BRPI0402404A - Processo para a preparação de ácido metacrìlico de alta pureza, ácido metacrìlico de alta pureza, e, métodos para impedir a decomposição de hiba dentro de uma corrente contendo ácido metacrìlico e um catalisador ácido, para remover hiba de uma corrente contendo ácido metacrìlico e para purificar uma corrente de maa contendo hiba em um processo de purificação - Google Patents

Processo para a preparação de ácido metacrìlico de alta pureza, ácido metacrìlico de alta pureza, e, métodos para impedir a decomposição de hiba dentro de uma corrente contendo ácido metacrìlico e um catalisador ácido, para remover hiba de uma corrente contendo ácido metacrìlico e para purificar uma corrente de maa contendo hiba em um processo de purificação

Info

Publication number
BRPI0402404A
BRPI0402404A BR0402404-4A BRPI0402404A BRPI0402404A BR PI0402404 A BRPI0402404 A BR PI0402404A BR PI0402404 A BRPI0402404 A BR PI0402404A BR PI0402404 A BRPI0402404 A BR PI0402404A
Authority
BR
Brazil
Prior art keywords
methacrylic acid
hiba
high purity
acid
stream
Prior art date
Application number
BR0402404-4A
Other languages
English (en)
Inventor
Michael Stanley De Courcy
James Edward Elder
Jamie Jerrick John Juliette
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of BRPI0402404A publication Critical patent/BRPI0402404A/pt
Publication of BRPI0402404B1 publication Critical patent/BRPI0402404B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42—Separation; Purification; Stabilisation; Use of additives
    • C07C51/487—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to chemical modification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/02—Sulfur, selenium or tellurium; Compounds thereof
    • B01J27/053—Sulfates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42—Separation; Purification; Stabilisation; Use of additives
    • C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
    • C07C51/44—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation by distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42—Separation; Purification; Stabilisation; Use of additives
    • C07C51/50—Use of additives, e.g. for stabilisation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C57/00—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
    • C07C57/02—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms with only carbon-to-carbon double bonds as unsaturation
    • C07C57/03—Monocarboxylic acids
    • C07C57/04—Acrylic acid; Methacrylic acid
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2527/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • C07C2527/02—Sulfur, selenium or tellurium; Compounds thereof
    • C07C2527/053—Sulfates or other compounds comprising the anion (SnO3n+1)2-
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2527/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • C07C2527/02—Sulfur, selenium or tellurium; Compounds thereof
    • C07C2527/053—Sulfates or other compounds comprising the anion (SnO3n+1)2-
    • C07C2527/054—Sulfuric acid or other acids with the formula H2Sn03n+1

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

"PROCESSO PARA A PREPARAçãO DE áCIDO METACRìLICO DE ALTA PUREZA, áCIDO METACRìLICO DE ALTA PUREZA, E, METODOS PARA IMPEDIR A DECOMPOSIçãO DE HIBA DENTRO DE UMA CORRENTE CONTENDO áCIDO METACRìLICO E UM CATALISADOR áCIDO, PARA REMOVER HIBA DE UMA CORRENTE CONTENDO áCIDO METACRìLICO E PARA PURIFICAR UMA CORRENTE DE MAA CONTENDO HIBA EM UM PROCESSO DE PURIFICAçãO". é fornecido um processo neste relatório para a produção de alto rendimento de ácido metacrílico glacial de alta pureza ('HPMAA') que seja substancialmente puro, especificamente 99% puro ou mais, com teor de água de 0,05% ou menos e baixos níveis de outras impurezas, incluindo HIBA, ácido acrílico, MOMPA, metacroleína e outros. Este processo melhorado compreende o fornecimento de uma corrente de MAA bruto e a purificação da corrente de ácido metacrílico bruto em uma série de etapas sucessivas de destilação envolvendo duas colunas de destilação. O processo da invenção é capaz de produzir o produto de ácido metacrílico de alta pureza que seja especialmente adequado para a produção de polímeros de MAA especiais.
BRPI0402404-4A 2003-06-30 2004-06-17 Processo para a preparação de ácido metacrílico de alta pureza, e, método para purificar uma corrente de MAA contendo HIBA em um processo de purificação BRPI0402404B1 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48370303P 2003-06-30 2003-06-30

Publications (2)

Publication Number Publication Date
BRPI0402404A true BRPI0402404A (pt) 2005-06-14
BRPI0402404B1 BRPI0402404B1 (pt) 2014-09-16

Family

ID=33435272

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0402404-4A BRPI0402404B1 (pt) 2003-06-30 2004-06-17 Processo para a preparação de ácido metacrílico de alta pureza, e, método para purificar uma corrente de MAA contendo HIBA em um processo de purificação

Country Status (7)

Country Link
US (2) US20040267050A1 (pt)
EP (4) EP1493729B1 (pt)
JP (2) JP4032033B2 (pt)
KR (4) KR101095402B1 (pt)
CN (2) CN1847212B (pt)
BR (1) BRPI0402404B1 (pt)
TW (1) TWI298718B (pt)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7128813B2 (en) * 2002-05-01 2006-10-31 Rohm And Haas Company Process for manufacturing high purity methacrylic acid
JP4762829B2 (ja) * 2006-08-23 2011-08-31 東京応化工業株式会社 パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法
KR101175518B1 (ko) * 2006-09-22 2012-08-20 게케엔 드리펠린 인터나쇼날 게엠베하 중공 프로파일 형성방법
JP4960146B2 (ja) * 2007-05-16 2012-06-27 三菱レイヨン株式会社 気体の圧縮方法、ならびにこれを用いた（メタ）アクロレイン及び／または（メタ）アクリル酸の製造方法、およびメチルメタクリレートの製造方法
BRPI0920432A2 (pt) * 2008-10-01 2015-12-22 Arkema Inc controle de um processo para a purificação de ácido (met)acrílico usando análise de iv próximo online
DE102008043609A1 (de) 2008-11-10 2010-05-12 Evonik Röhm Gmbh Verfahren zur Reduzierung des Wassergehalts in (Meth)acrylsäure
CN101838192A (zh) * 2010-05-26 2010-09-22 天津大学 特戊酸粗品精制工艺及装置
KR102069941B1 (ko) * 2013-08-28 2020-01-23 아처 다니엘 미드랜드 캄파니 아크릴산으로부터 프로피온산의 분리
KR101616553B1 (ko) * 2013-08-30 2016-04-28 주식회사 엘지화학 (메트)아크릴산의 연속 회수 방법 및 장치
FR3012140B1 (fr) * 2013-10-18 2016-08-26 Arkema France Unite et procede pour la purification de methacrylate de methyle brut
FR3041958B1 (fr) * 2015-10-06 2019-06-14 Arkema France Procede ameliore de production d’acide (meth)acrylique de grade polymere
IL298782B2 (en) 2020-06-12 2025-07-01 Fujifilm Electronic Mat Usa Inc Solvent purification systems and methods
KR102957396B1 (ko) * 2020-07-31 2026-04-24 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 α-하이드록시카복실산 조성물의 제조 방법
JP7838671B2 (ja) * 2022-10-28 2026-04-01 三菱ケミカル株式会社 メタクリル酸含有組成物、メタクリル酸エステルの製造方法、重合性組成物及びメタクリル酸重合体の製造方法

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Also Published As

Publication number Publication date
BRPI0402404B1 (pt) 2014-09-16
TWI298718B (en) 2008-07-11
JP2007291137A (ja) 2007-11-08
US7723541B2 (en) 2010-05-25
EP1493728A1 (en) 2005-01-05
TW200526569A (en) 2005-08-16
EP2371803A1 (en) 2011-10-05
EP2377843B1 (en) 2014-01-15
KR20120051613A (ko) 2012-05-22
KR101213711B1 (ko) 2012-12-24
CN1847212A (zh) 2006-10-18
CN1847212B (zh) 2010-05-12
KR101160305B1 (ko) 2012-07-02
KR20050005767A (ko) 2005-01-14
KR20110056369A (ko) 2011-05-27
JP2005023060A (ja) 2005-01-27
CN1576266A (zh) 2005-02-09
US20040267050A1 (en) 2004-12-30
KR101095402B1 (ko) 2011-12-16
CN1286795C (zh) 2006-11-29
EP1493729A1 (en) 2005-01-05
EP1493729B1 (en) 2014-12-24
EP2377843A1 (en) 2011-10-19
US20070010690A1 (en) 2007-01-11
KR101180422B1 (ko) 2012-09-10
KR20110123712A (ko) 2011-11-15
JP4032033B2 (ja) 2008-01-16

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 16/09/2014, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 17A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2624 DE 20-04-2021 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.