BRPI0608389A2 - equipamento e método para aplicar uma camada fina uniforme de lìquido em substratos - Google Patents

equipamento e método para aplicar uma camada fina uniforme de lìquido em substratos

Info

Publication number
BRPI0608389A2
BRPI0608389A2 BRPI0608389-7A BRPI0608389A BRPI0608389A2 BR PI0608389 A2 BRPI0608389 A2 BR PI0608389A2 BR PI0608389 A BRPI0608389 A BR PI0608389A BR PI0608389 A2 BRPI0608389 A2 BR PI0608389A2
Authority
BR
Brazil
Prior art keywords
liquid
equipment
applying
substrates
uniform thin
Prior art date
Application number
BRPI0608389-7A
Other languages
English (en)
Inventor
Johann Brunner
Helmut Kalmbach
Josef Gentischer
Christian Buchner
Original Assignee
Schmid Technology Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schmid Technology Systems Gmbh filed Critical Schmid Technology Systems Gmbh
Publication of BRPI0608389A2 publication Critical patent/BRPI0608389A2/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0615—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced at the free surface of the liquid or other fluent material in a container and subjected to the vibrations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3306—Horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Special Spraying Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Coating Apparatus (AREA)
  • Photovoltaic Devices (AREA)
  • Silicon Compounds (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

EQUIPAMENTO E METODO PARA APLICAR UMA CAMADA FINA UNIFORME DE LìQUIDO EM SUBSTRATOS. A presente invenção refere-se a um equipamento (10) para aplicar uma camada fina uniforme de líquido, especialmente de ácido fosfórico, em células de sílicio (12) para a técnica fotovoltaica, com uma câmara de processo (14) que possuí uma bacia de líquido (16) e um dispositivo de som de alta freqUência (11) que transforma o líquido em uma névoa de líquido (15) e dotado com um equipamento de transporte (13) para as células de silício (12), disposto abaixo de um poço sob pressão (25) da câmara de processo (14) . De acordo com a presente invenção, tal equipamento (10) permite uma aplicação mais homogênea de líquido sobre as células de sílicio no que se refere tanto à superfície e à quantidade aplicada, isto pode ser alcançado pelo fato de que o poço sob pressão (25) para a névoa de líquido da câmara de processo (14) passa por um adelgaçamento do seu diâmetro livre em direção ao equipamento de transporte 13, desembocando em uma disposição de poço de passagem (40) que cobre o equipamento de transporte (13) para os substratos de sílicio (12) e que os diâmetros livres da extremidade da abertura do poço sob pressão (25) para névoa de liquido (25) e da disposição de poço de passagem (40) são mutuamente adaptados, de preferência, são essencialmente idênticos.
BRPI0608389-7A 2005-04-22 2006-03-28 equipamento e método para aplicar uma camada fina uniforme de lìquido em substratos BRPI0608389A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005019686A DE102005019686B3 (de) 2005-04-22 2005-04-22 Einrichtung und Verfahren zum Aufbringen einer gleichmäßigen, dünnen Flüssigkeitsschicht auf Substrate
PCT/EP2006/002797 WO2006111247A1 (de) 2005-04-22 2006-03-28 Einrichtung und verfahren zum aufbringen einer gleichmässigen, dünnen flüssigkeitsschicht auf substrate

Publications (1)

Publication Number Publication Date
BRPI0608389A2 true BRPI0608389A2 (pt) 2009-12-29

Family

ID=36089158

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0608389-7A BRPI0608389A2 (pt) 2005-04-22 2006-03-28 equipamento e método para aplicar uma camada fina uniforme de lìquido em substratos

Country Status (14)

Country Link
US (1) US8136478B2 (pt)
EP (1) EP1872386B1 (pt)
JP (1) JP4955656B2 (pt)
KR (1) KR20080009132A (pt)
CN (1) CN100594583C (pt)
AT (1) ATE481732T1 (pt)
AU (1) AU2006237053B8 (pt)
BR (1) BRPI0608389A2 (pt)
CA (1) CA2604256A1 (pt)
DE (2) DE102005019686B3 (pt)
ES (1) ES2349656T3 (pt)
IL (1) IL186720A0 (pt)
RU (1) RU2405227C2 (pt)
WO (1) WO2006111247A1 (pt)

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Publication number Priority date Publication date Assignee Title
DE102005019686B3 (de) * 2005-04-22 2006-04-13 Schmid Technology Systems Gmbh Einrichtung und Verfahren zum Aufbringen einer gleichmäßigen, dünnen Flüssigkeitsschicht auf Substrate
US8323220B2 (en) * 2008-09-19 2012-12-04 Eilaz Babaev Spider vein treatment apparatus
US8376969B2 (en) * 2008-09-22 2013-02-19 Bacoustics, Llc Methods for treatment of spider veins
EP2190017A1 (en) 2008-11-20 2010-05-26 SAPHIRE ApS High voltage semiconductor based wafer
WO2010057978A1 (en) 2008-11-20 2010-05-27 Saphire Aps High voltage semiconductor based wafer and a solar module having integrated electronic devices
DE102009059042A1 (de) * 2009-12-10 2011-06-16 Schmid Technology Gmbh Verfahren und Vorrichtung zur Übertragung von Drucksubstanz von einem Drucksubstanzträger auf ein Substrat
CN102284393B (zh) * 2010-06-17 2014-04-02 海洋王照明科技股份有限公司 一种荧光粉涂覆装置及使用该涂覆装置的涂覆方法
CN103250230B (zh) * 2010-12-13 2016-08-31 Tp太阳能公司 掺杂剂涂布系统以及涂布蒸气化掺杂化合物于光伏太阳能晶圆的方法
AT512219B1 (de) 2011-12-02 2016-06-15 Braincon Handels-Gmbh Zerstäubungsvorrichtung
FR2995728B1 (fr) * 2012-09-14 2014-10-24 Commissariat Energie Atomique Dispositif et procede de restauration des cellules solaires a base de silicium avec transducteur ultrason
JP5680604B2 (ja) * 2012-10-29 2015-03-04 株式会社川熱 防食被膜付き鉄筋棒の製造装置
FI125920B (en) * 2013-09-09 2016-04-15 Beneq Oy A method of coating a substrate
FR3023735B1 (fr) * 2014-07-17 2016-07-29 Areco Finances Et Tech - Arfitec Nebuliseur compact pour rafraichir l'air
DE102014112625A1 (de) 2014-09-02 2016-03-03 Schmid Energy Systems Gmbh Großflächen-Ultraschallverdampfer
CL2018003252A1 (es) * 2018-11-16 2019-03-15 Un sistema de nebulizacion en linea por ultrasonido, útil en la disposición de agentes agroquimicos para la fruta de postcosecha
US11458500B2 (en) * 2020-08-24 2022-10-04 Bloomy Lotus Limited Focused ultrasonic atomizer
CN215062598U (zh) * 2021-05-13 2021-12-07 中山市斯泰尔电器科技有限公司 一种新型聚能装置及超声波加湿器

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Also Published As

Publication number Publication date
US20090053397A1 (en) 2009-02-26
AU2006237053A1 (en) 2006-10-26
AU2006237053B2 (en) 2011-06-02
DE102005019686B3 (de) 2006-04-13
EP1872386B1 (de) 2010-09-15
JP4955656B2 (ja) 2012-06-20
ES2349656T3 (es) 2011-01-10
CA2604256A1 (en) 2006-10-26
CN101164139A (zh) 2008-04-16
JP2008536669A (ja) 2008-09-11
AU2006237053A8 (en) 2011-07-07
RU2405227C2 (ru) 2010-11-27
IL186720A0 (en) 2008-02-09
AU2006237053B8 (en) 2011-07-07
KR20080009132A (ko) 2008-01-24
RU2007137829A (ru) 2009-05-27
WO2006111247A1 (de) 2006-10-26
ATE481732T1 (de) 2010-10-15
EP1872386A1 (de) 2008-01-02
DE502006007888D1 (de) 2010-10-28
CN100594583C (zh) 2010-03-17
US8136478B2 (en) 2012-03-20

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A ANUI DADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2211 DE 21/05/2013.