BRPI0715723A2 - indicadores de doses de uv - Google Patents

indicadores de doses de uv

Info

Publication number
BRPI0715723A2
BRPI0715723A2 BRPI0715723-1A2A BRPI0715723A BRPI0715723A2 BR PI0715723 A2 BRPI0715723 A2 BR PI0715723A2 BR PI0715723 A BRPI0715723 A BR PI0715723A BR PI0715723 A2 BRPI0715723 A2 BR PI0715723A2
Authority
BR
Brazil
Prior art keywords
dose indicators
indicators
dose
Prior art date
Application number
BRPI0715723-1A2A
Other languages
English (en)
Inventor
Katia Studer
Tunja Jung
Kurt Dietliker
Urs Lehmann
Original Assignee
Ciba Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding Inc filed Critical Ciba Holding Inc
Publication of BRPI0715723A2 publication Critical patent/BRPI0715723A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Laminated Bodies (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Measurement Of Radiation (AREA)
BRPI0715723-1A2A 2006-08-24 2007-08-15 indicadores de doses de uv BRPI0715723A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06119455 2006-08-24
PCT/EP2007/058422 WO2008022952A1 (en) 2006-08-24 2007-08-15 Uv-dosis indicators

Publications (1)

Publication Number Publication Date
BRPI0715723A2 true BRPI0715723A2 (pt) 2013-09-17

Family

ID=38293999

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0715723-1A2A BRPI0715723A2 (pt) 2006-08-24 2007-08-15 indicadores de doses de uv

Country Status (8)

Country Link
US (1) US8049186B2 (pt)
EP (1) EP2054769A1 (pt)
JP (1) JP2010501655A (pt)
KR (1) KR20090043591A (pt)
CN (1) CN101506734B (pt)
BR (1) BRPI0715723A2 (pt)
RU (1) RU2453886C2 (pt)
WO (1) WO2008022952A1 (pt)

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US9121776B2 (en) 2009-11-13 2015-09-01 Lincoln Global, Inc. Welding arc apparel with UV or thermochromic activated images
US8284385B2 (en) * 2009-11-13 2012-10-09 Lincoln Global, Inc. Welding arc apparel with UV activated images
EP2501778A2 (en) * 2009-11-16 2012-09-26 Basf Se Multi color, photoactive, color changing compositions
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US8445864B2 (en) 2011-08-26 2013-05-21 Raytheon Company Method and apparatus for anti-biofouling of a protected surface in liquid environments
US9776219B2 (en) 2013-01-17 2017-10-03 Raytheon Company Method and apparatus for removing biofouling from a protected surface in a liquid environment
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TWI624890B (zh) 2013-08-22 2018-05-21 櫻花彩色筆股份有限公司 Indicator for electronic component manufacturing apparatus, and design and/or management method of the same
KR102342177B1 (ko) 2014-02-14 2021-12-21 사쿠라 컬러 프로덕츠 코포레이션 플라즈마 처리 감지 표시기
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WO2018070360A1 (ja) * 2016-10-11 2018-04-19 株式会社村田製作所 揮発性有機物検知体及びその製造方法、揮発性有機物の検知方法並びに揮発性有機物検知装置
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JPWO2022181289A1 (pt) * 2021-02-26 2022-09-01
CN116868034A (zh) 2021-02-26 2023-10-10 富士胶片株式会社 紫外线感测部件、微胶囊、微胶囊的制造方法、用于形成紫外线感测层的分散液、紫外线感测试剂盒
WO2022181332A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知キット、紫外線測定方法、および、紫外線感知キット用ユニット
WO2022181285A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
EP4299690A4 (en) * 2021-02-26 2024-07-31 FUJIFILM Corporation Uv radiation sensitive member and uv radiation sensitive kit
WO2022181321A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
JPWO2022209858A1 (pt) * 2021-03-31 2022-10-06
GB2617847B (en) 2022-04-21 2024-05-22 Intellego Tech Ab Sweden Stable UV indicator
CN119497711A (zh) * 2022-05-13 2025-02-21 二次3D股份有限公司 用于形成物体的光引发剂、组合物和方法
WO2023220841A1 (en) * 2022-05-19 2023-11-23 Jianguo Wen A detecting element for visualizing the intensity distribution of microwave field, and method of preparation and use thereof

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Also Published As

Publication number Publication date
US8049186B2 (en) 2011-11-01
EP2054769A1 (en) 2009-05-06
RU2453886C2 (ru) 2012-06-20
US20090194708A1 (en) 2009-08-06
CN101506734A (zh) 2009-08-12
WO2008022952A1 (en) 2008-02-28
JP2010501655A (ja) 2010-01-21
CN101506734B (zh) 2012-04-11
KR20090043591A (ko) 2009-05-06
RU2009110250A (ru) 2010-09-27

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2320 DE 23-06-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.