BRPI0407155A - Conjunto de eletrodo de geração de plasma - Google Patents

Conjunto de eletrodo de geração de plasma

Info

Publication number
BRPI0407155A
BRPI0407155A BR0407155-7A BRPI0407155A BRPI0407155A BR PI0407155 A BRPI0407155 A BR PI0407155A BR PI0407155 A BRPI0407155 A BR PI0407155A BR PI0407155 A BRPI0407155 A BR PI0407155A
Authority
BR
Brazil
Prior art keywords
electrodes
plasma generation
electrode set
housing
wall
Prior art date
Application number
BR0407155-7A
Other languages
English (en)
Inventor
Frank Swallow
Peter Dobbyn
Original Assignee
Dow Corning Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0302265A external-priority patent/GB0302265D0/en
Priority claimed from GB0304094A external-priority patent/GB0304094D0/en
Application filed by Dow Corning Ireland Ltd filed Critical Dow Corning Ireland Ltd
Publication of BRPI0407155A publication Critical patent/BRPI0407155A/pt

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Fluid Mechanics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Capacitors (AREA)
  • Secondary Cells (AREA)

Abstract

"CONJUNTO DE ELETRODO DE GERAçãO DE PLASMA". Um conjunto de geração de descarga de plasma incandescente e/ou de descarga de barreira dielétrica (1) que compreende pelo menos um par de eletrodos substancialmente espaçados eq³idistantes (2), o espaçamento entre os eletrodos sendo adaptado para a formação de uma zona de plasma (8) quando da introdução de um gás de processo e permitindo a passagem, quando requerido, de um precursor(es) gasoso(s), líquido(s) e/ou sólido(s), caracterizado pelo fato de pelo menos um dos eletrodos (2) compreender um alojamento (20) que tem uma parede interna (5) e uma externa (6), onde a parede interna (5) é formada a partir de um material dielétrico não poroso, e cujo alojamento (20) substancialmente retém pelo menos um material condutivo eletricamente substancialmente não metálico.
BR0407155-7A 2003-01-31 2004-01-28 Conjunto de eletrodo de geração de plasma BRPI0407155A (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0302265A GB0302265D0 (en) 2003-01-31 2003-01-31 Plasma generating electrode assembly
GB0304094A GB0304094D0 (en) 2003-02-24 2003-02-24 Plasma generating electrode assembly
PCT/EP2004/001756 WO2004068916A1 (en) 2003-01-31 2004-01-28 Plasma generating electrode assembly

Publications (1)

Publication Number Publication Date
BRPI0407155A true BRPI0407155A (pt) 2006-02-07

Family

ID=32827039

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0407155-7A BRPI0407155A (pt) 2003-01-31 2004-01-28 Conjunto de eletrodo de geração de plasma

Country Status (13)

Country Link
US (2) US20060196424A1 (pt)
EP (1) EP1588592B1 (pt)
JP (1) JP2006515708A (pt)
KR (1) KR101072792B1 (pt)
AT (1) ATE451823T1 (pt)
BR (1) BRPI0407155A (pt)
CA (1) CA2513327A1 (pt)
DE (1) DE602004024500D1 (pt)
EA (1) EA010388B1 (pt)
ES (1) ES2336329T3 (pt)
MX (1) MXPA05008024A (pt)
TW (1) TW200423824A (pt)
WO (1) WO2004068916A1 (pt)

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7622693B2 (en) 2001-07-16 2009-11-24 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US8764978B2 (en) 2001-07-16 2014-07-01 Foret Plasma Labs, Llc System for treating a substance with wave energy from an electrical arc and a second source
WO2005039752A1 (en) 2003-10-15 2005-05-06 Dow Corning Ireland Limited Manufacture of resins
US7573202B2 (en) * 2004-10-04 2009-08-11 The Board Of Trustees Of The University Of Illinois Metal/dielectric multilayer microdischarge devices and arrays
GB0423685D0 (en) 2004-10-26 2004-11-24 Dow Corning Ireland Ltd Improved method for coating a substrate
WO2006048649A1 (en) * 2004-11-05 2006-05-11 Dow Corning Ireland Limited Plasma system
DE102005001158B4 (de) * 2005-01-10 2016-11-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Barrierenentladungselektroden mit Kühlung und Vorrichtung mit einer solchen Barrierenentladungselektrode
US7477017B2 (en) 2005-01-25 2009-01-13 The Board Of Trustees Of The University Of Illinois AC-excited microcavity discharge device and method
KR100909750B1 (ko) * 2005-03-01 2009-07-29 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치 및 반도체 디바이스의 제조 방법
JP5017906B2 (ja) * 2005-04-19 2012-09-05 東洋製罐株式会社 プラズマｃｖｄ用マイクロ波供給装置及び該マイクロ波供給装置を備えた蒸着膜形成装置
JP4405973B2 (ja) * 2006-01-17 2010-01-27 キヤノンアネルバ株式会社 薄膜作製装置
JP2007199091A (ja) * 2006-01-20 2007-08-09 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ
JP4942360B2 (ja) * 2006-02-20 2012-05-30 積水化学工業株式会社 プラズマ処理装置の電極構造
JP2007257962A (ja) * 2006-03-22 2007-10-04 Sekisui Chem Co Ltd 放電処理装置および放電処理方法
US8281734B2 (en) 2006-05-02 2012-10-09 Dow Corning Ireland, Ltd. Web sealing device
JP2009535514A (ja) 2006-05-02 2009-10-01 ダウ・コーニング・アイルランド・リミテッド 流体交換システム
KR100675752B1 (ko) * 2006-09-14 2007-01-30 (주) 씨엠테크 플라즈마 반응기
WO2008042128A1 (en) * 2006-10-03 2008-04-10 Dow Global Technologies, Inc. Improved plasma electrode
RU2366119C2 (ru) * 2006-10-18 2009-08-27 Общество С Ограниченной Ответственностью "Вмк-Оптоэлектроника" Головка для аналитического газового плазматрона
DE102006060932A1 (de) 2006-12-20 2008-07-03 Carl Freudenberg Kg Temperaturstabile plasmabehandelte Gebilde und Verfahren zu deren Herstellung
JP5654238B2 (ja) * 2006-12-28 2015-01-14 ネーデルランツ オルガニサティー フォール トゥーゲパストナトゥールヴェテンシャッペリーク オンデルズーク テーエンオー 表面誘電体バリア放電プラズマユニット、および表面プラズマを発生させる方法
ITMI20070350A1 (it) * 2007-02-23 2008-08-24 Univ Milano Bicocca Metodo di lavorazine a plasma atmosferico per il trattamento dei materiali
WO2009021988A1 (fr) * 2007-08-14 2009-02-19 Universite Libre De Bruxelles Procédé de dépôt de nanoparticules sur un support
US8857371B2 (en) 2007-08-31 2014-10-14 Toshiba Mitsubishi-Electric Industrial Systems Corporation Apparatus for generating dielectric barrier discharge gas
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma
US8278810B2 (en) 2007-10-16 2012-10-02 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
US9230777B2 (en) 2007-10-16 2016-01-05 Foret Plasma Labs, Llc Water/wastewater recycle and reuse with plasma, activated carbon and energy system
US9445488B2 (en) 2007-10-16 2016-09-13 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US9185787B2 (en) 2007-10-16 2015-11-10 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US8810122B2 (en) 2007-10-16 2014-08-19 Foret Plasma Labs, Llc Plasma arc torch having multiple operating modes
US9516736B2 (en) 2007-10-16 2016-12-06 Foret Plasma Labs, Llc System, method and apparatus for recovering mining fluids from mining byproducts
US10267106B2 (en) 2007-10-16 2019-04-23 Foret Plasma Labs, Llc System, method and apparatus for treating mining byproducts
US9761413B2 (en) 2007-10-16 2017-09-12 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US8074439B2 (en) 2008-02-12 2011-12-13 Foret Plasma Labs, Llc System, method and apparatus for lean combustion with plasma from an electrical arc
US11806686B2 (en) 2007-10-16 2023-11-07 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US9051820B2 (en) 2007-10-16 2015-06-09 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US9560731B2 (en) 2007-10-16 2017-01-31 Foret Plasma Labs, Llc System, method and apparatus for an inductively coupled plasma Arc Whirl filter press
NL1036272A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
US10244614B2 (en) 2008-02-12 2019-03-26 Foret Plasma Labs, Llc System, method and apparatus for plasma arc welding ceramics and sapphire
US8904749B2 (en) 2008-02-12 2014-12-09 Foret Plasma Labs, Llc Inductively coupled plasma arc device
JP2010016225A (ja) * 2008-07-04 2010-01-21 Tokyo Electron Ltd 温度調節機構および温度調節機構を用いた半導体製造装置
DE202009011521U1 (de) 2009-08-25 2010-12-30 INP Greifswald Leibniz-Institut für Plasmaforschung und Technologie e. V. Plasma-Manschette
DE102010001606A1 (de) * 2010-02-04 2011-08-04 Laser-Laboratorium Göttingen eV, 37077 Hohltrichterförmiger Plasmagenerator
US20130038196A1 (en) * 2010-04-30 2013-02-14 Agc Glass Europe Electrode for a dbd plasma process
KR101101364B1 (ko) * 2010-05-07 2012-01-02 유정호 웨이퍼 처리를 위한 다중 플라즈마 발생 장치
WO2011139128A2 (ko) * 2010-05-07 2011-11-10 나노세미콘(주) 웨이퍼 처리를 위한 다중 플라즈마 발생 장치
KR101022538B1 (ko) * 2010-07-02 2011-03-16 광주과학기술원 플라즈마 발생장치 및 이를 구비하는 플라즈마 분광분석장치
US9090492B2 (en) 2011-02-18 2015-07-28 Sealite Engineering, Inc. Microchlorine generation for anti-biofouling
JP5795065B2 (ja) * 2011-06-16 2015-10-14 京セラ株式会社 プラズマ発生体及びプラズマ発生装置
CN102914567A (zh) * 2011-08-05 2013-02-06 中国科学院寒区旱区环境与工程研究所 多路沙地水分动态监测仪
US9815072B2 (en) 2011-10-12 2017-11-14 1366 Technologies Inc. Apparatus for depositing a thin layer of polymer resist on a substrate
CN102361531B (zh) * 2011-10-26 2013-07-03 西安电子科技大学 大面积均匀非磁化等离子体产生装置及方法
ES2769350T3 (es) 2011-11-11 2020-06-25 Univ Saga Dispositivo de generación de plasma para suprimir descargas localizadas
KR101337047B1 (ko) 2012-01-11 2013-12-06 강원대학교산학협력단 상압 플라즈마 장치
GB2501933A (en) * 2012-05-09 2013-11-13 Linde Ag device for providing a flow of non-thermal plasma
WO2013173578A2 (en) * 2012-05-18 2013-11-21 Rave N.P., Inc. Contamination removal apparatus and method
CN102956432B (zh) * 2012-10-19 2015-07-22 京东方科技集团股份有限公司 显示基板的大气压等离子体处理装置
US9408287B2 (en) 2012-11-27 2016-08-02 General Electric Company System and method for controlling plasma induced flow
CN105143413B (zh) 2012-12-11 2017-07-04 弗雷特等离子实验室公司 高温逆流涡动反应器系统、方法和装置
US9175389B2 (en) * 2012-12-21 2015-11-03 Intermolecular, Inc. ALD process window combinatorial screening tool
KR101462765B1 (ko) * 2013-03-08 2014-11-21 성균관대학교산학협력단 패턴화된 세포 배양용 기판의 제조방법, 패턴화된 세포 배양용 기판 및 세포칩
CA2902195C (en) 2013-03-12 2016-06-07 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US20150022075A1 (en) * 2013-07-22 2015-01-22 Anderson Remplex, Inc. Dielectric Barrier Discharge Apparatus
TWI486996B (zh) * 2013-12-04 2015-06-01 Ind Tech Res Inst 電漿裝置及電漿裝置的操作方法
CZ305156B6 (cs) * 2013-12-19 2015-05-20 Masarykova Univerzita Způsob plazmové úpravy vnitřního a/nebo vnějšího povrchu dutého elektricky nevodivého tělesa a zařízení pro provádění tohoto způsobu
GB201401146D0 (en) * 2014-01-23 2014-03-12 Linde Ag Non-thermal plasma
US20170072628A1 (en) * 2014-05-28 2017-03-16 Drexel University Nozzle for selectively generating either plasma or ultraviolet radiation
JP6584787B2 (ja) * 2015-02-13 2019-10-02 株式会社日立ハイテクノロジーズ プラズマイオン源および荷電粒子ビーム装置
CN111876751A (zh) * 2015-02-18 2020-11-03 株式会社尼康 电子器件制造装置及方法、半导体装置和显示器
US10669653B2 (en) * 2015-06-18 2020-06-02 Kevin Kremeyer Directed energy deposition to facilitate high speed applications
RU2601335C1 (ru) * 2015-07-06 2016-11-10 Федеральное государственное бюджетное учреждение науки Институт физики твердого тела Российской академии наук (ИФТТ РАН) Способ нанесения массивов углеродных нанотрубок на металлические подложки
SG10202109874VA (en) 2017-01-19 2021-10-28 Open Monoclonal Tech Inc Human antibodies from transgenic rodents with multiple heavy chain immunoglobulin loci
DE102017118652A1 (de) * 2017-08-16 2019-02-21 Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen Plasmageneratormodul und dessen Verwendung
CN111052873B (zh) * 2017-09-06 2022-10-28 东芝三菱电机产业系统株式会社 活性气体生成装置
CN108347868A (zh) * 2018-04-26 2018-07-31 苏州工业职业技术学院 一种电力电子管路结构
EP3565386A1 (en) * 2018-04-30 2019-11-06 Universiteit Gent Method for plasma powder treatment and coating
KR102123734B1 (ko) * 2018-08-20 2020-06-17 광운대학교 산학협력단 플라즈마 소스
CN111199959B (zh) * 2018-11-19 2021-11-02 台达电子企业管理（上海）有限公司 功率模块的封装结构
KR20200060559A (ko) * 2018-11-20 2020-06-01 세메스 주식회사 본딩 장치 및 본딩 방법
CN113491174A (zh) * 2018-12-20 2021-10-08 机械解析有限公司 用于等离子体放电设备的电极组件
DE102020104533B4 (de) 2020-02-20 2022-03-24 Bernd Deutsch Fluidbehandlungsvorrichtung, Elektrodengitter dafür und Baueinheit aus einer Mehrzahl solcher Elektrodengitter
JP7516700B2 (ja) * 2020-06-10 2024-07-17 サカタインクス株式会社 プラズマ含有ガス製造装置
US12060677B2 (en) * 2021-04-01 2024-08-13 Saudi Arabian Oil Company Systems and methods for the functionalization of polyolefin fibers
TWI780758B (zh) * 2021-06-09 2022-10-11 國立中山大學 電漿處理裝置及其方法
CN113560150A (zh) * 2021-07-15 2021-10-29 南京工业大学 一种用于农膜材料防尘涂层沉积的等离子体改性装置
KR20230051871A (ko) 2021-10-12 2023-04-19 삼성전자주식회사 기판 처리 장치 및 방법
JP7726521B2 (ja) * 2021-10-12 2025-08-20 国立大学法人東京科学大学 プラズマによる対象物の処理方法およびシステム
CN115151011B (zh) * 2022-06-15 2025-02-28 珠海格力电器股份有限公司 气液两相介质阻挡放电装置、电极以及电极的制作方法
CN115475498A (zh) * 2022-08-25 2022-12-16 大连海事大学 一种船舶废气等离子体脱除装置的余热回收系统

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3707024A (en) * 1971-03-31 1972-12-26 Us Agriculture Method for electrostatically bulking and impregnating staple yarns
GB1401692A (en) * 1972-03-23 1975-07-30 Electricity Council Ozonisers
US4130490A (en) * 1977-05-23 1978-12-19 Lovelace Alan M Administrator Electric discharge for treatment of trace contaminants
EP0240648B1 (de) * 1986-04-02 1988-10-05 Franz Plasser Bahnbaumaschinen-Industriegesellschaft m.b.H. Gleis-Schotterbett-Reinigungsmaschine mit Siebanlage
DE3623225A1 (de) * 1986-07-10 1988-01-21 Heinkel E M Kg Hochfrequenzozonisator
JPS6398958A (ja) * 1986-10-15 1988-04-30 Sanyo Electric Co Ltd 二次電池
DE3866533D1 (de) * 1988-01-30 1992-01-09 Rieter Ag Maschf Waermeabfuhr von textilmaschinen.
US4999136A (en) * 1988-08-23 1991-03-12 Westinghouse Electric Corp. Ultraviolet curable conductive resin
DE69032691T2 (de) * 1989-12-07 1999-06-10 Japan Science And Technology Corp., Kawaguchi, Saitama Verfahren und Gerät zur Plasmabehandlung unter atmosphärischem Druck
JPH03188285A (ja) 1989-12-15 1991-08-16 Oki Electric Ind Co Ltd ドライエッチング装置
CN1026186C (zh) 1990-09-27 1994-10-12 机械电子工业部第四十九研究所 一种制作介质薄膜的方法
US5478429A (en) * 1993-01-20 1995-12-26 Tokyo Electron Limited Plasma process apparatus
US5387775A (en) * 1993-03-31 1995-02-07 The United States Of America As Represented By The United States Department Of Energy Apparatus for the plasma destruction of hazardous gases
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
JP3341179B2 (ja) 1994-01-31 2002-11-05 イーシー化学株式会社 大気圧グロ−放電用電極及び該電極を使用したプラズマ処理方法
ES2088825B1 (es) * 1994-11-15 1997-03-01 Biozon Sociedad Limitada Procedimiento, formula e instalacion para el tratamiento y esterilizacion de los residuos biologicos, solidos, liquidos, metalicos ferricos, metalicos no ferricos, toxicos y peligrosos hospistalarios.
JP3806847B2 (ja) 1995-11-24 2006-08-09 イーシー化学株式会社 大気圧グロー放電プラズマによる粉体の処理方法及び装置
JPH1131608A (ja) 1997-07-10 1999-02-02 Hitachi Cable Ltd 保護抵抗
DE59914876D1 (de) * 1998-07-08 2008-11-06 Infineon Technologies Ag Verfahren zur herstellung einer integrierten schaltungsanordnung umfassend einen hohlraum in einer materialschicht, sowie eine durch das verfahren erzeugte integrierte schaltungsanordnung
RU2159520C1 (ru) * 1999-04-30 2000-11-20 Камский политехнический институт Плазмотрон с жидкими электродами (варианты)
JP2001035835A (ja) 1999-07-16 2001-02-09 Sachiko Okazaki プラズマ処理方法及びプラズマ処理装置
EP1073091A3 (en) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
GB9928781D0 (en) 1999-12-02 2000-02-02 Dow Corning Surface treatment
JP2003516211A (ja) * 1999-12-08 2003-05-13 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Ｘ線吸収度を調整しうるフィルタ素子を有するフィルタとｘ線吸収センサとを具えるｘ線装置
AU2001224729A1 (en) * 2000-01-10 2001-07-24 Tokyo Electron Limited Segmented electrode assembly and method for plasma processing
US6232723B1 (en) * 2000-02-09 2001-05-15 Igor Alexeff Direct current energy discharge system
KR100755241B1 (ko) * 2000-05-29 2007-09-04 가부시키가이샤 아도테쿠 프라즈마 테쿠노로지 피처리물처리장치 및 그것을 사용한 플라즈마설비
JP5349726B2 (ja) * 2000-10-04 2013-11-20 ダウ・コーニング・アイルランド・リミテッド コーティングを形成するための方法および装置
MY138190A (en) 2000-10-26 2009-05-29 Dow Corning Ireland Ltd An Irish Company An atmospheric pressure plasma assembly
CN1180151C (zh) 2001-04-10 2004-12-15 中国科学院化学研究所 羊毛纤维制品的防缩处理方法
JP3641608B2 (ja) * 2001-11-22 2005-04-27 東芝三菱電機産業システム株式会社 オゾン発生器
GB0208261D0 (en) 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly

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TW200423824A (en) 2004-11-01
ES2336329T3 (es) 2010-04-12
US20060196424A1 (en) 2006-09-07
MXPA05008024A (es) 2006-01-27
DE602004024500D1 (de) 2010-01-21
US7892611B2 (en) 2011-02-22
KR101072792B1 (ko) 2011-10-14
WO2004068916A1 (en) 2004-08-12
US20110006039A1 (en) 2011-01-13
EA010388B1 (ru) 2008-08-29
ATE451823T1 (de) 2009-12-15
EA200501210A1 (ru) 2005-12-29
EP1588592A1 (en) 2005-10-26
CA2513327A1 (en) 2004-08-12
JP2006515708A (ja) 2006-06-01
KR20050103201A (ko) 2005-10-27

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