BR8505338A - Composto,processo de deposicao de vapor quimico organico de metal e processo para sintese de compostos organometalicos hibridos - Google Patents

Composto,processo de deposicao de vapor quimico organico de metal e processo para sintese de compostos organometalicos hibridos

Info

Publication number: BR8505338A
Authority: BR; Brazil
Prior art keywords: metal organic; organic chemical; hybrid; compound; deposition process
Prior art date: 1984-10-25

Application number

BR8505338A

Other languages

English (en)

Inventor

Benjamin C Hui

Jorg Lorberth

Andreas A Melas

Original Assignee

Thiokol Morton Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-10-25

Filing date

1985-10-25

Publication date

1986-08-05

1985-10-25 Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc

1986-08-05 Publication of BR8505338A publication Critical patent/BR8505338A/pt

Links

150000001875 compounds Chemical class 0.000 title abstract 6
238000000034 method Methods 0.000 title abstract 4
230000015572 biosynthetic process Effects 0.000 title 1
238000005229 chemical vapour deposition Methods 0.000 title 1
239000002184 metal Substances 0.000 title 1
238000003786 synthesis reaction Methods 0.000 title 1
238000002488 metal-organic chemical vapour deposition Methods 0.000 abstract 3
125000001424 substituent group Chemical group 0.000 abstract 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 2
125000000217 alkyl group Chemical group 0.000 abstract 2
229910052797 bismuth Inorganic materials 0.000 abstract 2
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract 2
125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 abstract 2
ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Chemical group C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 abstract 2
150000004678 hydrides Chemical class 0.000 abstract 2
230000000737 periodic effect Effects 0.000 abstract 2
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
229910052711 selenium Inorganic materials 0.000 abstract 2
239000011669 selenium Substances 0.000 abstract 2
229910052714 tellurium Inorganic materials 0.000 abstract 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract 1
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
239000004411 aluminium Substances 0.000 abstract 1
229910052782 aluminium Inorganic materials 0.000 abstract 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
229910052790 beryllium Inorganic materials 0.000 abstract 1
ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 abstract 1
229910052799 carbon Inorganic materials 0.000 abstract 1
239000002131 composite material Substances 0.000 abstract 1
-1 hydride compound Chemical class 0.000 abstract 1
229910052749 magnesium Inorganic materials 0.000 abstract 1
239000011777 magnesium Substances 0.000 abstract 1
229910052757 nitrogen Inorganic materials 0.000 abstract 1
150000002902 organometallic compounds Chemical class 0.000 abstract 1
229910052760 oxygen Inorganic materials 0.000 abstract 1
239000001301 oxygen Substances 0.000 abstract 1
229910052717 sulfur Inorganic materials 0.000 abstract 1
239000011593 sulfur Substances 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C391/00—Compounds containing selenium
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C395/00—Compounds containing tellurium
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/02—Magnesium compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/06—Zinc compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/08—Cadmium compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/10—Mercury compounds
- C07F3/12—Aromatic substances containing mercury
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/505—Preparation; Separation; Purification; Stabilisation
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/70—Organo-arsenic compounds
- C07F9/72—Aliphatic compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/94—Bismuth compounds
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
- C23C16/306—AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Inorganic Chemistry (AREA)
Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Biochemistry (AREA)
General Health & Medical Sciences (AREA)
Molecular Biology (AREA)
Chemical Vapour Deposition (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

BR8505338A 1984-10-25 1985-10-25 Composto,processo de deposicao de vapor quimico organico de metal e processo para sintese de compostos organometalicos hibridos BR8505338A (pt)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/664,645 US4720560A (en)	1984-10-25	1984-10-25	Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition

Publications (1)

Publication Number	Publication Date
BR8505338A true BR8505338A (pt)	1986-08-05

Family

ID=24666848

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR8505338A BR8505338A (pt)	1984-10-25	1985-10-25	Composto,processo de deposicao de vapor quimico organico de metal e processo para sintese de compostos organometalicos hibridos

Country Status (10)

Country	Link
US (1)	US4720560A (pt)
EP (1)	EP0181706B1 (pt)
JP (1)	JPS61104079A (pt)
KR (1)	KR900001008B1 (pt)
AT (1)	ATE48002T1 (pt)
BR (1)	BR8505338A (pt)
CA (1)	CA1251804A (pt)
DE (1)	DE3574257D1 (pt)
DK (1)	DK488785A (pt)
IL (1)	IL76716A0 (pt)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3514410A1 (de) *	1985-04-20	1986-10-23	Schering AG, Berlin und Bergkamen, 1000 Berlin	Neue alkalimetallaluminiumdialkyldihydride und deren loesungen in aromatischen kohlenwasserstoffen
JPH0627327B2 (ja) *	1987-06-30	1994-04-13	インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン	Ｉｂ族金属の付着方法
EP0305144A3 (en) *	1987-08-24	1989-03-08	Canon Kabushiki Kaisha	Method of forming crystalline compound semiconductor film
DE3742525C2 (de) *	1987-12-11	1998-02-19	Hertz Inst Heinrich	Verfahren zur Herstellung von Metallalkylverbindungen und deren Verwendung
US4992305A (en) *	1988-06-22	1991-02-12	Georgia Tech Research Corporation	Chemical vapor deposition of transistion metals
US4915988A (en) *	1988-06-22	1990-04-10	Georgia Tech Research Corporation	Chemical vapor deposition of group IIA metals and precursors therefor
US4942252A (en) *	1988-08-16	1990-07-17	Cvd Incorporated	Synthesis of phosphorus and arsenic, halides and hydrides
NL8802458A (nl) *	1988-10-07	1990-05-01	Philips Nv	Werkwijze voor de vervaardiging van een epitaxiale indiumfosfide-laag op een substraatoppervlak.
US5147688A (en) *	1990-04-24	1992-09-15	Cvd, Inc.	MOCVD of indium oxide and indium/tin oxide films on substrates
DE4104076C2 (de) *	1991-02-11	1994-03-31	Bruker Analytische Messtechnik	Vorrichtung zur kernresonanzspektrometrischen Messung von chemischen und/oder physikalischen Reaktionsabläufen
US5300185A (en) *	1991-03-29	1994-04-05	Kabushiki Kaisha Toshiba	Method of manufacturing III-V group compound semiconductor
DE4214224A1 (de) *	1992-04-30	1993-11-04	Merck Patent Gmbh	Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten
US5380895A (en) *	1993-02-10	1995-01-10	Bandgap Technology Corporation	Method for the synthesis of metal alkyls and metal aryls
US5502227A (en) *	1993-07-27	1996-03-26	Cvd, Incorporated	Liquid indium source
JPH07153700A (ja) *	1993-11-26	1995-06-16	Sony Corp	有機金属気相成長法及び発光素子作製方法
US6211106B1 (en) *	1998-06-18	2001-04-03	Industrial Technology Research Institute	Groups IIA and IIIA based catalyst composition for preparing high-syndiotacticity polystyrene
DE60301152T8 (de)	2002-01-17	2006-04-27	Shipley Co., L.L.C., Marlborough	Organoindiumverbindungen zur Verwendung in der chemischen Dampfphasenabscheidung
DE102005037076B3 (de) *	2005-08-03	2007-01-25	Otto-Von-Guericke-Universität Magdeburg	Verfahren zur Herstellung von gemischt substituierte Organobismuthverbindungen und deren Verwendung
US20070141374A1 (en) *	2005-12-19	2007-06-21	General Electric Company	Environmentally resistant disk
WO2014078263A1 (en) *	2012-11-14	2014-05-22	Dow Global Technologies Llc	Methods of producing trimethylgallium
WO2015024893A1 (de) *	2013-08-22	2015-02-26	Umicore Ag & Co. Kg	Verfahren zur herstellung von alkylindium-verbindungen und deren verwendung
EP3173507A1 (de) *	2015-11-25	2017-05-31	Umicore AG & Co. KG	Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen
WO2022118744A1 (ja) *	2020-12-04	2022-06-09	株式会社高純度化学研究所	インジウムおよび一種以上の他の金属を含有する膜を製造するための蒸着用原料およびインジウムおよび一種以上の他の金属を含有する膜の製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2266776A (en) *	1938-09-24	1941-12-23	Atlantic Refining Co	Diesel fuel
US2818416A (en) *	1952-12-10	1957-12-31	Ethyl Corp	Cyclomatic compounds
US2880115A (en) *	1955-07-13	1959-03-31	Ohio Commw Eng Co	Method of gas plating light metals
US3097066A (en) *	1956-02-25	1963-07-09	Studiengesellschaft Kohle Mbh	Process for the production of boron and aluminium compounds containing hydrocarbon raicals and/or hydrogen
US2987534A (en) *	1958-04-25	1961-06-06	Ethyl Corp	Group iii-a element compounds
US3026356A (en) *	1958-04-25	1962-03-20	Herbert C Brown	Process for the preparation of organo boron compounds
US2969382A (en) *	1958-04-25	1961-01-24	Ethyl Corp	Process for the manufacture of cyclopentadienyl group iii-a metal compounds
US3247261A (en) *	1958-12-24	1966-04-19	Dal Mon Research Co	Organo-metallo compounds
US3161686A (en) *	1960-03-30	1964-12-15	Herbert C Brown	Novel organoboron compounds
JPS466817Y1 (pt) *	1967-06-30	1971-03-10
US3755479A (en) *	1967-10-24	1973-08-28	Ethyl Corp	Beryllium hydride compositions and their use in making cyclopentadienyl beryllium hydride compounds
US3578494A (en) *	1969-04-09	1971-05-11	Continental Oil Co	Zinc plating by chemical reduction
US3755478A (en) *	1971-08-18	1973-08-28	Lithium Corp	Cyclic process for the preparation of diorganomagnesium compounds
JPS5312359B2 (pt) *	1972-06-14	1978-04-28
JPS5422276B2 (pt) *	1973-03-19	1979-08-06
DE2429600A1 (de) *	1973-06-22	1975-01-16	Gen Electric	In luft stabile, magnetische materialien und verfahren zu deren herstellung
EP0040939B1 (en) *	1980-05-27	1985-01-02	The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and	Manufacture of cadmium mercury telluride
JPS57145972A (en) *	1980-11-18	1982-09-09	British Telecomm	Formation of group iii-v compount
US4447369A (en) *	1982-04-16	1984-05-08	Ethyl Corporation	Organomagnesium compounds

1984
- 1984-10-25 US US06/664,645 patent/US4720560A/en not_active Expired - Lifetime
1985
- 1985-10-15 AT AT85307400T patent/ATE48002T1/de not_active IP Right Cessation
- 1985-10-15 EP EP85307400A patent/EP0181706B1/en not_active Expired
- 1985-10-15 DE DE8585307400T patent/DE3574257D1/de not_active Expired
- 1985-10-15 IL IL76716A patent/IL76716A0/xx unknown
- 1985-10-21 CA CA000493480A patent/CA1251804A/en not_active Expired
- 1985-10-24 KR KR1019850007847A patent/KR900001008B1/ko not_active Expired
- 1985-10-24 DK DK488785A patent/DK488785A/da not_active Application Discontinuation
- 1985-10-25 JP JP60239257A patent/JPS61104079A/ja active Granted
- 1985-10-25 BR BR8505338A patent/BR8505338A/pt unknown

Also Published As

Publication number	Publication date
EP0181706A1 (en)	1986-05-21
CA1251804A (en)	1989-03-28
JPH0357188B2 (pt)	1991-08-30
KR860003266A (ko)	1986-05-21
KR900001008B1 (ko)	1990-02-24
ATE48002T1 (de)	1989-12-15
DK488785A (da)	1986-04-26
EP0181706B1 (en)	1989-11-15
IL76716A0 (en)	1986-02-28
DE3574257D1 (en)	1989-12-21
US4720560A (en)	1988-01-19
DK488785D0 (da)	1985-10-24
JPS61104079A (ja)	1986-05-22

Publication	Publication Date	Title
IL76716A0 (en)	1986-02-28	Hybrid organometallic compounds,particularly for metal organic chemical vapor deposition
PH21552A (en)	1987-12-11	Infra-red absorber
DE60016685D1 (de)	2005-01-20	Schmiermittelzusammensetzungen die eine Molybdän-Amine Verbindung enthalten
ES8706684A1 (es)	1987-06-16	Un procedimiento para preparar derivados del acido 1-arabiciclo (3,2,0) hept 2-en-7-ona-2-carboxilico.
FI873402A0 (fi)	1987-08-05	Aromatisk metylenbindningar av en aromatisk olja innehaollande metylenbindningar.
ATE124695T1 (de)	1995-07-15	Kondensierte heterocyclische verbindungen, ihre herstellung und verwendung.
HUP9603023A2 (hu)	1998-01-28	Szubsztituált (szulfonimid-amido)-benzoil-guanidin-származékok, eljárás előállításukra és az ezeket tartalmazó gyógyszerkészítmények
KR930022947A (ko)	1993-12-18	제초조성물, 그의 제조방법 및 제초제로서의 사용
HUT47099A (en)	1989-01-30	Process for producing pyridine derivatives and pharmaceutical compositions comprising such compounds
DE3860300D1 (de)	1990-08-16	Tieftemperaturschmieroel.
FI885036A0 (fi)	1988-11-01	Hiilivetykoostumus, kuten polttoaineöljy, ja sen lisäaineet
CA2268286A1 (en)	1998-04-30	Urea grease composition
EP0598910A4 (en)	1994-02-07	METHOD FOR PRODUCING NUCLEOSIDE DERIVATIVES.
ATE35992T1 (de)	1988-08-15	Tris(beta,beta-dimethylphenethyl)zinnverbindungen.
CA2044696A1 (en)	1991-12-29	Process for the production of organosilicon compounds
ES438637A1 (es)	1977-06-01	Procedimiento para preparar derivados de fluorenona.
GB1413764A (en)	1975-11-12	Halogenated aralkyl ethers
ATE88471T1 (de)	1993-05-15	Azolylmethylcyloalkyloxirane, ihre herstellung und verwendung als pflanzenschutzmittel.
DE69609555D1 (de)	2000-09-07	Katalysator für Ethylen-(Co)-Polymerisation mit verbesserter Aktivität
Hui et al.	1986	Hybrid Organometallic Compounds and Process for Metal Organic Chemical Vapour Deposition
ATE225389T1 (de)	2002-10-15	Schmierölzusammensetzung
JPS57206690A (en)	1982-12-18	Transition metal complex compound and manufacture
DE68928684D1 (de)	1998-07-09	Supraleiter und Verfahren zu deren Herstellung
GB2301361A (en)	1996-12-04	High temperature epoxy resins
TW368503B (en)	1999-09-01	Process for preparing carbapenem and penem compounds and new compounds involved in that process