CH524159A - Verfahren zur Herstellung photographischer Positiv-Bilder durch Photopolymerisation - Google Patents

Verfahren zur Herstellung photographischer Positiv-Bilder durch Photopolymerisation

Info

Publication number
CH524159A
CH524159A CH1355369A CH1355369A CH524159A CH 524159 A CH524159 A CH 524159A CH 1355369 A CH1355369 A CH 1355369A CH 1355369 A CH1355369 A CH 1355369A CH 524159 A CH524159 A CH 524159A
Authority
CH
Switzerland
Prior art keywords
photopolymerization
production
photographic images
positive photographic
positive
Prior art date
Application number
CH1355369A
Other languages
English (en)
Inventor
John Cerwonka Edward
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Publication of CH524159A publication Critical patent/CH524159A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
CH1355369A 1968-09-09 1969-09-08 Verfahren zur Herstellung photographischer Positiv-Bilder durch Photopolymerisation CH524159A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75860668A 1968-09-09 1968-09-09

Publications (1)

Publication Number Publication Date
CH524159A true CH524159A (de) 1972-06-15

Family

ID=25052377

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1355369A CH524159A (de) 1968-09-09 1969-09-08 Verfahren zur Herstellung photographischer Positiv-Bilder durch Photopolymerisation

Country Status (7)

Country Link
US (1) US3620734A (de)
BE (1) BE738538A (de)
CH (1) CH524159A (de)
DE (1) DE1944749A1 (de)
FR (1) FR2017668A1 (de)
GB (1) GB1282779A (de)
NL (1) NL6913630A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3909273A (en) * 1973-07-23 1975-09-30 Keuffel & Esser Co Photopolymerization utilizing diazosulfonate and aromatic hydroxy compounds
US4202742A (en) * 1979-04-30 1980-05-13 Westinghouse Electric Corp. Photopolymerization of ethylenically unsaturated monomers
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1252526B (de) * 1960-10-10
BE610628A (de) * 1960-11-14

Also Published As

Publication number Publication date
DE1944749A1 (de) 1970-03-19
BE738538A (de) 1970-02-16
US3620734A (en) 1971-11-16
GB1282779A (en) 1972-07-26
NL6913630A (de) 1970-03-11
FR2017668A1 (de) 1970-05-22

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Legal Events

Date Code Title Description
PL Patent ceased