BRPI0820988A2 - Galvanic bath, process for galvanic separation and use of a bipolar diaphragm for separation in a galvanic bath - Google Patents

Galvanic bath, process for galvanic separation and use of a bipolar diaphragm for separation in a galvanic bath

Info

Publication number
BRPI0820988A2
BRPI0820988A2 BRPI0820988-0A BRPI0820988A BRPI0820988A2 BR PI0820988 A2 BRPI0820988 A2 BR PI0820988A2 BR PI0820988 A BRPI0820988 A BR PI0820988A BR PI0820988 A2 BRPI0820988 A2 BR PI0820988A2
Authority
BR
Brazil
Prior art keywords
galvanic
separation
bath
galvanic bath
bipolar diaphragm
Prior art date
Application number
BRPI0820988-0A
Other languages
Portuguese (pt)
Inventor
Hartmut Trenkner
Alexander Jimenez
Original Assignee
Coventya Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coventya Gmbh filed Critical Coventya Gmbh
Publication of BRPI0820988A2 publication Critical patent/BRPI0820988A2/en
Publication of BRPI0820988B1 publication Critical patent/BRPI0820988B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cosmetics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
BRPI0820988-0A 2007-12-14 2008-12-15 galvanic bath, process for galvanic separation and use of a bipolar diaphragm for separation in a galvanic bath and use of a bipolar diaphragm to prevent anodic decomposition BRPI0820988B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007060200.8 2007-12-14
DE102007060200A DE102007060200A1 (en) 2007-12-14 2007-12-14 Galvanic bath, process for electrodeposition and use of a bipolar membrane for separation in a galvanic bath
PCT/EP2008/010635 WO2009077146A2 (en) 2007-12-14 2008-12-15 Galvanic bath, method for galvanic deposition, and use of a bipolar membrane for separating in a galvanic bath

Publications (2)

Publication Number Publication Date
BRPI0820988A2 true BRPI0820988A2 (en) 2015-08-04
BRPI0820988B1 BRPI0820988B1 (en) 2018-12-04

Family

ID=40394014

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0820988-0A BRPI0820988B1 (en) 2007-12-14 2008-12-15 galvanic bath, process for galvanic separation and use of a bipolar diaphragm for separation in a galvanic bath and use of a bipolar diaphragm to prevent anodic decomposition

Country Status (6)

Country Link
EP (1) EP2235236B1 (en)
BR (1) BRPI0820988B1 (en)
DE (1) DE102007060200A1 (en)
ES (1) ES2396801T3 (en)
PL (1) PL2235236T3 (en)
WO (1) WO2009077146A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2489763A1 (en) * 2011-02-15 2012-08-22 Atotech Deutschland GmbH Zinc-iron alloy layer material
JP5805055B2 (en) * 2012-11-24 2015-11-04 丸仲工業株式会社 Horizontal conveyance type electroplating equipment
JP5995906B2 (en) 2014-05-19 2016-09-21 株式会社豊田中央研究所 Manufacturing method of diaphragm and manufacturing method of metal coating
RU2610183C1 (en) * 2015-07-22 2017-02-08 Дипсол Кемикалз Ко., Лтд. Electroplating with zinc alloy
WO2016075964A1 (en) 2015-07-22 2016-05-19 ディップソール株式会社 Zinc alloy plating method
CN106987879A (en) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 Electrodeposition apparatus and electrodeposition method thereof
EP3696299A1 (en) 2019-02-15 2020-08-19 Coventya GmbH Method for producing a corrosion-resistant aluminum-silicon alloy casting, corresponding corrosion-resistant aluminum-silicon alloy casting and its use
CN111663167A (en) * 2020-06-16 2020-09-15 合肥工业大学 Metal wire preparation method based on BPE technology
CN113025829B (en) * 2021-04-26 2022-12-06 福建师范大学 A method of using bipolar membrane electrodialysis to treat copper ore smelting waste residue

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (en) * 1991-03-18 1992-10-08 Hans Josef May Zinc@ metal strip electrochemical coating - using ionic exchange membrane preventing oxygen@ and chlorine@ gases at anode contaminating cathodic area for metal salt redn.
DE29615084U1 (en) * 1996-08-29 1996-10-24 Ko, Chien-Hsin, Taipeh/T`ai-pei Device for the continuous electroplating of plates
DE19834353C2 (en) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkaline zinc-nickel bath
US6827832B2 (en) * 1999-12-22 2004-12-07 National Research Council Of Canada Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
ES2250166T5 (en) 2000-06-15 2016-05-20 Coventya Inc Zinc-Nickel Electroplating
US6528185B2 (en) * 2001-02-28 2003-03-04 Hong Kong Polytechnic University Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
DE10225203A1 (en) 2002-06-06 2003-12-18 Goema Ag Method and device for returning rinsing water and cleaning a process bath
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
WO2006004662A1 (en) * 2004-06-25 2006-01-12 Ge Ionics, Inc. Bipolar membrane and method of making same

Also Published As

Publication number Publication date
WO2009077146A3 (en) 2010-01-14
WO2009077146A2 (en) 2009-06-25
PL2235236T3 (en) 2013-03-29
EP2235236A2 (en) 2010-10-06
BRPI0820988B1 (en) 2018-12-04
DE102007060200A1 (en) 2009-06-18
ES2396801T3 (en) 2013-02-27
EP2235236B1 (en) 2012-10-03

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 15/12/2008, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 17A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2859 DE 21-10-2025 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.