BR0113221A - Fotoiniciadores tensoativos - Google Patents

Fotoiniciadores tensoativos

Info

Publication number
BR0113221A
BR0113221A BR0113221-0A BR0113221A BR0113221A BR 0113221 A BR0113221 A BR 0113221A BR 0113221 A BR0113221 A BR 0113221A BR 0113221 A BR0113221 A BR 0113221A
Authority
BR
Brazil
Prior art keywords
radical
alkyl
unsubstituted
substituted
phenyl
Prior art date
Application number
BR0113221-0A
Other languages
English (en)
Inventor
Gisele Baudin
Tunja Jung
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0113221A publication Critical patent/BR0113221A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0834Compounds having one or more O-Si linkage
    • C07F7/0838Compounds with one or more Si-O-Si sequences
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group
    • Y10S522/905Benzophenone group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

"FOTOINICIADORES TENSOATIVOS". Compostos da fórmula Ia, Ib e Ic R, R~ 1~, e R~ 2~ são um radical fenila, naftila, antracila, fenantrila ou um heterocíclico, esses radicais sendo não-substituídos ou substituídos por A-X-, A~ 1~-X~ 1~-, A~ 2~- X~ 2~-, C~ 1-~C~ 8~ alquila, fenila, OR~ 8~, SR~ 9~ e/ou NR~ 10~R~ 11~; contanto que haja pelo menos um substituinte A-X-, A~ 1~-X~ 1~-, ou A~ 2~-X~ 2~- no radical R ou em pelo menos um dos radicais R~ 1~, ou R~ 2~; R~ a~ e R~ b~ SãO, por exemplo, fenileno, naftileno, antracileno, fenantrileno ou um radical heterocíclico divalente, esses radicais sendo não-substituídos ou substituídos por A-X-, A~ 1~-X~ 1~-, A~ 2~- X~ 2~-, C~ 1~-C~ 8~ alquila, fenila, OR~ 8~, SR~ 9~ e/ou NR~ 10~R~ 11~; R~ 8~, R~ 9~, R~ 10~ e R~ 11~, são, por exemplo, hidrogênio; fenila não-substituída ou substituída ou C~ 1~-C ~12~ alquila; A, A~ 1~ e A~ 2~ são, por exemplo, um radical da fórmula ou A, A~ 1~ e A~ 2~ são um radical A~ 0~; A~ 0~ é, por exemplo, C~ 6~-C~ 30~ alquila, C~ 6~-C~ 30~ alquenila, C~ 6~-C~ 30~ alquinila, C~ 6~-C~ 30~ aralquila; A~ 3~ é um radical da fórmula III na qual n tem o valor 2; ou A~ 8~ é um radical A~ 4~; A~ 4~ é, por exemplo, C~ 6~-C~ 30~ alquileno, C~ 6~-C~ 30~ alquenileno, C~ 6~-C~ 30~ alquinileno, C~ 6~-C~ 30~ aralquileno; n é um número de 1 a 1000; m é um número de 0 a 100; p é um número de 0-10 000; G~ 1~, G~ 2~ R~ 15~ R~ 16~ R~ 17~ R~ 18~ R~ 19~ R~ 20~ R~ 21~, R~ 22~, R~ 23~ e R~ 24~ são, por exemplo, C~ 1~-C~ 18~ alquila; X, X~ 1~ e X~ 2~, se A, A~ 1~ e A~ 2~ forem um radical da fórmula III, são, por exemplo, C~ 1~-C~ 10~ alquileno; e X, X~ 1~ e X~ 2~, se A, A~ 1~ ou A~ 2~ tiverem a definição de A~ 0~, são uma ligação simples, -O-, -S- ou -NR~ 14~-; Y é, por exemplo, C~1~-C~ 20~ alquila não-substituída ou substituída; Y~ 1~ e Y~ 2~ são, por exemplo, C~ 1~-C~ 12~ alquileno não-substituído ou substituído; são adequados como fotoiniciadores que se acumulam na superfície dos revestimentos.
BR0113221-0A 2000-08-14 2001-08-07 Fotoiniciadores tensoativos BR0113221A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00810721 2000-08-14
PCT/EP2001/009122 WO2002014326A1 (en) 2000-08-14 2001-08-07 Surface-active photoinitiators

Publications (1)

Publication Number Publication Date
BR0113221A true BR0113221A (pt) 2003-06-24

Family

ID=8174857

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0113221-0A BR0113221A (pt) 2000-08-14 2001-08-07 Fotoiniciadores tensoativos

Country Status (11)

Country Link
US (1) US6906113B2 (pt)
EP (1) EP1309599A1 (pt)
JP (1) JP2004506639A (pt)
KR (1) KR20030022397A (pt)
CN (1) CN1214035C (pt)
AU (1) AU2001283989A1 (pt)
BR (1) BR0113221A (pt)
CA (1) CA2416325A1 (pt)
MX (1) MXPA03001093A (pt)
TW (1) TW557298B (pt)
WO (1) WO2002014326A1 (pt)

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US20040033317A1 (en) * 2000-12-13 2004-02-19 Gisele Baudin Surface-active photoinitators
JP2005517022A (ja) * 2002-02-04 2005-06-09 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 界面活性光開始剤
EP1472292B1 (en) * 2002-02-04 2008-07-23 Ciba Holding Inc. Surface-active siloxane photoinitiators
CN1307207C (zh) * 2002-04-26 2007-03-28 西巴特殊化学品控股有限公司 可引入的光敏引发剂
JP4283004B2 (ja) * 2003-02-04 2009-06-24 株式会社日立製作所 ディスク制御装置およびディスク制御装置の制御方法
TWI373477B (en) * 2004-07-29 2012-10-01 Dainippon Ink & Chemicals Radiation curable resin composition for shaping, sheet for shaping, and shaped material
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
ITTV20050084A1 (it) 2005-06-15 2006-12-16 Asolo Spa Calzatura con suola traspirante.
DE602006018023D1 (de) * 2005-08-08 2010-12-16 Angstrom Medica Inc Zementprodukte sowie verfahren zu deren herstellung und verwendung
WO2007119421A1 (ja) * 2006-03-31 2007-10-25 Konica Minolta Opto, Inc. 表示装置用フィルム、偏光板及びその製造方法、液晶表示装置
KR20090118907A (ko) * 2006-11-10 2009-11-18 더 리전트 오브 더 유니버시티 오브 캘리포니아 대기압 플라즈마 유도 그래프트 중합
US7985826B2 (en) * 2006-12-22 2011-07-26 Reichhold, Inc. Molding resins using renewable resource component
US8815973B2 (en) 2007-08-28 2014-08-26 Pioneer Surgical Technology, Inc. Cement products and methods of making and using the same
EP2215525B1 (en) * 2007-11-27 2018-01-10 3D Systems Incorporated Photocurable resin composition for producing three dimensional articles having high clarity
JP2010209183A (ja) 2009-03-09 2010-09-24 Fujifilm Corp インク組成物及びインクジェット記録方法
JP6010352B2 (ja) 2012-06-07 2016-10-19 株式会社オートネットワーク技術研究所 硬化性増感剤、光硬化材料、硬化物及びワイヤーハーネス材料
CN103616799B (zh) * 2013-11-07 2016-02-24 李厚民 一种固化后有机可溶的光敏树脂、制备方法及溶解方法
MX2016016627A (es) 2014-06-23 2017-06-06 Carbon Inc Metodos de produccion de objetos tridimensionales a partir de materiales que tienen multiples mecanismos de endurecimiento.
CN107438513B (zh) * 2015-02-05 2020-12-29 卡本有限公司 通过间歇曝光的增材制造方法
WO2017079502A1 (en) * 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
WO2017112653A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
CN213006569U (zh) 2017-06-21 2021-04-20 卡本有限公司 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统
CN109762397A (zh) * 2019-01-21 2019-05-17 长沙新宇高分子科技有限公司 一种含氨基酮光引发剂的uv光固化组合物

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Also Published As

Publication number Publication date
KR20030022397A (ko) 2003-03-15
MXPA03001093A (es) 2003-05-27
US20040014832A1 (en) 2004-01-22
CN1214035C (zh) 2005-08-10
WO2002014326A1 (en) 2002-02-21
CN1447814A (zh) 2003-10-08
TW557298B (en) 2003-10-11
CA2416325A1 (en) 2002-02-21
EP1309599A1 (en) 2003-05-14
AU2001283989A1 (en) 2002-02-25
US6906113B2 (en) 2005-06-14
JP2004506639A (ja) 2004-03-04

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]