensitive element to electromagnetic radiation 510 with incident light through a cover 520 of which parts 522 are essentially capable of transmitting light, and other parts 524 essentially unable to transmit light.

   It is evident that means other than the cover 520 may be used to expose the element unreachable to electromagnetic radiation 510 to the incident light to allow this light to fall on the element in a selective and discreet manner. , for example by projection onto the element of a predetermined drawing by means of well-known image projection systems *
Under the influence of this selective and discrete irradiation of the radiation sensitive element 510, there occurs at the boundary or interface 516 between the metal layer 512 and the coating layer 514 an inter-reaction. causing the formation of an intor-reaction product as shown at 526 in FIG.

   57, in the areas 527 of this limit or this interface corresponding to the areas subjected to illumination during the exposure, while the other airer of the limit or of the interface, comr represented at 528, which are protected from the The illumination by the non-transmitting parts 524 of the cover 520, are left untouched.



   The boundary areas 527, as a consequence of the formation of the inter-reaotion product 526, form reduced adhesion interface portions of the coating layer 514 and the metal layer 512 allowing the layer to reapply. garment 514 to be stripped, selectively and discreetly from the. metallic orohe level of these irradiated areas - The

  <Desc / Clms Page number 48>

 stripping can be carried out by any appropriate ohimic means, for example by bending or bending the element or
 EMI48.1
 ; ..:, I- - 4-4 h- "4 '" ,,,, 0 \ "' \" "'14 :. \". 1.D. any of these means causing the parts of the coating layer 514 corresponding to the boundary areas 524 to separate from the metal layer 512.

   However, the stripping is carried out separately by means of a foldable sheet 530 (Fig. 58), having on one side 532 a coating of adhesive forming a very strong bond with the outer surface of the coating layer 514. The force d 'adhesion between the plia- element;

     ble 530 and the outer surface of the coating layer 514 is, however, less than the normal force of adhesion between the coating layer 514 and the metal layer 512 at the areas 528 which have not been subjected to the irradiation. therefore, when the collapsible member 530 is pulled back as shown in Fig. 58, it peels away discrete portions 534 of the substantially brittle coating hole 514 which correspond to the irradiated areas 527 of the radiation sensitive member and which ae clearly separate portions 536 of the coating layer corresponding to the non-irradiated areas 528 of the boundary or interface 516.



   The exposed and stripped electromagnetic radiation sensitive element is then subjected to the emotion of heat, as shown in FIG. 59, by being rapidly heated to a temperature high enough to cause a heat-initiated reaction between the material of the remaining portions 536 of the coating layer 514 and the metal of the metal layer 512 at the boundary or interface 528 of oontaot between them - This temperature is usually in the neighborhood of a few hundred degrees and the thermal reaction is effected simply by placing the exposed and stripped element on a "hot plate" essentially similar to the hot plate of an ordinary electric oven,

   the metallic layer

  <Desc / Clms Page number 49>

 512 being in contact with the hot surface * - Under the influence of the heat supplied to the element, the remaining parts 536 of the coating layer 514 react rapidly with the metal of the metal layer 512 at the contact areas 526 between them, causing a deep attack of the metal layer on these contact areas. The product or products formed as a consequence of this inter-reaction caused by the heat between the remaining parts of the covering layer 51A ot the metal of the metal layer 512 is vaporized or sublimated as soon as they form, so that the item A1 held is a metal layer 512 having a pattern.

   elief formed by hollow parts as shown at 53a in FIG. 60, which correspond to the surface of the metal layer 512 which has been attacked as a consequence of the inter-reaction caused by heat. between the remaining portions 536 of the coating layer 514 and the metal of the metal layer 512, and having substantially uni-planar protrusions 540 corresponding to the irradiated surface portions 527 from which the coating layer was washed during the coating operation. counting following the exposure of the sensitive element to the ray. original in the light.



   With a metal layer 512 which is essentially thin, generally on the order of 1 micron or less, the heat-induced attack of the metal layer is caused to extend from one surface of the aorta to another. the finished ar- tial is similar to item B1 of fig. 61; composed of a metallic layer 512 provided with remaining parts 542 which form an appropriate metallic pattern by contrast with perforations 544 resulting from ourfaoe attack on the surface of the metallic layer.
Da fig. b2 shows in schematic section a variation of the radiation sensitive element 510 '.

   This variant of the element is essentially similar to the element

  <Desc / Clms Page number 50>

 
 EMI50.1
 previously described, otest-à-dir qt1'dlidbôrdpd'rts a motallic oouohe 512 provided with a coating layer 514 which adhered to it * However, the metal layer 512 has on its remaining free face a reinforcing support or substeat 546 consisting of any suitable aorta material only after exposure to incident light through a suitable mask 520, and after stripping of portions of the coating layer, mount 514 and heat application to the element. - ment, as already explained, the artiole obtained is essentially as shown schematically on, in fig 63,

   formed by a metallic relief pattern 542 supported by a reinforcing support or substrate 546. FIG. 63 shows in C1 a finished article in which the metal layer 512 was initially thin to a sufficient extent that the heat etching of the metal layer had been completely effected from its surface together with the remaining parts of the layer of metal. coating entirely to the surface of the substrate 546. Obviously, the material of the substrate 546 should preferably be such that it does not react with the material of the coating layer 514 or the resulting product. the thermal reaction between the material of this coating layer and the metal of the metal layer 512.

   It is also evident that the metal layer 512 can be made thick enough not to be attacked entirely from one surface to another during the heating operation of the method of the invention, so that the artiole obtained. is essentially analogous to the artiole A1 of fig 60, provided with a suitable reinforcing support or substrate. ;

   
Fig. 64 schematically shows an application of the invention for the production of an article provided with a metallic relief design, for example a printed electrical circuit. The radiation sensitive element 510 ', whereby a metal orohe 512 disposed on a substrate 546 of non-conductive material, and provided with a layer of

  <Desc / Clms Page number 51>

 
 EMI51.1
 coating 514,

   is exposed to a radiation such as light 518 through a cover 520 having suitable parts 524 incapable of transmitting light and other parts 522 essentially capable of transmitting light * The combination of several parts capable of transmitting the light from the cover forms the outer profile of a typical circuit design having conductors 548 and terminal portions 550 provided with small portions incapable of transmitting light 552, at the following fines indicated below the light exposure as represented at the
 EMI51.2
 fig. 64 and u "wettemount doo partio6 do the coating layer., 'Corre-mnndant to the areas of the element 510' subjected to the air. # '+ .Armedia.xe d:

  . cover, followed by the thermal reaction between the remaining parts of the coating layer and the metal layer 512, in accordance with the method of the invention explained in detail in the above, the article obtained D1 is a printed circuit formed of metal conductors 554, with the drawing illustrated in fig.

   65, and provided with suitable terminals 556 having recesses 558 for connection with electrical or electronic conductors, by soldering or the like. The circuit is "printed" on the surface of the substrate 546 forming for it a support base, and is in all points oomparable to a printed circuit obtained by conventional and more complex processes.
In the foregoing, it has been explained in detail, starting with selective and discrete exposure of a radiation-sensitive element in accordance with the invention to electromagnetic radiation of sufficient intensity and duration to cause complete inter-reaction between the elements. irradiated parts of the coating layer and the metal layer of the element,

   the metal layer is attacked in depth at the level of selectively and discreetly irradiated areas. The invention further relates to forming a metallic pattern.

  <Desc / Clms Page number 52>

 by exposing an element sensitized to the rayonnemont to an image of electromagnetic radiation following a predetermined pattern, and following this selective and discrete exposure with a second uniform exposure to electromagnetic radiation of intensity and duration only sufficient to cause a slight inter-reaction between the metal layer and the covering layer at the boundary between them to cause a significant reduction in the mutual adhesion force.

   The remainder of the coating layer is then removed by pulling or torn off from the metallic layer which has been previously provided with a substrate, so as to thus form on the substrate a metallic pattern corresponding to the image projected on the substrate. 'radiation sensitive element
With regard more particularly to FIGS.

   66 to 79, these figures show variants of the method of the invention for obtaining a metallic pattern on a suitable substrate by means of a typical radiation sensitive element 610 according to the invention, essentially comprising a Botanical layer 612 provided with a coating layer 614 which essentially adheres thereto, and which is formed of a material capable of interacting when exposed to electromagnetic radiation, with the metal or metals of the metal layer 612.



   As described in detail in the foregoing, the metal layer 612 of the radiation sensitive element 610 (fig. 66) comprises a metal, either alone or alloyed with one or more other metals, or combined or mixed with one or more. Other Elements The coating layer 614, adhesively attached thereto, comprises any of the materials described above.



   The radiation sensitive element 610 of Fig. 66 is further illustrated as having a reinforcing support or substrate 616 placed by substantially weak adhesion with the metal orohe 622. This reinforcing support or substrate 616

  <Desc / Clms Page number 53>

 substrate 616 is not absolutely necessary, but is often advantageous for providing essentially rigid support for the two-layer assembly formed of the metal layer 612 and the coating layer 614 due to the thinness of each layer, ranging from a few layers of atoms with a few A's, the reinforcing support or substrate 616 thus providing great mechanical resistance to the element which can:

   be handled with minimal care - A typical configuration example for a radiation sensitive element 610 would consist, for example, of a glass substrate 616 provided with a metallic silver shell 612 and having on its other side a layer of very strongly adhering 614 coating made of arsenic trisulphide
The radiation sensitive element 610 is exposed, as already explained in the foregoing, selectively and discreetly, to incident electromagnetic radiation 618, for example intense white light, via a cover 620 having a suitable design composed of parts as shown at 624 which are essentially capable of transmitting incident radiation,

   while other parts 624 of the cache are essentially unable to transmit radiation. The radiation sensitive element 610 is thus exposed so that the parts of the incident radiation 618 fall on the coating layer 614 and cause inter-reaction between the material of the coating layer 614 and the metal of the metal layer 612 at the same time. level of the irradiated areas of the interface or boundary layer between them, as shown at 626, while other areas 628 are protected from radiation - It is evident that other means can be employed to selectively and discreetly expose the element radiation sensitive 610 to incident electromagnetic radiation, for example by projection onto the surface of the radiation sensitive element,

   by any well-known suitable projection device, of a

  <Desc / Clms Page number 54>

 appropriate drawing image ''
The radiation sensitive element 610 is exposed to incident electromagnetic radiation, as already explained, for a time sufficient to cause inter-reaction between the material of the coating layer 614 and the metal of the metallic layer. 612 to consume in depth all the metal of the discrete parts of the metal oouohe! corresponding to the areas 626 thus irradiated, with formation of the inter-reaotion product as represented at 630 in FIG. 67.



   In accordance with one aspect of the invention, a suitable substrate 632 formed of any suitable material such as glass, plastics or metal foil, etc., is disposed, as shown in FIG. 68, in contact with the exposed surface. outer surface of the coating layer 614, the substrate 632 'having on its face 634, adjacent to the outer surface of the coating layer 614, an adhesive layer forming an essentially strong bond with the surface of this coating layer - It is sufficient that the bond formed between the substrate 632 and the coating layer
614 is stronger than the bond formed between the metal layer 612 and the reinforcing support 616, so that the assembly formed by the substrate 632 to which the remaining parts 638 of the coating layer 614 adhere and the,

   remaining portions 636 of metallic layer 612 are readily separated from reinforcing support 616 as shown in Fig. 69.



   The artiole obtained is the article A2 of the fig 69 constituted by the substrate 632 provided with a metallic pattern formed by the remaining parts 636 of the metal oouohe # 612, the remaining parts 638 of the coating layer 614 being arranged between these metal parts 636 and the substrate 632.

   This article is a useful article for some applications * For example, Artiole A2 can be used

  <Desc / Clms Page number 55>

 as intaglio printing plate, the surface parts for-
 EMI55.1
 mées by àd produce G, i ',:. 1 vd .: .........: they r y ^ i. the 2 = iù =; ± h ± nz of a wetting by an ink or similar agent, while the surface of the metal parts 636 is essentially impermeable to this wetting-
For other applications, it is preferable to remove the inter-reaction product 630, this removal being effected by simple mechanical means, for example by wiping or brushing or by chemical means; for example pa:

   dissolving the inter-reaction product in an aqueous solution of a base, so that the article obtained is the artiol B2 of fig 70 provided with a raised metallic image composed of the remaining parts 636 of the layer metal 612 disposed by adhesion to the root portion 638 of the coating layer 614, recesses 640 being formed at the portions of the two layers which interacted during exposure to the incident electromagnetic radiation forming the design.



   According to another aspect of the invention, the metallic layer 612 of article B2 is placed in adhesion with a substrate 642 having on one face 644, in contact with the metallic layer, an adhesive forming an appropriate bond (with the surface of the metal layer as shown in fig '71.

   The preallomet substrate 632 disposed on the surface of the coating layer 614 is in this case formed of a material which is essentially capable of transmitting electromagnetic radiation, such material being glass, transparent plastic or the like.
The assembly thus formed is subjected to a second esp @@ aition to the incident electromagnetic radiation 618 falling on its side provided with the substrate 632 capable of transmitting the radiation, as shown in FIG. 74, for a period and with an intensity sufficient to cause a slight inter-reaction between the remaining parts 638 and 6.

   

  <Desc / Clms Page number 56>

 respectively, of the coating layer and of the metal layer 612, causing at the interface or limit between them the formation of a slight amount, as shown at 646 in FIG. 73, of the inter-reaction product causing a substantial reduction in the adhesion force between the remaining portions 638 and 636 of the coating layer 614 and. ; of the metal layer 612.

   As a consequence of the reduction in the adhesion force between the layers, the coating layer 614 can be separated or stripped from the metallic layer 612 thereby obtaining an article O2 (fig '74) comprising a metallic pattern formed by the remaining parts. 636 of the metal layer 612 arranged on the substrate 642.



   It should thus be noted that by the method of rods 66 to 70, variations of finished articles can be formed. formed and consist primarily of a metallic pattern on a substrate, the remaining parts of the coating layer 614 being disposed between the metallic pattern and the substrate while by the process illustrated in Figs' 66 to 74 a metallic pattern is formed on a substrate appropriate, this metallic design being actually transferred from the original electromagnetic radiation sensitive element to a suitable support or substrate * The radiation sensitive element 610 of the pin 66 can actually be considered a universal element to obtain,

   by a transfer process as illustrated in Figs. 66-74, a suitable metallic pattern on a suitable substrate. For special applications where the material and other characteristics of the substrate on which a metallic pattern is desired are known, the The radiation sensitive element may be designed so as to be provided during manufacture with a suitable substrate material affixed by adhesion to the metal layer. This radiation-sensitive element is shown in a diagrammatic section, at 611 on the rod 75.

   The radiation sensitive element 611 is

  <Desc / Clms Page number 57>

 thus formed of a suitable substrate 642. to which adheres a metallic layer 012 provided to its undercoating 614 of a material capable of interacting with the metal of the metallic layer 612 when exposed to electromagnetic radiation - To facilitate handling during the successive operations of obtaining a suitable metallic pattern on the substrate 642, as explained in detail in the following section, the radiation sensitive element 611 is preferably provided with a transmitting layer 632. radiation. a non-reactive material such as glass,

   a pla3T material or another similar transparent material *
The radiation sensitive element 611 is selectively and unobtrusively exposed to electromagnetic radiation 618, as shown in FIG. 75, by exposure through a cover 620 or by projection onto the element of an image. appropriate.

   Exposure to electromagnetic radiation is carried out for a period of time and with sufficient intensity to cause in the irradiated areas of the element an inter-reaction between the metal of the metallic layer 612 and the material of the coating layer 614 by causing a deep consumption of the metal of the metal layer with formation of the inter-reaction product 630 at these irradiated areas, as shown in fig '76.

     In order to reduce the adhesive force between the metal layer 612 and the cover layer 614, the radiation sensitive element 611 is then uniformly exposed to the incident radiation for a short period of time so as to cause the formation of a very thin layer of inter-reaction product 646 at the interface or the boundary between
 EMI57.1
 they, like ...

    .v .. 'eSO; 4..d: -'-' - ')' - illa.n1ere quo the I, v ... \. 1.Cl (of 614 coating puioee easily be separated from the metallic layer 612 as shown in fig 78, leaving had: the substrate 642 a metallic pattern formed by the parts

  <Desc / Clms Page number 58>

 The remaining 636 of the metallic layer 612 and the parts # of the inter-reaction product 630 corresponding to the selectively and discretely irradiated areas, thereby obtaining the finished article D2.

   After removal of the inter-reaction product 630, the article obtained is similar to that shown on E2 in FIG. 79, consists of a suitable metallic pattern formed by the remaining portions 636 of the metallic layer 612 disposed on the substrate 642.



   To further simplify the process illustrated in Figs. 75-79, the selective and discrete exposure to the incident radiation, illustrated in Fig. 75, may be effected through a mask or by means of an image projected onto the radiation sensitive element 611 such that a small amount of radiation can fall uniformly onto the radiation sensitive element, selective and discrete parts being irradiated with a greater intensity of radiation, these parts corresponding to parts 622 of the cover 620 capable of transmitting the radiation, so that the second exposure illustrated in fig '76 is carried out at the same time as the selective and discreet exposure to the image of the drawing, shown in fig. 75.



   It should be noted that the methods of the invention illustrated in FIGS. 66-79 allow metallic designs to be made on a suitable substrate by means of a radiation sensitive element without requiring complicated or delicate chemical treatment of the element after exposure to an appropriate radiation image of the design to be. got-
According to another of its aspects, the invention features methods of producing offset lithographic plates and the like by means of radiation sensitive elements, essentially comprising a metallic layer, a second layer of capable material, when exposed. electromagnetic radiation,

   to form an inter-reaction product

  <Desc / Clms Page number 59>

 with the metal or metals of the metal layer and a
 EMI59.1
 ro181èm "coucad rormand 6kz aup..r .. * js" "..-. W¯ ..., ,, o.,) J /" '"r- cedes consisting in exposing the sensitive element to the radiation to a image projected onto them, resulting in a selective and discrete inter-reaction between the metal or metals of the metal layer and the material of the second layer, so that the reacted parts have hydrophilic or olecphilic qualities different from those of the part unreacted items *
The figs 80 to 86 show, by an exaggerated schematic sectional view at the rod 80,

   a typical radiation sensitive Piedmont 710 having essentially three different layers essentially adhering to each other. The first or upper layer is a metallic layer 712 disposed by adhesion and in intimate contact with a second layer 714 of material capable, when exposed to electromagnetic radiation, of undergoing an interaction with the metal or metals. of the ketallic layer 712, as already explained in detail. The layer 714 is in turn disposed by adhesion on a reinforcing support or third layer 716 of a material incapable of undergoing an interaction with the second layer 714, even if it is exposed to electromagnetic radiation.



   The reinforcing support or third layer 716 forms a suitable mechanical support, reasonably flexible, for the two-layer assembly formed by the metallic layer 712 and the layer 714, these layers 712 and 714 being essentially thin, ranging from a few layers of atoms to a few A's, while the reinforcing support or third layer 716 is preferably a few hundredths of a millimeter thick. The material of the reinforcing support or third or third layer 716 can be any material. suitable but preferred is a metal such as, for example, aluminum or aoier.

   A typical example of a configuration for an element

  <Desc / Clms Page number 60>

 sensitive to radiation 710 therefore consists of a
 EMI60.1
 auppon a'd + U11lnlJàl Qu i J..9: rtL'19 s: v4Ju wi; . '. . hundredths of a millimeter thick, provided with a coating of
 EMI60.2
 tri91! ure or pentaoulfide of arsenic a few A thick forming the second layer 714 provided in turn with a metallic layer 712 of silver or silver-or-drunk alloy, a few layers of atoms or a few A's thick, and therefore

   thin enough to transmit electromagnetic radiation such as intense white light from an electron shell
The radiation sensitive element 710 is selectively and discreetly exposed to the incident electromagnetic radiation 718 caused to fall on the metallic layer 712 through a cover 720 having a suitable design, composed of parts, as shown at 722, which are essentially capable of transmitting incident radiation, while other parts 724 are essentially incapable of transmitting this radiation. Alternatively,

   an image can be projected by any suitable well known projection device onto the surface of the metal layer 712 to form a suitable image or pattern thereon *
The electromagnetic radiation falling selectively and discretely on the surface of the metallic ouohe 712, at the level of the areas designated by 726, is transmitted to the boundary layer between the metallic layer 712 and the ouohe 714-, at the level of corresponding selective and discrete areas to the irradiated surface mows 726 thereby causing a selective and discrete inter-reaction between the metal or metals of the metal layer 712 and the material of the layer 714.

     With a view to sufficient exposure both in terms of duration and intensity of the radiation, reacted surface areas are formed corresponding to these irradiated areas which, as shown at 728 on rod 81, are formed by the interaction product resulting from this selective and discreet inter-reaction

  <Desc / Clms Page number 61>

 between the metal or metals of the metal layer 712 and the material of the ouohe, 714. Other surface areas of the metal layer 712, as shown at 730, remain intact. The inter-reaction product at areas 726 has generally shown good oleophilic qualities. that the intact unreacted surface portions 730 of the metallic layer 712 possess essentially hydrophilic qualities.

   The choice of metallic layer 712 and the material of layer 714 can predetermine the direction of wetting. Therefore, the affixed radiation sensitive element 710, shown in FIG. 81, can be used as an offset lithographic plate or the like, without any subsequent treatment. This is done in the manner well known in the art of printing by offset lithographic plates, by attaching a plate, as illustrated to the rod 81, on a drum of a printing machine, by wetting its surface with a film of water, then by embossing the surface of the plate.

   The hydrophilic surface portions 728 of the plate absorb water during the wetting operation and therefore repel ink during the wetting operation. The non-wettable surface portionsa 730 of the plate due to their oleophilic qualities a accept ink during inking and the lithographic plate can thus be used to discretely and selectively ink a printing belt appropriately. or a similar member which is used, in turn, to print directly on a suitable material capable of receiving printing.



   It has been found that when the metal layer 712 is very thin, on the order of a few atom layers to a few A, and is made of a metal such as silver, after selective and discreet exposure to electromagnetic radiation in the form of an image projected onto the surface of the radiation sensitive element 710, the lithographic plaus

  <Desc / Clms Page number 62>

 
 EMI62.1
 Offset chique obtained gr4nently and discreetly from inter-reaction material 728 which is oldophilic, while the unreacted areas 730 of the metal layer 712 behave as a hydrophilic medium.

   The reason for this behavior may be a consequence of the thin film structure and if before exposure the surface is cleaned and coated with gum arabic, the hydrophilicity of the thin metal layer 712 is enhanced and results in an offset lithographic plate whose ratio of the degree of oleophilicity to the degree of hydrophilicity of the exposed areas is greater than the corresponding ratio of the unexposed areas, while the thicker metal layers 712 can be made to give an opposite result, as explained in the above *
The invention is illustrated by the following examples, given without limitation.
Example 1
A radiation sensitive element 710 consists of
 EMI62.2
 by a reinforcing support 71.6 formed by a very thin aluminum core,

     covered with a layer 714 a few A thick of arsenic trisulphide, in turn carrying a coating forming a metallic layer 712 of silver, one or two A thick - After selective and discreet exposure to radiation electromagnetic, the lithographic plate obtained shows hydrophilic qualities compared to the parts of the irradiated surface area having reacted and oleophilic qualities compared to the parts of the surface which have not reacted *
Example 2
An element sensitive to radiation 710 consisting of an aluminum reinforcing support 716, reopened with a layer 714 of arsenic pentasulfide a few # thick,

   bearing a metallic layer 712 of silver, of

  <Desc / Clms Page number 63>

 ...... a few layers before exposure to electromagnetic radiation by cleaning the surface of the silver using a solution of aoido nitric of average concentration and by coating this surface with gum arabic - After exposure, unreacted silver surface parts have hydrophilic qualities, while reacted surface nettles have oleophilic qualities.
Example
An element 710 consisting of an aluminum reinforcing support 716, carrying an oouohe 714 of arsenic bridging a few 1 thick,

   provided in turn with a metallic layer of copper 712, with a thickness of a few layers of atoms to a few A, after elective and discrete exposure to electromagnetic radiation, exhibits reacted parts which possess hydrophilic qualities, while the unreacted parts of metallic copper have oleophilic qualities.



     Figure 82 shows in section a variant of the element sensitive to radiation 710, provided with a reinforcing support or third layer 716 capable of transmitting the radiation, for example a thin transparent layer of a plastic material * Ayoo such a arrangement of the elements, 'it is therefore possible to discreetly and selectively expose the reyomnement sensitive element 710' to electromagnetic radiation falling on the surface of the reinforcing support or third layer 716 transmitting the radiation, as illustrated in FIG. 82. The resulting artiole is an offset lithographic plate, as shown in Fig '83, which is in all tip substantially similar to the offset lithographic plate of Fig' 81.



   In FIG. 84, there is shown schematically in section a radiation sensitive element 710 "comprising a first layer 714 of the same material as the layer 714 of

  <Desc / Clms Page number 64>

 
 EMI64.1
 the element of the: rod 80 or 02, ootte.t1ttrè.bctO.b.h. being '..1'
 EMI64.2
 ",> IJ.> JB m:.: Hence # 1 =., ..., ...."> = 5t <l'z "i '7 1';? i" 1 to be disposed in turn in adhesion on a reinforcing support or third layer 716.



   As a typical structural example, the first layer 714 is made of any of the materials listed above, with respect to the exemplary embodiment following rod 80, for example arsenic triulfide or pentasulfide. of arsenio, the metal layer 712 can be formed from any of the metals or from a mixture of the metals already indicated, for example silver or an alloy of silver and copper and the third layer or support backing 716 may be formed from any suitable material, preferably aluminum.



   After selective and discrete exposure to electromagnetic radiation 718 via a mask 720, as shown at rod 84, or alternatively, by means of an image of electromagnetic radiation projected onto the outer surface of the tube. first layer 714, the element sensitive to electromagnetic radiation 710 "impressed is provided, oomme shown schematically in cross section in FIG.



  * 85, of aleotivea and discrete surface areas 728 formed by the inter-reaction product resulting from the reaction caused by the radiation between the metal or metals of the metallic layer 712 and the material of the layer 714, the surface expanses 732 of the layer 714 remaining unresponsive. Because the ratio of hydrophilic to oleophilic degree of reacted areas 728 differs from the corresponding ratio of unreacted areas 732, the element of FIG. 85 can be used as an offset lithographic plate or as an offset lithographic plate. similar plate, but preferably, as experiments have shown, for most applications it is better to remove the reacted parts 728 and the remaining parts of the first layer 714.

   This result is obtained by de-

  <Desc / Clms Page number 65>

 mechanical squealing or else:. alternatively, per wash
 EMI65.1
 j 1 .., .7r, ... ilÙa1 v'.nüd ûJ la j! 6. 'ri alô w14 to r.t31 û.i.d concentration of sodium hydroxide which dissolves the remaining unreacted parts of the first layer 714 and the reacted 728 parts,

   thus giving the offset lithographic plate of Fig. 86 having only the reinforcing support 716 and the remaining parts 734 which have not reacted with the metallic layer 712. The removal of the parts 72 having reacted and remaining parts of the first layer 71 is facilitated by brushing or wiping the surface of 1 plate or by jetting or spraying water -
The lithographic offset plate obtained from fig 8 is therefore a bimetallic plate comprising a support of:, metallic insert 716, for example in aluminum, parts of its surface of which are covered or hidden by a different metal such as silver , defined by the remaining parts 734 of the metallic layer 712.

   Although the exaggerated representation of Fig. 86 shows the physically exposed areas 736 of the metallic reinforcement support 716 as being set back from the surface of the areas 734 of the metallic layer 712, it should be noted that this differentiation of levels only bear, in reality, - on only a few layers o of atoms or a few A. the exposed areas 736 of the metallic reinforcing support 716 are generally hydrophilic while the surface of the remaining parts 734 of the metallic layer 712 is generally oleophilic .

   The hydrophilic quality of the exposed surface areas 736 of the reinforcing support 716 can be significantly increased by pre-granulating the surface of the metallic reinforcing support 716, before applying the metallic coating or layer 712 thereto during the fabrication of the rayon sensitive plate. This prior granulation of the surface of the metal reinforcing support 716 can be carried out by brushing anodization or granulation by balls and further favors

  <Desc / Clms Page number 66>

 the adhesion between the layers formed by the reinforcing support 716 and the metal oouohe 712.



   Example 4
A radiation sensitive element 710 'having a backing support of granulated aluminum 716, provided with a metallic silver layer 712 a few # thick, in turn carrying a surface layer 714 of triulphide. arsenic, also a few A thick, after selective and discreet exposure to electromagnetic radiation and washing in a solution with a low concentration of sodium hydroxide,

   exhibits unreacted silver parts having oleophilic qualities and granulated aluminum parts corresponding to the irradiated areas having reacted and having hydrophilic qualities Example 5
A radiation sensitive element 710 'consisting of a support for reinforcing granul4 aluminum 716 provided with a metallic layer of silver 712, a few A in thickness, covered in turn with an oouohe 714 of ohloride. Orp, also a few A thick, is discreetly and selectively exposed to electromagnetic radiation.



  The exposed element is used as a lithographic plate by placing it in a printing press, and the washing with water preceding the raking of the plate is sufficient to wash away the unreacted copper chloride and the product. re-reaction of the inter-reaction between copper chloride and silver - the remaining silver areas are oleophilic, while the granulated aluminum areas corresponding to the irradiated and reacted areas are hydrophilic *
It is evident that offset lithographic plates having the configuration of the rod 86 can be preserved, after use, for a very long period of time, without deteriorating, because.

   they consist exclusively of two

  <Desc / Clms Page number 67>

   superimposed metallic ouohes which. do - * then * likely
 EMI67.1
 ! 1 :. .Ad'w..y7 ^ y '34 - - ,, - 3 n.; NtA1 i .11, n! "'R7nlW 4 - 1. ^, - 1 -. -,, -. - - -1 - - - as shown in rod 81, 83 or 85, contain virtually reactive layer formed by the metallic ooucho 712 ot the layer 714, the inking of the surface of the metallic layer 712 of FIG.

   81 and the surface of the layer 714 of FIG. 85 forms a radiation opaque coating which allows the plates to be stored by a conventional process, for example by placing each wrapped plate in a plate which offers infinite storage life.



   In practice, the same method of storing the wrapped plate in a drawer is suitable for plates conforming to rod 83, although it is possible to reopen the surface of the reinforcing support 716, capable of transmitting radiation, to render it unfit for this transmission, if desired.



   It can therefore be seen that the methods of the invention provide a means of producing offset lithographic plates and the like by means of elements sensitive to radiation, without requiring complicated or delicate chemical treatment of the elements after exposure to images. appropriate radiation
It has further been found that some of the materials described in the foregoing as etan capable of reacting with a metal layer under the influence of electromagnetic radiation are in themselves endowed with the ability, when exposed. electromagnetic radiation,

   to show physical and chemical characteristics different from those of the same material which has not been subjected to exposure to electromagnetic radiation - Changes in chemical and physical qualities result, for example, in the ratio of hydrophilic degree to degree oleophilic of exponated airea is different from the corresponding ratio of unexposed areas.

   exposed and unexposed areas

  <Desc / Clms Page number 68>

 show differences in sofubility in particular solvents which make it possible to obtain a significant increase in the differences between the ratios of the hydrophilic degree to the oleophilic degree and the inverse ratios of these areas *
With regard in general to Figs' 87 to 89 and more particularly fig. 87, there is shown schematically, part in perspective, part in a cutout, an example of a typical radiation sensitive element 810 comprising a radiation sensitive hole 812 disposed by adhesion to a substrate or a reinforcing support 814.

   The reinforcing support or substrate 814 may be made of any suitable material forming a layer, for example, a few hundredths of a millimeter in thickness, shaped in any suitable manner so as to have a planar shape or a curved shape. reinforcing support or substrate 814. can be plastic, metallic foil such as zinc, aluminum or the like, which shows low reactivity to the material of layer 812.

   The radiation sensitive layer 812 preferably consists of a mixture of arsonio and sulfur or a compound of arsenic and sulfur such as areenio trisulfide or pentesulfide and forms an adherent layer of thickness ranging from a few layers of atoms to a few A or a few hundredths of a mm.

   The radiation sensitive layer or coating 812 is applied to the backing substrate or backing 814 preferably by vaporizing and condensing on the backing substrate or backing 814 under a reduced atmosphere, or by preparing a solution of the arsenio mixture. and sulfur or a corresponding compound in a suitable solvent such as an aqueous solution of potassium carbonate or ammonium hydroxide and by brushing or spraying a surface of the reinforcing support or aube- trat with the solution , then by evaporating the solvent, thus leaving on the surface of the reinforcing support or substrate a

  <Desc / Clms Page number 69>

 
 EMI69.1
 1 thin coating of the material: BeX:.: \ :: r1J. ¯h1.? 1o: nen .8C't;

  Magnetic - The electro-magnetic sensitive element 810 is selectively and unobtrusively exposed to electromagnetic r onment 816, for example light radiation, or by scanning with an electron beam to; ant on the surface of the electromagnetic layer 812. electromagnetic radiation by the intermediary of an approximate mask, oomne represented in 818, or alternatively, as a variation 'by projecting an image of electromagnetic radiation app .. opr14e on the surface of the layer z sensitive ;;

   i12 radiation by any conventional image projection device * Ja .. '18 the example represents, the cover 818 presents words, as illustrated in 820, which are essentially incarable to transmit 1- electromagnetic radiation 816, tended only to other parts, as shown at 822, are essentially capable of transmitting this radiation. Therefore, discrete areas as shown at 822 of the radiation sensitive layer 812 are irradiated with electromagnetic radiation 816 while other areas, such as shown at 82 are essentially protected from the action of electromagnetic radiation.



   As a consequence of this selective and discrete irradiation of the element sensitive to electromagnetic radiation 810, a latent image is formed, represented by the surface areas 824 of FIGS. 87 and 88 having chemical and physical characteristics different from those of the unexposed surface areas 826 of the sensitive layer 812.

   It was found that with a thin layer 812 of trisulfide or arsenic pen-culture deposited on a substrate or backing support 814, after discrete and selective exposure to. electromagnetic radiation such as high intensity white light or the like, the ratio of ± hydrophilic to oleophilic degree of exposed areas 824 of the

  <Desc / Clms Page number 70>

 
 EMI70.1
 ; ,, i,,, -. : 2. 911, -a- .., a;, ..;.:, .. *, ß91'h '-? Nt:

   that of the unexposed portions 826 to a considerable extent allowing the exposed radiation sensitive element to be effectively used as a lithographic plate or cylinder or the like for offset printing. With the layer 812 made of arsenic trisulfide, the unexposed parts 826 of the surface of the sensitive layer 812 are oleophilic to the point that during inking of the plate or cylinder, following wetting of the entire surface of the plate or cylinder, these unexposed surface areas accept ink while the exposed areas 824, being essentially hydrophilic, when wetted by water, refuse ink.



   The exposed area portions 824 of the radiation sensitive element 810 also show a difference in solubility in comparatively predetermined solvents. to the solubility in the same solvent of unexposed parts of areas 926. For example, radiation sensitive elements having a layer 812 of arsenic trisulfide or pentasulfide show a marked increase in solubility in a low concentration aqueous solution. of ammonium hydroxide of the parts of exposed areas 624 compared to the parts of unexposed areas 826, of the aorta that under the action of this solution of low concentration of ammonium hydroxide on the exposed element 810 of the fig. 88, a plate or an element is obtained as shown at 811 in FIG.

   89 showing discontinuities of the layer 812, as illustrated at 828, which correspond to the surface areas of the layer 812 which have been previously exposed to electromagnetic radiation and which physically expose corresponding surface areas 830 of the substrate or the reinforcing support 814.

   Other solvents which have been shown to be suitable include sodium sulfide, ammonium hydroxide, potassium carbonate and commercial detergents. It is evident that if the surface of the substrate or support is

  <Desc / Clms Page number 71>

 reinforcement 814 consists of a hydrophilic material, the ratio of the degree of oiliness to degree of hydrolysis of the unexposed areas 826 of the sensitive layer compared to the exposed areas, now removed from the surface of the reinforcing substrate or support,

   is thus essentially promoted * It is also evident that the material of the substrate or reinforcing support 814 is capable of dissolving in a suitable solvent in which the remaining particles 826 corresponding to the unexposed area of the sensitive layer rig is essentially insoluble. , los remaining parts 326 of the layer 812 act by resisting the action of, this solvent so that an article as shown in FIG.

   90 which has recessed areas corresponding to the areas initially exposed to electromagnetic radiation, These recessed areas can be made to extend to depth over the entire thickness of the reinforcing support or substrate 814 so as to form profiled openings as shown in 832 to rod 4.



   It is therefore found that the invention of the means for obtaining lithographic plates by a simple and practical process, and also gives a resistant material for the manufacture of various articles by methods comparable to the conventional and very "photoreactanoo" processes. superior to them in terms of quality, cost and ease of manufacture *;

     The invention further relates to the production of various articles by suitable exposure of radiation sensitive elements made in accordance with the invention to an electromagnetic radiation image resulting from the selective and discrete projection onto the surface of a radiation sensitive element. radiation of ordinary light, monochromatic light, coherent light, applied for example by a laser or the like, beams of particles such as an ion or electron beam, or by exposure to a

  <Desc / Clms Page number 72>

 
 EMI72.1
 Infrared or ultra radiation! 10;. :: i; .5) !:

   other rayon-
 EMI72.2
 .., 9,. + ,,.,. "C;, n," ''?! Jr.,!, 1. "1. Such as X-ray, !!! gamma rays, etc-
As a consequence of this selective and discrete exposure to electromagnetic radiation, the two layers $ of the element sensitive to electromagnetic radiation are brought to interact at the level of the irradiated areas, which leads to the formation, at the level of these irradiated areas, of an inter-reaction product having chemical and physical characteristics different from the ohimical and physical characteristics of the material of the two layers in their unreacted form.
As explained in detail in the foregoing, the elements sensitive to electromagnetic radiation shown as a whole at 910 in FIGS. 91 to 100,

   essentially comprise two dissimilar layers essentially adhering to one another. One of the layers, for example the ooucb 912 (fig. 91) is a metallic layer carrying by adhesion and in intimate contact with it a second layer 914 of a material capable, when exposed to electromagnetic radiation, of 'Inter-react with the metal or metals of the metal layer 912.

   In some applications it is appropriate to produce a suitable reinforcing substrate or support for the electromagnetic radiation sensitive element 910, which reinforcing support consists of a rigid or flexible material such as a metal plate or foil, or a sheet of material. plastic, paper or cardboard etc-, as explained in the above-
As already mentioned, the metallic layer 912 of the radiation sensitive element 910 comprises a metal, itself or alloyed with another metal or with other metals, itself in combination or in admixture with one or more other elements. metal layer 912 thus contains any one of several common metals such as silver,

  <Desc / Clms Page number 73>

 
 EMI73.1
 He, 4 = ,? ^ r 3 T4, /: '1 1 -: in - f 77, M;

   --7 A> n. 1 t n'1 m .., fi,. ", '¯ ... -r ...... ¯ ......, = - -. ¯ ..-.., ¯.¯ ... y ...... chromium, nickel, etc., The second layer 914 contains clearances, (any of the materials defined above. These materials include ternary materials containing arsenic, sulfur and iodine, or arsenic, sulfur and bismuth, for example.

   The material forming the second layer 914 can also be any one of several binary materials such as a metal halide, sulfide, iodide, selenide or telluride, monosulfide, disulfide, trisulfide and pentasulfura. arsenic and sulfur mixture
 EMI73.2
 and adienium- As -asbestos, the material of the layer 914 can be found in any of several simple elements such as halogen, arsenic, sulfur, iodine, selenium, tellurium, thallium, etc.

   Both layers 912 and 914 are essentially thin, in the range of a few atom layers to a few a or thousandths of a mm thick.
As shown in Fig. 91, the electromagnetic radiation sensitive element 910 can be exposed to the action of incident electromagnetic radiation 916 through a suitable cover 918 having parts, as shown at 920. , which are essentially capable of transmitting incident electromagnetic radiation and other parts, as shown in year 922, which are essentially incapable of transmitting electromagnetic radiation. Therefore,

   the surface of the electromagnetic radiation sensitive element 910 is subjected to a selective and discrete exposure to the incident electromagnetic radiation 916, so that some of its areas, as shown in 924, are irradiated, while others areas, represented and 926 and corresponding to part 922 of
 EMI73.3
 cache, which does not trnpm ++ A.¯:} '0.0 .J..O; I .ayonnoment electromagneziqu are essentially protected.

   The face of the element sensitive to electromagnetic radiation 910 subjected to the action of electromagnetic radiation 916 may be the face formed

  <Desc / Clms Page number 74>

 
 EMI74.1
 a "1 a 99Cnt29 nniicho 914. iii .c1! A) 1'irtlgi 901Zg f; r5t physical form, either solid, liquid or gas, or alternatively, the metal layer 912 can be subjected to the action of incident electromagnetic radiation in a selective and discrete manner, provided that this metallic layer 912 is essentially capable of transmitting the electromagnetic radiation used, so that at the boundary between the two layers, a selective and discrete interaction can be caused between the materials of the two layers at the level of the irradiated areas.

   The incident electromagnetic radiation can be in the spectrum of invisible light or visible light, either coherent or incoherent light, or monochromatic light or the like. The source of incident electromagnetic radiation, not shown, can therefore be a lamp with incandescent, electric arc, laser ur, eto.

   It may also be a source of X-rays or a radioactive isotope producing gamma rays or the like.
Alternatively, an image may be projected onto the surface of the electromagnetic radiation sensitive element 91Q as shown in FIG. 92, by any olassic means, for example by a projector 928 having an appropriate illumination source, not shown, and arranged to project an image by means of a lens system '930.



  This arrangement may consist of a projector 928 in a well known form, for example a stationary projection apparatus, a continuous web projection apparatus, an enlarger, an opaque projector, and so on.
Fig. 93 shows in schematic form a device which can be used for exposing an element sensitive to electromagnetic radiation 910 to an enorgetic beam, such as an ion or electron beam. This positive die consists, for example, of a bell or other container 932 provided with a removable base 934 which can be closed -

  <Desc / Clms Page number 75>

 
A vacuum source 936 is connected to the interior 938 of the second station 932 in view ') of maintaining therein an appropriate low pressure atmosphere, of the order of 10-2 to
10-8 mm of mercury, for example.

   Alternatively, for some applications, the interior 936 of the bell or container 932 may be filled with an inert gas.



   The bell or container 932 internally contains an ion or electron source 940 having a beam forming an adjusting element connected to a beam adjusting device 942. Such an arrangement is conventional and is well known in the art. field of cathode ray tubes and in the field of electron microscopy *
By means of the device of fig '93, the element sensitive to electromagnetic radiation, arranged at the base
934 inside 938 the bell or container 932, is adapted to undergo ionic or electron bombardment by the ion or electron beam coming from the ionic or electronic source 940 under the control of the control system
942 of the beam.

   The element sensitive to electromagnetic radiation 910 can be subjected to this bombardment by the ionic or electronic weakness via a suitable mask, not shown, so as to cause a discrete and selective irradiation of suitable areas of the radiation. the element or, preferably, the electromagnetic radiation sensitive element 910 can be subjected to bombardment by the ion or electron beam in a selective and discrete manner by an appropriately controlled sweep of its surface, by means of a thin beam of ions or electrons, of intensity modulated and suitably deflected under the control of the control system 942,

   in accordance with the conventional system available in the art of cathode ray tubes and information recording. As shown in fig. 96, the scanning of the surface of the electromagnetic radiation sensitive element 910 can be carried out using a narrow beam 944 of ions

  <Desc / Clms Page number 76>

 or electrons, this beam being suitably deflected and caused to scan "lines", as shown arbitrarily at 946 along a surface of the element, the beam being further adjustable in an adjustable manner in order to interrupt on command the passage of ions or electrons to prevent them from hitting the surface of the radiation-sensitive element, at the level of areas which are supposed not to be exposed,

   while the ions or electrons can strike the surface of the element at the level of the areas which are supposed to be exposed The system of adjustment and deflection of the beam allows a satisfactory return of the beam so as to scan each successive line 946
FIG. 94 schematically shows the device essentially similar to that of FIG. 93, in which, however, the element sensitive to electromagnetic radiation 910 is disposed on the outer side of a receptacle 932 having a face 948 arranged to transmit the beam * This device can consist of a Leonardo type tube which is essentially similar to a conventional cathode ray tube,

   but which has a face 548 sufficiently thin and made of a suitable material such as titanium which allows the transmission of electrons while maintaining the necessary vacuum inside the tube.



   Fig 95 schematically shows a device substantially similar to that of Fig '94, except that the electromagnetic radiation sensitive element 910 takes the form of a flexible elongate element, as described in detail above, with respect to the elements. Fig '1 to 8. This flexible elongated electromagnetic radiation sensitive element 910 may be constituted by a paper support provided with a thin coating of a material such as arsenic trisulfide or pentasulfide, capable of reacting with the metal. when exposed to electromagnetic radiation - By means of the device of fig '95, the element sensitive to the radiation

  <Desc / Clms Page number 77>

 
 EMI77.1
 "-A .-. 'A-t .."' 4! '\. ".....-" -....... "" '.- "..... !! -...')" - 4 ......, ..- / " \ -...

     - - t diJL vrr V.w. \; 1 1 J- *? ' . ¯ ........ 1 ..,. 1 -..- v .........; 4 "-v ... <1, "1 '- ri ....., emptied from a conventional supply reel, as shown at 950, to another conventional reel 952, by means of an advance mechanism, not shown, and information may be recorded on the surface of the radiation sensitive element either continuously or intermittently, as is well known in the art of recording and storing information.
Fig. 97 illustrates, schematically, in a sectional view, an element sensitive to electromagnetic radiation 910 in accordance with the invention, after selective and discrete exposure to electromagnetic radiation. The areas not subjected to irradiation, as shown in 954, for example remain intact,

   while at the area subjected to irradiation, as shown at 956, an inter-reaction is caused between the metal or metals of the metal layer 912 and the material of the layer 914, so that the product Inter-reaction 958 obtained has chemical and physical characteristics which differ from those of the unaffected parts of both the metallic layer 912 and the layer 914.

   In fig. 97, the element sensitive to electromagnetic radiation 910 is shown after exposure to this radiation causing a complete interaction at the level of the irradiated areas 956, between the various constituents of the two layers, while FIG. .

   98 results obtained by exposing the sensitive element to electromagnetic radiation 910 to electromagnetic radiation the intensity of which has been varied or alternatively the duration. Areas such as those represented in 960 have been exposed for a time and to a sufficient intensity to cause a complete and irreversible reaction between the constituents of the two layers, while at the level of the areas 962 and 964 various degrees of irradiation, intensity and intensity have been shown. insufficient time to induce

  <Desc / Clms Page number 78>

 
 EMI78.1
 a complete reaction - 2ax. 41 ... ...

   las caxac "a reaction plotted * ar conséqeMnf.'a'Ia'ffg * ô, the ohimic and physical oarac-jj teristics of areas 960, 962 and 964 have not only different from those of unaffected areas 954, but also show differences between them.



   These differences in chemical and physical characteristics result in differences in chemical reactivity towards, for example, appropriate solvents, so that the irradiated areas can be selectively dissolved leaving unirradiated areas or the irradiated areas intact and areas, not irradiated, chosen from one of the layers can be dissolved at will-
Changes in physical characteristics can be electrical or thermal, optical, or wettability changes.

   These latter modifications described in particular in the foregoing make it possible to obtain, by the element sensitive to electromagnetic radiation of the invention and by the methods of the invention, lithographic plates and similar articles having areas endowed with oleophilic characteristics. and hydrophiles. Changes in electrical characteristics result, among other things, from changes in the specific resistivity of the materials of the exposed areas of the radiation-sensitive element as a consequence of selective and discrete exposure to electromagnetic radiation. These changes in resistivity allow for obtain, by means of the invention and as explained in detail in the foregoing,

   printed electrical circuits comprising entire electrical elements, such as resistors and capacitors. appropriate predetermined values. the variations in specific resistivity also allow the invention to be used in information storage systems, in which the information is recorded on the element in any suitable manner and is read by differentiation between the resistivity of the elements.

  <Desc / Clms Page number 79>

   different areas mainly as memory systems using magnetic tape or perforated tape '
Other physical variations undergone by the sensitive elements in accordance with the invention, as a consequence of exposure to electromagnetic radiation, may be of an optical nature.

   For example, an element sensitive to electromagnetic radiation, as illustrated in FIG. 99, consisting of a metallic layer 912, formed for example of any of the metals listed above, such as silver, provided with a layer 914 of a material such as, for example, trisulfide or arsenic pentasulfide, is prepared so as to bear a metal layer 912 of thickness calculation.

   to give, for example, a transmission of 1 # or any other suitable percentage of a predetermined electromangetic radiation, for example ordinary light, after exposure to the electromagnetic radiation laying a predetermined period of time and at a predetermined intensity , the interaction between the metal of the metallic layer 912 and the material of the layer 914 results in the element 910 becoming, for example, capable of transmitting the radiation at 50%.

   It should be noted that transmissie filters can be made in accordance with the principles of the invention or that, as a variant, these variations in the optical quality of the element sensitive to electromagnetic radiation 910 can be used advantageously in the optical recording and reading of stored information, following a suitable code or diagram of the element sensitive to electromagnetic radiation - As a consequence of discrete and selective exposure to electromagnetic radiation a property, according to an appropriate diagram and having sufficient duration and intensity to cause the inter-reaction between the materials of the two layers,

   the element sensitive to the exposed electromagnetic radiation which is obtained substantially takes the form shown schematically in FIG. 1CC

  <Desc / Clms Page number 80>

 
 EMI80.1
 where the unaffected areas 954 "rôk? ôEf Véàinliemen% incapable of transmitting radiation, while the exposed areas 966 have become essentially capable of transmitting it.



   As previously mentioned, it has been found that at least some of the materials suitable for layer 914 show substantial chemical and physical transformation when exposed to electromagnetic radiation or particulate bombardment, even though the layer. metal-
 EMI80.2
 The oxides of these materials include monosulfide, disulfide, trisulfide and pentasulfide of arsenic and mixtures of arsenic, sulfur and iodine.

   When using these materials, the metallic layer can be omitted as desired without departing from the scope of the invention. Vapor deposited layers, whether or not they are on one. reactive metal substrate, are among the layers most sensitive to electromagnetic radiation, apparently due to the particular molecular structure caused by the rapid cooling of the thin layer deposited on the substrate.



   It should be noted that the radiation sensitive elements and the methods of using these elements, according to the invention, constitute means intended for practical applications for obtaining useful articles by exposure to electromagnetic radiation following a predetermined diagram, followed by simple processing operations -

 

Claims (1)

EMI81.1 3 2 "1 1, 1 D É ï A fi -'- v. 1 CI 1- Element sensitive to electromagnetic radiation, characterized in that it comprises a first layer of metal and a second layer of a material capable, when exposed to electromagnetic radiation, of undergoing an inter-reaction with the metal of the first layer to form an interaction product with different physical and chemical characteristics of metal and material glues. 2 - Element according to claim 1, wherein the first layer is a metal belonging to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc, chromium and their mixtures. 3 - Element according to claim 1, wherein the material of the second layer is selected from a group comprising halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, a halide, sulphide, metal arsenide, selenide or. mixtures thereof. 4 - Sign according to claim 1, wherein the material of the second layer is selected from a group comprising arsenic monosulfide, disulfide, trisulfide or pentasulfide and mixtures thereof. 5 - Element according to claim 1, wherein the electromagnetic radiation is in the form of a bombardment of particles. 6 - Element according to claim 1, wherein the electromagnetic radiation is light. 7 - Element in which the characteristics taken at the surface and in depth of the first and second layers and of the inter-reaction product differ in an adjustable manner from each other. 8 - Element according to claim 1, wherein the first layer is disposed in adhesion on a flexible sheet of material belonging to the group comprising paper, cardboard, plastic or the like. <Desc / Clms Page number 82> 9 - The element of claim 6, wherein the. second layer is in solid phase. 10. The element of claim 8, wherein the second layer is in the liquid phase. 11 - Element according to claim 8, wherein the second layer is in the vapor phase. 12 - An element sensitive to electromagnetic radiation according to claim 1, comprising a plurality of superpode layers essentially by adhesion capable of transmitting this radiation, each of the layers being constituted by a pair formed of a first and a second layer which adhere. 13. The element of claim 12, wherein the material of the first layer contains at least one metal belonging to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum. , zinc and chromium. 14. The element of claim 13, wherein the material of the second layer is selected from a group consisting of halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, a halide, sulphide, iodide, arsenide, selenide, metal telluride and their mixtures. 15. The element of claim 13 wherein the material of the second layer is selected from the group consisting of arsenic monosulfide, disulfide, trisulfide and pantasulfide, and mixtures thereof. 16 - Element sensitive to electronsgnetic radiation comprising a substrate and an adherent layer of a material composed of a mixture of arsenic and sulfur, this layer showing, after selective and discrete exposure to the radiation: electromagnetic slow Discrete exposed areas with chemical and physical characteristics that differ from discrete unexposed areas. <Desc / Clms Page number 83> EMI83.1 7 - lÎ6Iwd ± Ù iù, 2âi'ZlO G4 i c vi.c.,. W7 .... r ... s. v..lc v: t. The ratio of the hydrophilic degree to the oleophilic degree of the exposed areas is different from the corresponding ratio of the unexposed areas. EMI83.2 18 - E1Óa: ent aenaiblo au radionner 11 <ictromaen6tiquo of claim 16, wherein the exposed and unexposed areas suffer a difference in solubility in a predetermined solvent. 19 - Element sensitive to electromagnetic radiation following the awakening of cation 16, in which the layer is the triaul fure of arsenic. 20. An electromagnetic radiation sensitive element according to claim 16, wherein the layer is formed of arsenic pentasulfide. EMI83.3 21 - Photoresistor, composed easentially of arsenic and sulfur. 22 - Phororesistance according to claim 21, com posed essentially of arsenic trisulfide. 23 - A photoresistor according to claim 21, com posed essentially of arsenic pentasulfide. 24 - Lithographic plate comprising a mixture of arsenic and sulfur on a substrate. 25. A lithographic plate according to claim 24 wherein the mixture is arsenic tr4isulfide. 26 - A lithographic plate according to claim 24 wherein the mixture is arsenic pentasulfide. 27 - Method of producing a metallic pattern by means of an element sensitive to electromagnetic radiation comprising essentially two different layers essentially adhering to each other, the first of these layers being a metallic layer arranged by adhesion to the substrate and the second of these layers being a capable material, when exposed <Desc / Clms Page number 84> to this radiation, to form an inter-reaction product with the first layer, the process of forming a radiation-defined image on the second layer of the radiation sensitive element to selectively and unobtrusively cause the formation of the interaction product in predetermined areas of the boundary between the first and the second layer to consumes.- selectively and discreetly in-depth parts of the first layer, and then to remove the substrate. 28 - Proceeded according to the. claim 27 further comprising the step of removing the inter-reaction product, 29 - The method of claim 27 further comprising attaching the second layer to a backing support. 30. The method of claim 28 further comprising attaching the second layer to a backing support. 31. The method of claim 27, further comprising attaching the first layer to a backing support, then exposing the radiation sensitive member uniformly to electromagnetic radiation to cause inter-reaction at the remaining areas of the boundary between the first. and the second layer to an extent only sufficient to reduce their mutual adhesion, then to remove the second layer. 32 - The method of claim 31 further comprising removing the inter-reaction product. 33. The method of claim 29, wherein the reinforcing support is substantially capable of transmitting electromagnetic radiation, which further comprises attaching the first layer to the reinforcing support, then exposing the ray sensitive member uniformly to it. electromagnetic radiation to cause an inter-reaction <Desc / Clms Page number 85> at the remaining areas of the boundary between the first and the second layer to an extent only sufficient to reduce their mutual adhesion, and then to remove the second layer. 34. The method of claim 30, wherein the reinforcing support is substantially capable of transmitting this electromagnetic radiation, and which further comprises attaching the first layer to a reinforcing support, then exposing the sensitive member to the radiation. uniformly to electromagnetic radiation to cause an inter-reaction at the remaining areas of the boundary between the first and second layer to an extent only sufficient to reduce their mutual adhesion, and then to remove the second layer. 35 - The method of claim 27, wherein the first layer is a metal which belongs to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc, chromium and their mixtures. 36 - The method of claim 27, wherein the material of the second layer is selected from the group consisting of halogen, le. sulfur, iodine, arsenic, selenium, tellurium, thallium, a halide, sulphide, iodide, arsenide, selenide or telluremetallic and their mixtures. 37 - The method of claim 27, wherein the material of the second layer is selected from ur. group comprising arsenic trisulphide and pentasulphide and mixtures thereof. 38 - Process for obtaining a metallic design on a reinforcing support, which consists in exposing discreetly and selectively by projecting an image of the design to be obtained the surface of an element sensitive to electromagnetic radiation comprising this support of reinforcement to which a metallic layer adheres, the metallic layer being provided with a layer <Desc / Clms Page number 86> of strongly adherent coating of a material capable, when exposed to this radiation, of an inter-reaction with the metal of the metal layer to form a product of interaction with it, in exposing this element to an image projected on it for a period sufficient to cause this inter-reaction discreetly and selectively so as to consume in a discrete and selective manner in depth parts of the metal layer, in exposing this element uniformly to electromagnetic radiation to cause inter-reaction at the remaining areas of the boundary between the metal layer and the coating layer to an extent only sufficient to reduce their mutual adhesion, to separate the coating layer from the metal layer, to removing the inter-reaction product so as to form on the reinforcing support a metallic pattern which adheres thereto and which is a metallic reproduction of this image. 39 - The method of claim 38, wherein the coating layer is separated from the reinforcing support by means of an element provided with an adhesive coating forming with the outer surface of the coating layer a stronger bond than the reduced bond between. the coating layer and the metal layer. 40 - The method of claim 39, wherein the metal layer is formed of a metal belonging to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc and chromium and mixtures of these metals. 41 - The method of claim 39, wherein the material of the coating layer is selected from the group consisting of halogen, sulfur, iodine, arsenic, selenium, tellurium, lo thallium, a halide, a sulfide, iodide, arsenide, selenide or metal telluride and mixtures thereof. <Desc / Clms Page number 87> 42. The method of claim 39 wherein the material of the coating layer is selected from a group comprising arsenic trisulfide and pentasulfide and mixtures thereof. 43 - Method of producing a metal relief design by means of an element sensitive to electromagnetic radiation comprising a metal layer covered with an adherent coating layer, of a material capable of interaction, when it is exposed to electromagnetic radiation with the metallic layer, so as to reduce the adhesion between the coating layer and the metallic layer which consists in projecting an image by electromagnetic radiation of the design to be reproduced on the element sensitive to the radiation, so as to reduce the adhesion force to the predetermined airca level between the coating layer and the metal layer, to the place .- where. they are struck by electromagnetic radiation, removing parts of the coating layer corresponding to these reduced adhesion areas, while leaving other parts of the coating layer to adhere to the metal layer, then heating the latter to cause inter-reaction between the remaining partioo of the coating layer and the metal layer by attacking the metal layer in depth, at these areas covered by the remaining parts of the coating layer. 44 - The method of claim 43, wherein the material of the coating layer is selected from the group consisting of halogen, sulfur, arsenic, selenium, tellurium, thallium, a halide, sulphide, iodide, arsenide , selenide, metal telluride, arsenic trisulfide or pentasulfide, mixtures of lead and iodine and mixtures of arsenic, sulfur and a halogen. <Desc / Clms Page number 88> 45 - The method of claim 43, wherein the metallic coating is formed of a metal selected from a group comprising silver, copper, nickel, niobium, lead, iron, zinc, chromium and 7 ,'aluminum: 46 - The method of claim 43, wherein the metal layer is provided with a different substrate. 47 - A method according to claim 43, wherein the step of removing parts of the coating layer is carried out by means of an element provided with an non-adhesive coating forming the coating of the coating with a stronger bond than the coating. Reduced adhesion between the coating layer and the metal layer, this bond being weaker than the normal adhesion strength between the coating layer and the metal layer. - Method of forming a relief image by means of a radiation element comprising essentially two different layers. essentially cherishing each other, the first of these metallic layers and the second being of a material capable, when exposed to this radiation, of forming an inter- product with the first layer which consists in forming an image defined by a beam @ on the element sensitive to this radiation in order to selectively and discreetly proquer the formation of the product of interaction @ at the level of predetermined areas of the boundary between the first and the himself. conde layer to selectively and discreetly reduce them. mutual adhesion, to remove parts of the second layer corresponding to the areas of the reduced adhesion limit, so as to expose the first layer at the level of these aves and to electrochemically treat the areas in question of the @ layer where they are thus exposed. <Desc / Clms Page number 89> EMI89.1 49 - A method of brightening up claim 48, wherein the areas of the first layer are voi treated. , ectrochemical, by electrolytic deposition. 50 - Process according to the rovendicat / c / t 4. * / 'Which also consists in then exposing uniformly.'. extinguished sensitive to radiation to radiation eluted to cause the formation of the inter-reaction product to the remaining areas of the boundary between the first and the second layer to reduce their mutual adhesion, then to ri-over the remaining part of this second layer. 51 - Process according to The dream; . '. cation 49 which further consists in then exposing u. ^ .. :: ormem, the radiation sensitive element to 6làec-.rom radiation; .6, "- only to cause the formation of the inter-reaction product A level of the remaining parts of the first and second; ' che to thoroughly consume the rest of the first cuckold; at the level of the parts in question, then to remove the inter-reaction product. 52 - Method according to 1a: Indication 48, in which the areas of the first layer are electromagnetically treated by electrimic erosion. 53 - Process according to the: vendication 52, in which the first layer is wholeePiLrradi6e in depth, electrochemically, at the place where E) e is thus exposed. 54 - A method according to Claim 52 which further comprises subsequently exposing the radiation sensitive element to 61E radiation. ro .-, a, -nd tick to cause the formation of the inter-ref 'product. ion at the level of the remaining areas of the boundary between the first., re and the second layer to reduce mutual adhesion, pu4-: remove the remainder of the second layer. 55 - Process according to 'evendication 52 which further consists in exposing unifo' - 1 radiation sensitive element to electro: oagnetic radiation to cause the <Desc / Clms Page number 90> formation of the inter-reaction product at the level of the remaining areas of the boundary between the first and the second layer., reducing their mutual adhesion, then removing the remainder of the second layer. 56 - A method of producing an electrical component of the class comprising an element of essentially low resistivity, juxtaposed with an element of essentially high resistivity, by means of a radiation sensitive electrolyte comprising in the hand a first layer of metal defining the element of low resistivity and a second adherent layer of a material defining the element of high resistivity and capable, when exposed to electromagnetic radiation, to undergo an inter-reaction with the metal of the first layer, so as to form a product of 'inter-reaction having a composition and an electrical resistivity intermediate between the resistivities of the metal and, respectively, of the material, said method comprising exposing the element to incident electromagnetic radiation to cause the formation of a predetermined amount of the intermediate resistivity interaction product and permanently shielding this element from incident electromagnetic radiation to prevent subsequent formation of this intermediate resistivity product. inter-reaction. 57 - The method of claim 56, wherein the metal of the first layer belongs to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc, chromium and their mixtures. 58 - The method of claim 57, wherein the nature of the second layer is selected from a group comprising halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, halide, sulphide, iodide , arsenide, selenide or telluremetallic, arsenic trisulphide or pentasulride and mixtures thereof. 59 - The method of claim 56 which further comprises continuously monitoring the electrical characteristics of the element during its exposure to electromagnetic radiation. <Desc / Clms Page number 91> EMI91.1 tick, then a a: V vc: r: 1 XpOSv0r. ! Qz, .quo àc * W i: u .: c :: t; y5 predetermined electrical jcLidf3 of the element have been obtained. 60 - Resistance obtained in accordance with the process of paragraph 56. 61 - Capacitor obtained according to the process of paragraph 56. EMI91.2 62 - Method of producing an eloct circuit #j.? -.-. , ¯. ¯ ¯ carrying at least one resistor and one conductor, electrical connections between these elements and input and output terminals, by means of an element sensitive to radiation essentially comprising a first layer of metal juxtaposed and adhering to a second layer of a material capable, when exposed to electromagnetic radiation, of interacting with that metal, thereby a. train ur. inter-reaction product having an electrical resistivity intermediate between the resistivities of the ketal and, respectively, of the material (-the first layer being in turn disposed on one face of a dielectric provided with a metal layer on its other interface, which consists in exposing areas of the element to incident electromagnetic radiation projected onto these aircs, in accordance with a predetermined pattern, to cause the formation of the interaction product by deep consolation of all the metal of the first metal layer at the level of these areas, to be protected simultaneously from incident electromagnetic radiation from other areas of the element, according to a predetermined pattern, in order to leave in the first layer a network conducting the electric current and defining the resistance, a first plate of the capacitor and its intermediate electric connections, at the same time partially exposing a first part of the other areas corresponding to the resistance to cause the formation of the inter-reaction product with deep consumption of u <Desc / Clms Page number 92> EMI92.1 -.i <-: 1>, a - àrc Qû 9ùU: cxr: ar sa: si8tar.ce to a predetermined resistance value, simultaneously exposing a second part of the other airea corresponding to the first plate of the capacitor to cause the formation of the inter-reaction product by deep consumption of the first metal layer to balance the area of the plate to set a predetermined capacitance for the capacitor, to attach electrical terminals to appropriate parts of the first metal layer and to the metal layer to form the input terminals and output, and to permanently shield the element from incident electromagnetic radiation to prevent further formation of the inter-reaction product. 63 - The method of claim 62, wherein the metal of the first layer belongs to a group comprising silver, nickel, copper, 'niobium, lead, iron, aluminum, zinc, chromo and heavy mixtures. 64 - The method of claim 63, wherein the material of the second layer is selected from a group comprising halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, halide, oulfuro, iodide, arsenide, selenide or metal telluride, arsenic trisulfide or pentasulfide and mixtures thereof. 65 - The method of claim 62 which further comprises continuously monitoring the electrical characteristics of the circuit during exposure to electromagnetic radiation, then stopping this exposure when predetermined electrical characteristics are obtained. 66 - A method of obtaining a permanent self-revealing metallic reproduction of an image by means of a radiation sensitive element comprising a flexible sheet of material belonging to the group of paper, cardboard, a. plastic and the like, an essential metallic layer <Desc / Clms Page number 93> EMI93.1 slightly thin on a surface ce a: 0U ';': ':' ù, ...,. ;;. : A coating layer on the metal layer, of a material capable, when exposed to electromagnetic radiation, of inter-reaction with the metal of the layer, thereby forming an inter-reaction product having a composition and physical characteristics different from those of matter and metal, which involves selectively and unobtrusively exposing the radiation-sensitive element to radiation 1.Completing the image to an extent sufficient to selectively and discreetly cause a inter-reaction between metal and matter, with formation of this inter-reaction product selectively and discreetly removing the eta, and then removing the inter-reaction product. 67 - The method of claim 66, wherein the metal of the layer belongs to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc and chromium. 68 - The method of claim 67, wherein the coating layer is solid phase. 69 - The method of claim 67, in the latch the coating layer is in the liquid phase. 70 - The method of claim 67, wherein the coating layer is in the vapor phase. 71 - The method of claim 68 which further comprises removing the coating layer. 72 - The method of claim 71 which further comprises coloring the metallic reproduction. 73 - Process according to claim 72, in which the metal is silver and the coloring is carried out with hydrogen sulfide gas. 74 - The method of claim 71, wherein steps of removing the inter-reaction product and the <Desc / Clms Page number 94> Coating layer are performed simultaneously by momentarily bending the element after exposure to radiation around an element of essentially small diameter. 75 - A method according to claim 69 which further consiate to remove the coating layer. 76. The method of claim 75 further comprising the step of coloring the metallic reproduction. 77 - Process according to claim 76, in which the metal is silver and the coloring is carried out with gaseous hydrogen sulfide. 78 - Process according to claim 75, in which the operations of removing the inter-reaction product and the coating layer are carried out simultaneously by momentary bending of the element, after exposure to radiation around an element of essentially small diameter. 79. The method of claim 70 further comprising the step of coloring the metallic reproduction. 80 - A method according to claim 79, wherein the metal is silver and the coloring is carried out with hydrogen sulfide gas. 81 - The method of claim 70, wherein the step of removing the inter-reaction product is carried out by momentarily bending the member after exposure to radiation around a member of substantially small diameter. 82 - The method of claim 67 wherein the material of the coating layer is selected from a group consisting of halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, halide. , metal sulfide, iodide, arsenide, selenide or telluride, and mixtures thereof. 83 - The method of claim 67, wherein the material of the coating layer is selected from a group comprising arsenic trisulfide and pentasulfide and mixtures thereof. <Desc / Clms Page number 95> EMI95.1 4 -,?,: 6 1'l) b (, ": l () :: 1 of a 1 = aqo in relief, 3t1 :: the" "of a multi-layered radiation sensitive element, be- being essentially several superimposed strata essentially adherent and capable of transmitting the radiation, each of the strata being constituted by a pair of essentially adherent layers composed in different ways capable, when exposed to this radiation, of undergoing an inter- EMI95.2 reaction to form a product of ir, tor-rac:. ::.:. Y (U1t has a layout and physical characteristics which differ from those of the materials in question, which process consists in forming a defined image by radiation on the first of the strata so that the radiation partially penetrates, selectively and discretely , beyond the first of the strata, to a depth proportional to the intensity of the radiation, EMI95.3 in which areas the inter-reaction product is formed, to a depth locally dependent on the intensity of the radiation, then removing the inter-reaction product. 85 - Method according to -cation 84, in which the image defined by radiation consists of an outline of the relief image to be obtained, this method comprising, in addition, removing at least one of the atrutoo dane lea limitoc from the perimeter of this contour, so as to define a recessed surface which corresponds to this coutonr. 86. The method of claim 84, wherein the radiation defined image consists of an outline of the relief image to be obtained, said method further comprising; removing at least one of the strata outside the peprimeter of the contour, so as to define a relief surface which corresponds to this contour. 87 - The method of claim 84, wherein the inter-reaction product is removed by selective chemical action. <Desc / Clms Page number 96> 88 - The method of claim 84, wherein the inter-reaction product is removed by mechanical action. 89 - The method of claim 84, wherein the inter-reaction product is removed by heat sublimation. 90 - Process for producing a lithographic plate which consists in placing on the substrate an adherent layer of a mixture of arsenic and sulfur and in discreetly and selectively exposing this layer to an electromagnetic radiation. 91 - The method of claim 90 which further comprises subjecting the layer to the action of a solvent capable of differential dissolution of the layer in: unction of exposure to electromagnetic radiation. 92 - A method of producing an offset lithographic plate by means of a radiation sensitive element comprising essentially three different layers essentially adhering to each other, the first of these layers being metallic, the second being of a capable material, when it is exposed to radiation, to form an inter-reaction product with the first layer and the third of these layers being of a material incapable of undergoing an inter-reaction with the second layer, the first layer being essentially capable of transmitting the radiation , this method comprising forming a defined image by radiation on the first layer capable of transmitting the radiation, so as to selectively and discretely cause the formation of the inter-reaction product, the reacted parts of the first layer having been selectively and unobtrusively struck by the radiation being characterized by a ratio of the hydrophilic degree to the oleophilic degree different from the corresponding ratio of its parts which have not been struck <Desc / Clms Page number 97> 93 - The method of claim 92, wherein the first layer is a metal belonging to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc, chromium and their mixed. 94 - The method of claim 92, wherein the material of the second layer is selected from a group ceasing a halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, a halide, sulphide, iodide, arsenide, selenide or telluremetallic, arsenic trisulfide or pentasulfide, and their .: mixtures. 95 - A method of producing an offset lithographic plate by means of a radiation sensitive element comprising essentially three different layers essentially adhering to each other, the first of these layers being metallic, the second being of a capable material, when 'it is exposed to radiation, to form an inter-reaction product. with the first and the third layer being of a material incapable of inter-reacting with the second layer, the second and the third layer being essentially capable of transmitting this radiation, which consists of forming a defined image by radiation on the third layer to selectively and unobtrusively cause the formation of the inter-reaction product at the boundary between the second and the first layer, by selective and discrete consumption of parts of the first layer, the reacted parts of the first layer being characterized by ur. ratio of the hydrophilic degree to the different oleophilic degree of its unreacted parts. 96 - The method of claim 95, wherein the first layer is a metal belonging to a group comprising silver, nickel, copper, niobium, lead, iron, aluminum, zinc, chromium and their mixtures * <Desc / Clms Page number 98> 97 - The method of claim 95, wherein the material of the second layer is selected from a group comprising halogen, sulfur, iodine, arsenic, selenium, tellurium, tahllium a halide, sulfide, iodide , arsenide, EMI98.1 metallic sel3ni.ae or tellururo, arsenic trisulfide or pemasulfide, and mixtures thereof. 98 - A method of producing an offset lithographic plate by means of a radiation sensitive element comprising essentially three different layers substantially adhering to each other, the second of these layers being metallic, the first being in a capable manner, when it is exposed to radiation, to form an inter-reaction product with the second layer, the third being of a material incapable of undergoing an inter-reaction with the second layer, the first layer and the inter-reaction product being soluble in a solvent in which the second layer is insoluble, said method of forcing a defined image by radiation on the first layer to selectively and unobtrusively cause the formation of the interaction product at the boundary between the first and the second layer, by selective and discrete consumption of parts of the first layer , and to dissolve selectively and discreetly in the solvent EMI98.2 the reaction product and the first layer thereby exposing parts of the third layer, the remaining parts of the second layer being characterized by a ratio of hydrophilic to oleophilic degree different from that of the exposed parts of the third layer. 99. The method of claim 98, wherein the material of the second layer is selected from a group consisting of halogen, sulfur, iodine, arsenic, selenium, tellurium, thallium, halide, metal sulfide, iodide, arsenide, selenide or telluride, arsenic trisulfide or pentasulfide, and mixtures thereof. <Desc / Clms Page number 99> EMI99.1 --... -.... ...... 100 -, Method according to claim 98, da.ne foul:: .. =: UW 1: "'' 'v' ':' '.;:' ':: -: si, .....,. ";; .. J".:. I, .. '1- ..; -: "": "' ;;.,", "- \.": 'J (,: cone .. is previously granulated to increase the hydrophilic quality and to allow better adhesion of the second layer.