BE861311A - Procede d'attaque plasmatique, notamment pour la fabrication de semiconducteurs - Google Patents

Procede d'attaque plasmatique, notamment pour la fabrication de semiconducteurs

Info

Publication number
BE861311A
BE861311A BE183021A BE183021A BE861311A BE 861311 A BE861311 A BE 861311A BE 183021 A BE183021 A BE 183021A BE 183021 A BE183021 A BE 183021A BE 861311 A BE861311 A BE 861311A
Authority
BE
Belgium
Prior art keywords
plasmatic
semiconductors
manufacture
attack process
attack
Prior art date
Application number
BE183021A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of BE861311A publication Critical patent/BE861311A/fr

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
BE183021A 1976-11-29 1977-11-29 Procede d'attaque plasmatique, notamment pour la fabrication de semiconducteurs BE861311A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762654083 DE2654083A1 (de) 1976-11-29 1976-11-29 Plasmaaetzverfahren

Publications (1)

Publication Number Publication Date
BE861311A true BE861311A (fr) 1978-03-16

Family

ID=5994209

Family Applications (1)

Application Number Title Priority Date Filing Date
BE183021A BE861311A (fr) 1976-11-29 1977-11-29 Procede d'attaque plasmatique, notamment pour la fabrication de semiconducteurs

Country Status (5)

Country Link
JP (1) JPS5368642A (fr)
BE (1) BE861311A (fr)
DE (1) DE2654083A1 (fr)
FR (1) FR2372571A1 (fr)
IT (1) IT1089040B (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025233A (ja) * 1983-07-22 1985-02-08 Fujitsu Ltd 真空処理方法
AT386316B (de) * 1985-11-11 1988-08-10 Voest Alpine Ag Plasmareaktor zum aetzen von leiterplatten
US4711197A (en) * 1986-10-16 1987-12-08 Thermco Systems, Inc. Gas scavenger

Also Published As

Publication number Publication date
DE2654083A1 (de) 1978-06-01
JPS5368642A (en) 1978-06-19
IT1089040B (it) 1985-06-10
FR2372571A1 (fr) 1978-06-23

Similar Documents

Publication Publication Date Title
FR2351500A1 (fr) Procede perfectionne pour la fabrication d'interfaces metal-semi-conducteur
PT67347A (fr) Procede pour la fabrication d'un materiel de nettoyage
BE863916A (fr) Procede pour la production d'ethylene glycol
FR2445620B1 (fr) Procede d'attaque par plasma pour la fabrication de dispositifs a semi-conducteurs
FR2508237B1 (fr) Procede pour la fabrication d'une jonction de josephson, notamment d'une jonction tunnel de josephson
BE858768A (fr) Procede pour la fabrication du 1-chloro-1,1-difluorethane
FR2302499A1 (fr) Procede pour la fabrication de revete
BE861172A (fr) Procede de preparation d'alpha-amino-amides
RO76562A (fr) Procede pour la preparation des 3-imidazolilbenzo-1,2,4-triazine-1-oxydes
FR2724857B1 (fr) Procede de fabrication d'aubes cristallines
BE860929A (fr) Procede pour la fabrication d'ethyleneglycols tres purs
BE859325A (fr) Procede pour la chloration dirigee d'alcoylbenzenes
RO72837A (fr) Procede pour la preparation du 5-amino-1,2,3-thiadiazole
BE864135A (fr) Procede pour la fabrication de peradices
BE836023A (fr) Procede de fabrication d'aminucomposes
BE831256A (fr) Procede pour la fabrication d'alkylacetophenones
BE878885A (fr) Procede pour la fabrication de monofilaments
BE861311A (fr) Procede d'attaque plasmatique, notamment pour la fabrication de semiconducteurs
BE880031A (fr) Procede pour la preparation de 1 alpha, 3 beta-dihydroxy-delta 5-steroides
BE854178A (fr) Procede de fabrication d'electrodes ameliorees
FR2601039B1 (fr) Procede pour la fabrication de fontes de type perlitique
BE878932A (fr) Procede de fabrication l'etiquettes
BE852490A (fr) Procede pour la fabrication de toles galvanisees
BE860084A (fr) Procede de preparation d'hydroxy-4 alcoyl-4 cyclohexadiene-2,5 one-1
BE846299A (fr) Procede pour la fabrication de coke metallurgique