BE738538A - - Google Patents
Info
- Publication number
- BE738538A BE738538A BE738538DA BE738538A BE 738538 A BE738538 A BE 738538A BE 738538D A BE738538D A BE 738538DA BE 738538 A BE738538 A BE 738538A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75860668A | 1968-09-09 | 1968-09-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE738538A true BE738538A (de) | 1970-02-16 |
Family
ID=25052377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE738538D BE738538A (de) | 1968-09-09 | 1969-09-08 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3620734A (de) |
| BE (1) | BE738538A (de) |
| CH (1) | CH524159A (de) |
| DE (1) | DE1944749A1 (de) |
| FR (1) | FR2017668A1 (de) |
| GB (1) | GB1282779A (de) |
| NL (1) | NL6913630A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3769023A (en) * | 1971-05-07 | 1973-10-30 | Horizons Inc | Light sensitive reproduction and electron beam sensitive material |
| US3909273A (en) * | 1973-07-23 | 1975-09-30 | Keuffel & Esser Co | Photopolymerization utilizing diazosulfonate and aromatic hydroxy compounds |
| US4202742A (en) * | 1979-04-30 | 1980-05-13 | Westinghouse Electric Corp. | Photopolymerization of ethylenically unsaturated monomers |
| US4663269A (en) * | 1985-08-07 | 1987-05-05 | Polytechnic Institute Of New York | Method of forming highly sensitive photoresist film in the absence of water |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1252526B (de) * | 1960-10-10 | |||
| BE610628A (de) * | 1960-11-14 |
-
1968
- 1968-09-09 US US758606A patent/US3620734A/en not_active Expired - Lifetime
-
1969
- 1969-09-03 DE DE19691944749 patent/DE1944749A1/de active Pending
- 1969-09-08 BE BE738538D patent/BE738538A/xx unknown
- 1969-09-08 CH CH1355369A patent/CH524159A/de not_active IP Right Cessation
- 1969-09-08 GB GB44208/69A patent/GB1282779A/en not_active Expired
- 1969-09-08 NL NL6913630A patent/NL6913630A/xx unknown
- 1969-09-09 FR FR6930640A patent/FR2017668A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| DE1944749A1 (de) | 1970-03-19 |
| CH524159A (de) | 1972-06-15 |
| US3620734A (en) | 1971-11-16 |
| GB1282779A (en) | 1972-07-26 |
| NL6913630A (de) | 1970-03-11 |
| FR2017668A1 (de) | 1970-05-22 |