BE872621A - Installation de revetement sous vide equipee d'un mecanisme pour le transport des substrats en continu - Google Patents

Installation de revetement sous vide equipee d'un mecanisme pour le transport des substrats en continu

Info

Publication number
BE872621A
BE872621A BE192207A BE192207A BE872621A BE 872621 A BE872621 A BE 872621A BE 192207 A BE192207 A BE 192207A BE 192207 A BE192207 A BE 192207A BE 872621 A BE872621 A BE 872621A
Authority
BE
Belgium
Prior art keywords
substrates
vacuum coating
coating installation
installation equipped
continuous transportation
Prior art date
Application number
BE192207A
Other languages
English (en)
Original Assignee
Leybold Heraeus Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Gmbh & Co Kg filed Critical Leybold Heraeus Gmbh & Co Kg
Publication of BE872621A publication Critical patent/BE872621A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
BE192207A 1978-10-12 1978-12-08 Installation de revetement sous vide equipee d'un mecanisme pour le transport des substrats en continu BE872621A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2844491A DE2844491C2 (de) 1978-10-12 1978-10-12 Vakuum-Beschichtungsanlage mit einer Einrichtung zum kontinuierlichen Substrattransport

Publications (1)

Publication Number Publication Date
BE872621A true BE872621A (fr) 1979-03-30

Family

ID=6052035

Family Applications (1)

Application Number Title Priority Date Filing Date
BE192207A BE872621A (fr) 1978-10-12 1978-12-08 Installation de revetement sous vide equipee d'un mecanisme pour le transport des substrats en continu

Country Status (4)

Country Link
US (1) US4261808A (fr)
JP (1) JPS5554569A (fr)
BE (1) BE872621A (fr)
DE (1) DE2844491C2 (fr)

Families Citing this family (45)

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DE2900724C2 (de) * 1979-01-10 1986-05-28 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur Beschichtung von Substraten im Vakuum
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US4434037A (en) 1981-07-16 1984-02-28 Ampex Corporation High rate sputtering system and method
EP0122092A3 (fr) * 1983-04-06 1985-07-10 General Engineering Radcliffe Limited Dispositif de revêtement sous vide
US4526670A (en) * 1983-05-20 1985-07-02 Lfe Corporation Automatically loadable multifaceted electrode with load lock mechanism
GB8421162D0 (en) * 1984-08-21 1984-09-26 British Telecomm Growth of semi-conductors
US4722298A (en) * 1986-05-19 1988-02-02 Machine Technology, Inc. Modular processing apparatus for processing semiconductor wafers
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5798027A (en) * 1988-02-08 1998-08-25 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
DE3938267C2 (de) * 1989-11-17 1997-03-27 Leybold Ag Vorrichtung zum Heizen von Substraten
DE4111384C2 (de) * 1991-04-09 1999-11-04 Leybold Ag Vorrichtung zur Beschichtung von Substraten
JP3732250B2 (ja) * 1995-03-30 2006-01-05 キヤノンアネルバ株式会社 インライン式成膜装置
TW552306B (en) 1999-03-26 2003-09-11 Anelva Corp Method of removing accumulated films from the surfaces of substrate holders in film deposition apparatus, and film deposition apparatus
US6833031B2 (en) 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
DE10131232C1 (de) * 2001-06-28 2002-09-05 Siemens Ag Vorrichtung zur Beschichtung von Substraten mit oxidischem Material sowie Verwendung der Vorrichtung
JP4591080B2 (ja) * 2004-12-27 2010-12-01 富士電機システムズ株式会社 薄膜形成装置
DE112005003484A5 (de) * 2005-03-31 2008-07-24 Applied Materials Gmbh & Co. Kg Vorrichtung und Verfahren zum Beschichten von Substraten
US20080041314A1 (en) * 2006-08-18 2008-02-21 Robert William Bruce Vaccum coater device and mechanism for transporting workpieces in same
US20080121620A1 (en) * 2006-11-24 2008-05-29 Guo G X Processing chamber
DE102007009615A1 (de) * 2007-02-26 2008-08-28 Leybold Optics Gmbh Anlage und Verfahren zur Vakuumbehandlung von bandförmigen Substraten
US8784622B2 (en) * 2007-12-06 2014-07-22 Intevac, Inc. System and method for dual-sided sputter etch of substrates
US20100006420A1 (en) * 2008-07-08 2010-01-14 Seagate Technology Llc Inline interlayer heater apparatus
US8759084B2 (en) * 2010-01-22 2014-06-24 Michael J. Nichols Self-sterilizing automated incubator
CA2886976C (fr) * 2012-10-01 2020-01-21 Nissan Motor Co., Ltd. Dispositif de revetement en ligne, procede de revetement en ligne et separateur
DE102014104366A1 (de) * 2014-03-28 2015-10-01 Von Ardenne Gmbh Vorrichtung zum Behandeln von Substraten
KR20190071003A (ko) * 2014-10-10 2019-06-21 캐논 아네르바 가부시키가이샤 성막 장치
WO2017101971A1 (fr) * 2015-12-14 2017-06-22 Applied Materials, Inc. Système de traitement pour traitement des deux côté d'un substrat, et procédé de traitement des deux côtés d'un substrat
CN111748786A (zh) * 2015-12-17 2020-10-09 株式会社爱发科 真空处理装置
CN108350567B (zh) * 2016-08-25 2019-06-14 株式会社爱发科 成膜装置及成膜方法以及太阳能电池的制造方法
JP6754530B2 (ja) * 2016-09-06 2020-09-16 株式会社アルバック 成膜装置及び成膜方法並びに太陽電池の製造方法
KR101972730B1 (ko) * 2016-11-02 2019-04-25 가부시키가이샤 알박 진공 처리 장치
JP6379322B1 (ja) * 2016-11-04 2018-08-22 株式会社アルバック 成膜装置
JP6442648B1 (ja) * 2017-06-14 2018-12-19 株式会社アルバック 真空処理装置
CN111971415B (zh) * 2019-01-08 2023-02-17 株式会社爱发科 真空处理装置
CN109609923B (zh) * 2019-01-11 2023-08-25 广东谛思纳为新材料科技有限公司 一种便于拉链扣电离子镀铂加工的自动化装置
KR102507701B1 (ko) * 2019-02-28 2023-03-09 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 성막 장치
JP6814998B1 (ja) * 2019-12-25 2021-01-20 株式会社プラズマイオンアシスト プラズマ処理装置
CN112366627A (zh) * 2020-11-24 2021-02-12 安徽精工电缆桥架有限公司 一种耐热耐腐蚀的电缆桥架
CN114765103B (zh) * 2021-01-12 2025-07-25 等离子体成膜有限公司 等离子体处理装置
KR20230118907A (ko) * 2021-01-19 2023-08-14 시바우라 기카이 가부시키가이샤 표면 처리 장치 및 표면 처리 방법

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DE1236900B (de) * 1959-03-13 1967-03-16 Erwin Lothar Holland Merten Vorrichtung zum Herstellen von metallischen UEberzuegen auf plattenfoermigen Koerpern oder Werkstuecktraegern durch Vakuum-Aufdampfen
DE1183337B (de) * 1959-07-02 1964-12-10 Bernard Marie Maurice Gilbert Vorrichtung zum Vakuumbedampfen von plattenfoermigen Gegenstaenden, z. B. Spiegeln, mit Metall
GB907688A (en) * 1960-03-24 1962-10-10 Ti Group Services Ltd Improvements in or relating to the production of cured coatings of polymeric material
US3288700A (en) * 1963-10-23 1966-11-29 Northern Electric Co Sputtering apparatus including a folded flexible conveyor
LU45647A1 (fr) * 1964-03-12 1965-09-13
US3596285A (en) * 1969-07-11 1971-07-27 Teletype Corp Liquid metal recorder
DE2116190C3 (de) * 1971-04-02 1979-08-30 Flachglas Ag Delog-Detag, 4650 Gelsenkirchen Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung
JPS5315466B2 (fr) * 1973-04-28 1978-05-25
DE2415119A1 (de) * 1974-03-28 1975-10-16 Siemens Ag Kathodenzerstaeubungsanlage mit kontinuierlichem substratdurchlauf
US3873025A (en) * 1974-05-06 1975-03-25 Stora Kopparbergs Bergslags Ab Method and apparatus for atomizing a liquid medium and for spraying the atomized liquid medium in a predetermined direction
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
JPS5421175A (en) * 1977-07-18 1979-02-17 Tokyo Ouka Kougiyou Kk Improvement of plasma reaction processor
US4131533A (en) * 1977-12-30 1978-12-26 International Business Machines Corporation RF sputtering apparatus having floating anode shield

Also Published As

Publication number Publication date
DE2844491C2 (de) 1983-04-14
JPS5554569A (en) 1980-04-21
JPS5647952B2 (fr) 1981-11-12
US4261808A (en) 1981-04-14
DE2844491A1 (de) 1980-04-17

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