BE892711A - Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive - Google Patents

Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive

Info

Publication number
BE892711A
BE892711A BE0/207717A BE207717A BE892711A BE 892711 A BE892711 A BE 892711A BE 0/207717 A BE0/207717 A BE 0/207717A BE 207717 A BE207717 A BE 207717A BE 892711 A BE892711 A BE 892711A
Authority
BE
Belgium
Prior art keywords
reactive
forming
oxide coating
nebulization technique
nebulization
Prior art date
Application number
BE0/207717A
Other languages
English (en)
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Publication of BE892711A publication Critical patent/BE892711A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Fluid Mechanics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Physical Vapour Deposition (AREA)
  • Nozzles (AREA)
BE0/207717A 1981-03-31 1982-03-31 Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive BE892711A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56048258A JPS57161063A (en) 1981-03-31 1981-03-31 Method and device for sticking metallic oxide film on substrate

Publications (1)

Publication Number Publication Date
BE892711A true BE892711A (fr) 1982-07-16

Family

ID=12798411

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/207717A BE892711A (fr) 1981-03-31 1982-03-31 Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive

Country Status (6)

Country Link
US (1) US4407709A (fr)
JP (1) JPS57161063A (fr)
BE (1) BE892711A (fr)
DE (1) DE3212037A1 (fr)
FR (1) FR2503190A1 (fr)
GB (1) GB2097428A (fr)

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US5956145A (en) * 1992-09-18 1999-09-21 J. A. Woollam Co. Inc. System and method for improving data acquisition capability in spectroscopic rotatable element, rotating element, modulation element, and other ellipsometer and polarimeter and the like systems
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DE4235200C1 (fr) * 1992-10-19 1993-07-29 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4242633C2 (de) * 1992-12-17 1996-11-14 Fraunhofer Ges Forschung Verfahren zur Durchführung von stabilen Niederdruck-Glimmprozessen
FR2699934B1 (fr) * 1992-12-30 1995-03-17 Lorraine Inst Nat Polytech Procédé de contrôle de la concentration en métalloïde d'un dépôt réalisés par voie physique en phase vapeur réactive à l'aide d'un plasma froid de pulvérisation.
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US6217720B1 (en) * 1997-06-03 2001-04-17 National Research Council Of Canada Multi-layer reactive sputtering method with reduced stabilization time
WO1999007914A1 (fr) * 1997-08-08 1999-02-18 Lockheed Martin Corporation Commande de procede de pulverisation cathodique en couche mince, en fonction des raie d'emission multispectroscopiques
EP0918042A1 (fr) * 1997-11-20 1999-05-26 Balzers Hochvakuum AG Substrat revêtu d'au moins une couche de MgO
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JP2003201562A (ja) * 2002-01-11 2003-07-18 Nippon Telegr & Teleph Corp <Ntt> 成膜モニタリング方法
US6863772B2 (en) * 2002-10-09 2005-03-08 Taiwan Semiconductor Manufacturing Co., Ltd Dual-port end point window for plasma etcher
DE10260614B4 (de) * 2002-12-23 2008-01-31 Advanced Micro Devices, Inc., Sunnyvale Plasmaparametersteuerung unter Verwendung von Lerndaten
US7172681B2 (en) * 2003-02-05 2007-02-06 Bridgestone Corporation Process for producing rubber-based composite material
JP4720298B2 (ja) * 2005-06-07 2011-07-13 株式会社ブリヂストン 導電性化合物薄膜の成膜方法
FR2888587B1 (fr) * 2005-07-13 2007-10-05 Sidel Sas Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant un dispositif d'analyse optique du plasma
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US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US11155493B2 (en) 2010-01-16 2021-10-26 Cardinal Cg Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
CN103187225B (zh) * 2011-12-28 2015-10-21 中微半导体设备(上海)有限公司 一种可监测刻蚀过程的等离子体处理装置
JP6244103B2 (ja) * 2012-05-04 2017-12-06 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 反応性スパッタ堆積のための方法および反応性スパッタ堆積システム
CN104937131B (zh) * 2013-01-23 2018-01-16 株式会社尼康 成膜装置和膜的制造方法
KR102871323B1 (ko) * 2015-03-03 2025-10-15 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 그 제작 방법, 또는 그를 포함하는 표시 장치
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
CN112746259B (zh) * 2020-12-30 2023-06-23 尚越光电科技股份有限公司 一种通过等离子体辉光光谱来控制磁控溅射镀膜杂质含量的方法
US12224159B1 (en) * 2023-08-09 2025-02-11 Sky Tech Inc. Gas mixing method to enhance plasma

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FR1541499A (fr) * 1966-10-31 1968-10-04 Air Reduction Procédé et appareil de contrôle de la densité d'une vapeur par spectroscopie
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Also Published As

Publication number Publication date
US4407709A (en) 1983-10-04
GB2097428A (en) 1982-11-03
JPS57161063A (en) 1982-10-04
DE3212037A1 (de) 1982-10-21
FR2503190A1 (fr) 1982-10-08

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: NIPPON SHEET GLASS CO.

Effective date: 19850331