BR0318178A - litografia interferométrica ótica sem máscara - Google Patents

litografia interferométrica ótica sem máscara

Info

Publication number
BR0318178A
BR0318178A BRPI0318178-2A BR0318178A BR0318178A BR 0318178 A BR0318178 A BR 0318178A BR 0318178 A BR0318178 A BR 0318178A BR 0318178 A BR0318178 A BR 0318178A
Authority
BR
Brazil
Prior art keywords
optical
optical device
mask
plane
interferometric lithography
Prior art date
Application number
BRPI0318178-2A
Other languages
English (en)
Inventor
Jose Manuel Nunes Vic Rebordao
Alexandre Pereira Cabral
Original Assignee
Imprensa Nac Casa Da Moeda S A
Inst Nac De Engenharia Tecnolo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imprensa Nac Casa Da Moeda S A, Inst Nac De Engenharia Tecnolo filed Critical Imprensa Nac Casa Da Moeda S A
Publication of BR0318178A publication Critical patent/BR0318178A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)

Abstract

"LITOGRAFIA INTERFEROMéTRICA óTICA SEM MáSCARA". A presente invenção refere-se a um dispositivo ótico gerado por litografia interferométrica, na forma de um padrão de relevo de superfície que difrata a luz, para ser utilizado principalmente em segurança ótica, produzido por sistemas óticos que atendem às Regras de Scheimpflug e Hinge contendo: duas lentes idênticas L1 e L2, duas localizações físicas do objeto B1 e B2 e um plano da imagem A1 <154> A2. Nenhuma máscara física é necessária através de todo o processo de criação, assim eliminando qualquer tipo de efeito de franja. O dispositivo realmente implementa um holograma focalizado no plano, com um padrão de superfície complexo de vales e cristas com uma função de geração não-trivial, o qual é, por si mesmo, tanto uma característica de segurança adicional do dispositivo quanto a sua impressão digital. O tempo para gerar o dispositivo ótico é proporcional ao número de cores especificado para a geometria de referência e não depende da área total do dispositivo ótico.
BRPI0318178-2A 2003-03-25 2003-03-25 litografia interferométrica ótica sem máscara BR0318178A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/PT2003/000004 WO2004088363A1 (en) 2003-03-25 2003-03-25 Maskless optical interferometric lithography

Publications (1)

Publication Number Publication Date
BR0318178A true BR0318178A (pt) 2006-03-21

Family

ID=33129388

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0318178-2A BR0318178A (pt) 2003-03-25 2003-03-25 litografia interferométrica ótica sem máscara

Country Status (6)

Country Link
US (1) US7319551B2 (pt)
EP (1) EP1606657A1 (pt)
AU (1) AU2003212727B2 (pt)
BR (1) BR0318178A (pt)
CA (1) CA2516603A1 (pt)
WO (1) WO2004088363A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7242464B2 (en) 1999-06-24 2007-07-10 Asml Holdings N.V. Method for characterizing optical systems using holographic reticles
US6934038B2 (en) 2000-02-15 2005-08-23 Asml Holding N.V. Method for optical system coherence testing
US7751030B2 (en) 2005-02-01 2010-07-06 Asml Holding N.V. Interferometric lithographic projection apparatus
US7440078B2 (en) 2005-12-20 2008-10-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
US7561252B2 (en) 2005-12-29 2009-07-14 Asml Holding N.V. Interferometric lithography system and method used to generate equal path lengths of interfering beams
US8264667B2 (en) 2006-05-04 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and other exposure
US7952803B2 (en) 2006-05-15 2011-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8934084B2 (en) 2006-05-31 2015-01-13 Asml Holding N.V. System and method for printing interference patterns having a pitch in a lithography system
US7443514B2 (en) 2006-10-02 2008-10-28 Asml Holding N.V. Diffractive null corrector employing a spatial light modulator
US7684014B2 (en) 2006-12-01 2010-03-23 Asml Holding B.V. Lithographic apparatus and device manufacturing method
JP2013145863A (ja) 2011-11-29 2013-07-25 Gigaphoton Inc ２光束干渉装置および２光束干渉露光システム
EP3652522A4 (en) 2017-07-14 2021-03-24 Neolund AB HIGH RESOLUTION MOLECULAR LIDAR

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918469A (en) 1980-11-05 1990-04-17 Mcgrew Stephen P Diffractive color and texture effects for the graphic arts
EP0375833B1 (de) 1988-12-12 1993-02-10 Landis &amp; Gyr Technology Innovation AG Optisch variables Flächenmuster
US5453338A (en) 1992-03-31 1995-09-26 Dai Nippon Printing Co., Ltd. Hologram and method of and apparatus for producing the same
US5291317A (en) 1990-07-12 1994-03-01 Applied Holographics Corporation Holographic diffraction grating patterns and methods for creating the same
US5138471A (en) 1990-07-20 1992-08-11 Mcgrew Stephen P Holocomposer
EP0534616B1 (en) 1991-08-29 1997-10-29 Fujitsu Limited Holographic recording apparatus and holographic optical element
FR2716983B1 (fr) 1994-03-03 1996-05-24 Hologram Ind Sarl Procédé pour réaliser une image optiquement variable.
CN1053118C (zh) 1997-07-09 2000-06-07 天津市元亨医药保健品公司 强心卡及其制造方法
TW460758B (en) * 1998-05-14 2001-10-21 Holographic Lithography System A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
AU761179B2 (en) * 1998-10-30 2003-05-29 Corning Incorporated Wavelength tuning of photo-induced gratings
US6480283B1 (en) * 1999-05-20 2002-11-12 California Institute Of Technology Lithography system using quantum entangled photons
US7304775B2 (en) * 2000-03-03 2007-12-04 Coho Holdings, Llc Actively stabilized, single input beam, interference lithography system and method
US6641268B2 (en) * 2001-02-28 2003-11-04 Massachusetts Institute Of Technology Interferometric projection system

Also Published As

Publication number Publication date
AU2003212727A8 (en) 2004-10-25
US7319551B2 (en) 2008-01-15
EP1606657A1 (en) 2005-12-21
AU2003212727A1 (en) 2004-10-25
WO2004088363A1 (en) 2004-10-14
US20070002448A1 (en) 2007-01-04
CA2516603A1 (en) 2004-10-14
AU2003212727B2 (en) 2008-09-04

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Legal Events

Date Code Title Description
B08F Application fees: application dismissed [chapter 8.6 patent gazette]

Free format text: REFERENTE A 9A ANUIDADE(S).

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2144 DE 07/02/2012.