BE820006A - Dispositif pour ajuster des pastilles semiconductrices par rapport a un masque d'exposition au rayonnement - Google Patents
Dispositif pour ajuster des pastilles semiconductrices par rapport a un masque d'exposition au rayonnementInfo
- Publication number
- BE820006A BE820006A BE148607A BE148607A BE820006A BE 820006 A BE820006 A BE 820006A BE 148607 A BE148607 A BE 148607A BE 148607 A BE148607 A BE 148607A BE 820006 A BE820006 A BE 820006A
- Authority
- BE
- Belgium
- Prior art keywords
- semiconducting
- tablets
- relation
- adjusting
- exposure mask
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19732346720 DE2346720C3 (de) | 1973-09-17 | Vorrichtung zum Justieren von Halbleiterscheiben bezüglich einer Bestrahlungsmaske |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE820006A true BE820006A (fr) | 1975-01-16 |
Family
ID=5892800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE148607A BE820006A (fr) | 1973-09-17 | 1974-09-17 | Dispositif pour ajuster des pastilles semiconductrices par rapport a un masque d'exposition au rayonnement |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5057656A (2) |
| BE (1) | BE820006A (2) |
| CH (1) | CH572664A5 (2) |
| DK (1) | DK481574A (2) |
| FR (1) | FR2244261A1 (2) |
| IT (1) | IT1021303B (2) |
| LU (1) | LU70922A1 (2) |
| NL (1) | NL7412033A (2) |
| SE (1) | SE7411634L (2) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5267570A (en) * | 1975-12-03 | 1977-06-04 | Hitachi Ltd | Pattern printing device |
| JPS5313879A (en) * | 1976-07-23 | 1978-02-07 | Nec Corp | Silicon mask for x-ray exposure and its production |
| DE2942990A1 (de) * | 1979-10-24 | 1981-05-07 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur automatischen justierung von strukturen in zwei parallelen ebenen, insbesondere bei der herstellung von integrierten halbleiterschaltungen |
| DD151231A1 (de) * | 1980-06-02 | 1981-10-08 | Dietmar Klingenfeld | Optische anordnung fuer projektionslithografische einrichtungen |
| GB2089524B (en) * | 1980-12-17 | 1984-12-05 | Westinghouse Electric Corp | High resolution lithographic process |
| JPS61111535A (ja) * | 1985-09-30 | 1986-05-29 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ｘ線露光方法 |
| JPS61111534A (ja) * | 1985-09-30 | 1986-05-29 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ｘ線露光装置 |
-
1974
- 1974-09-10 NL NL7412033A patent/NL7412033A/xx unknown
- 1974-09-11 FR FR7430737A patent/FR2244261A1/fr not_active Withdrawn
- 1974-09-12 CH CH1240374A patent/CH572664A5/xx not_active IP Right Cessation
- 1974-09-12 DK DK481574A patent/DK481574A/da unknown
- 1974-09-12 IT IT27200/74A patent/IT1021303B/it active
- 1974-09-16 SE SE7411634A patent/SE7411634L/xx unknown
- 1974-09-16 LU LU70922A patent/LU70922A1/xx unknown
- 1974-09-17 BE BE148607A patent/BE820006A/xx unknown
- 1974-09-17 JP JP49107073A patent/JPS5057656A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| LU70922A1 (2) | 1975-02-24 |
| JPS5057656A (2) | 1975-05-20 |
| DK481574A (2) | 1975-06-02 |
| DE2346720A1 (de) | 1975-04-03 |
| CH572664A5 (2) | 1976-02-13 |
| DE2346720B2 (de) | 1975-07-17 |
| SE7411634L (2) | 1975-03-18 |
| IT1021303B (it) | 1978-01-30 |
| FR2244261A1 (en) | 1975-04-11 |
| NL7412033A (nl) | 1975-03-19 |
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