BE832633A - Profilage des bords de pastilles semi- conductrices - Google Patents

Profilage des bords de pastilles semi- conductrices

Info

Publication number
BE832633A
BE832633A BE159371A BE159371A BE832633A BE 832633 A BE832633 A BE 832633A BE 159371 A BE159371 A BE 159371A BE 159371 A BE159371 A BE 159371A BE 832633 A BE832633 A BE 832633A
Authority
BE
Belgium
Prior art keywords
profiling
semi
edges
conductive pellets
pellets
Prior art date
Application number
BE159371A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE832633A publication Critical patent/BE832633A/fr

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/104—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices having particular shapes of the bodies at or near reverse-biased junctions, e.g. having bevels or moats
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
BE159371A 1974-08-21 1975-08-21 Profilage des bords de pastilles semi- conductrices BE832633A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US49928874A 1974-08-21 1974-08-21

Publications (1)

Publication Number Publication Date
BE832633A true BE832633A (fr) 1975-12-16

Family

ID=23984661

Family Applications (1)

Application Number Title Priority Date Filing Date
BE159371A BE832633A (fr) 1974-08-21 1975-08-21 Profilage des bords de pastilles semi- conductrices

Country Status (7)

Country Link
JP (1) JPS5146076A (fr)
BE (1) BE832633A (fr)
CA (1) CA1038969A (fr)
DE (1) DE2536108A1 (fr)
FR (1) FR2282722A1 (fr)
GB (1) GB1471116A (fr)
IT (1) IT1040004B (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
FR2410366A1 (fr) * 1977-11-29 1979-06-22 Radiotechnique Compelec Transistor de type mesa et procede de realisation de ce transistor
JPS5895553A (ja) * 1981-12-01 1983-06-07 Nippon Shokubai Kagaku Kogyo Co Ltd 耐熱衝撃性の改良されたハニカム触媒の製造方法
DE3422051C2 (de) * 1984-06-14 1986-06-26 Brown, Boveri & Cie Ag, 6800 Mannheim Silizium-Halbleiterbauelement mit ätztechnisch hergestellter Randkontur und Verfahren zur Herstellung dieses Bauelements
GB2176338A (en) * 1985-06-06 1986-12-17 Marconi Electronic Devices Edge contouring in a semiconductor device
JPH0777240B2 (ja) * 1989-01-20 1995-08-16 富士通株式会社 半導体装置の製造方法
JPH03129854A (ja) * 1989-10-16 1991-06-03 Toshiba Corp 半導体装置の製造方法
DE19536438A1 (de) * 1995-09-29 1997-04-03 Siemens Ag Halbleiterbauelement und Herstellverfahren

Also Published As

Publication number Publication date
GB1471116A (en) 1977-04-21
DE2536108A1 (de) 1976-03-11
JPS5227033B2 (fr) 1977-07-18
FR2282722A1 (fr) 1976-03-19
CA1038969A (fr) 1978-09-19
IT1040004B (it) 1979-12-20
JPS5146076A (en) 1976-04-20

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