BE845471A - Composant d'electrique sur semi-conducteur a liaison electrostatique et procede de fabrication d'un tel composant - Google Patents

Composant d'electrique sur semi-conducteur a liaison electrostatique et procede de fabrication d'un tel composant

Info

Publication number
BE845471A
BE845471A BE170038A BE170038A BE845471A BE 845471 A BE845471 A BE 845471A BE 170038 A BE170038 A BE 170038A BE 170038 A BE170038 A BE 170038A BE 845471 A BE845471 A BE 845471A
Authority
BE
Belgium
Prior art keywords
component
semiconductor
manufacturing
electrostatic link
electrical component
Prior art date
Application number
BE170038A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE845471A publication Critical patent/BE845471A/fr

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/04Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
    • H03F3/16Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only with field-effect devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0415Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having ferroelectric gate insulators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/50Devices controlled by mechanical forces, e.g. pressure
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
BE170038A 1975-09-04 1976-08-24 Composant d'electrique sur semi-conducteur a liaison electrostatique et procede de fabrication d'un tel composant BE845471A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/610,364 US4047214A (en) 1975-09-04 1975-09-04 Electrostatically bonded dielectric-on-semiconductor device, and a method of making the same

Publications (1)

Publication Number Publication Date
BE845471A true BE845471A (fr) 1977-02-24

Family

ID=24444720

Family Applications (1)

Application Number Title Priority Date Filing Date
BE170038A BE845471A (fr) 1975-09-04 1976-08-24 Composant d'electrique sur semi-conducteur a liaison electrostatique et procede de fabrication d'un tel composant

Country Status (7)

Country Link
US (1) US4047214A (fr)
JP (1) JPS5232280A (fr)
BE (1) BE845471A (fr)
CA (1) CA1060573A (fr)
DE (1) DE2638405A1 (fr)
FR (1) FR2323228A1 (fr)
GB (1) GB1554302A (fr)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2348580A1 (fr) * 1976-04-16 1977-11-10 Thomson Csf Dispositif de lecture electrique d'une image optique, utilisant l'effet piezo-resistif
US4259365A (en) * 1978-03-02 1981-03-31 Wolfgang Ruppel Method for creating a ferroelectric or pyroelectric body
US4348611A (en) * 1978-03-02 1982-09-07 Wolfgang Ruppel Ferroelectric or pyroelectric sensor utilizing a sodium nitrite layer
JPS584485B2 (ja) * 1978-06-06 1983-01-26 クラリオン株式会社 周波数選択装置
GB2056810B (en) * 1979-08-14 1984-02-22 Clarion Co Ltd Surface-acoustic-wave device
US4378510A (en) * 1980-07-17 1983-03-29 Motorola Inc. Miniaturized accelerometer with piezoelectric FET
USH655H (en) 1983-02-24 1989-07-04 Radiation hardening of MISFET devices
DD251851A1 (de) * 1984-05-28 1987-11-25 Akad Wissenschaften Ddr Paste fuer die herstellung gedruckter kondensatoren
US4639631A (en) * 1985-07-01 1987-01-27 Motorola, Inc. Electrostatically sealed piezoelectric device
US4767973A (en) * 1987-07-06 1988-08-30 Sarcos Incorporated Systems and methods for sensing position and movement
DE3910164A1 (de) * 1989-03-29 1990-10-04 Siemens Ag Elektrostatischer wandler zur erzeugung von akustischen oberflaechenwellen auf nicht piezoelektrischem halbleitersubstrat
DE3937073A1 (de) * 1989-11-07 1991-05-08 Siemens Ag Integriertes akustoelektronisches bauelement mit gebondeter iii-v-halbleiterschicht
FR2688090B1 (fr) * 1992-02-27 1994-04-08 Commissariat A Energie Atomique Cellule memoire non volatile du type metal-ferroelectrique semi-conducteur.
JPH06132579A (ja) * 1992-09-01 1994-05-13 Canon Inc 変位素子及びそれを用いたプローブ、同プローブを有する機器
US5607453A (en) * 1994-04-28 1997-03-04 Furukawa Co., Ltd. Composite medical treating device composed ferrodielectric substance and semiconductor
JP2643833B2 (ja) * 1994-05-30 1997-08-20 日本電気株式会社 半導体記憶装置及びその製造方法
JPH10284762A (ja) * 1995-02-16 1998-10-23 Asahi Chem Ind Co Ltd 表面弾性波を増幅するための積層構造及び増幅器
US5907768A (en) * 1996-08-16 1999-05-25 Kobe Steel Usa Inc. Methods for fabricating microelectronic structures including semiconductor islands
US5874755A (en) * 1996-11-07 1999-02-23 Motorola, Inc. Ferroelectric semiconductor device and method of manufacture
US20020038990A1 (en) * 2000-08-18 2002-04-04 National Aeronautics And Space Administration Piezoelectric composite device and method for making same
AU2002251690A1 (en) * 2000-12-13 2002-08-12 Rochester Institute Of Technology A method and system for electrostatic bonding
WO2002073673A1 (fr) 2001-03-13 2002-09-19 Rochester Institute Of Technology Commutateur micro-electromecanique et un procede de sa mise en oeuvre et de sa fabrication
US7195393B2 (en) 2001-05-31 2007-03-27 Rochester Institute Of Technology Micro fluidic valves, agitators, and pumps and methods thereof
US7378775B2 (en) 2001-10-26 2008-05-27 Nth Tech Corporation Motion based, electrostatic power source and methods thereof
US7211923B2 (en) 2001-10-26 2007-05-01 Nth Tech Corporation Rotational motion based, electrostatic power source and methods thereof
DE10235814B3 (de) * 2002-08-05 2004-03-11 Infineon Technologies Ag Verfahren zur lösbaren Montage eines zu prozessierenden Halbleitersubstrats auf einem Trägerwafer
US7217582B2 (en) 2003-08-29 2007-05-15 Rochester Institute Of Technology Method for non-damaging charge injection and a system thereof
US7287328B2 (en) 2003-08-29 2007-10-30 Rochester Institute Of Technology Methods for distributed electrode injection
US20050082624A1 (en) * 2003-10-20 2005-04-21 Evgeni Gousev Germanate gate dielectrics for semiconductor devices
US8581308B2 (en) 2004-02-19 2013-11-12 Rochester Institute Of Technology High temperature embedded charge devices and methods thereof
TW201216363A (en) * 2010-10-01 2012-04-16 Univ Nat Chiao Tung Dielectric structure, transistor and manufacturing method thereof with praseodymium oxide

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479572A (en) * 1967-07-06 1969-11-18 Litton Precision Prod Inc Acoustic surface wave device
US3585415A (en) * 1969-10-06 1971-06-15 Univ California Stress-strain transducer charge coupled to a piezoelectric material
US3686579A (en) * 1971-06-21 1972-08-22 Zenith Radio Corp Solid-state, acoustic-wave amplifiers
US3868719A (en) * 1973-04-02 1975-02-25 Kulite Semiconductor Products Thin ribbon-like glass backed transducers
US3851280A (en) * 1973-08-01 1974-11-26 Texas Instruments Inc Non-linear signal processing device using square law detection of surface elastic waves with insulated gate field effect transistor

Also Published As

Publication number Publication date
GB1554302A (en) 1979-10-17
DE2638405A1 (de) 1977-03-17
FR2323228A1 (fr) 1977-04-01
JPS5232280A (en) 1977-03-11
US4047214A (en) 1977-09-06
CA1060573A (fr) 1979-08-14

Similar Documents

Publication Publication Date Title
BE845471A (fr) Composant d'electrique sur semi-conducteur a liaison electrostatique et procede de fabrication d'un tel composant
FR2297539A1 (fr) Dispositif electronique a liaison capillaire et procede de fabrication d'un tel dispositif
DE3161295D1 (en) Process and device for simultaneously assembling components on a substrate
DE3379621D1 (en) Semiconductor integrated circuit device and a method for manufacturing the same
FR2524201B1 (fr) Procede de fabrication d'un dispositif semi-conducteur du type multicouche
FR2317852A1 (fr) Ruban d'interconnexion pour liaison d'ensemble de dispositifs semi-conducteurs et procede de fabrication d'un tel ruban
FR2483127B1 (fr) Procede de fabrication d'un dispositif semi-conducteur
DE3275885D1 (en) Method of fabricating a mos device on a substrate
EP0051488A3 (en) Semiconductor device and method for manufacturing the same
EP0154337A3 (en) Transistor circuit for semiconductor device with hysteresis operation and manufacturing method therefor
FR2299725A1 (fr) Composant de circuit integre et procede de fabrication d'un tel composant
FR2553576B1 (fr) Dispositif a circuits integres a semi-conducteurs et procede de fabrication d'un tel dispositif
FR2462023B1 (fr) Procede de fabrication d'un dispositif semi-conducteur
BE890772A (fr) Procede de fabrication d'un circuit integre
KR910003762A (ko) 게터링 시이트를 가진 절연체위에 반도체를 구비한 구조의 기판과 그 제조방법
FR2411490B1 (fr) Dispositif electrique structure chimiosensible et son procede de fabrication
KR840005928A (ko) 반도체 장치의 제조방법
FR2566969B1 (fr) Element de contact electrique d'un connecteur et procede de fabrication de cet element
FR2491715B1 (fr) Circuits a conducteur de cuivre en film epais et leur procede de fabrication
EP0075454A3 (en) Semiconductor device having new conductive interconnection structure and method for manufacturing the same
BE822787A (fr) Dispositif de branchement de fils electriques et procede de fabrication d'un tel dispositif
EP0042175A3 (en) Semiconductor device having a semiconductor layer formed on an insulating substrate and method for making the same
FR2559954B1 (fr) Boitier pour composant electronique du type a simple ligne et son procede de fabrication
FR2560436B1 (fr) Procede de fabrication d'un dispositif a semi-conducteur comportant un film monocristallin sur un isolant
FR2480995B1 (fr) Dispositif de contact electrique et procede de fabrication d'un tel dispositif